U.S. patent number D612,483 [Application Number D/337,947] was granted by the patent office on 2010-03-23 for face mask.
This patent grant is currently assigned to Hsiner Co., Ltd.. Invention is credited to Eric Chang.
United States Patent |
D612,483 |
Chang |
March 23, 2010 |
Face mask
Claims
CLAIM The ornamental design for face mask, as shown and described.
Inventors: |
Chang; Eric (Taichung Hsien,
TW) |
Assignee: |
Hsiner Co., Ltd. (Shen Kang
Hsiang, TW)
|
Appl.
No.: |
D/337,947 |
Filed: |
June 2, 2009 |
Foreign Application Priority Data
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|
|
|
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Dec 4, 2008 [TW] |
|
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97147139 |
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Current U.S.
Class: |
D24/110.1;
D24/110.4 |
Current International
Class: |
2902 |
Field of
Search: |
;D24/110.1,110.4,110.5,164
;128/206.21,204.18,207.12,204.13,205.25,206.26,206.24,207.11,207.17 |
References Cited
[Referenced By]
U.S. Patent Documents
Primary Examiner: Simmons; Ian
Assistant Examiner: Lee; Christopher
Attorney, Agent or Firm: Occhiuti Rohlicek & Tsao
LLP
Description
FIG. 1 is a perspective view of face mask showing my new
design;
FIG. 2 is a front elevational view thereof;
FIG. 3 is a rear elevational view thereof;
FIG. 4 is a left side elevational view thereof;
FIG. 5 is a right side elevational view thereof;
FIG. 6 is a top plan view thereof; and,
FIG. 7 is a bottom plan view thereof.
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