Diving mask

Chen Ja

Patent Grant D873991

U.S. patent number D873,991 [Application Number D/662,479] was granted by the patent office on 2020-01-28 for diving mask. The grantee listed for this patent is Yan Chen. Invention is credited to Yan Chen.


United States Patent D873,991
Chen January 28, 2020

Diving mask

Claims

CLAIM The ornamental design for a diving mask, as shown and described.
Inventors: Chen; Yan (Hubei, CN)
Applicant:
Name City State Country Type

Chen; Yan

Hubei

N/A

CN
Appl. No.: D/662,479
Filed: September 5, 2018

Foreign Application Priority Data

Aug 24, 2018 [CN] 2018 3 0474568
Current U.S. Class: D24/110.2; D24/110.4
Current International Class: 2902
Field of Search: ;D24/110-110.5 ;D29/110

References Cited [Referenced By]

U.S. Patent Documents
D775722 January 2017 Caprice
D838358 January 2019 Xu
D839408 January 2019 Hu
D849932 May 2019 Caprice
D852265 June 2019 Liao
D852266 June 2019 Liao
D859642 September 2019 Xiong
D860436 September 2019 Chen
2016/0297505 October 2016 Caprice
2017/0096204 April 2017 Cucchia
2018/0065719 March 2018 Liao
2018/0297676 October 2018 Zheng
2019/0023366 January 2019 Liao
2019/0039702 February 2019 Gamberini
2019/0224506 July 2019 Palmieri
2019/0225311 July 2019 Barone
2019/0329853 October 2019 Zheng
Foreign Patent Documents
301013059.0000 Jul 2019 KR
Primary Examiner: Bekic; Lilyana

Description



FIG. 1 is a top, front and left side perspective view of a diving mask showing my new design;

FIG. 2 is a bottom, rear and right side perspective view thereof;

FIG. 3 is a front elevational view thereof;

FIG. 4 is a rear elevational view thereof;

FIG. 5 is a left side view thereof;

FIG. 6 is a right side view thereof;

FIG. 7 is a top plan view thereof; and,

FIG. 8 is a bottom plan view thereof.

The broken lines in the drawings illustrate portions of the diving mask which form no part of the claimed design.

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Patent Diagrams and Documents

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