STRATUM
Oxford Instruments Nanotechnology ToolsLimited
Application Filed: 2013-02-01
Trademark Application Details
REGISTERED
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| Serial Number | 79128106 |
| Registration Number | 4508602 |
| Mark Drawing Code | 4000: Illustration: Drawing with word(s)/letter(s)/number(s) in Block form |
| Domestic Representative | Leigh Ann Lindquist |
| Attorney Name | Leigh Ann Lindquist |
| Attorney Docket Number | S20400 |
| Law Office Assigned | M50 |
| Employee Name | LEWIS, SHAILA E |
Timeline
| 2013-02-01 | Application Filed |
| 2014-01-21 | Published for Opposition |
| 2014-04-08 | Location: PUBLICATION AND ISSUE SECTION |
| 2014-04-08 | Status: Live/Registered |
| 2014-04-08 | Trademark Registered |
| 2019-04-08 | Transaction Date |
Trademark Applicants & Owners
| Owner: |  Oxford Instruments Nanotechnology ToolsLimited |
| Entity Statement | Limited Company |
| Address | Tubney Woods Abingdon, Oxon OX13 5QX GB |
| Legal Entity Type | |
| Legal Entity State | GB |
Documents
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Attorney of Record
Good, Services, and Codes
| International Codes: | 9 |
| U.S. Codes: | 021,023,026,036,038 |
| Type Code | Type |
|---|---|
| GS0091 | Apparatus and instruments in the field of plasma technology and semiconductor processing, plasma sources, sources for generating plasma, namely, plasma etching apparatus comprising scientific instruments to ionise gas for the etching of silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments used to etch silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments for the creation of plasma, scientific instruments used to ionise gas in a reaction chamber; apparatus and instruments for plasma generation, sources for generating ionized gas plasma, comprising scientific instruments for the creation of plasma, scientific instruments used to ionise gas in a reaction chamber, creation of plasma via induction coupling; plasma research apparatus and instruments, namely, plasma etching apparatus comprising scientific instruments to ionise gas for the etching of silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments used to etch silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers; plasma cluster tools, namely, scientific apparatus comprising multiple plasma etching chambers sharing a common vacuum wafer loading module, all being laboratory apparatus and instruments; computer hardware and software for use in operating the aforesaid goods; structural parts and fittings for all the aforesaid goods |
Trademark Filing History
| Description | Date | Event Coding |
|---|---|---|
| SN ASSIGNED FOR SECT 66A APPL FROM IB | 2013-04-18 | 1 REPR M: |
| NEW APPLICATION OFFICE SUPPLIED DATA ENTERED IN TRAM | 2013-04-23 | 2 NWOS I:Incoming Correspondence |
| APPLICATION FILING RECEIPT MAILED | 2013-04-27 | 3 MAFR O:Outgoing Correspondence |
| ASSIGNED TO EXAMINER | 2013-05-06 | 4 DOCK D:Assigned to Examiner |
| NON-FINAL ACTION WRITTEN | 2013-05-06 | 5 CNRT R:Renewal |
| NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW | 2013-05-07 | 6 RFCR E:E-Mail |
| REFUSAL PROCESSED BY MPU | 2013-05-07 | 7 RFRR P: |
| NON-FINAL ACTION MAILED - REFUSAL SENT TO IB | 2013-05-08 | 8 RFCS P: |
| REFUSAL PROCESSED BY IB | 2013-05-26 | 9 RFNT P: |
| TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED | 2013-10-31 | 10 REAP I:Incoming Correspondence |
| ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED | 2013-10-31 | 11 ARAA I:Incoming Correspondence |
| TEAS RESPONSE TO OFFICE ACTION RECEIVED | 2013-11-08 | 12 TROA I:Incoming Correspondence |
| ASSIGNED TO LIE | 2013-11-12 | 13 ALIE A:Allowance for Publication |
| CORRESPONDENCE RECEIVED IN LAW OFFICE | 2013-11-19 | 14 CRFA I:Incoming Correspondence |
| TEAS/EMAIL CORRESPONDENCE ENTERED | 2013-11-19 | 15 TEME I:Incoming Correspondence |
| APPROVED FOR PUB - PRINCIPAL REGISTER | 2013-12-11 | 16 CNSA O:Outgoing Correspondence |
| LAW OFFICE PUBLICATION REVIEW COMPLETED | 2013-12-13 | 17 PREV O:Outgoing Correspondence |
| NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED | 2014-01-01 | 18 NONP E:E-Mail |
| NOTICE OF START OF OPPOSITION PERIOD CREATED, TO BE SENT TO IB | 2014-01-01 | 19 OP2R P: |
| NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB | 2014-01-01 | 20 OPNS P: |
| NOTIFICATION PROCESSED BY IB | 2014-01-16 | 21 GPNX P: |
| PUBLISHED FOR OPPOSITION | 2014-01-21 | 22 PUBO A:Allowance for Publication |
| OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED | 2014-01-21 | 23 NPUB E:E-Mail |
| REGISTERED-PRINCIPAL REGISTER | 2014-04-08 | 24 R.PR A:Allowance for Publication |
| FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB | 2014-07-08 | 25 FICR P: |
| FINAL DISPOSITION PROCESSED | 2014-07-18 | 26 FIMP P: |
| FINAL DISPOSITION NOTICE SENT TO IB | 2014-07-18 | 27 FICS P: |
| FINAL DECISION TRANSACTION PROCESSED BY IB | 2014-08-08 | 28 FINO P: |
| COURTESY REMINDER - SEC. 71 (6-YR) E-MAILED | 2019-04-08 | 29 REM3 E:E-Mail |
| TEAS SECTION 71 & 15 RECEIVED | 2020-04-09 | 30 ES75 I:Incoming Correspondence |
| CASE ASSIGNED TO POST REGISTRATION PARALEGAL | 2020-05-13 | 31 APRE A:Allowance for Publication |
| REGISTERED - SEC. 71 ACCEPTED & SEC. 15 ACK. | 2020-05-15 | 32 C75A O:Outgoing Correspondence |
| NOTICE OF ACCEPTANCE OF SEC. 71 & 15 - E-MAILED | 2020-05-15 | 33 NA75 E:E-Mail |
| COURTESY REMINDER - SEC. 71 (10-YR) E-MAILED | 2023-04-08 | 34 REM4 E:E-Mail |
| DEATH OF INTERNATIONAL REGISTRATION | 2023-08-26 | 35 DETH P: |
| NOTIFICATION OF EFFECT OF CANCELLATION OF INTL REG E-MAILED | 2023-08-26 | 36 DENC E:E-Mail |
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