GS0011 | chemical reagents for non-medical purposes; chemical compositions capable of undergoing change by processing to yield chemical products for use in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits; solvent compositions for use in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits; doping compounds for use in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits; chemical compositions that yield decomposition products or reaction products in processes employing same, for use in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits; etchants for use in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits; photoresists; chemicals for use in electrochemical deposition processes in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits; metal plating chemical compositions; gases used for deposition, etching, lithography, planarization, plasma treatment, ashing, cleaning, ion implantation, and annealing, in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits; materials used for deposition, etching, lithography, planarization, plasma treatment, ashing, cleaning, ion implantation, and annealing, in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits; doping compound gases and chemical vapor deposition precursor gases for use in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits; chemicals for use in treating hazardous gases produced in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits, to reduce the hazardous character of such gases; chemical source materials for the deposition of thin films in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits; organometallic chemicals for use in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits; ion implantation precursors for use in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits; chemicals for use in chemical reagent delivery systems for use in the manufacture of microelectronic products, semiconductors, digital storage media and flat-panel displays; gases provided in a gas supply container holding adsorbent material on which the gas is adsorbed, for use in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits, for deposition, etching, lithography, planarization, plasma treatment, ashing, cleaning, ion implantation, and annealing; gaseous chemicals in vapor or liquid form, for use in deposition, etching, lithography, planarization, plasma treatment, ashing, cleaning, ion implantation and annealing, in the manufacture of microelectronic products, semiconductors, flat-panel displays, integrated circuits and in testing and qualification thereof; consumable solid, liquid and gaseous chemical compositions and cleaning compositions for use in the manufacture of semiconductors and flat panels; gases adsorbed on adsorbents in gas supply containers for sub-atmospheric pressure gas dispensing, for use in deposition, etching, lithography, planarization, plasma treatment, ashing, cleaning, ion implantation and annealing, in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits; solid adsorbents for use in storage and dispensing of gases for use in deposition, etching, lithography, planarization, plasma treatment, ashing, cleaning, ion implantation and anneling, in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits; ionic liquid storage media for use in storage and dispensing of gases for use in deposition, etching, lithography, planarization, plasma treatment, ashing, cleaning, ion implantation and annealing, in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits; chemical storage media for use in storage and dispensing of gases for use in deposition, etching, lithography, planarization, plasma treatment, ashing, cleaning, ion implantation and annealing, in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits; solid and liquid chemicals provided in a vapor supply container for use in generating vapor for manufacture of microelectronic products, semiconductors, flat-panel displays, integrated circuits, electronic systems and subsystems; chemical compositions useful for removing microelectronics manufacturing fabrication materials from microelectronic products such as wafers and microelectronic devices, that are rejected after such microelectronics manufacturing fabrication materials have been deposited on them, and that are recycled following the removal of such materials; adsorbent materials having industrial gases adsorbed thereon |