U.S. patent number D853,323 [Application Number D/616,854] was granted by the patent office on 2019-07-09 for earphone charging system.
This patent grant is currently assigned to Human, Incorporated. The grantee listed for this patent is Human, Incorporated. Invention is credited to Donovan Deame, Adam Abraham Jossem, Dae Il Kwon, Lea Martin, Stephen John Minarsch, Joseph B. Moak, Francesca Alyssum Quaglia, Sam Rhea Sarcia, Douglas B. Satzger, Benjamin S. Willis.
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United States Patent |
D853,323 |
Minarsch , et al. |
July 9, 2019 |
Earphone charging system
Claims
CLAIM The ornamental design for an earphone charging system,
substantially as shown and described.
Inventors: |
Minarsch; Stephen John
(Seattle, WA), Martin; Lea (Seattle, WA), Jossem; Adam
Abraham (Seattle, WA), Kwon; Dae Il (Seattle, WA),
Quaglia; Francesca Alyssum (Seattle, WA), Willis; Benjamin
S. (Bellevue, WA), Moak; Joseph B. (San Carlos, CA),
Sarcia; Sam Rhea (Lakeside, CA), Deame; Donovan (San
Francisco, CA), Satzger; Douglas B. (Menlo Park, CA) |
Applicant: |
Name |
City |
State |
Country |
Type |
Human, Incorporated |
Seattle |
WA |
US |
|
|
Assignee: |
Human, Incorporated (Seattle,
WA)
|
Appl.
No.: |
D/616,854 |
Filed: |
September 8, 2017 |
Current U.S.
Class: |
D13/108 |
Current International
Class: |
1302 |
Field of
Search: |
;D13/107-110,118-119,184
;D14/251,253,432,434 |
References Cited
[Referenced By]
U.S. Patent Documents
Primary Examiner: Tarcza; Rosemary K
Assistant Examiner: Buckner; Nathaniel D.
Attorney, Agent or Firm: Seed IP Law Group LLP
Description
FIG. 1 is a top isometric view of an earphone charging system,
showing our new design.
FIG. 2 is a bottom isometric view thereof.
FIG. 3 is a top plan view thereof.
FIG. 4 is a bottom plan view thereof.
FIG. 5 is a left side elevational view thereof.
FIG. 6 is a right side elevational view thereof.
FIG. 7 is a front elevational view thereof; and,
FIG. 8 is a rear elevational view thereof.
The broken lines in the figures depict portions of the article
which form no part of the claimed design.
* * * * *