Gas diffusion plate for a plasma processing apparatus

Description

FIG. 1 is a front, bottom and right side perspective view of a gas diffusion plate for a plasma processing apparatus according to the design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a left side elevational view thereof;

FIG. 4 is a right side elevational view thereof;

FIG. 5 is a top plan view thereof;

FIG. 6 is a bottom plan view thereof;

FIG. 7 is a rear elevational view thereof;

FIG. 8 is a cross-sectional view taken along line 8-8 of FIG. 2;

FIG. 9 is an enlarged view of the portion shown in BOX 9 in FIG. 2; and,

FIG. 10 is an enlarged view of the portion shown in BOX 10 in FIG. 8.

The broken lines show the boundary of enlarged portions and form no part of the claimed design.

Claims

CLAIM The ornamental design for a gas diffusion plate for a plasma processing apparatus, as shown and described.

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Inventors:	Tanaka; Kazuumi (Tokyo, JP), Okuda; Kouji (Tokyo, JP)
Applicant:	Name City State Country Type Hitachi High-Technologies Corporation Mintato-ku, Tokyo N/A JP
Assignee:	Hitachi High-Technologies Corporation (Tokyo, JP)
Appl. No.:	D/638,441
Filed:	February 27, 2018

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Foreign Application Priority Data

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Nov 6, 2017 [JP]			2017-024710

Current U.S. Class:	D24/225
Current International Class:	2402
Field of Search:	;D24/107,110.6,113,129,144,206,224,193,197,216,225 ;D23/200,213-215,222,223,229,283,269 ;D15/140,17,126,138,176 ;D13/182 ;D12/212 ;D8/66,358,375

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References Cited [Referenced By]

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U.S. Patent Documents

D411516	June 1999	Imafuku
D589473	March 2009	Takamoto
D638550	May 2011	Bedingham
D648289	November 2011	Mayer
D667561	September 2012	Bedingham
D672050	December 2012	Lee
D734483	July 2015	Chan
D789888	June 2017	Jang
D793572	August 2017	Kozuka
D794210	August 2017	Jarvius
2012/0097770	April 2012	Lee
2018/0247853	August 2018	Furuta

Primary Examiner: Hattan; Susan Bennett
Assistant Examiner: Agilee; Omeed
Attorney, Agent or Firm: Crowell & Moring LLP

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