Mark For: IAPC® trademark registration is intended to cover the categories of semiconductor wafer processing equipment, operational software, and components, namely, epitaxial reactors, chemical vapor deposition reactors, physical vapor deposition reactors, plasma etchers, ion implanters, semiconductor wafer inspection devices, and chemical mechanical polishers; all for the processing and production of semiconductor substrates, thin films, silicon discs and wafers. [all]
Status
2022-07-31 UTC
DEAD REGISTRATION Cancelled Invalidated
The trademark application was registered, but subsequently it was cancelled or invalidated and removed from the registry.
(Electrical and scientific apparatus) Scientific, nautical, surveying, electric, photographic, cinematographic, optical, weighing, measuring, signaling, checking (supervision), lifesaving and teaching apparatus and instruments; apparatus for recording, transmission or reproduction of sound or images; magnetic data carriers, recording discs; automatic vending machines and mechanisms for coin operated apparatus; cash registers, calculating machines, data processing equipment and computers; fire-extinguishing apparatus.
Filed Use
No
Current Use
Yes
Intent To Use
No
Filed ITU
Yes
44D Filed
No
44E Current
No
66A Current
No
Current Basis
No
No Basis
No
Cancellation Code
2
Attorney Name
ROBERT W MULCAHY
Attorney Docket Number
TM0494/FET/D
Law Office Assigned
L60
Employee Name
GOLD, BARBARA A
Timeline
2002-03-14
Application Filed
2002-11-12
Published
2002-11-12
Published for Opposition
2003-06-15
Date of First Use
2003-06-15
Date of Use In Commerce
2004-07-27
Trademark Registered
2004-08-02
Location: FILE REPOSITORY (FRANCONIA)
2011-03-04
Cancelled
2011-03-04
Status: Dead/Cancelled
2011-03-04
Status: Registration cancelled because registrant did not file an acceptable declaration under Section 8. To view all documents in this
MSC2061 ROBERT W MULCAHY APPLIED MATERIALS INC 2881 SCOTT BLVD SANTA CLARA CA 95054
Good, Services, and Codes
(CANCELLED) IC 009. US 021 023 026 036 038. G & S: Semiconductor wafer processing equipment, operational software, and components, namely, epitaxial reactors, chemical vapor deposition reactors, physical vapor deposition reactors, plasma etchers, ion implanters, semiconductor wafer inspection devices, and chemical mechanical polishers; all for the processing and production of semiconductor substrates, thin films, silicon discs and wafers. FIRST USE: 20030615. FIRST USE IN COMMERCE: 20030615
International Codes:
9
U.S. Codes:
021,023,026,036,038
Type Code
Type
GS0091
Semiconductor wafer processing equipment, operational software, and components, namely, epitaxial reactors, chemical vapor deposition reactors, physical vapor deposition reactors, plasma etchers, ion implanters, semiconductor wafer inspection devices, and chemical mechanical polishers; all for the processing and production of semiconductor substrates, thin films, silicon discs and wafers
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