Gas inlet attachment for wafer processing apparatus

Description

FIG. 1 is a front, top and right side perspective view of a gas inlet attachment for wafer processing apparatus showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a right side elevational view thereof;

FIG. 5 is a left side elevational view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof; and,

FIG. 8 is a cross sectional view taken along line 8-8 in FIG. 2.

Claims

CLAIM The ornamental design for a gas inlet attachment for wafer processing apparatus, as shown and described.

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Inventors:	Murata; Satoru (Toyama, JP), Morita; Shinya (Toyama, JP)
Applicant:	Name City State Country Type KOKUSAI ELECTRIC CORPORATION Tokyo N/A JP
Assignee:	KOKUSAI ELECTRIC CORPORATION (Tokyo, JP)
Appl. No.:	D/699,539
Filed:	July 26, 2019

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Foreign Application Priority Data

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Jan 28, 2019 [JP]			2019-001458

Current U.S. Class:	D15/144.1
Current International Class:	1509
Field of Search:	;D13/182,184,199,122 ;D15/144,144.1,144.2 ;D8/2,382

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References Cited [Referenced By]

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U.S. Patent Documents

D326272	May 1992	Nakao
D326273	May 1992	Nakao
D787458	May 2017	Kim
D796458	September 2017	Jang
10364493	July 2019	Lee
2004/0217217	November 2004	Han
2007/0131168	June 2007	Gomi
2008/0092815	April 2008	Chen
2010/0243166	September 2010	Hayashi
2011/0098841	April 2011	Tsuda
2015/0240359	August 2015	Jdira
2015/0348755	December 2015	Han
2017/0051408	February 2017	Takagi
2018/0087152	March 2018	Yoshida
2018/0087156	March 2018	Fukushima
2018/0135173	May 2018	Kim
2018/0135179	May 2018	Ikeuchi

Primary Examiner: Oswecki; Elizabeth J
Attorney, Agent or Firm: Fitch, Even, Tabin & Flannery, LLP

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