U.S. patent number D475,758 [Application Number D/162,614] was granted by the patent office on 2003-06-10 for reticle pattern for a gun scope.
This patent grant is currently assigned to Nikon Corporation. Invention is credited to Yasuaki Ishikawa.
United States Patent |
D475,758 |
Ishikawa |
June 10, 2003 |
Reticle pattern for a gun scope
Claims
The ornamental design for the reticle pattern for a gun scope, as
shown and described.
Inventors: |
Ishikawa; Yasuaki (Tokyo,
JP) |
Assignee: |
Nikon Corporation (Tokyo,
JP)
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Appl.
No.: |
D/162,614 |
Filed: |
June 20, 2002 |
Foreign Application Priority Data
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May 20, 2002 [JP] |
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2002-013288 |
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Current U.S.
Class: |
D22/108 |
Current International
Class: |
2201 |
Field of
Search: |
;D22/100,108,109,199
;D16/130,132,134,135,136 ;42/120,122,123 ;33/297 ;356/21,246,247
;359/422,428 |
References Cited
[Referenced By]
U.S. Patent Documents
Foreign Patent Documents
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44-41868 |
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Dec 1973 |
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JP |
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47-26183 |
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Jul 1975 |
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JP |
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Other References
Nikon Corporation, "Nikon: A better look at your world," (2001),
pp. 9 and 24..
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Primary Examiner: Zarfas; Louis S.
Assistant Examiner: Weingart; Monica A.
Attorney, Agent or Firm: Oliff & Berridge, PLC
Description
FIG. 1 is a front perspective view of reticle pattern for a gun
scope showing our new design;
FIG. 2 is a front view, the rear side view being a mirror image of
the front view thereof;
FIG. 3 is a top view, the bottom view being a mirror image of the
top view thereof;
FIG. 4 is a left view, the right view being a mirror image of the
left view thereof; and,
FIG. 5 is an enlarged sectional view of the reticle pattern for a
gun scope taken along the lines 5--5 in FIG. 2.
The broken lines shown in all views are to illustrate environment
only and form no part of the claimed design.
* * * * *