VISTEC

Vistec Electron Beam Gmbh

Application Filed: 2006-09-18
Trademark Application Details
Trademark Logo VISTEC

Mark For: VISTEC® trademark registration is intended to cover the categories of [ Research, development and technological consultation in the field of electron beam writing; creation of software for electron beam writing and process technology, in particular for simulating and optimizing high resolution electron beam writing and nanometer process technologies; technological advisory and consultation services in the field of ] machines, apparatus and instruments for use in the electronics, micro-lithography, semi-conductor, integrated circuit, [ magnetic domain memories ] and integrated optical systems industries; design, maintenance and development of computer software for use in the electronics, micro-lithography, [ semi-conductor, integrated circuit, magnetic domain memories and integrated optical systems industries and for the design, testing and fabrication of photo-lithographic masks; ] technological advisory and consultation services in connection with the design, testing and fabrication of photo-lithographic masks.

Status

2021-05-08 UTC
LIVE REGISTRATION Issued and Active
The trademark application has been registered with the Office.


Research OneLook Acronym Finder
Serial Number77001615
Registration Number3376869
Mark Literal ElementsVISTEC
Mark Drawing Type4 - STANDARD CHARACTER MARK
Mark TypeService Mark
Current LocationGENERIC WEB UPDATE 2018-02-01
Basis1(a)
Class StatusACTIVE
Primary US Classes
  • 100: Miscellaneous
  • 101: Advertising and Business
Primary International Class
  • 042 - Primary Class
  • (Computer, scientific & legal) Scientific and technological services and research and design relating thereto: industrial analysis and research services; design and development of computer hardware and software; legal services.
Filed UseYes
Current UseYes
Intent To UseNo
Filed ITUNo
44D FiledNo
44E CurrentNo
66A CurrentNo
Current BasisNo
No BasisNo
Domestic RepresentativePhilip A. Jones
Attorney NameRoxana A. Sullivan
Attorney Docket Number30115-103853
Law Office AssignedL70
Employee NamePAPPAS, MATTHEW JAMES

Timeline

2006-04-04Date of First Use
2006-04-04Date of Use In Commerce
2006-09-18Application Filed
2007-11-20Published
2007-11-20Published for Opposition
2008-02-05Trademark Registered
2018-02-01Location: GENERIC WEB UPDATE
2018-02-01Status: Live/Registered
2018-02-01Status: The registration has been renewed.
2018-02-05Renewal Date
2018-07-08Transaction Date
2027-02-05Maintenance Early File Date
2028-02-07Maintenance On Time Date
2028-08-07Maintenance Late Fee Date

Trademark Parties (Applicants & Owners)

Party: VISTEC ELECTRON BEAM GMBH
AddressIlmstrasse 4 JENA GERMANY 07743
Legal Entity TypeLimited Liability Company
Legal Entity StateGERMANY

Attorney of Record

Roxana A. Sullivan
Dennemeyer & Associates, LLC
2 North Riverside Plaza, Suite 1500
Chicago, IL 60606

Good, Services, and Codes

International Codes:42
U.S. Codes:100,101
Type CodeType
GS0421[ Research, development and technological consultation in the field of electron beam writing; creation of software for electron beam writing and process technology, in particular for simulating and optimizing high resolution electron beam writing and nanometer process technologies; technological advisory and consultation services in the field of ] machines, apparatus and instruments for use in the electronics, micro-lithography, semi-conductor, integrated circuit, [ magnetic domain memories ] and integrated optical systems industries; design, maintenance and development of computer software for use in the electronics, micro-lithography, [ semi-conductor, integrated circuit, magnetic domain memories and integrated optical systems industries and for the design, testing and fabrication of photo-lithographic masks; ] technological advisory and consultation services in connection with the design, testing and fabrication of photo-lithographic masks

Trademark Filing History

DescriptionDateProceeding Number
REGISTERED AND RENEWED (FIRST RENEWAL - 10 YRS)2018-02-0176874
REGISTERED - SEC. 8 (10-YR) ACCEPTED/SEC. 9 GRANTED2018-02-0176874
NOTICE OF ACCEPTANCE OF SEC. 8 & 9 - E-MAILED2018-02-01
CASE ASSIGNED TO POST REGISTRATION PARALEGAL2018-02-0176874
TEAS SECTION 8 & 9 RECEIVED2018-01-10
COURTESY REMINDER - SEC. 8 (10-YR)/SEC. 9 E-MAILED2017-02-05
REGISTERED - SEC. 8 (6-YR) ACCEPTED & SEC. 15 ACK.2014-02-1175461
NOTICE OF ACCEPTANCE OF SEC. 8 & 15 - E-MAILED2014-02-11
CASE ASSIGNED TO POST REGISTRATION PARALEGAL2014-02-1175461
TEAS SECTION 8 & 15 RECEIVED2014-01-30
REGISTERED - SEC. 8 (6-YR) & SEC. 15 FILED2014-01-3075461
TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED2013-11-19
ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED2013-11-19
AUTOMATIC UPDATE OF ASSIGNMENT OF OWNERSHIP2012-07-18
AUTOMATIC UPDATE OF ASSIGNMENT OF OWNERSHIP2008-04-16
REGISTERED-PRINCIPAL REGISTER2008-02-05
ASSIGNED TO EXAMINER2008-01-2474645
PUBLISHED FOR OPPOSITION2007-11-20
NOTICE OF PUBLICATION2007-10-31
LAW OFFICE PUBLICATION REVIEW COMPLETED2007-10-1571373
APPROVED FOR PUB - PRINCIPAL REGISTER2007-10-15
TEAS/EMAIL CORRESPONDENCE ENTERED2007-10-0168658
TEAS RESPONSE TO OFFICE ACTION RECEIVED2007-06-12
CORRESPONDENCE RECEIVED IN LAW OFFICE2007-06-1268658
EXAMINERS AMENDMENT AND/OR PRIORITY ACTION - COMPLETED2007-02-1283171
EXAMINER'S AMENDMENT/PRIORITY ACTION MAILED2007-02-12
COMBINED EXAMINER'S AMENDMENT/PRIORITY ACTION ENTERED2007-02-1271373
ASSIGNED TO LIE2007-02-1271373
ASSIGNED TO EXAMINER2007-02-0783171
NEW APPLICATION ENTERED IN TRAM2006-09-21

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