NLINE

Mark For: NLINE® trademark registration is intended to cover the categories of inspection and test equipment for the semiconductor industry, namely, wafer inspection equipment, reticle inspection equipment, defect detection equipment, defect review equipment, defect classification equipment, nanotopography measurement equipment, wafer flatness measurement equipment, surface profiling equipment, film thickness measurement equipment, critical dimension measurement equipment, and microscopes, for use in the manufacturing and testing of semiconductors. [all]

Status

2022-09-17 UTC
⟳ Refresh

DEAD REGISTRATION Cancelled Invalidated

Research	OneLook Acronym Finder
Serial Number	76182067
Registration Number	2925556
Mark Literal Elements	NLINE
Mark Drawing Type	1 - TYPESET WORD(S) /LETTER(S) /NUMBER(S)
Mark Type	TRADEMARK. SERVICE MARK
Standard Character Claim	No
Register	PRINCIPAL
Current Location	PUBLICATION AND ISSUE SECTION 2004-12-28
Basis	1(a)
Class Status	SECTION 8 - CANCEL
Primary US Classes	021: Electrical Apparatus, Machines and Supplies 023: Cutlery, Machinery, Tools and Parts Thereof 026: Measuring and Scientific Appliances 036: Musical Instruments and Supplies 038: Prints and Publications
Primary International Class	009 - Primary Class (Electrical and scientific apparatus) Scientific, nautical, surveying, electric, photographic, cinematographic, optical, weighing, measuring, signaling, checking (supervision), lifesaving and teaching apparatus and instruments; apparatus for recording, transmission or reproduction of sound or images; magnetic data carriers, recording discs; automatic vending machines and mechanisms for coin operated apparatus; cash registers, calculating machines, data processing equipment and computers; fire-extinguishing apparatus.
Filed Use	No
Current Use	Yes
Intent To Use	No
Filed ITU	Yes
44D Filed	No
44E Current	No
66A Current	No
Current Basis	No
No Basis	No
Cancellation Code	2
Attorney Name	THOMAS R FELGER
Attorney Docket Number	068062.0105
Law Office Assigned	L50
Employee Name	MICHOS, JOHN E

Timeline

(CANCELLED)
IC 009. US 021 023 026 036 038. G & S: Inspection and test equipment for the semiconductor industry, namely, wafer inspection equipment, reticle inspection equipment, defect detection equipment, defect review equipment, defect classification equipment, nanotopography measurement equipment, wafer flatness measurement equipment, surface profiling equipment, film thickness measurement equipment, critical dimension measurement equipment, and microscopes, for use in the manufacturing and testing of semiconductors. FIRST USE: 20000701. FIRST USE IN COMMERCE: 20000701(CANCELLED)
IC 037. US 100 103 106. G & S: Installation, maintenance and repair of inspection and test equipment for the semiconductor industry, namely, wafer inspection equipment, reticle inspection equipment, defect detection equipment, defect review equipment, defect classification equipment, nanotopography measurement equipment, wafer flatness measurement equipment, surface profiling equipment, film thickness measurement equipment, critical dimension measurement equipment, and microscopes. FIRST USE: 20000701. FIRST USE IN COMMERCE: 20000701(CANCELLED)
IC 040. US 100 103 106. G & S: Custom manufacture and design of inspection and test equipment for the semiconductor industry, namely, wafer inspection equipment, reticle inspection equipment, defect detection equipment, defect review equipment, defect classification equipment, nanotopography measurement equipment, wafer flatness measurement equipment, surface profiling equipment, film thickness measurement equipment, critical dimension measurement equipment, and microscopes. FIRST USE: 20000701. FIRST USE IN COMMERCE: 20000701(CANCELLED)
IC 042. US 100 101. G & S: On-site and off-site inspection services for the semiconductor industry, namely wafer inspection, reticle inspection, defect detection, defect review, defect classification, nanotopography measurement, wafer flatness measurement, surface profiling, film thickness measurement, critical dimension measurement, and microscopy; and leasing and consultation of inspection and test equipment for the semiconductor industry, namely wafer inspection equipment, reticle inspection equipment, defect detection equipment, defect review equipment, defect classification equipment, nanotopography measurement equipment, wafer flatness measurement equipment, surface profiling equipment, film thickness measurement equipment, critical dimension measurement equipment, and microscopes. FIRST USE: 20000701. FIRST USE IN COMMERCE: 20000701