EAU-ZONE

Mark For: EAU-ZONE® trademark registration is intended to cover the categories of chemical substances in aqueous- or vapour phase, comprising water, ozone and additives, or water and ozone, used for the formation of an oxide layer on semiconductor substrates. [all]

Status

2022-10-28 UTC
⟳ Refresh

DEAD REGISTRATION Cancelled Invalidated

Research	OneLook Acronym Finder
Serial Number	76013341
Registration Number	2529215
Mark Literal Elements	EAU-ZONE
Mark Drawing Type	1 - TYPESET WORD(S) /LETTER(S) /NUMBER(S)
Mark Type	TRADEMARK. SERVICE MARK
Standard Character Claim	No
Register	PRINCIPAL
Current Location	SCANNING ON DEMAND 2007-04-23
Basis	44(e)
Class Status	SECTION 8 - CANCEL
Primary US Classes	001: Raw or Partly Prepared Materials 005: Adhesives 006: Chemicals and Chemical Compositions 010: Fertilizers 026: Measuring and Scientific Appliances 046: Foods and Ingredients of Foods
Primary International Class	001 - Primary Class (Chemicals) Chemicals used in industry, science and photography, as well as in agriculture, horticulture and forestry; unprocessed artificial resins, unprocessed plastics; manures; fire extinguishing compositions; tempering and soldering preparations; chemical substances for preserving foodstuffs; tanning substances; adhesives used in industry.
Filed Use	No
Current Use	No
Intent To Use	No
Filed ITU	No
44D Filed	Yes
44E Current	Yes
66A Current	No
Current Basis	No
No Basis	No
Cancellation Code	2
Domestic Representative	Andrew H. Simpson
Attorney Name	Andrew H. Simpson
Attorney Docket Number	VANM125.002T
Law Office Assigned	L50
Employee Name	MANDIR, FREDERICK M

Timeline

(CANCELLED)
IC 001. US 001 005 006 010 026 046. G & S: CHEMICAL SUBSTANCES IN AQUEOUS- OR VAPOUR PHASE, COMPRISING WATER, OZONE AND ADDITIVES, OR WATER AND OZONE, USED FOR THE FORMATION OF AN OXIDE LAYER ON SEMICONDUCTOR SUBSTRATES(CANCELLED)
IC 003. US 001 004 006 050 051 052. G & S: CHEMICAL SUBSTANCES IN AQUEOUS- OR VAPOUR PHASE, COMPRISING WATER, OZONE AND ADDITIVES, OR WATER AND OZONE, USED FOR THE REMOVAL OF ORGAN
IC CONTAMINATION, SUCH AS PHOTORESIST, PHOTORESIDUES AND DRY ETCHING RESIDUES ON SEMICONDUCTOR SUBSTRATES(CANCELLED)
IC 009. US 021 023 026 036 038. G & S: CHEMICAL APPARATUS FOR THE TREATMENT OF SEMICONDUCTOR WAFERS, SEMICONDUCTOR SUBSTRATES AND FLAT PANEL DISPLAYS(CANCELLED)
IC 042. US 100 101. G & S: TECHNICAL AND SCIENTIF
IC RESEARCH AND DEVELOPMENT IN THE FIELD OF CHEMICAL SUBSTANCES IN AQUEOUS- OR VAPOUR PHASE, CONTAINING WATER, OZONE AND ADDITIVES, OR WATER AND OZONE, AND IN THE FIELD OF MICRO-ELECTRONICS, FOR COMPOSING METHODS OR DESIGNING EQUIPMENT FOR THE REMOVAL OF ORGAN
IC CONTAMINATION OR FOR THE FORMATION OF OXIDE LAYERS ON SEMICONDUCTOR WAFERS, SEMICONDUCTOR SUBSTRATES AND FLAT PANEL DISPLAYS