Mask

Chung , et al. November 2, 2

Patent Grant D935012

U.S. patent number D935,012 [Application Number D/732,685] was granted by the patent office on 2021-11-02 for mask. The grantee listed for this patent is Yun-Ho Chung, Shin-Hyan No. Invention is credited to Yun-Ho Chung, Shin-Hyan No.


United States Patent D935,012
Chung ,   et al. November 2, 2021

Mask

Claims

CLAIM We claim, the ornamental design for a mask, as shown and described.
Inventors: Chung; Yun-Ho (Seoul, KR), No; Shin-Hyan (Seoul, KR)
Applicant:
Name City State Country Type

Chung; Yun-Ho
No; Shin-Hyan

Seoul
Seoul

N/A
N/A

KR
KR
Appl. No.: D/732,685
Filed: April 27, 2020

Foreign Application Priority Data

Mar 3, 2020 [KR] 30-2020-0009539
Current U.S. Class: D24/110.1
Current International Class: 2902
Field of Search: ;D24/110,110.1-110.6,162,231 ;D29/102,106-108,110

References Cited [Referenced By]

U.S. Patent Documents
4827924 May 1989 Japuntich
5617849 April 1997 Springett
D431647 October 2000 Henderson
D449377 October 2001 Henderson
D567937 April 2008 Gerson
7677248 March 2010 Gerson
D698498 January 2014 Fleming
D844253 March 2019 Cho
D877885 March 2020 Bergman
D903097 November 2020 Costella
Foreign Patent Documents
302827489 May 2014 CN
303398052 Sep 2015 CN
305628635 Feb 2020 CN
305796091 May 2020 CN
306244724 Dec 2020 CN
D1644822 Oct 2019 JP
Primary Examiner: Bekic; Lilyana
Assistant Examiner: Starr; Lee D.
Attorney, Agent or Firm: Novick, Kim & Lee, PLLC Kim; Jae Youn Shin; Hyun Woo

Description



FIG. 1 is a perspective view of a mask, showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a left side elevational view thereof;

FIG. 5 is a right side elevational view thereof;

FIG. 6 is a top plan view thereof; and,

FIG. 7 is a bottom plan view thereof.

* * * * *


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