INSPEC

GenISys GmbH

Application Filed: 2023-07-24
Trademark Application Details
Trademark Logo INSPEC
630
Live/Pending
NEW APPLICATION - RECORD INITIALIZED NOT ASSIGNED TO EXAMINER
Research OneLook Acronym Finder
Serial Number79379510
Mark Drawing Code4000: Illustration: Drawing with word(s)/letter(s)/number(s) in Block form

Timeline

2023-07-24Application Filed
2023-09-28Location: INITIAL REVIEW/SERIALIZATION BRANCH(MAILROOM)
2023-09-28Status: Live/Pending
2023-09-29Transaction Date

Trademark Applicants & Owners

Owner: GenISys GmbH
AddressEschenstr. 66 82024 Taufkirchen DE
Legal Entity TypeGesellschaft Mit Beschränkter Haftung (gmbh)
Legal Entity State DE

Documents

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Attorney of Record

Heiko Dumlich
Voltastrasse 5
13355 Berlin

FED REP GERMANY

Good, Services, and Codes

International Codes:9
U.S. Codes:021,023,026,036,038
International Codes:42
U.S. Codes:100,101
Type CodeType
GS0091Downloadable computer software for remote monitoring and analysis for use in patterning, processing in the fields of micro and nanoscale science and technology, manufacturing in the fields of micro- and nanoscale science and technology, lithography, microscopy, simulation in the fields of micro- and nanoscale science and technology, classification in the fields of micro- and nanoscale science and technology, metrology, inspection, and defect detection; software for monitoring, analysing, controlling and running physical world operations all in the fields of micro- and nanoscale science and technology; computer software for use in remote meter monitoring; measuring, detecting, monitoring and controlling devices; scanning electron microscopes; scanning probe microscopes; apparatus and instruments for scanning probe microscopy; metering software, recognition software, monitoring software, control software, the aforementioned goods for use in patterning, processing in the fields of micro- and nanoscale science and technology, manufacturing in the fields of micro- and nanoscale science and technology, lithography, microscopy, simulation in the fields of micro- and nanoscale science and technology, classification in the fields of micro- and nanoscale science and technology, metrology, inspection, and defect detection; software, for use in the following fields: metrology; software, for use in the following fields: control of micro structuring and nano structuring systems; software, for use in the following fields: control of lithography systems; software, for use in the following fields: classification in the fields of micro- and nanoscale science and technology; software, for use in the following fields: detection of defects; software, for use in the following fields: process control in the fields of micro- and nanoscale science and technology; software, for use in the following fields: process monitoring in the fields of micro- and nanoscale science and technology; microscopy software; software, for use in relation to the following goods: scanning electron microscopes; software, for use in the following fields: surface structuring; software, for use in the following fields: surface analysis; software, for use in the following fields: material analyzes; automation software for use in patterning, processing in the fields of micro- and nanoscale science and technology, manufacturing in the fields of micro- and nanoscale science and technology, lithography, microscopy, simulation in the fields of micro- and nanoscale science and technology, classification in the fields of micro- and nanoscale science and technology, metrology, inspection, and defect detection; simulation software for use in patterning, processing in the fields of micro- and nanoscale science and technology, manufacturing in the fields of micro- and nanoscale science and technology, lithography, microscopy, simulation in the fields of micro- and nanoscale science and technology, classification in the fields of micro- and nanoscale science and technology, metrology, inspection, and defect detection; software, for use in the following fields: monte carlo simulations; simulation software, for use in the following fields: material analyzes; simulation software, for use in the following fields: surface analysis; simulation software, for use in the following fields: scanning electron microscopes; calibration software; measuring sensors; computer hardware for use in patterning, processing in the fields of micro- and nanoscale science and technology, manufacturing in the fields of micro- and nanoscale science and technology, lithography, microscopy, simulation in the fields of micro- and nanoscale science and technology, classification in the fields of micro- and nanoscale science and technology, metrology, inspection, and defect detection

Trademark Filing History

DescriptionDateEvent Coding
SN ASSIGNED FOR SECT 66A APPL FROM IB2023-09-281 REPR M:
NEW APPLICATION OFFICE SUPPLIED DATA ENTERED2023-09-292 NWOS I:Incoming Correspondence
APPLICATION FILING RECEIPT MAILED2023-10-033 MAFR O:Outgoing Correspondence
LETTER OF PROTEST EVIDENCE FORWARDED2023-12-094 LOPT I:Incoming Correspondence
ASSIGNED TO EXAMINER2024-03-275 DOCK D:Assigned to Examiner
LETTER OF PROTEST EVIDENCE REVIEWED-NO FURTHER ACTION TAKEN2024-03-276 LOPR P:
NON-FINAL ACTION WRITTEN2024-03-277 CNRT R:Renewal
NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW2024-03-288 RFCR E:E-Mail
REFUSAL PROCESSED BY MPU2024-04-159 RFRR P:
NON-FINAL ACTION MAILED - REFUSAL SENT TO IB2024-04-1510 RFCS P:
REFUSAL PROCESSED BY IB2024-05-0811 RFNT P:

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