U.S. patent number D873,991 [Application Number D/662,479] was granted by the patent office on 2020-01-28 for diving mask.
The grantee listed for this patent is Yan Chen. Invention is credited to Yan Chen.
United States Patent |
D873,991 |
Chen |
January 28, 2020 |
Diving mask
Claims
CLAIM The ornamental design for a diving mask, as shown and
described.
Inventors: |
Chen; Yan (Hubei,
CN) |
Applicant: |
Name |
City |
State |
Country |
Type |
Chen; Yan |
Hubei |
N/A |
CN |
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|
Appl.
No.: |
D/662,479 |
Filed: |
September 5, 2018 |
Foreign Application Priority Data
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Aug 24, 2018 [CN] |
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2018 3 0474568 |
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Current U.S.
Class: |
D24/110.2;
D24/110.4 |
Current International
Class: |
2902 |
Field of
Search: |
;D24/110-110.5
;D29/110 |
References Cited
[Referenced By]
U.S. Patent Documents
Foreign Patent Documents
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301013059.0000 |
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Jul 2019 |
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KR |
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Primary Examiner: Bekic; Lilyana
Description
FIG. 1 is a top, front and left side perspective view of a diving
mask showing my new design;
FIG. 2 is a bottom, rear and right side perspective view
thereof;
FIG. 3 is a front elevational view thereof;
FIG. 4 is a rear elevational view thereof;
FIG. 5 is a left side view thereof;
FIG. 6 is a right side view thereof;
FIG. 7 is a top plan view thereof; and,
FIG. 8 is a bottom plan view thereof.
The broken lines in the drawings illustrate portions of the diving
mask which form no part of the claimed design.
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