CENTURA

Applied Materials, Inc.

Application Filed: 1992-09-14
Trademark Application Details
Trademark Logo CENTURA

Mark For: CENTURA™ trademark registration is intended to cover the categories of semiconductor wafer processing equipment and components; namely, epitaxial reactors, chemical vapor deposition reactors, plasma etchers, physical vapor deposition reactors, ion implanters, support frames therefor, and parts therefor.

Status

2021-07-26 UTC
DEAD APPLICATION Refused Dismissed or Invalidated
This trademark application was refused, dismissed, or invalidated by the Office and this application is no longer active.


Research OneLook Acronym Finder
Serial Number74313317
Mark Literal ElementsCENTURA
Mark Drawing Type1 - TYPESET WORD(S) /LETTER(S) /NUMBER(S)
Mark TypeTrademark
Standard Character ClaimNo
Current LocationFILE REPOSITORY (FRANCONIA) 1994-08-11
Basis1(b)
Class StatusABANDONED
Primary US Classes
  • 021: Electrical Apparatus, Machines and Supplies
  • 026: Measuring and Scientific Appliances
Primary International Class
  • 009 - Primary Class
  • (Electrical and scientific apparatus) Scientific, nautical, surveying, electric, photographic, cinematographic, optical, weighing, measuring, signaling, checking (supervision), lifesaving and teaching apparatus and instruments; apparatus for recording, transmission or reproduction of sound or images; magnetic data carriers, recording discs; automatic vending machines and mechanisms for coin operated apparatus; cash registers, calculating machines, data processing equipment and computers; fire-extinguishing apparatus.
Filed UseNo
Current UseNo
Intent To UseYes
Filed ITUYes
44D FiledNo
44E CurrentNo
66A CurrentNo
Current BasisNo
No BasisNo
Attorney NamePaul Hentzel
Law Office AssignedJ40
Employee NameCARMINE, FERRELL D

Timeline

1992-09-14Application Filed
1993-03-02Published
1993-03-02Published for Opposition
1994-06-23Abandon
1994-06-23Status: Abandoned because no Statement of Use or Extension Request timely filed after Notice of Allowance was issued. To view all docume
1994-06-23Status: Dead/Abandoned
1994-08-11Location: FILE REPOSITORY (FRANCONIA)
2018-07-08Transaction Date

Trademark Parties (Applicants & Owners)

Party: Applied Materials, Inc.
Address3050 Bowers Santa Clara, CALIFORNIA UNITED STATES 95054
Legal Entity TypeCorporation
Legal Entity StateDELAWARE

Documents

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Attorney of Record

Paul Hentzel
441 Nevada Avenue
Palo Alto, CA 94301


Good, Services, and Codes

International Codes:9
U.S. Codes:021,026
Type CodeType
GS0091semiconductor wafer processing equipment and components; namely, epitaxial reactors, chemical vapor deposition reactors, plasma etchers, physical vapor deposition reactors, ion implanters, support frames therefor, and parts therefor

Trademark Filing History

DescriptionDateProceeding Number
EXTENSION 2 DENIAL LETTER MAILED1994-08-02
EXTENSION 2 DENIAL LETTER PREPARED1994-07-20
ABANDONMENT - NO USE STATEMENT FILED1994-06-23
EXTENSION 2 FILED1994-06-13
EXTENSION 1 GRANTED1994-02-08
EXTENSION 1 FILED1993-12-13
NOA MAILED - SOU REQUIRED FROM APPLICANT1993-06-22
PUBLISHED FOR OPPOSITION1993-03-02
NOTICE OF PUBLICATION1993-01-29
APPROVED FOR PUB - PRINCIPAL REGISTER1992-12-28
EXAMINER'S AMENDMENT MAILED1992-12-14
ASSIGNED TO EXAMINER1992-11-2769930

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