U.S. patent number D648,846 [Application Number D/369,646] was granted by the patent office on 2011-11-15 for mask for respirator.
This patent grant is currently assigned to Teijin Pharma Limited. Invention is credited to Shinya Fujimoto, Akito Nishijima, Keiko Omura.
United States Patent |
D648,846 |
Omura , et al. |
November 15, 2011 |
Mask for respirator
Claims
CLAIM The ornamental design for a mask for respirator, as shown and
described.
Inventors: |
Omura; Keiko (Hino,
JP), Fujimoto; Shinya (Ibaraki, JP),
Nishijima; Akito (Ibaraki, JP) |
Assignee: |
Teijin Pharma Limited (Tokyo,
JP)
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Appl.
No.: |
D/369,646 |
Filed: |
September 10, 2010 |
Foreign Application Priority Data
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Mar 12, 2010 [JP] |
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2010-006121 |
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Current U.S.
Class: |
D24/110.1 |
Current International
Class: |
2902 |
Field of
Search: |
;D24/110,110.1,110.4,110.5,110.6,129,164
;128/205.29,205.25,206.12,206.13,206.24,206.19,206.25,206.28,206.18,207.13 |
References Cited
[Referenced By]
U.S. Patent Documents
Foreign Patent Documents
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2140902 |
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Jan 2010 |
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EP |
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1-22311 |
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Jun 1989 |
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JP |
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2-77052 |
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Jun 1990 |
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JP |
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2004-000570 |
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Jan 2004 |
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JP |
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2004-000572 |
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Jan 2004 |
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JP |
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2004-209061 |
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Jul 2004 |
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JP |
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2010284563 |
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Dec 2010 |
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JP |
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WO 2008106716 |
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Sep 2008 |
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WO |
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Primary Examiner: Simmons; Ian
Assistant Examiner: Johnson; Rashida
Attorney, Agent or Firm: Sughrue Mion, PLLC
Description
FIG. 1 is a is a perspective view of a mask for respirator showing
our new design;
FIG. 2 is a front elevational view thereof;
FIG. 3 is a rear elevational view thereof;
FIG. 4 is a left side elevational view thereof;
FIG. 5 is a right side elevational view thereof;
FIG. 6 is a top plan view thereof; and,
FIG. 7 is a bottom plan view thereof.
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