Mask

Description

FIG. 1 is a front, top, and right side perspective view of a mask showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a left side elevational side view thereof;

FIG. 5 is a right side elevational side view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof;

FIG. 8 is a rear, bottom, right side perspective view thereof;

FIG. 9 is a front, top, and right side perspective view showing that a front portion of the mask is at a left rotation position; and,

FIG. 10 is a front, top, and right side perspective view showing that the front portion of the mask is at a right rotation position.

The broken lines in the drawings depict portions of the mask that form no part of the claimed design.

Claims

CLAIM The ornamental design for a mask, as shown and described.

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Inventors:	Lin; Chien-Hua (Taoyuan, TW), Huang; Shao-Yi (Taoyuan, TW), Hsu; Yu-Chung (Taoyuan, TW), Lo; Kai-Yao (Taoyuan, TW), Huang; Chia-Chen (Taoyuan, TW), Hung; Chi-Shan (Taoyuan, TW)
Applicant:	Name City State Country Type MICROBASE TECHNOLOGY CORP. Taoyuan N/A TW
Assignee:	MICROBASE TECHNOLOGY CORP. (Taoyuan, TW)
Appl. No.:	D/650,937
Filed:	June 11, 2018

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Foreign Application Priority Data

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Dec 15, 2017 [TW]			106307377
Feb 1, 2018 [TW]			107300655

Current U.S. Class:	D24/110.1; D24/110.4
Current International Class:	2902
Field of Search:	;D24/108,110,110.1,110.4,110.5,127,128,164

Foreign Patent Documents

	304700984		Jun 2018		CN
	D1121613		Sep 2001		JP
	D192285		Aug 2018		TW

Primary Examiner: Bekic; Lilyana
Attorney, Agent or Firm: Li & Cai Intellectual Property (USA) Office

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