Mark For: TECHNICS® trademark registration is intended to cover the categories of electronic Ion Milling and Etching Apparatus, Ion Mass Spectrometers, Ion Guns, and Electronic Plasma Processors All for Use in Microelectronic Optics and Thin Films. [all]
Status
2022-04-18 UTC
DEAD REGISTRATION Cancelled Invalidated
The trademark application was registered, but subsequently it was cancelled or invalidated and removed from the registry.
(Electrical and scientific apparatus) Scientific, nautical, surveying, electric, photographic, cinematographic, optical, weighing, measuring, signaling, checking (supervision), lifesaving and teaching apparatus and instruments; apparatus for recording, transmission or reproduction of sound or images; magnetic data carriers, recording discs; automatic vending machines and mechanisms for coin operated apparatus; cash registers, calculating machines, data processing equipment and computers; fire-extinguishing apparatus.
Filed Use
Yes
Current Use
Yes
Intent To Use
No
Filed ITU
No
44D Filed
No
44E Current
No
66A Current
No
Current Basis
No
No Basis
No
Cancellation Code
2
Attorney Name
Michael W. Beasley
Law Office Assigned
530
Employee Name
TINGLEY, JOHN C
Timeline
1971-12-01
Date of First Use
1971-12-01
Date of Use In Commerce
1982-05-28
Application Filed
1983-09-06
Published
1983-09-06
Published for Opposition
1983-11-29
Trademark Registered
1990-04-10
Cancelled
1990-04-10
Status: Dead/Cancelled
1990-04-10
Status: Registration cancelled because registrant did not file an acceptable declaration under Section 8. To view all documents in this
Michael W. Beasley Galland, Kharasch, Calkins & Morse 1054 31st St., NW. Washington DC 20007
Good, Services, and Codes
(CANCELLED) IC 009. US 026. G & S: Electronic Ion Milling and Etching Apparatus, Ion Mass Spectrometers, Ion Guns, and Electronic Plasma Processors All for Use in Microelectronic Optics and Thin Films. FIRST USE: 19711201. FIRST USE IN COMMERCE: 19711201
International Codes:
9
U.S. Codes:
026
Type Code
Type
GS0091
Electronic Ion Milling and Etching Apparatus, Ion Mass Spectrometers, Ion Guns, and Electronic Plasma Processors All for Use in Microelectronic Optics and Thin Films
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