Gas inlet attachment for substrate processing apparatus

Description

FIG. 1 is a front, top and left side perspective view of a gas inlet attachment for substrate processing apparatus showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof; and,

FIG. 4 is a left side elevational view thereof;

FIG, 5 is a right side elevational view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof; and,

FIG. 8 is a cross-sectional view take along line 8-8 in Fig.4.

Claims

CLAIM I claim the ornamental design for a gas inlet attachment for substrate processing apparatus, as shown and described.

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Inventors:	Shimada; Hironori (Toyama, JP)
Applicant:	Name City State Country Type KOKUSAI ELECTRIC CORPORATION Tokyo N/A JP
Assignee:	KOKUSAI ELECTRIC CORPORATION (Tokyo, JP)
Appl. No.:	D/672,229
Filed:	December 4, 2018

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Foreign Application Priority Data

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Jul 19, 2018 [JP]			2018-015808

Current U.S. Class:	D15/144.1; D13/182
Current International Class:	1509
Field of Search:	;D13/182,199 ;D15/138,144,144.1,199 ;D23/266

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References Cited [Referenced By]

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U.S. Patent Documents

D326272	May 1992	Nakao
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D890572	July 2020	Saiki
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Primary Examiner: Sikder; Selina
Attorney, Agent or Firm: Fitch, Even, Tabin & Flannery LLP