U.S. patent number D593,197 [Application Number D/297,565] was granted by the patent office on 2009-05-26 for face mask.
This patent grant is currently assigned to RIC Investments, LLC. Invention is credited to Christopher J. McCracken, Jonathan P. Todd.
United States Patent |
D593,197 |
Todd , et al. |
May 26, 2009 |
Face mask
Claims
CLAIM The ornamental design for a face mask, as shown and
described.
Inventors: |
Todd; Jonathan P. (Murrysville,
PA), McCracken; Christopher J. (Monroeville, PA) |
Assignee: |
RIC Investments, LLC
(Wilmington, DE)
|
Appl.
No.: |
D/297,565 |
Filed: |
November 14, 2007 |
Current U.S.
Class: |
D24/110.2;
D24/110.4 |
Current International
Class: |
2902 |
Field of
Search: |
;D24/110,110.1-110.4
;D29/105,106,107,110 ;128/201.24,201.25,205.25,205.29,206.21,206.24
;600/529,532 |
References Cited
[Referenced By]
U.S. Patent Documents
Foreign Patent Documents
Primary Examiner: Simmons; Ian
Assistant Examiner: Lee; Christopher
Attorney, Agent or Firm: Nathan; Timothy A.
Description
FIG. 1 is a perspective illustration of an embodiment of the face
mask according to our design;
FIG. 2 is a front elevation view thereof;
FIG. 3 is a rear elevation view thereof;
FIG. 4 is a right side view thereof;
FIG. 5 is a left side view thereof;
FIG. 6 is a top plan view thereof; and,
FIG. 7 is a bottom plan view thereof.
Where included, broken lines showing environment or structure are
for illustrative purposes only and form no part of the claimed
design.
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