ATMI

Mark For: ATMI® trademark registration is intended to cover the categories of chemical reagents, namely, epitaxial thin film materials, organometallic source reagent compounds and complexes, and ion implantation materials, all for use in the electronics and semiconductor manufacturing industry; chemicals for use in chemical reagent delivery systems for use in the manufacture of semiconductors; processing gases for use in the manufacture of semiconductors, flat panel displays, compact discs and recording media; sub-atmospheric pressure gases for ion implantation and chemical vapor deposition; chemicals for treating hazardous gases in semiconductor applications; manufacturing chemicals for the tool hardening industry and for research and development laboratories, all for use in the manufacture of semiconductors; chemical reagents for use in the manufacture of semiconductors in the electronics and semiconductor manufacturing industry. [all]

>Color is not claimed as a feature of the mark.

Status

2022-06-15 UTC
⟳ Refresh

DEAD REGISTRATION Cancelled Invalidated

Research	OneLook Acronym Finder
Serial Number	76550175
Registration Number	3310234
Mark Literal Elements	ATMI
Mark Drawing Type	3 - AN ILLUSTRATION DRAWING WHICH INCLUDES WORD(S)/ LETTER(S)/NUMBER(S)
Mark Type	TRADEMARK. SERVICE MARK
Standard Character Claim	No
Register	PRINCIPAL
Current Location	PUBLICATION AND ISSUE SECTION 2007-10-16
Basis	1(a)
Class Status	SECTION 8 - CANCEL
Primary US Classes	001: Raw or Partly Prepared Materials 005: Adhesives 006: Chemicals and Chemical Compositions 010: Fertilizers 026: Measuring and Scientific Appliances 046: Foods and Ingredients of Foods
Primary International Class	001 - Primary Class (Chemicals) Chemicals used in industry, science and photography, as well as in agriculture, horticulture and forestry; unprocessed artificial resins, unprocessed plastics; manures; fire extinguishing compositions; tempering and soldering preparations; chemical substances for preserving foodstuffs; tanning substances; adhesives used in industry.
Filed Use	Yes
Current Use	Yes
Intent To Use	No
Filed ITU	No
44D Filed	No
44E Current	No
66A Current	No
Current Basis	No
No Basis	No
Cancellation Code	2
Attorney Name	Arlene L. Hornilla
Attorney Docket Number	200300517US
Law Office Assigned	L60
Employee Name	MAYS, PAULA BENITA

Timeline

(CANCELLED)
IC 001. US 001 005 006 010 026 046. G & S: Chemical reagents, namely, epitaxial thin film materials, organometallic source reagent compounds and complexes, and ion implantation materials, all for use in the electronics and semiconductor manufacturing industry; chemicals for use in chemical reagent delivery systems for use in the manufacture of semiconductors; processing gases for use in the manufacture of semiconductors, flat panel displays, compact discs and recording media; sub-atmospheric pressure gases for ion implantation and chemical vapor deposition; chemicals for treating hazardous gases in semiconductor applications; manufacturing chemicals for the tool hardening industry and for research and development laboratories, all for use in the manufacture of semiconductors; chemical reagents for use in the manufacture of semiconductors in the electronics and semiconductor manufacturing industry. FIRST USE: 19941130. FIRST USE IN COMMERCE: 19941130(CANCELLED)
IC 006. US 002 012 013 014 023 025 050. G & S: Metallic containers for storing chemicals; manually operated metal inlet, outlet, and refill valves; manually operated metal manifolds for transferring chemicals; pipes and tubes of metal for transferring chemicals; metal chemical delivery cabinets for housing metal containers, valves, manifolds and pipes of metal; all for use in chemical delivery and refill canister systems. FIRST USE: 19941130. FIRST USE IN COMMERCE: 19941130(CANCELLED)
IC 007. US 013 019 021 023 031 034 035. G & S: Semiconductor manufacturing machines. FIRST USE: 19941130. FIRST USE IN COMMERCE: 19941130(CANCELLED)
IC 009. US 021 023 026 036 038. G & S: Apparatus and instruments for monitoring and control of manufacturing processes; encoded integrated circuit cards and encoded smart cards, containing programming used to facilitate interactive consumer transactions; non-destructive gas analyzers; silicon wafers and epitaxial thin films sold as a component of electrical/electronic substrates. FIRST USE: 19941130. FIRST USE IN COMMERCE: 19941130(CANCELLED)
IC 011. US 013 021 023 031 034. G & S: Abatement apparatus, namely, scrubbers, oxidizers, concentrators, reactors, sorbers and incinerators, for the treatment of effluents from semiconductor manufacturing processes. FIRST USE: 19941130. FIRST USE IN COMMERCE: 19941130(CANCELLED)
IC 022. US 001 002 007 019 022 042 050. G & S: Disposable bulk container liners. FIRST USE: 20000710. FIRST USE IN COMMERCE: 20000710(CANCELLED)
IC 035. US 100 101 102. G & S: Providing product information by telecommunications interaction and in person in the field of advanced materials and chemical precursors and products thereof, namely, thin film materials, organometallic source reagent compounds, chemical mechanical polishing preparations, chemical vapor deposition equipment, and chemical reagent delivery systems for chemical vapor deposition, semiconductor and superconductor materials and chemical reagents, materials packaging, and semiconductor processing. FIRST USE: 19941130. FIRST USE IN COMMERCE: 19941130(CANCELLED)
IC 037. US 100 103 106. G & S: Construction, installation, maintenance, and deinstallation of manufacturing equipment. FIRST USE: 19941123. FIRST USE IN COMMERCE: 19941123(CANCELLED)
IC 040. US 100 103 106. G & S: Custom semiconductor manufacturing material treatment services. FIRST USE: 19941123. FIRST USE IN COMMERCE: 19941123(CANCELLED)
IC 042. US 100 101. G & S: Technical consultation and support services, namely, trouble-shooting, engineering design, maintenance, needs analysis, and assistance in product and process implementation, and cooperative technology development services, in the field of integrated circuits, electronic systems and subsystems, equipment and software for the non-destructive analysis of materials, equipment and software for monitoring fluids and fluid streams to determine the presence, characteristics and concentration of specific materials in such streams, analytical monitoring and process control equipment, and chemical analysis equipment. FIRST USE: 19941123. FIRST USE IN COMMERCE: 19941123