SMARTNET

Applied Materials, Inc.

Application Filed: 2000-04-28
Trademark Application Details
Trademark Logo SMARTNET

Mark For: SMARTNET™ trademark registration is intended to cover the categories of semiconductor wafer processing equipment, and components, namely, epitaxial reactors; chemical vapor deposition reactors; physical vapor deposition reactors; plasma etchers; ion implanters; and chemical mechanical polishers. [all]

Status

2022-10-21 UTC
DEAD APPLICATION Refused Dismissed or Invalidated
This trademark application was refused, dismissed, or invalidated by the Office and this application is no longer active.


Research OneLook Acronym Finder
Serial Number76035196
Mark Literal ElementsSMARTNET
Mark Drawing Type1 - TYPESET WORD(S) /LETTER(S) /NUMBER(S)
Mark TypeTRADEMARK
Standard Character ClaimNo
RegisterPRINCIPAL
Current LocationDIVISIONAL UNIT 2004-10-04
Basis1(b)
Class StatusACTIVE
Primary US Classes
  • 021: Electrical Apparatus, Machines and Supplies
  • 023: Cutlery, Machinery, Tools and Parts Thereof
  • 026: Measuring and Scientific Appliances
  • 036: Musical Instruments and Supplies
  • 038: Prints and Publications
Primary International Class
  • 009 - Primary Class
  • (Electrical and scientific apparatus) Scientific, nautical, surveying, electric, photographic, cinematographic, optical, weighing, measuring, signaling, checking (supervision), lifesaving and teaching apparatus and instruments; apparatus for recording, transmission or reproduction of sound or images; magnetic data carriers, recording discs; automatic vending machines and mechanisms for coin operated apparatus; cash registers, calculating machines, data processing equipment and computers; fire-extinguishing apparatus.
Filed UseNo
Current UseNo
Intent To UseYes
Filed ITUYes
44D FiledNo
44E CurrentNo
66A CurrentNo
Current BasisNo
No BasisNo
Attorney NameRobert W. Mulcahy
Law Office AssignedL50
Employee NameBROWN, BRIAN D

Timeline

2000-04-28Application Filed
2002-01-01Published
2002-01-01Published for Opposition
2004-10-04Location: DIVISIONAL UNIT
2005-03-27Abandon
2005-03-27Status: Abandoned because no Statement of Use or Extension Request timely filed after Notice of Allowance was issued. To view all docume
2005-03-27Status: Dead/Abandoned
2018-07-08Transaction Date

Trademark Parties (Applicants & Owners)

Party: Applied Materials, Inc.
Address3050 Bowers Avenue Santa Clara, CALIFORNIA UNITED STATES 95054
Legal Entity TypeCorporation
Legal Entity StateDELAWARE

Documents

ApplicationIMAGE/TIFF2000-04-26
DrawingIMAGE/TIFF2000-04-26
Duplicate Application2000-04-26
Duplicate Drawing2000-04-26
XSearch Search Summary2000-10-26
Evidence Outgoing2000-11-02
Offc Action Outgoing2000-11-03
Response to Office Action2001-05-03
Unclassified-Other2001-08-01
XSearch Search Summary2001-09-07
Unclassified-Other2001-10-25
Notice of Publication2001-12-12
Notice of Allowance2002-03-26
Extension of Time to File SOU2002-09-05
Extension of Time to File SOU2002-09-05
Extension of Time to File SOU2003-03-07
Extension of Time to File SOU2003-03-07
Extension of Time to File SOU2003-09-12
Extension of Time to File SOUAPPLICATION/XML,IMAGE/TIFF2003-09-12
ITU Extension ApprovalAPPLICATION/XML2003-09-26
Extension of Time to File SOU2004-03-14
Extension of Time to File SOU2004-03-14
ITU Extension Approval2004-03-25
File Jacket2004-07-16
Extension of Time to File SOU2004-09-19
ITU Extension ApprovalAPPLICATION/XML2004-09-29
Notice of Abandonment2005-06-10

Attorney of Record

ROBERT W. MULCAHY
APPLIED MATERIALS, INC.
2881 SCOTT BOULEVARD, M/S 2061
SANTA CLARA, CA 95054

Good, Services, and Codes

(ABANDONED)
IC 009. US 021 023 026 036 038. G & S: SEMICONDUCTOR WAFER PROCESSING EQUIPMENT, AND COMPONENTS, NAMELY, EPITAXIAL REACTORS; CHEMICAL VAPOR DEPOSITION REACTORS; PHYSICAL VAPOR DEPOSITION REACTORS; PLASMA ETCHERS; ION IMPLANTERS; AND CHEMICAL MECHANICAL POLISHERS

International Codes:9
U.S. Codes:021,023,026,036,038
Type CodeType
GS0091SEMICONDUCTOR WAFER PROCESSING EQUIPMENT, AND COMPONENTS, NAMELY, EPITAXIAL REACTORS; CHEMICAL VAPOR DEPOSITION REACTORS; PHYSICAL VAPOR DEPOSITION REACTORS; PLASMA ETCHERS; ION IMPLANTERS; AND CHEMICAL MECHANICAL POLISHERS

Trademark Filing History

DescriptionDateProceeding Number
ABANDONMENT NOTICE MAILED - NO USE STATEMENT FILED2005-06-10
ABANDONMENT - NO USE STATEMENT FILED2005-06-1046996
SOU EXTENSION 5 GRANTED2004-09-28
TEAS EXTENSION RECEIVED2004-09-19
SOU EXTENSION 5 FILED2004-09-19
CASE FILE IN TICRS2004-07-20
SOU EXTENSION 4 GRANTED2004-03-24
TEAS EXTENSION RECEIVED2004-03-14
SOU EXTENSION 4 FILED2004-03-14
TEAS EXTENSION RECEIVED2003-09-12
SOU EXTENSION 3 GRANTED2003-09-12
SOU EXTENSION 3 FILED2003-09-12
SOU EXTENSION 2 GRANTED2003-05-09
TEAS EXTENSION RECEIVED2003-03-07
SOU EXTENSION 2 FILED2003-03-07
SOU EXTENSION 1 GRANTED2002-09-19
TEAS EXTENSION RECEIVED2002-09-05
SOU EXTENSION 1 FILED2002-09-05
NOA MAILED - SOU REQUIRED FROM APPLICANT2002-03-26
PUBLISHED FOR OPPOSITION2002-01-01
NOTICE OF PUBLICATION2001-12-12
APPROVED FOR PUB - PRINCIPAL REGISTER2001-09-07
NON-FINAL ACTION MAILED2000-11-03
ASSIGNED TO EXAMINER2000-10-2676835

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