U.S. patent number D935,012 [Application Number D/732,685] was granted by the patent office on 2021-11-02 for mask.
The grantee listed for this patent is Yun-Ho Chung, Shin-Hyan No. Invention is credited to Yun-Ho Chung, Shin-Hyan No.
United States Patent |
D935,012 |
Chung , et al. |
November 2, 2021 |
Mask
Claims
CLAIM We claim, the ornamental design for a mask, as shown and
described.
Inventors: |
Chung; Yun-Ho (Seoul,
KR), No; Shin-Hyan (Seoul, KR) |
Applicant: |
Name |
City |
State |
Country |
Type |
Chung; Yun-Ho
No; Shin-Hyan |
Seoul
Seoul |
N/A
N/A |
KR
KR |
|
|
Appl.
No.: |
D/732,685 |
Filed: |
April 27, 2020 |
Foreign Application Priority Data
|
|
|
|
|
Mar 3, 2020 [KR] |
|
|
30-2020-0009539 |
|
Current U.S.
Class: |
D24/110.1 |
Current International
Class: |
2902 |
Field of
Search: |
;D24/110,110.1-110.6,162,231 ;D29/102,106-108,110 |
References Cited
[Referenced By]
U.S. Patent Documents
Foreign Patent Documents
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|
|
|
|
302827489 |
|
May 2014 |
|
CN |
|
303398052 |
|
Sep 2015 |
|
CN |
|
305628635 |
|
Feb 2020 |
|
CN |
|
305796091 |
|
May 2020 |
|
CN |
|
306244724 |
|
Dec 2020 |
|
CN |
|
D1644822 |
|
Oct 2019 |
|
JP |
|
Primary Examiner: Bekic; Lilyana
Assistant Examiner: Starr; Lee D.
Attorney, Agent or Firm: Novick, Kim & Lee, PLLC Kim;
Jae Youn Shin; Hyun Woo
Description
FIG. 1 is a perspective view of a mask, showing our new design;
FIG. 2 is a front elevational view thereof;
FIG. 3 is a rear elevational view thereof;
FIG. 4 is a left side elevational view thereof;
FIG. 5 is a right side elevational view thereof;
FIG. 6 is a top plan view thereof; and,
FIG. 7 is a bottom plan view thereof.
* * * * *