Microwave introducing antenna for a plasma processing apparatus

Description

FIG. 1 is a front view of a microwave introducing antenna for a plasma processing apparatus showing our new design:

FIG. 2 is a right side view thereof;

FIG. 3 is a top plan view thereof;

FIG. 4 is a sectional view taken along line 4--4 of FIG. 1 thereof; and,

FIG. 5 is a perspective view thereof.

Claims

CLAIM The ornamental design for a microwave introducing antenna for a plasma processing apparatus, as shown.

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Inventors:	Ueda; Atsushi (Amagasaki, JP), Tian; Cai Zhong (Amagasaki, JP)
Assignee:	Tokyo Electron Limited (Tokyo, JP)
Appl. No.:	D/281,070
Filed:	June 14, 2007

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Foreign Application Priority Data

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Dec 15, 2006 [JP]			2006-034512

Current U.S. Class:	D14/230; D14/233
Current International Class:	1403
Field of Search:	;D14/230,233 ;343/770,769 ;118/723MW ;438/514,726 ;455/269 ;156/345,345.34,345.41,914

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References Cited [Referenced By]

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U.S. Patent Documents

5175561	December 1992	Goto
6124833	September 2000	Bialkowski et al.
D563949	March 2008	Yamashita et al.
D563950	March 2008	Yamashita et al.
D563951	March 2008	Yamashita et al.
2002/0020498	February 2002	Ohmi et al.
2004/0036660	February 2004	Huor
2005/0250338	November 2005	Ohmi et al.
2006/0118241	June 2006	Ohmi et al.
2007/0134895	June 2007	Matsuyama et al.
2007/0163617	July 2007	Ozaki et al.

Foreign Patent Documents

	2-48806		Feb 1990		JP
	5-67918		Mar 1993		JP
	5-90834		Apr 1993		JP
	5-226927		Sep 1993		JP
	2001-338918		Dec 2001		JP
	2006-244891		Sep 2006		JP

Primary Examiner: Nelson; T. Chase
Assistant Examiner: Windmuller; John
Attorney, Agent or Firm: Oblon, Spivak, McClelland, Maier & Neustadt, P.C.