Photosensitive resin composition, photosensitive resin varnish, photosensitive resin film, and photosensitive resin cured product

Suzumura , et al. December 10, 2

Patent Grant 8604096

U.S. patent number 8,604,096 [Application Number 13/512,713] was granted by the patent office on 2013-12-10 for photosensitive resin composition, photosensitive resin varnish, photosensitive resin film, and photosensitive resin cured product. This patent grant is currently assigned to Hitachi Chemical Company, Ltd.. The grantee listed for this patent is Ikue Mitani, Ikuo Mukai, Masami Ochiai, Kouji Suzumura, Toshihiko Takasaki. Invention is credited to Ikue Mitani, Ikuo Mukai, Masami Ochiai, Kouji Suzumura, Toshihiko Takasaki.


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