Mark For: RAPIDFIRE® trademark registration is intended to cover the categories of semiconductor wafer processing equipment, namely, thermal treatment reactors, chemical vapor deposition reactors, and plasma-enhanced chemical vapor deposition reactors; electronically operated apparatus for the manufacture of semiconductors and for the deposition of thin films on semiconductor wafers by chemical vapor deposition or plasma-enhanced chemical vapor deposition, as well as components and replacement parts thereof. [all]
Status
2022-08-13 UTC
DEAD REGISTRATION Cancelled Invalidated
The trademark application was registered, but subsequently it was cancelled or invalidated and removed from the registry.
(Electrical and scientific apparatus) Scientific, nautical, surveying, electric, photographic, cinematographic, optical, weighing, measuring, signaling, checking (supervision), lifesaving and teaching apparatus and instruments; apparatus for recording, transmission or reproduction of sound or images; magnetic data carriers, recording discs; automatic vending machines and mechanisms for coin operated apparatus; cash registers, calculating machines, data processing equipment and computers; fire-extinguishing apparatus.
Filed Use
No
Current Use
No
Intent To Use
No
Filed ITU
Yes
44D Filed
No
44E Current
Yes
66A Current
No
Current Basis
No
No Basis
No
Cancellation Code
2
Domestic Representative
Jennifer Sheehan Anderson
Attorney Name
Jennifer Sheehan Anderson
Attorney Docket Number
218537
Law Office Assigned
L80
Employee Name
CARRUTHERS, ALICE S
Timeline
2001-10-22
Application Filed
2002-11-26
Published
2002-11-26
Published for Opposition
2003-02-18
Trademark Registered
2009-02-21
Location: POST REGISTRATION
2013-09-20
Cancelled
2013-09-20
Status: Dead/Cancelled
2013-09-20
Status: Registration cancelled because registrant did not file an acceptable declaration under Section 8. To view all documents in this
Jennifer Sheehan Anderson Honigman Miller Schwartz and Cohn LLP 39400 Woodward Avenue, Suite 101 Bloomfield Hills MI 48304-5151
Good, Services, and Codes
(CANCELLED) IC 009. US 021 023 026 036 038. G & S: Semiconductor wafer processing equipment, namely, thermal treatment reactors, chemical vapor deposition reactors, and plasma-enhanced chemical vapor deposition reactors; electronically operated apparatus for the manufacture of semiconductors and for the deposition of thin films on semiconductor wafers by chemical vapor deposition or plasma-enhanced chemical vapor deposition, as well as components and replacement parts thereof
International Codes:
9
U.S. Codes:
021,023,026,036,038
Type Code
Type
GS0091
Semiconductor wafer processing equipment, namely, thermal treatment reactors, chemical vapor deposition reactors, and plasma-enhanced chemical vapor deposition reactors; electronically operated apparatus for the manufacture of semiconductors and for the deposition of thin films on semiconductor wafers by chemical vapor deposition or plasma-enhanced chemical vapor deposition, as well as components and replacement parts thereof
Trademark Filing History
Description
Date
Proceeding Number
CANCELLED SEC. 8 (10-YR)/EXPIRED SECTION 9
2013-09-20
TEAS CHANGE OF CORRESPONDENCE RECEIVED
2011-07-26
REGISTERED - SEC. 8 (6-YR) ACCEPTED & SEC. 15 ACK.
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