U.S. patent number RE37,361 [Application Number 09/300,376] was granted by the patent office on 2001-09-11 for scanning type exposure apparatus and exposure method.
This patent grant is currently assigned to Nikon Corporation. Invention is credited to Hiroshi Chiba, Seiji Miyazaki, Susumu Mori, Tsuyohsi Narabe, Tsuyoshi Naraki, Masami Seki, Masamitsu Yanagihara.
United States Patent |
RE37,361 |
Yanagihara , et al. |
September 11, 2001 |
**Please see images for:
( Certificate of Correction ) ** |
Scanning type exposure apparatus and exposure method
Abstract
.[.In a scanning type exposure apparatus for exposing an entire
surface of a pattern region on a mask to a substrate by scanning
the mask and the substrate with respect to a projection optical
system in a predetermined direction with a speed ratio in
accordance with a magnification of the projection optical system,
there are provided a plurality of illumination optical systems for
illuminating respective areas of the pattern region on the mask
with respective light fluxes from respective light source; a
plurality of projection optical systems arranged so as to
correspond to the respective illumination optical systems, the
projection optical systems projecting respective images of the
areas illuminated by the respective illumination optical systems
onto respective projection areas on the substrate; a memory device
for obtaining and storing a change of shape of the substrate; a
magnification changing device for changing a magnification of at
least one of the projection optical systems in accordance with the
change of shape of the substrate; and an imaging position changing
device for changing the position of said image projected via the at
least one projection optical systems in accordance with the change
in magnification..]. .Iadd.An exposure apparatus for exposing a
pattern of a mask onto a substrate includes an image transfer
system, an imaging characteristic adjusting mechanism and an
exposure system. The image transfer system projects the pattern of
the mask onto the substrate while moving the mask and the substrate
synchronously during the projection of the pattern onto the
substrate such that portions of the pattern overlap each other. The
imaging characteristic adjusting mechanism is disposed in a space
between the mask and the substrate, and adjusts imaging
characteristics of a portion of the image transfer system that
projects the pattern onto the substrate. The exposure system
exposes the pattern during the synchronous movement of the mask and
the substrate by the image transfer system. .Iaddend.
Inventors: |
Yanagihara; Masamitsu
(Yokohama, JP), Mori; Susumu (Tokyo, JP),
Naraki; Tsuyoshi (Tokyo, JP), Seki; Masami
(Shiki, JP), Miyazaki; Seiji (Yokohama,
JP), Narabe; Tsuyohsi (Ohmiya, JP), Chiba;
Hiroshi (Yokohama, JP) |
Assignee: |
Nikon Corporation (Tokyo,
JP)
|
Family
ID: |
30117269 |
Appl.
No.: |
09/300,376 |
Filed: |
April 27, 1999 |
Related U.S. Patent Documents
|
|
|
|
|
|
|
Application
Number |
Filing Date |
Patent Number |
Issue Date |
|
|
337467 |
Nov 8, 1994 |
|
|
|
Reissue of: |
689691 |
Aug 13, 1996 |
05625436 |
Apr 29, 1997 |
|
|
Foreign Application Priority Data
|
|
|
|
|
Nov 11, 1993 [JP] |
|
|
5-282308 |
Sep 28, 1994 [JP] |
|
|
6-232963 |
|
Current U.S.
Class: |
355/53; 355/50;
355/55; 355/77 |
Current CPC
Class: |
G03F
7/70358 (20130101); G03F 7/70883 (20130101); G03F
7/70858 (20130101); G03F 9/70 (20130101); G03F
7/70241 (20130101); G03F 7/70258 (20130101); G03F
7/70275 (20130101) |
Current International
Class: |
G03F
7/20 (20060101); G03F 9/00 (20060101); H01L
021/027 () |
Field of
Search: |
;355/50,51,53,55,56,70,77,46 |
References Cited
[Referenced By]
U.S. Patent Documents
Foreign Patent Documents
Primary Examiner: Pendegrass; Joan
Attorney, Agent or Firm: Oliff & Berridge PLC
Parent Case Text
This is a continuation of application Ser. No. 08/337,467, filed
Nov. 8, 1994, now abandoned.
Claims
What is claimed is:
1. A scanning type exposure apparatus for exposing a pattern region
on a mask to a substrate by scanning said mask and said substrate
with respect to a plurality of projection optical systems in a
predetermined direction with a speed ratio in accordance with a
magnification of said projection optical system, comprising:
a plurality of illumination optical systems for illuminating
respective areas of said pattern region on said mask with
respective light fluxes;
said plurality of projection optical systems being arranged so as
to correspond to said respective illumination optical systems, said
projection optical systems projecting respective images of said
areas illuminated by said respective illumination optical system
onto respective projection areas on said substrate;
a magnification changing device for detecting a change of shape of
said substrate and changing a magnification of at lest one of said
projection optical systems in accordance with the change of shape
of said substrate; and
an imaging position changing device for changing the position of an
image projected via said at least one projection optical system in
accordance with said change in magnification.
2. A scanning type exposure apparatus according to claim 1, further
comprising a control device for changing, in accordance with, among
said change of shape, a change in a direction perpendicular to said
predetermined direction, the magnification of said at least one
projection optical system, and the position of said image projected
via said at least one projection optical system in said
perpendicular direction, and changing the position of said image of
said at least one projection optical system in said scanning
direction in accordance with, among said change of shape, a change
in said scanning direction.
3. A scanning type exposure apparatus according to claim 1, further
comprising a speed ratio changing means device for changing said
speed ratio in accordance with the change of shape of said
substrate.
4. A scanning type exposure apparatus according to claim 1, wherein
said plurality of projection optical systems are arranged such that
adjacent projection optical systems in a direction perpendicular to
said predetermined direction are displaced from each other in said
predetermined direction to form a plurality of rows in said
perpendicular direction.
5. A scanning type exposure apparatus according to claim 1, wherein
said imaging position changing device comprises a plurality of
plane parallel glasses with the same thickness disposed in
respective optical axes of said projection optical systems and said
plane parallel glasses are displaced at respectively different
angles with respect to said respective optical axes in accordance
with the change of shape of said substrate.
6. A scanning type exposure apparatus according to claim 1, wherein
said imaging position changing device comprises a plurality of
plane parallel glasses with different thicknesses disposed in
respective optical axes of said projection optical systems and said
plane parallel glasses are displaced at the same angle with respect
to said respective optical axes in accordance with the change of
shape of said substrate.
7. A scanning type exposure apparatus according to claim 1, wherein
said substrate has a plurality of alignment marks arranged in the
vicinity of said projection areas along said predetermined
direction, said apparatus further comprising a mark detecting
device disposed with a predetermined positional relationship with
respect to said projection optical systems in a position capable of
detecting at least a portion of said alignment marks so as to
detect said alignment marks while said mask and said substrate are
moved; and a positioning device for correcting the position of said
mask or said substrate with respect to said projection optical
systems in accordance with the detection result of said mark
detecting device.
8. A scanning type exposure apparatus according to claim 7, wherein
the change of shape of said substrate is obtained in accordance
with positions of said alignment marks detected by said mark
detecting device.
9. A scanning type exposure apparatus according to claim 1, wherein
said projection optical systems are a magnification-erection
type.
10. A scanning type exposure apparatus according to claim 1,
further comprising a holding member for holding said mask and said
photosensitive substrate together.
11. A method of exposing a pattern image of a mask to a substrate
via a plurality of projection optical systems, comprising the steps
of:
detecting a change of shape of said substrate;
changing a magnification of at least one of said projection optical
systems in accordance with the change of shape of said substrate;
and
changing the position of an image projected via said at least one
projection optical system in accordance with the change of
magnification of said at least one projection optical system.
12. A method according to claim 11, further comprising the steps of
changing, in accordance with, among said change of shape, a change
in a direction perpendicular to said predetermined direction, the
magnification of said at least one projection optical system, and
the position of said image projected via said at least one
projection optical system in said perpendicular direction; and
changing the position of said image projected via said at least one
projection optical system in said predetermined direction in
accordance with, among said change of shape, a change in said
predetermined direction.
13. A method according to claim 11, further comprising the step of
changing said speed ratio in accordance with the change of shape of
said substrate.
14. A scanning type exposure apparatus comprising:
a plurality of projection optical systems for respectively
projecting a pattern image of a mask onto a substrate;
a moving device for moving said mask and said substrate relative to
said projection optical systems, while holding said mask and said
substrate together; and
an adjusting device for detecting a change of shape of said
substrate, and for adjusting at least one imaging characteristic of
said projection optical systems. .Iadd.
15. An exposure apparatus for exposing a pattern of a mask onto a
substrate, comprising:
an image transfer system that projects the pattern of the mask onto
the substrate while moving the mask and the substrate synchronously
during the projection of the pattern onto the substrate such that
portions of the pattern overlap each other;
an imaging characteristic adjusting mechanism disposed in a space
between the mask and the substrate, to adjust imaging
characteristics of a portion of the image transfer system that
projects the pattern onto the substrate; and
an exposure system that exposes the pattern during the synchronous
movement of the mask and the substrate by the image transfer
system. .Iaddend..Iadd.
16. The exposure apparatus according to claim 15, wherein the
imaging characteristic adjusting mechanism includes an optical
member. .Iaddend..Iadd.
17. The exposure apparatus according to claim 15, wherein the
exposure apparatus includes a plurality of projection optical
systems. .Iaddend..Iadd.
18. The exposure apparatus according to claim 17, wherein the
exposure apparatus includes five of the projection optical systems.
.Iaddend..Iadd.
19. The exposure apparatus according to claim 15, wherein a
magnification of the portion of the image transfer system that
projects the pattern onto the substrate is substantially equal to
one. .Iaddend..Iadd.
20. The exposure apparatus according to claim 15, wherein a
projection area of the portion of the image transfer system that
projects the pattern onto the substrate has a trapezoidal shape.
.Iaddend..Iadd.
21. The exposure apparatus according to claim 15, wherein a
projection area of the portion of the image transfer system that
projects the pattern onto the substrate has a polygonal shape.
.Iaddend..Iadd.
22. The exposure apparatus according to claim 15, wherein the
imaging characteristic adjusting mechanism includes a light
transmissive optical member. .Iaddend..Iadd.
23. The exposure apparatus according to claim 15, wherein the
imaging characteristic adjusting mechanism adjusts a magnification
of the portion of the image transfer system that projects the
pattern onto the substrate. .Iaddend..Iadd.
24. The exposure apparatus according to claim 15, wherein the
imaging characteristic adjusting mechanism adjusts a size of the
pattern formed on the substrate by the portion of the image
transfer system that projects the pattern onto the substrate.
.Iaddend..Iadd.
25. The exposure apparatus according to claim 15, wherein the
imaging characteristic adjusting mechanism adjusts a location where
the pattern is formed on the substrate by the portion of the image
transfer system that projects the pattern onto the substrate.
.Iaddend..Iadd.
26. A scanning exposure apparatus comprising:
an image transfer system that projects a pattern on a mask onto a
substrate while moving the mask and the substrate synchronously
during the projection of the pattern onto the substrate; and
an imaging characteristic adjusting mechanism that adjusts imaging
characteristics of a portion of the image transfer system that
projects the pattern of the mask onto the substrate, the imaging
characteristic adjusting mechanism disposed in a space that
includes the substrate and the portion of the image transfer system
that projects the pattern onto the substrate;
the image transfer system performing a transfer of the pattern on
the mask onto the substrate by overlapping transfer of the pattern
onto the substrate. .Iaddend..Iadd.
27. The scanning exposure apparatus according to claim 26, wherein
the imaging characteristic adjusting mechanism includes an optical
member. .Iaddend..Iadd.
28. The scanning exposure apparatus according to claim 26, wherein
the image transfer system includes a plurality of projection
optical systems. .Iaddend..Iadd.
29. The scanning exposure apparatus according to claim 28, wherein
the image transfer system includes five of the projection optical
systems. .Iaddend..Iadd.
30. The scanning exposure apparatus according to claim 26, wherein
a magnification of the portion of the image transfer system that
projects the pattern onto the substrate is substantially equal to
one. .Iaddend..Iadd.
31. The scanning exposure apparatus according to claim 26, wherein
a projection area of the portion of the image transfer system that
projects the pattern onto the substrate has a trapezoidal shape.
.Iaddend..Iadd.
32. The scanning exposure apparatus according to claim 26, wherein
a projection area of the portion of the image transfer system that
projects the pattern onto the substrate has a polygonal shape.
.Iaddend..Iadd.
33. The scanning exposure apparatus according to claim 26, wherein
the imaging characteristic adjusting mechanism includes a light
transmissive optical member. .Iaddend..Iadd.
34. The scanning exposure apparatus according to claim 26, wherein
the imaging characteristic adjusting mechanism adjusts a
magnification of the portion of the image transfer system that
projects the pattern onto the substrate. .Iaddend..Iadd.
35. The scanning exposure apparatus according to claim 26, wherein
the imaging characteristic adjusting mechanism adjusts a size of
the pattern formed on the substrate by the portion of the image
transfer system that projects the pattern onto the substrate.
.Iaddend..Iadd.
36. The scanning exposure apparatus according to claim 26, wherein
the imaging characteristic adjusting mechanism adjusts a location
where the pattern is formed on the substrate by the portion of the
image transfer system that projects the pattern onto the substrate.
.Iaddend..Iadd.
37. A method of performing exposure with an exposure apparatus,
comprising the steps of:
utilizing an image transfer system to project an image of a pattern
on a mask onto a substrate to form the pattern onto the substrate
while moving the mask and the substrate synchronously such that
portions of the pattern overlap each other on the substrate;
and
adjusting at least one imaging characteristic of a portion of the
image transfer system located between the mask and the substrate,
the adjusting being accomplished by using an imaging characteristic
adjusting mechanism disposed in a space between the substrate and
the portion of the image transfer system that projects the pattern
onto the substrate. .Iaddend..Iadd.
38. The method according to claim 37, wherein the imaging
characteristic adjusting mechanism includes an optical member.
.Iaddend..Iadd.
39. The method according to claim 37, wherein the image transfer
system includes a plurality of projection optical systems, and the
adjusting step is performed with respect to at least one of the
plurality of projection optical systems. .Iaddend..Iadd.
40. The method according to claim 39, wherein there are five of the
projection optical systems. .Iaddend..Iadd.
41. The method according to claim 37, wherein a magnification of
the portion of the image transfer system that projects the pattern
onto the substrate is substantially equal to one.
.Iaddend..Iadd.
42. The method according to claim 37, wherein a projection area of
the portion of the image transfer system that projects the pattern
onto the substrate has a trapezoidal shape. .Iaddend..Iadd.
43. The method according to claim 37, wherein a projection area of
the portion of the image transfer system that projects the pattern
onto the substrate has a polygonal shape. .Iaddend..Iadd.
44. The method according to claim 37, wherein the imaging
characteristic adjusting mechanism includes a light transmissive
optical member. .Iaddend..Iadd.
45. The method according to claim 39, wherein the adjusting step
adjusts a magnification of the portion of the image transfer system
that projects the pattern onto the substrate. .Iaddend..Iadd.
46. The method according to claim 37, wherein the adjusting step
adjusts a size of the pattern formed on the substrate by the
portion of the image transfer system that projects the pattern onto
the substrate. .Iaddend..Iadd.
47. The method according to claim 37, wherein the adjusting step
adjusts a location where the pattern is formed on the substrate by
the portion of the image transfer system that projects the pattern
onto the substrate. .Iaddend..Iadd.
48. A substrate on which an image has been exposed utilizing the
method of claim 37. .Iaddend..Iadd.
49. A method of performing exposure with a scanning exposure
apparatus, comprising the steps of:
utilizing an image transfer system to project an image of a pattern
on a mask onto a substrate to form the pattern onto the substrate
while moving the mask and the substrate synchronously; and
adjusting at least one imaging characteristic of a portion of the
image transfer system that projects the pattern onto the substrate,
the adjusting being accomplished by using an imaging characteristic
adjusting mechanism disposed in a space that includes the substrate
and the portion of the image transfer system that projects the
pattern onto the substrate;
wherein the imaging transfer system transfers the pattern on the
mask onto the substrate by overlapping transfer of the pattern onto
the substrate. .Iaddend..Iadd.
50. The method according to claim 49, wherein the imaging
characteristic adjusting mechanism includes an optical member.
.Iaddend..Iadd.
51. The method according to claim 49, wherein the image transfer
system includes a plurality of projection optical systems, the
adjusting step being performed on at least one of the plurality of
projection optical systems. .Iaddend..Iadd.
52. The method according to claim 51, wherein there are five of the
projection optical systems. .Iaddend..Iadd.
53. The method according to claim 49, wherein a magnification of
the portion of the image transfer system that projects the pattern
onto the substrate is substantially equal to one.
.Iaddend..Iadd.
54. The method according to claim 49, wherein a projection area of
the portion of the image transfer system that projects the pattern
onto the substrate has a trapezoidal shape. .Iaddend..Iadd.
55. The method according to claim 49, wherein a projection area of
the portion of the image transfer system that projects the pattern
onto the substrate has a polygonal shape. .Iaddend..Iadd.
56. The method according to claim 49, wherein the imaging
characteristic adjusting mechanism includes a light transmissive
optical member. .Iaddend..Iadd.
57. The method according to claim 73, wherein the adjusting step
adjusts a magnification of the portion of the image transfer system
that projects the pattern onto the substrate. .Iaddend..Iadd.
58. The method according to claim 49, wherein the adjusting step
adjusts a size of the pattern formed on the substrate by the
portion of the image transfer system that projects the pattern onto
the substrate. .Iaddend..Iadd.
59. The method according to claim 49, wherein the adjusting step
adjusts a location where the pattern is formed on the substrate by
the portion of the image transfer system that projects the pattern
onto the substrate. .Iaddend..Iadd.
60. A substrate on which an image has been exposed utilizing the
method of claim 49. .Iaddend..Iadd.
61. An exposure apparatus for exposing a pattern of a mask onto a
substrate, comprising:
image transferring means for transferring the pattern of the mask
onto the substrate while moving the mask and the substrate
synchronously during projection of the pattern onto the substrate
such that portions of the pattern overlap each other;
imaging characteristic adjusting means disposed in a space between
the mask and the substrate, to adjust imaging characteristics of a
portion of the image transferring means that projects the pattern
onto the substrate; and
exposing means for exposing the pattern during the synchronous
movement of the mask and the substrate by the image transferring
means. .Iaddend.
Description
BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention relates to a scanning type exposure apparatus
and more particularly to a scanning type exposure apparatus capable
of performing preferable exposure to a substrate expanded and
contracted due to a previous exposure process.
2. Related Background Art
Recently, as display devices such as of personal computers,
televisions, etc., liquid crystal display devices have been used
widely. In such a liquid crystal display device, transparent thin
film electrodes are formed on a glass plate in the photolithography
in accordance with a predetermined pattern. For the
photolithography, projection exposure apparatuses are used in which
an original pattern formed on a mask is exposed on a photoresist
layer on a glass substrate. There are various step-and-repeat type
or mirror projection type exposure apparatuses.
Generally, in such projection exposure apparatuses, an original
pattern is exposed on a glass substrate repeatedly one over another
for many layers. As a result, the glass substrate is expanded and
contracted due to those exposure processes (heat) thereby to be
deformed from the initial state. In the conventional
step-and-repeat type exposure apparatuses, only one projection
optical system is provided, and the expansion and contraction of a
glass plate are corrected (magnification correction) by changing
the magnification of the projection optical system and changing the
stopped position of a substrate stage at the time of each stepping
operation thereby to change distances between adjacent transferred
images. Also, in the mirror projection type exposure apparatuses,
the magnification in the scanning direction is corrected by
sequentially changing the relative position of an original plate
and a photosensitive substrate with respect to a projection optical
system during scanning exposure while the magnification in the
direction perpendicular to the scanning direction is corrected by
changing the magnification of the projection optical system.
SUMMARY OF THE INVENTION
Recently, it is needed to form liquid crystal display substrates
large in size and accordingly, it is desired to enlarge an exposure
region in a projection exposure apparatus. For the enlargement of
the exposure region, it is considered to use an apparatus for
performing scanning exposure by the use of a plurality of
projection optical systems, instead of using conventional
step-and-repeat exposure apparatuses and mirror projection scanning
type exposure apparatuses. For example, a plurality of illumination
optical systems are provided, and respective light fluxes emitted
from the illumination optical systems illuminate different areas on
a mask and project images of the respective different areas onto
respective projection areas on a glass substrate via the respective
projection optical systems. More specifically, a light flux emitted
from a light source is made uniform in its light quantity via an
optical system including a fly eye lens and the like, shaped by a
field stop into a desired shape, and thereafter illuminate the
pattern surface of the mask. A plurality of such illumination
optical systems are provided and light fluxes emitted from the
respective illumination optical systems illuminate different small
areas (illumination areas) on the mask. The light fluxes
transmitted through the mask form pattern images of the mask on
respective different projection areas on the glass substrate via
the respective projection optical systems. Then, by scanning the
mask and glass substrate synchronously with respect to the
projection optical systems, the entire surface of the pattern
region on the mask is transferred to the glass substrate.
Thus, when the scanning type exposure apparatus is provided with
the plurality of projection optical systems, the expansion and
contraction of the substrate cannot be corrected by the
above-mentioned conventional method.
Therefore, it is an object of the present invention to provide a
scanning type exposure apparatus capable of correcting the
expansion and contraction of a substrate preferably even though the
apparatus is equipped with a plurality of projection optical
systems.
For achieving the above object, according to the present invention,
in a scanning type exposure apparatus having a plurality of
illumination optical systems for shaping light fluxes from
respective light source into a predetermined shape with respective
field stops and illuminating respective areas of a pattern region
on a mask with the respective light fluxes passed through the field
stops and a plurality of projection optical systems disposed so as
to correspond to the respective illumination optical systems,
wherein respective images of the areas of the pattern region
illuminated by the illumination optical systems are projected via
the respective projection optical systems onto projection areas on
a substrate and the entire surface of the pattern region is exposed
by shifting the mask and the substrate in a predetermined direction
(X-direction) at a speed ratio in accordance with the magnification
of the projection optical systems, there are provided memory means
for obtaining and storing a change of shape of the substrate;
magnification changing means for changing the magnification of at
least one of the plurality of projection optical systems in
accordance with the change of shape; and imaging position changing
means for changing the position of the image of the area projected
by at least one projection optical system.
Also, in accordance with, among the change of shape, a change in a
perpendicular direction (Y-direction) to the predetermined
direction, the magnification of the at least one projection optical
system, and the position of the image projected via the at least
one projection optical system in the perpendicular direction are
changed, and in accordance with, among the change of shape, a
change in the shifting direction (X-direction), the position of the
image of said at least one projection optical system in said
scanning direction is changed.
Further, the exposure apparatus is provided with speed ratio
changing means for changing the speed ratio of the mask to the
substrate in accordance with the change of shape of the
substrate.
The plurality of projection optical systems are arranged such that
adjacent projection optical systems in a perpendicular direction
(Y-direction) to the predetermined direction (X-direction) are
displaced from each other in the predetermined direction to form a
plurality of rows in the perpendicular direction.
The imaging position changing means are a plurality of plane
parallel glasses with the same thickness disposed in respective
optical axes of the projection optical systems and the plane
parallel glasses are displaced at respectively different angles
with respect to the respective optical axes in accordance with the
change of shape of the substrate.
The imaging position changing means may be a plurality of plane
parallel glasses with different thickness disposed in respective
optical axes of the projection optical systems and the plane
parallel glasses are displaced at the same angle with respect to
the respective optical axes in accordance with the change of shape
of the substrate.
Also, the above substrate has a plurality of alignment marks
arranged in the vicinity of the projection areas along the
predetermined direction (X-direction) and the scanning type
exposure apparatus further are provided with mark detecting means
disposed with a predetermined positional relationship with respect
to the projection optical systems in a position capable of
detecting at least a portion of the alignment marks so as to detect
the alignment marks while the mask and the substrate are moved; and
positioning means for correcting the position of the mask or the
substrate with respect to the projection optical systems in
accordance with the detection result of the mark detecting
means.
Also, the change of shape of the substrate is obtained in
accordance with positions of the alignment marks detected by the
mark detecting means.
In a method of illuminating a plurality of areas on a pattern
region on a mask with respective light fluxes from a plurality of
illumination optical systems, projecting respective images of the
illuminated areas on projection areas on a substrate via a
plurality of projection optical systems, and exposing the entire
surface of the mask on the substrate by shifting the mask and the
substrate with respect to the projection optical systems in a
predetermined direction (X-direction) with a speed ratio in
accordance with the magnification of the projection optical
systems, a change of shape of the substrate is obtained in advance,
the magnification of at least one of the projection optical systems
is changed in accordance with the change of shape, and the position
of the image projected by the at least one projection optical
system is changed.
In this exposure method, the magnification of the at least one
projection optical system, and the position of the image projected
via the at least one projection optical system in the perpendicular
direction are changed in accordance with, among the change of
shape, a change in a perpendicular direction (Y-direction) to the
predetermined direction (X-direction), and the position of the
image projected via the at least one projection optical system in
the predetermined direction is changed in accordance with, among
the change of shape, a change in the predetermined direction.
Further, in the exposure method, the speed ratio is changed in
accordance with the change of shape of the substrate.
According to the present invention, the magnification of the at
least one projection optical system is changed in accordance with
the change of shape of the substrate, and the position of the image
projected via the at least one projection optical system is
changed, it is possible to transfer the mask pattern to the
substrate with possible to transfer the mask pattern to the
substrate with its image corrected preferably with respect to the
change of shape of the substrate.
Also, the magnification of the at least one projection optical
system, and the position of the image projected via the at least
one projection optical system in the perpendicular direction are
changed in accordance with, among the change of shape, a change in
the perpendicular direction to the predetermined direction, and the
position of the image projected via the at least one projection
optical system in the predetermined direction is changed in
accordance with, among the change of shape, a change in the
predetermined direction. Therefore, the correction in accordance
with the change of shape of the substrate is possible.
Further, as the apparatus is provided with the speed ratio changing
means for changing the speed ratio of the mask to the substrate in
accordance with the change of shape of the substrate, easy
correction with respect to the change of shape of the substrate in
the predetermined direction is possible.
Since the plurality of projection optical systems are arranged such
that adjacent projection optical systems along a perpendicular
direction to the predetermined direction are displaced from each
other in the predetermined direction to form a plurality of rows in
the perpendicular direction, the correction of the change of shape
of the substrate according to the above structure becomes
effective.
Also, when the imaging position changing means are a plurality of
plane parallel glasses with the same thickness disposed in
respective optical axes of the projection optical systems and the
plane parallel glasses are displaced at respectively different
angles with respect to the respective optical axes in accordance
with the change of shape of the substrate, the change of the
position of the image becomes easy.
On the other hand, when the imaging position changing means are a
plurality of plane parallel glasses with different thicknesses
disposed in respective optical axes of the projection optical
systems and the plane parallel glasses are displaced at the same
angle with respect to the respective optical axes in accordance
with the change of shape of the substrate, the change of the
position of the image becomes easy, too.
Further, the above substrate has the plurality of alignment marks
arranged in the vicinity of the projection areas along the
predetermined direction and the scanning type exposure apparatus
are provided with the mark detecting means disposed with the
predetermined positional relationship with respect to the
projection optical systems in the position capable of detecting at
least a portion of the alignment marks so as to detect the
alignment marks while the mask and the substrate are moved; and the
positioning means for correcting the position of the mask or the
substrate with respect to the projection optical systems in
accordance with the detection result of the mark detecting means.
Therefore, it is possible to obtain the change of shape of the
substrate by the exposure apparatus.
Further, since the change of shape of the substrate is obtained in
accordance with positions of the alignment marks detected by the
mark detecting means, the change of shape of the substrate can be
obtained easily.
In the method of illuminating the plurality of areas on the pattern
region on the mask with respective light fluxes from the plurality
of illumination optical systems, projecting respective images on
the illuminated areas on the projection areas on the substrate via
the plurality of projection optical systems, and exposing the
entire surface of the mask on the substrate by shifting the mask
and the substrate with respect to the projection optical systems in
the predetermined direction with the speed ratio in accordance with
the magnification of the projection optical systems, the change of
shape of the substrate is obtained in advance, the magnification of
at least one of the projection optical systems is changed in
accordance with the change of shape, and the position of the image
projected via the at least one projection optical system is
changed. Therefore, it is possible to transfer the mask pattern to
the substrate with its image corrected preferably with respect to
the change of shape of the substrate.
Also, in this exposure method, the magnification of the at least
one projection optical system, and the position of the image
projected via the at least one projection optical system in the
perpendicular direction are changed in accordance with, among the
change of shape, a change in a perpendicular direction to the
predetermined direction, and the position of the image projected
via the at least one projection optical system in the predetermined
direction is changed in accordance with, among the change of shape,
a change in the predetermined direction. Therefore, the correction
with respect to the change of shape of the substrate is
possible.
Furthermore, in the exposure method, as the speed ratio is changed
in accordance with the change of shape of the substrate, the
correction with respect to the change of shape of the substrate in
the predetermined direction is easy.
According to the present invention, as above, the magnification of
at least one of the projection optical system is changed in
accordance with the amount of expansion and contraction of the
substrate, and the position of the projected image is changed in
accordance with the change of magnification, so that it is possible
to correct the projected image of the mask pattern in accordance
with the expansion and contraction of the substrate. Therefore,
even though the image of the mask pattern is exposed repeatedly on
the substrate one over another for a plurality of layers, the
exposed images on the substrate will not be deviated from each
other.
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is a schematic diagram showing the structure of a scanning
type exposure apparatus according to an embodiment of the present
invention;
FIG. 2 is a block diagram showing the structure of the control
system for shifting optical axes of the projection optical systems
in the apparatus of FIG. 1;
FIG. 3 shows the state of the projection areas projected on the
photosensitive substrate;
FIG. 4A shows the alignment marks formed on the photosensitive
substrate;
FIG. 4B shows the shapes of the alignment marks;
FIG. 4C shows the beams for detecting the alignment marks;
FIG. 5A is a graph of a waveform obtained by the alignment
sensor;
FIG. 5B is a graph of a waveform obtained by the alignment
sensor;
FIG. 6 is an explanatory diagram showing the state of correcting
the optical axes in accordance with the expansion and contraction
of the photosensitive substrate according to the embodiment of the
present invention;
FIG. 7 is a diagram for explaining a change of the positional
relationship of images produced in accordance with the change of
magnification of the projection optical systems;
FIG. 8 is a diagram showing the change of magnification and the
changes of positions of images;
FIG. 9A shows a lattice-like pattern;
FIG. 9B shows deviations of images of the lattice-like pattern;
FIG. 10 shows a modification of the scanning type exposure
apparatus of the present invention;
FIG. 11 shows another example of a magnification control device of
the projection optical system; and
FIG. 12 is a diagram for explaining the rotation of the plane
parallel glass and the shift of an image.
DESCRIPTION OF THE PREFERRED EMBODIMENTS
FIG. 1 schematically shows the structure of a scanning type
exposure apparatus according to an embodiment of the present
invention. FIG. 2 is a block diagram showing the structure of a
control system for shifting imaging positions of projected images
via projection optical systems of the exposure apparatus in FIG. 1.
A light flux emitted from a light source such as an extra-high
pressure mercury lamp is shaped into a predetermined shape by an
illumination optical system 1a including a fly eye lens, an
illumination field stop and the like and forms the image of the
field stop on a pattern surface of a mask 2. In this apparatus, a
plurality of illumination optical systems the same as the
illumination optical system 1a are provided, and respective light
fluxes emitted from the illumination optical system 1a to 1e
illuminate small areas (illumination areas) M1 to M5 on the mask 2.
The plurality of light fluxes transmitted through the mask 2 form
pattern images of the illumination areas M1 to M5 of the mask 2 on
respective projection areas P1 to P5 on a photosensitive substrate
5 via the projection optical systems 3a to 3e. In this case, the
projection optical systems 3a to 3e are one-to-one erecting
systems. The respective projection optical systems 3a to 3e are
provided with magnification control devices 10 for changing
magnifications of the projection optical systems by adjusting the
air pressure between optical elements of each projection optical
system. Further, plane parallel glasses 4a to 4e are disposed in
respective light paths between the projection optical systems 3a to
3e and the photosensitive substrate 5. The projection positions
(projection areas P1 to P5) of the pattern images on the
photosensitive substrate 5 are changed by changing angles of the
respective plane parallel glasses 4a to 4e with respect to optical
axes AX1 to AX5 to shift the optical axes of the projection optical
axes. The projection areas P1 to P5 on the photosensitive substrate
5 are in a trapezoid shape. As shown in FIG. 3, adjacent projection
areas (e.g., P1 and P2, P2 and P3) along in a Y-direction
(nonscanning direction) are displaced in an X-direction (scanning
direction) by a predetermined amount from each other, and end
portions of adjacent projection areas (ranges indicated by broken
lines) are overlapped in the Y-direction (i.e., two lows along the
Y-direction). Accordingly, the plurality of projection optical
systems 3a to 3e are displaced by a predetermined amount in the
X-direction and overlapped in the Y-direction in accordance with
the arrangement of the projection areas P1 to P5. The plurality of
the illumination optical systems 1a to 1e are arranged such that
the arrangement of the illumination areas on the mask 2 becomes the
same as that of the projection areas P1 to P5. The whole surface of
a pattern region 2a on the mask 2 is transferred onto an exposure
region 5a on the photosensitive substrate 5 by scanning the mask 2
and the photosensitive substrate 5 synchronously in the X-direction
with respect to the projection optical systems 3a to 3e.
The photosensitive substrate 5 is disposed on a substrate stage 6.
The substrate stage 6 is provided with a drive device 7 having a
long stroke in the scanning direction for performing
one-dimensional scanning exposure, and a drive device 8 having a
short stroke for moving the stage 6 slightly in the Y-direction.
Further, the substrate stage 6 is provided with a position
measuring device (e.g., laser interferometer) 9 for detecting the
position of the substrate stage in the scanning direction with high
resolving power and high precision.
The mask 2 is supported by a mask stage (not shown). Similarly, the
mask stage is provided with a drive device having a long stroke in
the scanning direction, a drive device having a short stroke in the
direction perpendicular to the scanning direction, and a position
measuring device for detecting the position of the mask stage in
the scanning direction. Further, at least one of the substrate
stage and the mask stage has a rotating mechanism for correcting
the rotation of the mask or the photosensitive substrate.
The mask 2 and the photosensitive substrate 5 (or the mask stage
and the substrate stage 6) may be supported together by a carriage
as shown in FIG. 10.
Alignment marks D are formed on the respective photosensitive
substrate 5 and the mask 2. Alignment sensors PM, MM are provided
in predetermined positions with respect to the exposure apparatus
so as to detect those alignment marks D. It is necessary to provide
at least two alignment sensors PM and at least two alignment
sensors MM, and the positions of the marks are detected by signal
processing devices (not shown). As shown in FIG. 4, the alignment
mark D is constituted by marks Dy.sub.1, Dy.sub.2 (represented by
the marks Dy) formed in the vicinity of the transfer region 5a of
the photosensitive substrate or the pattern region 2a of the mask 2
approximately successively along the scanning direction, and marks
Dx.sub.11, Dx.sub.12, Dx.sub.21, Dx.sub.22 (represented by the mark
Dx) formed at lateral ends of the marks Dy.sub.1, Dy.sub.2 so as to
be spaced away for a predetermined distance from each other in the
Y-direction. Also, the alignment marks D are a set of grating-like
marks, as shown in FIG. 4C. Laser beams are emitted to the marks D
and the positions of the marks D with respect to the sensors PM, MM
are obtained by detecting diffracted light of each laser beam.
Laser beams emitted to the marks D are in the shape of a slit, as
shown in FIG. 4B. A laser beam Bx detects the mark Dx while a laser
beam By detects the mark Dy. The laser beam By is vibrated with a
constant amplitude and a constant frequency as indicated by broken
lines. The diffracted light produced from the mark D due to each
beam Bx, By is detected via slits of the respective alignment
sensors PM, MM by detectors and converted to electric signals.
The signal of the mark Dx due to the beam Bx becomes a waveform in
FIG. 5A indicating the change in signal intensity in accordance
with the X-coordinate detected by the position measuring device 9,
and the center position of the mark Dx can be detected with the
x-coordinate by performing a predetermined algorithm process. The
signal of the mask Dy due to the beam By can be obtained as the
change in signal intensity with respect to the deviation of the
position in the Y-direction as shown in FIG. 5B by detecting, on
the same frequency as the vibration, the phase of the signal
intensity obtained by the vibration of the beam and changed with
time. By subjecting the change in signal intensity to an AGC
process before the phase detection, a constant intensity
distribution is obtained in accordance with the deviation of the
position in the Y-direction in spite of the magnitude of the
intensity of the original signal.
The alignments of the photosensitive substrate 5 and the mask 2 are
performed by the use of the above-structured alignment marks and
the alignment sensors in accordance with the following procedure.
The following description is directed to the alignment of the
photosensitive substrate but the alignment of the mask is performed
in the same manner.
1) The photosensitive substrate 5 is placed on the stage 6, and the
stage 6 is moved such that the marks Dx.sub.11, Dx.sub.12 are
positioned within respective detecting ranges of the two alignment
sensors PM.
2) The positions of the marks Dx.sub.11, Dx.sub.12 in the
X-direction are measured by scanning the marks and beams
relatively.
3) The stage 6 is moved until the marks Dx.sub.21, Dx.sub.22 are
positioned within detecting ranges of the alignment sensors PM.
Then, the positions of the marks Dx.sub.21, Dx.sub.22 in the
X-direction are detected.
As a result, the average value of the differences (Dx.sub.11
-Dx.sub.21) and (Dx.sub.12 -Dx.sub.22) of the respective positions
becomes the amount of expansion and contraction of the
photosensitive substrate in the X-direction. And, the average value
of the differences (Dx.sub.11 -Dx.sub.12) and (Dx.sub.21
-Dx.sub.22) becomes the amount of rotation of the substrate around
the optical axes.
4) The stage is rotated in accordance with the measured amount of
rotation to correct the rotation of the substrate. For this, both
the substrate stage and the mask stage may be rotated to correct
the relative amount of rotation between the photosensitive
substrate and the mask. In this case, there is no need to provide a
rotating mechanism to one of the stages.
5) After the rotation correction, the positions of the marks are
again measured to check the rotation and the position of the
photosensitive substrate in the X-direction with respect to the
mask is obtained.
6) While the marks Dy are detected by the alignment sensors, the
stage 6 is moved in the X-direction. Regarding the mark Dy, a
signal as shown in FIG. 5B is obtained. Therefore, the position of
the stage 6 in the Y-direction is controlled by the drive device 8
such that the average value of the respective signals of the marks
Dy.sub.1, Dy.sub.2 becomes zero.
The amount of expansion and contraction of the photosensitive
substrate in the Y-direction due to its position in the X-direction
can be obtained continuously by converting the difference between
the detection signals of the mark Dy.sub.1, Dy.sub.2 to the
distance in the Y-direction. The expansion and contraction of the
photosensitive substrate in the X-direction can be corrected by
changing the speed of moving the photosensitive substrate with
respect to the design value based on the values obtained in the
above processes 2) and 3). In this case, the marks Dx are formed
only on both ends of the photosensitive substrate, so that it is
impossible to correct the expansion and contraction in accordance
with various positions in the X-direction. However, if the number
of the measuring points is increased by forming marks Dx on three
or more points and the amount of expansion and contraction of each
position between the measuring points is measured, approximately
continuous correction can be realized.
The amounts of expansion and contraction obtained as above are
stored in the memory of a control device 11 in FIG. 2. Then, when
performing exposure to the photosensitive substrate 5, the control
device 11 changes magnifications of the projection optical systems
3a to 3e by means of the magnification control device 10 based on
the amounts of expansion and contraction stored in the memory and
sends instructions to a drive device 12 to drive the plane parallel
glasses 4a to 4e to shift the optical axes. This operation is
necessary for the reason that since the positional relationship
between the overlapped portions of the projection area s as
indicated by the broken lines in FIG. 3 is changed due to the
changes of magnifications and the amount of exposure to the
photosensitive substrate becomes uneven, the positional
relationship between the projection areas is returned to the
initial condition. The change in positional relationship between
the plurality of projection areas when the magnifications of the
projection optical systems are changed will be described with
reference to FIGS. 7, 9A and 9B.
In FIG. 7, areas indicated by two-dot-chain lines represent the
projection area P1 to P5 when the magnifications of the projection
optical systems 3a to 3e is in the initial condition while areas
indicated by solid lines represent projection areas when the
magnifications of the projection optical systems are changed. For
the simplicity of the description, the shape of the projection
areas is made rectangular differently from that of the projection
areas P1 to P5 in FIG. 1. At the time of the initial
magnifications, the length of the projection areas in the
Y-direction is L, the length thereof in the X-direction is W, the
distance between the centers of the projection areas in the
Y-direction (e.g., P1 to P2) is P, and the distance between the
centers thereof in the X-direction is B. In this case, there is no
unnecessary overlap .eta. in the Y-direction, and the positional
relationship between the projection areas in the X-direction is set
to be in a predetermined condition. Therefore, a lattice-like
pattern as shown in FIG. 9A is transferred properly.
On the other hand, when each magnification of the projection
optical systems is changed by the M times, the length of the
projection areas in the Y-direction is L.times.M, and the length
thereof in the X-direction is W.times.H. However, the distances
between the centers of the projection areas are kept to be P and B.
Accordingly, the positional relationship between the projection
areas is changed (e.g., the distance between sides changes from "b"
to "Mb-.kappa." or "b-(M-1) W") and the overlap .eta. and the
deviation K expressed by the following expressions are produced
respectively in the Y- and X-directions: ##EQU1##
Therefore, the lattice-like pattern in FIG. 9A is transferred as an
image including the overlaps .eta. and the deviations .kappa. as
shown in FIG. 9B.
Then, in order to correct the overlaps and the deviations, the
distances between the projection areas are changed in accordance
with the change of magnification of the projection optical systems.
Basically, this correction is carried out such that the dimensions
of the projection areas and the distances between the projection
areas are made similar before and after the correction. In
connection with this correction, the correction of imaging
positions of the projection areas will be described with reference
to FIGS. 2, 6 and 12.
FIG. 6 shows the state of correcting the positions of the optical
axes in accordance with the expansion and contraction of the
photosensitive substrate according to this embodiment of the
present invention. The same members and parts as those in FIG. 1
are designated by the same reference numerals. The thicknesses of
the plane parallel glasses 4a to 4e are approximately identical and
the amount of shift for each optical axes AX1 to AX5 at the same
angle of rotation is the same. Also, when the angles of rotations
of the plane parallel glasses are zero, the positions of the
optical axes AX1 to AX5 projected on the photosensitive substrate 5
are .alpha., .beta., .gamma., .delta., .epsilon.. These positions
.alpha., .beta., .gamma., .delta., .epsilon. can be considered as
the positions of the patterns formed prior to the expansion and
contraction of the photosensitive substrate.
Now, for example, the photosensitive substrate 5 is considered to
be extended uniformly in the Y-direction by .DELTA.p (ppm). In this
case, the magnifications of the projection optical systems are
changed and the optical axes are shifted in accordance with the
changes of magnifications as follows. As the photosensitive
substrate is extended uniformly, the displacement of each position
thereof is proportional to the distance from the center of the
photosensitive substrate. Therefore, the amount of shift for each
optical axis is proportional to the distance from the center of the
photosensitive substrate. That is, if the distances between the
positions .alpha., .beta., .gamma., .delta., .epsilon. are l, the
displacement of each position .vertline..alpha.'-.alpha..vertline.,
.vertline..beta.'-.beta..vertline.,
.vertline..gamma.'-.gamma..vertline.,
.vertline..delta.-.delta.'.vertline.,
.vertline..epsilon.-.epsilon.'.vertline. becomes 2.DELTA.1,
.DELTA.1, 0, .DELTA.1, 21.DELTA.1 respectively. Also,
.DELTA.1=1.times..DELTA.p/10.sup.6.
When exposing a pattern again on the pattern formed on the extended
photosensitive substrate 5, each magnification of the projection
optical systems 3a to 3e is enlarged by .DELTA.p (ppm). Thereby,
the amount of shift for each optical axis AX1, AX5 is:
And, the amount of shift for each optical axis AX2, AX4 is:
When the angle of rotation of the plane parallel glass (fine angle)
is .theta. (rad), the thickness thereof is t(mm), and the
refractive index thereof is n, the amount .DELTA.1(mm) of shift due
to the rotation of the plane parallel glass is approximated as
follows:
Therefore, .theta. becomes: ##EQU2##
Then, by rotating the plane parallel glasses 4a to 4e at the
respective angles of rotations 2.theta., .theta., 0, -.theta.,
-2.theta. (the direction R in the drawing is made positive), the
projection positions of the optical axes AX1 to AX5 are made to
coincide with the positions .alpha.', .beta.', .gamma.', .delta.',
.epsilon.'. Thereby, the correction of the projected image in
accordance with the extension of the photosensitive substrate in
the Y-direction (the correction of the imaging positions) can be
performed.
Also, for example, as shown in FIG. 12, if the plane parallel glass
has the thickness t=3 (mm) and the refractive index n=1.74, and
when the plane parallel glass is inclined at the angle .theta.=1.0
(mrad), the optical axis AX is shifted by .DELTA.1=1.3 (.mu.m).
And, if the magnification of projection optical system is 1:1, the
imaging position on the photosensitive substrate is shifted by 1.3
(.mu.m).
Then, as shown in FIG. 2, the control device 11 rotates the plane
parallel glasses 4a to 4e by the drive device 12 based on the
amount .DELTA.1 of shift to change imaging positions.
When the expansion and contraction of the photosensitive substrate
are not uniform with respect to its center in the Y-direction,
i.e., when nonlinear expansion and contraction are produced in the
photosensitive substrate, the deviation of each position on the
photosensitive substrate is calculated and stored in the memory.
For example, the positions of arbitrarily chosen patterns formed on
the photosensitive substrate 5 are obtained by the use of another
position detecting device and the deviations of the positions of
those patterns from the respective design positions are obtained.
Then, the expansion and contraction of each of those positions on
the photosensitive substrate are obtained and stored in the memory
of the control device 11. When performing exposure, the
magnifications of the respective projection optical systems 3a to
3e are changed in accordance with the amounts of expansion and
contraction and the plane parallel glasses 4a to 4e are rotated at
respective angles of rotation in accordance with the changes of
magnifications (the amounts of expansion and contraction). Also,
when correcting the expansion and contraction of each arbitrarily
chosen position on the photosensitive substrate in the X-direction,
the magnifications of the projection optical systems and the angles
of rotations of the plane parallel glasses are controlled
continuously during scanning exposure. However, when the controls
of the magnifications and the angles of rotations do not follow the
scanning speed of the photosensitive, the amounts of expansion and
contraction of the photosensitive substrate are averaged in the
X-direction, and the magnifications and angles of rotations are
controlled based on the averaged amount of expansion and
contraction.
In the above embodiment, the thicknesses of the plane parallel
glasses are approximately the same, but may be differentiated when
the expansion and contraction of the photosensitive substrate are
uniform with respect to its center. That is, as known from the
expression (5), the amount of shift is proportional to the
thickness of the glass. Therefore, if the thickness of the plane
parallel glasses 4b, 4d is set to t and the thickness of the plane
parallel glasses 4a, 4e is set to 2t, the angles of rotations of
the plane parallel glasses 4a to 4e become the same. Therefore, the
structure of the drive device 12 for driving the plane parallel
glasses is simplified.
In the above embodiment, although the change of magnification is
uniform in both X- and Y-directions, there is a case that the
expansion and contraction of the photosensitive substrate are
different depending on the directions. In this case, as shown in
FIG. 8, magnifications in the X- and Y-directions are changed by
M.sub.1 and M.sub.2 times respectively. This can be performed by
changing the magnifications of the projection optical systems 3a to
3e and correcting the relative 10 speed of the mask 2 and the
photosensitive substrate 5 in during scanning exposure in the
X-direction. Namely, for example, each magnification of the
projection optical systems 3a to 3e is changed by M.sub.1 times.
And, regarding the difference between M.sub.1 and M.sub.2, the
speed of at least one of the mask and the photosensitive substrate
is decelerated or accelerated as the difference between the speeds
of the mask and the photosensitive substrate.
FIG. 10 shows a modification of the scanning type exposure
apparatus of the present invention. The same members and parts as
those in the apparatus in FIG. 1 are designated by the same
reference numerals. The points different from the apparatus in FIG.
1 are as follows. Namely, the apparatus in FIG. 10 has a carriage
17 capable of scanning and moving the mask 2 and the photosensitive
substrate 5 together. Also, the mask 2 is disposed on a mask stage
13, and the mask stage 13 is driven by drive devices 14, 15, 16
such as motors in the X- and Y-directions and the direction of
rotation (.theta.-direction) with respect to the optical axes of
the illumination optical systems thereby to control the positions
of the mask 2 in the X-, Y- and .theta.-directions. The positions
of the mask stage 13 and the carriage 17 in the X-direction are
detected respectively by measuring devices 18 and 19 such as laser
interference measuring devices.
The projection optical systems 3a to 3e are provided with
respective magnification control devices 20 therein. As shown in
FIG. 11, each magnification control device 20 is constituted by two
plano-concave lens 30a and 30b having comparatively large radii of
curvature and a biconvex lens 30. The image height is changed by
shifting the biconvex lens 30c in the direction of the optical axis
AX. For example, when lenses with the radius of curvature R=5000
(mm) and the refractive index n=1.74 are combined and the bioconvex
lens is shifted by .+-.68 (.mu.m), the magnification adjustment
(image height adjustment) of .+-.20 ppm becomes possible.
The mask 2 is provided with alignment marks MA1 to MA3 and the
photosensitive substrate 5 is provided with alignment marks PA1 to
PA3. The positions of the alignment marks MA1 to MA3 and PA1 to PA3
are detected by alignment sensors A1 and A2 disposed above the mask
2. The alignment sensors A1 and A2 are provided to detect the
alignment marks PA1 to PA3 via the mask 2 and two lateral end side
projection optical systems 3a and 3e and can detect the relative
positional relationship between the mask 2 and the photosensitive
substrate 5. The positional deviations between the mask 2 and the
photosensitive substrate 5 in the X- and Y-directions and the
direction of rotation (.theta.-direction) are obtained based on the
detected relative positional relationship and the alignment of the
mask 2 and the photosensitive substrate 5 is performed by the drive
devices 14 to 16.
The magnification error (expansion and contraction of the
photosensitive substrate) of the photosensitive substrate 5 with
respect to the mask 2 is detected by the alignment sensors A1 and
A2. For example, the positions of two sets of alignment marks MA1
and PA1, MA2 and PA2 are detected. Then, from the ratio of the
distance between the marks PA1 and PA2 to the distance between the
marks MA1 and MA2, a magnification is obtained. That is, as shown
in FIG. 10, the magnification (M.sub.1) in the Y-direction is
obtained by detecting two sets of alignment marks MA1 and PA1, MA2
and PA2 or more arranged along Y-direction, and the magnification
(M.sub.2) in the X-direction is obtained by detecting two sets of
alignment marks MA2 and PA2, MA3 and PA3 or more.
Then, based on the obtained magnifications, the imaging position of
the projection area defined by each projection optical system is
corrected by M.sub.1 times in the Y-direction and by M.sub.2 times
in the X-direction, and the plane parallel glasses 4a to 4e are
rotated.
When performing exposure by scanning the carriage 17 after the
imaging positions of the projection areas have been changed, the
drive devices 14 to 16 are driven to move the mask stage 13, and
the scanning exposure is performed such that the difference of the
speeds of the mask and the photosensitive substrate with respect to
the projection optical systems becomes V.times.(M.sub.2 -1). This
case is the same as the above case in which the amount of expansion
and contraction of the substrate in the X-direction is different
from that of the substrate in the Y-direction.
The differences between the structures of the apparatuses in FIGS.
1 and 10 are replaceable mutually.
In the above embodiment, the plurality of illumination optical
systems emit respective light fluxes to the plurality of projection
optical systems, but a light flux from one illumination optical
system may be divided into a plurality of light fluxes to be
emitted to the respective projection optical systems.
Also, the respective alignment sensors detect diffracted light from
the alignment marks, but may detect directly reflected light from
alignment marks. In this case, the alignment marks may be
continuous bar marks instead of the grating-like marks. In
particular, the mark Dx may be a group of bar marks arranged in
close proximity.
Also, in the apparatus in FIG. 1, instead of vibrating the
above-mentioned beam By, the slit in the alignment sensor may be
vibrated. Further, although the laser beams Bx and By shown in FIG.
4C are separated from each other, they may be integrated to be a
cross-shaped beam if they can be separated by a light-receiving
system.
Further, the measurement in the Y-direction is performed by
detecting the phase of the waveform obtained from the vibrating
beam in the above embodiment. However, there is another method in
which the beam is not vibrated but fixed and the diffracted light
or the directly reflected light from the mark is received by a
sensor having two sensor divisions to obtain the signal intensity
ratio of both sensor divisions electrically thereby to obtain the
position information shown in FIG. 5B. If the electric signal
intensities of the two sensor divisions are A and B, the ratio of
(A-B)/(A+B) is obtained and the obtainment of position information
does not depend on the signal intensity.
Furthermore, in the present embodiment, there is no specific
limitation on the distance between the two marks Dy formed on the
mask and the distance between the two marks Dy formed on the
photosensitive substrate, but if both distances are made equal, the
alignment marks of the mask are transferred to the photosensitive
substrate in the exposure of the first layer and the transferred
alignment marks can be used for the second and later layers on the
photosensitive substrate. In this case, when the exposure for the
third or more layers are required, it is preferable to provide a
shutter in a position conjugate to the field stop in order to
prevent the transfer of the alignment marks of the mask in the
second and later exposures.
* * * * *