Cover for a heater stage of a plasma processing apparatus

Description

FIG. 1 is a front view of a cover for a heater stage of a plasma processing apparatus showing my new design:

FIG. 2 is a rear view thereof;

FIG. 3 is a right side view thereof;

FIG. 4 is a top plan view thereof;

FIG. 5 is a sectional view taken along line 5--5 of FIG. 1 thereof;

FIG. 6 is an enlarged view taken along line 6--6 of FIG. 5 thereof;

FIG. 7 is an enlarged view taken along line 7--7 of FIG. 5 thereof; and,

FIG. 8 is a perspective view thereof.

Claims

CLAIM The ornamental design for a cover for a heater stage of a plasma processing apparatus, as shown.

---

Inventors:	Ueda; Atsushi (Amagasak-shi, JP)
Assignee:	Tokyo Electron Limited (Tokyo, JP)
Appl. No.:	D/281,073
Filed:	June 14, 2007

---

Foreign Application Priority Data

---

Dec 15, 2006 [JP]			2006-034517

Current U.S. Class:	D15/138; D15/199
Current International Class:	1509

---

References Cited [Referenced By]

---

U.S. Patent Documents

D239437	April 1976	Boduch
4048845	September 1977	Gilbert
4122964	October 1978	Morris
4213537	July 1980	Caccavale
D265176	June 1982	Bock
4779748	October 1988	King
D309109	July 1990	Allen
4978567	December 1990	Miller
D315309	March 1991	Baughman
D328837	August 1992	Marsten et al.
5209601	May 1993	Odill et al.
5354626	October 1994	Kobayashi et al.
D357385	April 1995	Addison et al.
5595496	January 1997	Konda et al.
D386792	November 1997	Miller
5771576	June 1998	Braxton et al.
D399245	October 1998	Harden
6093583	July 2000	Mukerji et al.
D442864	May 2001	Davies

Foreign Patent Documents

	0592017		Apr 1994		EP
	D1197395		Dec 2003		JP
	2004-307939		Nov 2004		JP
	30-0411787		Apr 2006		KR
	596249		Jun 2004		TW
	D110109		Apr 2006		TW
	D113217		Oct 2006		TW

Primary Examiner: Snapp; Sandra
Assistant Examiner: Palasik; Patricia
Attorney, Agent or Firm: Oblon, Spivak, McClelland, Maier & Neustadt, P.C.