Mark For: SUPERMASK™ trademark registration is intended to cover the category of
>The lining is a feature of the mark and does not indicate color.
Research | OneLook Acronym Finder |
Serial Number | 76451383 |
Mark Literal Elements | SUPERMASK |
Mark Drawing Type | 3 - AN ILLUSTRATION DRAWING WHICH INCLUDES WORD(S)/ LETTER(S)/NUMBER(S) |
Mark Type | TRADEMARK |
Standard Character Claim | No |
Register | PRINCIPAL |
Current Location | DIVISIONAL UNIT 2004-03-23 |
Basis | 1(b) |
Class Status | ACTIVE |
Primary US Classes |
|
Primary International Class |
|
Filed Use | No |
Current Use | No |
Intent To Use | Yes |
Filed ITU | Yes |
44D Filed | No |
44E Current | No |
66A Current | No |
Current Basis | No |
No Basis | No |
Domestic Representative | LACKENBACH SIEGEL MARZULLO ARONSON & GREENSPAN, P.C. |
Attorney Name | Howard N. Aronson |
Law Office Assigned | M40 |
Employee Name | REGAN, JOHN B |
2002-09-20 | Application Filed |
2003-12-30 | Published |
2003-12-30 | Published for Opposition |
2004-03-23 | Location: DIVISIONAL UNIT |
2004-09-24 | Abandon |
2004-09-24 | Status: Abandoned because no Statement of Use or Extension Request timely filed after Notice of Allowance was issued. To view all docume |
2004-09-24 | Status: Dead/Abandoned |
2018-07-08 | Transaction Date |
Party: | Supermask Co., Ltd. |
Address | 1/F, R3-A Building High Technical Industrial Zone Shenzhen CHINA |
Legal Entity Type | Corporation |
Legal Entity State | CHINA |
Application | 2002-09-20 | |
Drawing | 2002-09-20 | |
Duplicate Application | 2002-09-20 | |
Duplicate Drawing | 2002-09-20 | |
Offc Action Outgoing | 2003-02-10 | |
XSearch Search Summary | 2003-02-10 | |
XSearch Search Summary | 2003-02-10 | |
Offc Action Outgoing | 2003-02-11 | |
Amended Drawing | 2003-07-09 | |
Paper Correspondence Incoming | 2003-07-09 | |
Response to Office Action | 2003-07-09 | |
File Jacket | 2003-07-22 | |
Unclassified-Other | 2003-07-22 | |
Paper Correspondence Incoming | 2003-09-10 | |
Examiners Amendment | 2003-10-27 | |
Notation to File | 2003-10-27 | |
Notice of Publication | APPLICATION/XML | 2003-12-10 |
Notice of Allowance | 2004-03-12 | |
Notice of Abandonment | APPLICATION/XML | 2005-01-26 |
26.03.21 | Ovals that are completely or partially shaded |
26.17.01 | Bands, straight; Bars, straight; Lines, straight; Straight line(s), band(s) or bar(s) |
26.17.06 | Bands, diagonal; Bars, diagonal; Diagonal line(s), band(s) or bar(s); Lines, diagonal |
27.03.01 | Geometric figures forming letters, numerals or punctuation |
260312 | Ovals with bars, bands and lines |
260321 | Ovals that are completely or partially shaded |
261701 | Bands, straight; Bars, straight; Lines, straight; Straight line(s), band(s) or bar(s) |
261706 | Bands, diagonal; Bars, diagonal; Diagonal line(s), band(s) or bar(s); Lines, diagonal |
270301 | Geometric figures forming letters, numerals or punctuation |
(ABANDONED)
IC 009. US 021 023 026 036 038. G & S: photo-mask substrate and photo-chrome mask for use in LCD displays for photography and all types of film
International Codes: | 9 |
U.S. Codes: | 021,023,026,036,038 |
Type Code | Type |
---|---|
D10000 | "SUPERMASK" |
Description | Date | Proceeding Number |
---|---|---|
ABANDONMENT NOTICE MAILED - NO USE STATEMENT FILED | 2005-01-26 | |
ABANDONMENT - NO USE STATEMENT FILED | 2005-01-26 | 47164 |
NOA MAILED - SOU REQUIRED FROM APPLICANT | 2004-03-23 | |
PUBLISHED FOR OPPOSITION | 2003-12-30 | |
NOTICE OF PUBLICATION | 2003-12-10 | |
PREVIOUS ALLOWANCE COUNT WITHDRAWN | 2003-10-27 | |
EXAMINERS AMENDMENT E-MAILED | 2003-10-27 | |
APPROVED FOR PUB - PRINCIPAL REGISTER | 2003-10-27 | |
PAPER RECEIVED | 2003-09-10 | |
APPROVED FOR PUB - PRINCIPAL REGISTER | 2003-08-14 | |
CASE FILE IN TICRS | 2003-07-24 | |
PAPER RECEIVED | 2003-07-09 | |
CORRESPONDENCE RECEIVED IN LAW OFFICE | 2003-07-07 | |
NON-FINAL ACTION MAILED | 2003-02-11 | |
ASSIGNED TO EXAMINER | 2003-02-03 | 77658 |
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