APF

Applied Materials, Inc.

Application Filed: 2002-06-05
Trademark Application Details
Trademark Logo APF

Mark For: APF® trademark registration is intended to cover the categories of semiconductor wafer processing equipment, operational software, and components, namely-- epitaxial reactors, chemical vapor deposition reactors, physical vapor deposition reactors, plasma etchers, ion implanters, and chemical mechanical polishers; all for the processing and production of semiconductor substrates, thin films, silicon discs and wafers. [all]

Status

2022-07-21 UTC
LIVE REGISTRATION Issued and Active
The trademark application has been registered with the Office.


Research OneLook Acronym Finder
Serial Number76417719
Registration Number3165553
Mark Literal ElementsAPF
Mark Drawing Type1 - TYPESET WORD(S) /LETTER(S) /NUMBER(S)
Mark TypeTRADEMARK
Standard Character ClaimNo
RegisterPRINCIPAL
Affidavit TextSECT 15. SECT 8 (6-YR). SECTION 8(10-YR) 20161118.
Affidavit Text1ST RENEWAL 20161118
Current LocationGENERIC WEB UPDATE 2016-11-18
Basis1(a)
Class StatusACTIVE
Primary US Classes
  • 021: Electrical Apparatus, Machines and Supplies
  • 023: Cutlery, Machinery, Tools and Parts Thereof
  • 026: Measuring and Scientific Appliances
  • 036: Musical Instruments and Supplies
  • 038: Prints and Publications
Primary International Class
  • 009 - Primary Class
  • (Electrical and scientific apparatus) Scientific, nautical, surveying, electric, photographic, cinematographic, optical, weighing, measuring, signaling, checking (supervision), lifesaving and teaching apparatus and instruments; apparatus for recording, transmission or reproduction of sound or images; magnetic data carriers, recording discs; automatic vending machines and mechanisms for coin operated apparatus; cash registers, calculating machines, data processing equipment and computers; fire-extinguishing apparatus.
Filed UseNo
Current UseYes
Intent To UseNo
Filed ITUYes
44D FiledNo
44E CurrentNo
66A CurrentNo
Current BasisNo
No BasisNo
Attorney NameAlan Taboada
Attorney Docket NumberAPPM0610
Law Office AssignedL90
Employee NameSAUNDERS, ANDREA DAWN

Timeline

1ST RENEWAL 20161118Renewal Date
2002-06-05Application Filed
2002-11-19Published
2002-11-19Published for Opposition
2005-11-30Date of First Use
2005-11-30Date of Use In Commerce
2006-10-31Trademark Registered
2016-10-31Renewal Date
2016-11-18Location: GENERIC WEB UPDATE
2016-11-18Status: Live/Registered
2016-11-18Status: The registration has been renewed.
2018-07-08Transaction Date

Trademark Parties (Applicants & Owners)

Party: Applied Materials, Inc.
Address3050 Bowers Avenue Santa Clara, CALIFORNIA UNITED STATES 95054
Legal Entity TypeCorporation
Legal Entity StateDELAWARE

Attorney of Record

Alan Taboada
Moser Taboada
1030 Broad Street - Suite 203
Shrewsbury NJ 07702

Good, Services, and Codes


IC 009. US 021 023 026 036 038. G & S: Semiconductor wafer processing equipment, operational software, and components, namely-- epitaxial reactors, chemical vapor deposition reactors, physical vapor deposition reactors, plasma etchers, ion implanters, and chemical mechanical polishers; all for the processing and production of semiconductor substrates, thin films, silicon discs and wafers. FIRST USE: 20051130. FIRST USE IN COMMERCE: 20051130

International Codes:9
U.S. Codes:021,023,026,036,038
Type CodeType
GS0091Semiconductor wafer processing equipment, operational software, and components, namely-- epitaxial reactors, chemical vapor deposition reactors, physical vapor deposition reactors, plasma etchers, ion implanters, and chemical mechanical polishers; all for the processing and production of semiconductor substrates, thin films, silicon discs and wafers

Trademark Filing History

DescriptionDateProceeding Number
TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED2017-06-29
ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED2017-06-29
REGISTERED AND RENEWED (FIRST RENEWAL - 10 YRS)2016-11-1867110
REGISTERED - SEC. 8 (10-YR) ACCEPTED/SEC. 9 GRANTED2016-11-1867110
NOTICE OF ACCEPTANCE OF SEC. 8 & 9 - E-MAILED2016-11-18
CASE ASSIGNED TO POST REGISTRATION PARALEGAL2016-11-1867110
TEAS SECTION 8 & 9 RECEIVED2016-09-07
REGISTERED - SEC. 8 (6-YR) ACCEPTED & SEC. 15 ACK.2012-04-2877315
NOTICE OF ACCEPTANCE OF SEC. 8 & 15 - MAILED2012-04-28
CASE ASSIGNED TO POST REGISTRATION PARALEGAL2012-04-2877315
TEAS SECTION 8 & 15 RECEIVED2012-04-12
REGISTERED-PRINCIPAL REGISTER2006-10-31
LAW OFFICE REGISTRATION REVIEW COMPLETED2006-09-2776985
ASSIGNED TO LIE2006-09-1576985
AMENDMENT FROM APPLICANT ENTERED2006-09-0673797
ALLOWED PRINCIPAL REGISTER - SOU ACCEPTED2006-09-06
PAPER RECEIVED2006-08-31
CORRESPONDENCE RECEIVED IN LAW OFFICE2006-08-3173797
SU - NON-FINAL ACTION - WRITTEN2006-03-3076851
NON-FINAL ACTION MAILED2006-03-30
STATEMENT OF USE PROCESSING COMPLETE2006-03-0871280
USE AMENDMENT FILED2006-02-0371280
PAPER RECEIVED2006-02-03
SOU EXTENSION 5 GRANTED2005-08-1776873
TEAS EXTENSION RECEIVED2005-08-10
SOU EXTENSION 5 FILED2005-08-1076873
TEAS EXTENSION RECEIVED2005-02-01
SOU EXTENSION 4 GRANTED2005-02-0174192
SOU EXTENSION 4 FILED2005-02-0174192
SOU EXTENSION 3 GRANTED2004-08-25
CASE FILE IN TICRS2004-08-19
TEAS EXTENSION RECEIVED2004-08-05
SOU EXTENSION 3 FILED2004-08-05
SOU EXTENSION 2 GRANTED2004-02-18
TEAS EXTENSION RECEIVED2004-02-02
SOU EXTENSION 2 FILED2004-02-02
SOU EXTENSION 1 GRANTED2003-08-19
TEAS EXTENSION RECEIVED2003-08-05
SOU EXTENSION 1 FILED2003-08-05
NOA MAILED - SOU REQUIRED FROM APPLICANT2003-02-11
PUBLISHED FOR OPPOSITION2002-11-19
NOTICE OF PUBLICATION2002-10-30
APPROVED FOR PUB - PRINCIPAL REGISTER2002-09-23
ASSIGNED TO EXAMINER2002-09-2076851

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