HIPSTER

Ionautics AB

Trademark Registered: 2021-06-29
Trademark Application Details
Trademark Logo HIPSTER
630
Live/Pending
NEW APPLICATION - RECORD INITIALIZED NOT ASSIGNED TO EXAMINER
Research OneLook Acronym Finder
Serial Number79290530
Registration Number6398910
Mark Drawing Code4000: Illustration: Drawing with word(s)/letter(s)/number(s) in Block form

Timeline

2020-06-22Application Filed
2020-07-30Location: INITIAL REVIEW/SERIALIZATION BRANCH(MAILROOM)
2020-07-30Status: Live/Pending
2020-08-04Transaction Date
2021-06-29Trademark Registered

Trademark Applicants & Owners

Owner: Ionautics AB
Entity StatementAB (Aktiebolag)
AddressUvebergsvägen 45 SE-589 31 LINKÖPING SE
Legal Entity Type
Legal Entity State SE

Documents

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Attorney of Record

AWA SWEDEN AB
Junkersgatan 1
SE-582 35 Linköping
SWEDEN

Good, Services, and Codes

International Codes:7
U.S. Codes:013,019,021,023,031,034,035
Type CodeType
GS0071Machine tools and power tools; generators; machine coupling and transmission components (except for land vehicles); engines and motors not for land vehicles; vacuum plating machines; plasma surface treatment machines; plasma spraying machines; coating machines and apparatus; machines for finishing; machines for surface deposition; plasma etching machines; plasma cutting machines; plasma welding machines; machine plasma arc torches; machines and machine tools for treatment of materials and for manufacturing; material production and processing machines; sputtering machines; sputter coating guns; plasma generator for etching, photoresist removal, strip, sputtering, deposition, chemical vapor deposition, ion implantation, ion milling, wafer conditioning, on wafer clean, on wafer preclean, material engineering through assisting plasma, surface preconditioning, and surface preparation; parts and fittings for all the aforesaid goods
GS0071Vacuum plating machines; plasma surface treatment machines; plasma spraying machines; coating machines and apparatus, namely, sputter coating machines, physical vapor deposition (PVD) machines, plasma-enhanced chemical deposition (CVD) machines; machines for finishing, namely, plasma etching machines; plasma cutting machines; electric plasma welding machines; plasma machines arc cutting torches; machines and machine tools for treatment of materials and for manufacturing, namely, material production and processing coating machines and machines for surface deposition; material production and processing machines, namely, plasma treatment machines and machines for deposition of protective films on surfaces of a variety of organic and inorganic materials; sputtering machines for the application of protective thin film depositions to glass, plastic and other material substrates; sputter powder coating guns; electric plasma generator for etching, photoresist removal, stripping, sputtering, deposition, chemical vapor deposition, ion implantation, ion milling, wafer conditioning, wafer cleaning, wafer pre-cleaning, material engineering through assisting plasma, surface preconditioning, and surface preparation; parts and fittings for all the aforesaid goods

Trademark Filing History

DescriptionDateEvent Coding
SN ASSIGNED FOR SECT 66A APPL FROM IB2020-07-301 REPR M:
LIMITATION FROM ORIGINAL APPLICATION ENTERED2020-08-012 LIMI I:Incoming Correspondence
NEW APPLICATION OFFICE SUPPLIED DATA ENTERED IN TRAM2020-08-043 NWOS I:Incoming Correspondence
APPLICATION FILING RECEIPT MAILED2020-08-084 MAFR O:Outgoing Correspondence
ASSIGNED TO EXAMINER2020-09-245 DOCK D:Assigned to Examiner
NON-FINAL ACTION WRITTEN2020-09-246 CNRT R:Renewal
NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW2020-09-257 RFCR E:E-Mail
REFUSAL PROCESSED BY MPU2020-10-168 RFRR P:
NON-FINAL ACTION MAILED - REFUSAL SENT TO IB2020-10-169 RFCS P:
REFUSAL PROCESSED BY IB2020-11-0810 RFNT P:
TEAS RESPONSE TO OFFICE ACTION RECEIVED2021-03-0511 TROA I:Incoming Correspondence
CORRESPONDENCE RECEIVED IN LAW OFFICE2021-03-0512 CRFA I:Incoming Correspondence
TEAS/EMAIL CORRESPONDENCE ENTERED2021-03-0613 TEME I:Incoming Correspondence
EXAMINERS AMENDMENT -WRITTEN2021-03-0914 CNEA R:Renewal
EXAMINERS AMENDMENT E-MAILED2021-03-0915 GNEA O:Outgoing Correspondence
NOTIFICATION OF EXAMINERS AMENDMENT E-MAILED2021-03-0916 GNEN O:Outgoing Correspondence
EXAMINER'S AMENDMENT ENTERED2021-03-0917 XAEC I:Incoming Correspondence
APPROVED FOR PUB - PRINCIPAL REGISTER2021-03-0918 CNSA O:Outgoing Correspondence
NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED2021-03-2419 NONP E:E-Mail
NOTICE OF START OF OPPOSITION PERIOD CREATED, TO BE SENT TO IB2021-03-2420 OP2R P:
NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB2021-03-2421 OPNS P:
NOTIFICATION PROCESSED BY IB2021-04-1222 GPNX P:
PUBLISHED FOR OPPOSITION2021-04-1323 PUBO A:Allowance for Publication
OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED2021-04-1324 NPUB E:E-Mail
REGISTERED-PRINCIPAL REGISTER2021-06-2925 R.PR A:Allowance for Publication
FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB2021-09-2926 FICR P:
FINAL DISPOSITION PROCESSED2021-10-2927 FIMP P:
FINAL DISPOSITION NOTICE SENT TO IB2021-10-2928 FICS P:
FINAL DECISION TRANSACTION PROCESSED BY IB2021-11-2329 FINO P:
NEW REPRESENTATIVE AT IB RECEIVED2023-10-2930 NREP P:

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