U.S. patent number 3,794,761 [Application Number 05/270,732] was granted by the patent office on 1974-02-26 for pattern processing apparatus.
This patent grant is currently assigned to Tokyo Shibaura Electric Co., Ltd.. Invention is credited to Hiroshi Genchi, Tsuneo Yoneyama.
United States Patent |
3,794,761 |
Genchi , et al. |
February 26, 1974 |
PATTERN PROCESSING APPARATUS
Abstract
Information regarding a pattern being identified is obtained by
means of a photoelectric connector comprising a photoelectric
surface on which a photoinput image of the pattern is to be
projected, focusing means for focusing photoelectrons emitted by
the photoelectric surface in response to the photoinput image to
form a photoelectron image on a focal plane, means to enlarge or
reduce the photo-electron image, deflecting means for moving the
position of the photoelectron image in the focal plane, an array of
a plurality of electron beam detecting elements which are arranged
in a plane near the focal plane, each electron beam detecting
element generating a current proportional to the quantity of the
electron beam impinging thereupon, and a plurality of parallel
output conductors respectively connected to the electron beam
detecting elements. The outputs on the output conductors are
processed to identify the pattern.
Inventors: |
Genchi; Hiroshi (Tokyo,
JA), Yoneyama; Tsuneo (Yokosuka, JA) |
Assignee: |
Tokyo Shibaura Electric Co.,
Ltd. (Kawasaki-shi, JA)
|
Family
ID: |
26392678 |
Appl.
No.: |
05/270,732 |
Filed: |
July 11, 1972 |
Foreign Application Priority Data
|
|
|
|
|
Jul 15, 1971 [JA] |
|
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46/52071 |
Jul 15, 1971 [JA] |
|
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46/52072 |
|
Current U.S.
Class: |
348/704;
348/169 |
Current CPC
Class: |
G06K
9/42 (20130101); G06K 9/2009 (20130101); G06K
9/60 (20130101); G06K 9/32 (20130101); H01J
31/26 (20130101) |
Current International
Class: |
H01J
31/08 (20060101); H01J 31/26 (20060101); G06K
9/60 (20060101); H04n 005/30 () |
Field of
Search: |
;178/7.2,7.5SE,6.8,DIG.21,DIG.34 |
References Cited
[Referenced By]
U.S. Patent Documents
Primary Examiner: Murray; Richard
Attorney, Agent or Firm: Robert D. Flynn et al.
Claims
What we claim is:
1. Apparatus for processing patterns including a photoelectric
converter which comprises a photoelectric surface on which a
photoinput image of a pattern to be identified is to be projected,
focusing means for focusing photoelectrons emitted by said
photoelectric surface in response to said photoinput image to form
a photoelectron image on a focal plane, means to enlarge or reduce
said photoelectron image, deflecting means for moving the position
of said photoelectron image in said focal plane, an array of a
plurality of electron beam detecting elements which are arranged in
a plane near said focal plane, each electron beam detecting element
generating a current proportional to the quantity of the electron
beam impinging thereon, an evacuated envelope containing said
elements of said photoelectric converter and means for deriving out
in parallel outputs from said electron beam detecting elements.
2. A pattern processing apparatus according to claim 1 wherein said
focusing means comprises a first focusing coil disposed near said
photoelectric surface and a second focusing coil disposed near said
focal plane, and said means for enlarging or reducing the
photoelectron image comprises means for varying the ratio between
currents supplied to said first and second focusing coils so as to
enlarge or reduce said photoelectron image.
3. A pattern processing apparatus according to claim 1 wherein said
electron beam detecting elements comprise a plurality of
semiconductor detecting elements.
4. e pattern processing apparatus according to claim 3 wherein said
semiconductor detecting elements comprise a p-type semiconductor
substrate, a plurality of discrete n-type regions formed on one
surface of said semiconductor substrate, a plurality of discrete
metal electrodes formed in respective n-type regions and output
conductors connected to respective electrodes.
5. A pattern processing apparatus comprising a photoelectric
converter including a photoelectric surface on which a photoinput
image is to be projected, focusing means for focusing
photoelectrons emitted from said photoelectric surface in response
to said photoinput image to form a photoelectron image on a focal
plane, means for enlarging or reducing said photoelectron image,
deflecting means for moving the position of said photoelectron
image in said focal plane, an array of a plurality of electron beam
detecting means which are arranged in a plane near said focal
plane, each electron beam detecting element generating a current
proportional to the quantity of the electron beam impinging
thereon, an evacuated envelope containing said elements of said
photoelectric converter and a plurality of output conductors
respectively connected to said electron beam detecting elements and
are led out to the outside of said envelope; means for detecting a
characteristic portion of the picture image signal derived out
through said output conductors; means responsive to the output of
said characteristic portion detecting means for driving said means
for enlarging or reducing said photoelectron image; and means for
controlling said deflecting means so as to maintain said detected
characteristic portion at a predetermined position of the field of
view of said photoelectric converter which is formed by said array
of said electron beam detecting element when enlarging or reducing
said photoelectron image.
6. A pattern processing apparatus according to claim 5 wherein said
means for detecting the characteristic portion of said picture
image signal comprises means for detecting the maximum value of the
picture image signal level.
7. A pattern processing apparatus according to claim 6 which
further comprises means for driving said means for enlarging or
reducing said photoelectron image when the maximum value of said
picture image signal exceeds a predetermined threshold value and
for controlling said deflection means so as to maintain the portion
of said picture image signal manifesting the maximum value in the
field of view of said photoelectric converter.
8. A pattern processing apparatus according to claim 5 wherein said
focusing means comprises a first focusing coil disposed near said
photoelectric surface and a second focusing coil disposed near said
focal plane, said means for enlarging or reducing the photoelectron
image comprises means for varying the ratio between the currents
supplied to said first and second focusing coils and said array of
the electron beam detecting elements comprises a p-type silicon
semiconductor substrate, a plurality of descrete n-type regions
formed on one surface of said substrate, a plurality of metal
electrodes formed in the respective n-type regions and output
conductors connected to respective metal electrodes.
9. A pattern processing apparatus comprising a photoelectric
converter including a photoelectric surface on which a photoinput
image of a pattern to be identified is to be projected, focusing
means for focusing the photoelectrons emitted from said
photoelectric surface in response to said photoinput image to form
a photoelectron image on a focal plane, detecting means for moving
the position of said photoelectron image in said focal plane, an
array of a plurality of electron beam detecting elements disposed
in a plane close to said focal plane, each electron beam detecting
element generating current acting as a picture image signal and
proportional to the quantity of said electron beam impinging
thereon, and an evacuated envelope containing said elements of said
photoelectric converter; a plurality of output conductors
respectively connected to said detecting elements; means for
detecting the output conductor carrying said picture image signal
to control said deflection means so as to move said photoelectron
image in said focal plane; and means for detecting the output
conductor carrying the picture image signal of only a pattern to be
identified.
10. A pattern processing apparatus according to claim 9 wherein
said means for detecting the output conductor carrying said picture
image signal comprises a mask shaping circuit including means for
computing a logical sum of the signals for respective rows and
columns of a matrix comprised by said output conductors, and
vertical and horizontal mask registers respectively responsive to
the logical sum of the rows of said matrix and the logical sum of
the columns of said matrix for storing the projection signal in the
vertical and horizontal directions respectively, wherein said means
for moving the position of said photoelectron image in said focal
plane comprises means for supplying the signals stored in said
vertical and horizontal mask registers of said mask shaping circuit
to said deflecting means of said photoelectric converter as the
control signals, wherein said means for detecting the output
conductors carrying only the picture image signal of a pattern to
be identified comprises a plurality of gate circuits respectively
associated with said output conductors, and means for controlling
said gate circuits in accordance with the output signals from said
vertical and horizontal mask registers.
11. A pattern processing apparatus according to claim 9 wherein
said focusing means comprises a first focusing coil disposed near
said photoelectric surface and a second focusing coil disposed near
said focal plane, said means for enlarging and reducing said
photoelectron image comprises means for varying the ratio between
the currents supplied to said first and second focusing coils, and
said array of said electron beam detecting elements comprises a
p-type silicon semiconductor substrate, a plurality of discrete
n-type regions formed on one surface of said semiconductor
substrate, metal electrodes respectively formed in said n-type
regions and a plurality of output conductors respectively connected
to said metal electrodes.
12. A pattern processing apparatus comprising a photoelectric
surface on which a photoinput image of a pattern to be identified
is to be projected, focusing means for collecting the
photoelectrons emitted from said photoelectric surface in response
to said photoinput image projected thereon to form a photoelectron
image on a focal plane, means for enlarging or reducing said
photoelectron image, deflecting means for moving the position of
said photoelectron image in said focal plane, an array of a
plurality of electron beam detecting elements arranged in a plane
near said focal plane, each detecting element generating a current
acting as a picture image signal and proportional to the quantity
of the electron beam impinging thereon, and an evacuated envelope
containing above described various elements of said photoelectric
converter; a plurality of output conductors respectively connected
to said electron beam detecting elements; a mask shaping circuit
including vertical and horizontal mask registers connected to
detect the presence or absence of the signals on said output
conductors for storing the projection signals in the vertical and
horizontal directions of the detected picture image signal; and a
circuit for controlling said means for enlarging or reducing said
photoelectron image and said deflecting means in accordance with
the contents of said vertical and horizontal mask registers of said
mask shaping circuit.
13. A pattern processing apparatus according to claim 12 wherein
said mask shaping circuit comprises means to compute logical sums
of signals of respective rows and columns of said matrix comprised
by said output conductors, and means for supplying said logical
sums to said vertical and horizontal mask registers
respectively.
14. A pattern processing apparatus according to claim 12 wherein
said focusing means comprises a first focusing coil disposed near
said photoelectric plane and a second focusing coil disposed near
said focal plane, said means for enlarging and reducing the
photoelectron image comprises means for controlling the ratio
between the currents supplied to said first and second focusing
coils, and said array of said electron beam detecting elements
comprises a p-type silicon semiconductor substrate, a plurality of
discrete n-type regions formed on one surface of said semiconductor
substrate, a plurality of metal electrodes formed in the respective
n-type regions and output conductors connected to respective metal
electrodes.
Description
This invention relates to apparatus for identifying patterns, and
more particularly to a photoelectric converter and pattern
processing apparatus utilized in the identifying apparatus.
Heretobefore a flying spot scanner, vidicon or the like has been
used as the photoelectric converter in the apparatus for
identifying patterns. In all these prior art photoelectric
converters since the signals are produced by scanning the
photoelectric converter with an electron beam output signals are
derived out in succession. For this reason, it is difficult to
spacially process the signals with high resolutions.
Identification of a pattern, for example, involves the process of
detecting necessary informations over a wide field of view. In the
case of a letter read out device, it is necessary to detect the
positions of the letters printed on a document of the standard size
and to accurately read the letters. To increase the resolution in
such a case, it is necessary to use a number of scanning lines of
the order of about 2000 to 4000 lines per picture which is about 5
to 10 times larger than that of the scanning lines used in
television cameras. For this reason, use of such a large number of
scanning lines is not practical.
However, the resolution is not required to be so high provided that
the photoelectric converting apparatus can operate at high
resolutions at important portions of the pattern and can freely
control such positions and resolutions just in the same manner as
the human eyes even though the overall resolution of the
photoelectric converter may be relatively low. "Variation of the
resolution at a point" means the adjustment of the degree of
obscure which corresponds to a mathematical operation for obtaining
the sum of weights of the informations about that point. To this
end, it is necessary to parallely derive out signals produced at
the light receiving surface which is impossible with the prior art
photoelectric converter of the point scanning type. To obtain the
sum of weights by means of an electric circuit it is nesessary to
temporarily store the informations in high quality delay lines.
However, with this method it is not only difficult to process the
signals at high speeds but also requires complicated and expensive
circuits. In the prior art apparatus, in order to normalize the
object to be read out it has been necessary to store the output
from the phototelectric converter in a plane register and then
shift the stored image in the vertical as well in the horizontal
directions thereby normalizing the position of the image or to
simultaneously detect several bits of the register and then
compress them into a single bit thereby normalizing the size.
This method also requires special registers and a complicated
device for controlling the register.
It is an object of this invention to provide a new pattern
identifying apparatus having a pattern read out device which
operates under a new principle quite different from the prior art
device.
The pattern identifying apparatus of this invention is
characterized in that it includes a phototelectric converting
device capable of simultaneously deriving out video signals and is
not required to use electron beam scanning.
The photoelectric converting device relates to an improvement of
the so-called image dissector. Instead of scanning a photoelectron
image on a target with an electron beam as in the image orthicon,
in the image dissector, the entire photoelectron image is moved on
the photoelectric surface to derive out an electron beam emanated
from the photoelectric surface in accordance with an optical image
through a minute opening at a fixed point and the taken out
electron beam is amplified by a multiplying tube so as to serially
take out picture signals.
In accordance with the photoelectric converting device of the
invention, an array of a plurality of electron beam detecting
elements are substituted for the opening of the image dissector for
deriving out in parallel the picture signals in a given area.
Further, this photoelectric converting device is provided with
means for moving the phototelectron image formed on the array of
the electron beam detecting elements to any desired position and
means to enlarge or reduce the size of the photoelectron image. The
outputs from the photoelectric converting device are derived out in
parallel as picture signals of a given area over a plurality of
output conductors and the derived out picture signals are then
processed. For example, these pulurality of output conductors are
connected to a characteristic portion detecting circuit to
determine that which one of the output conductors carries the
characteristic portion of the picture signals. The photoelectron
image is enlarged or reduced until a desired size of the
characteristic portion of the picture image is obtained, and the
deflector device is controlled such that the characteristic portion
is always maintained in the field of view of the photoelectric
converting device. According to another method of processing the
output signals, the parallel outputs from the photoelectric
converter are applied to a mask signal forming circuit for
detecting a particular output conductor which carries the picture
signals, and the detected informations are used to control the
enlarging and reducing means and the deflector means of the
photoelectric converter thereby normalizing the position and
magnitude of the picture signal and determining the picture signal
to be identified.
According to this invention, various processing operations of the
pattern such as the search of the portion to be identified, the
normalization of the position and magnitude or the like which are
required for the identification of the pattern can be made
optically thereby greatly simplifying the pattern identifying
apparatus. Moreover, it is possible to greatly improve the
resolution over the prior art apparatus by the search, enlarging
and reducing operations of the objects being identified.
The present invention can be more fully understood from the
following detailed description when taken in connection with
reference to the accompanying drawings, in which:
FIG. 1 is a diagrammatic longitudinal sectional view showing the
construction of a photoelectric converter constructed in accordance
with the invention;
FIGS. 2A and 2B are a front view and a sectional side view
respectively showing one example of the array of electron beam
detecting elements of the photoelectric converter shown in FIG.
1;
FIG. 3 is a block diagram of a pattern processing apparatus
embodying the invention;
FIG. 4 is a block diagram showing the construction of the
deflection control circuit shown in FIG. 3;
FIG. 5 is a perspective view, partly in block form, of a modified
pattern identifying apparatus;
FIG. 6 is a block diagram showing the mask shaping circuit shown in
FIG. 5;
FIGS. 7A through 7F are diagrams for explaining successive steps of
processing the pattern with the pattern identifying apparatus shown
in FIG. 5;
FIG. 8 is a block diagram showing the construction of the
deflection control circuit shown in FIG. 5;
FIG. 9 is a block diagram showing the construction of a connector
circuit utilized in the circuit shown in FIG. 5; and
FIG. 10 is a block diagram of an isolating circuit utilized in the
circuit shown in FIG. 5.
With reference first to FIG. 1, the light from an object 11 to be
identified is focused on a photoelectric surface 13 by means of an
optical system 12. Electrons are emitted from the photoelectric
surface 13 in accordance with the light image of the object 11 and
the electrons are accelerated by a cylindrical electrode 14 and are
then focused by the first and second focusing coils 15 and 16 to
form a photoelectron image 17 on the focal plane of the focusing
coils. By supplying different currents to discrete focusing coils
15 and 16 it is possible to enlarge or reduce the photoelectron
image thereby providing the so-called zooming action.
The position of the photoelectron image is moved by the action of
the deflection coil 18. Although not clearly shown in the drawing
the deflection coil 18 comprises a horizontal deflection coil and a
vertical deflection coil so that it is possible to shift the
position of the photoelectron image 17 by supplying currents of
suitable values to these two coils. An array of the electron beam
detecting elements 19 is disposed near the focal plane on which
photoelectron image 17 is focused. This array 19 comprises a two
dimensional array of a plurality of detecting elements 19.sub.11
through 19mm as shown in FIG. 2A. In the illustrated example, the
electron beam detecting elements comprise semiconductor diodes.
However, it should be understood that any small detecting elements
may be used. As shown in the sectional side view of the array of
the detecting elements 19 shown in FIG. 2B, a plurality of n-type
regions 21 are formed by diffusing an n-type impurity in to the
surface of a p-type silicon semiconductor substrate 20 to form a
plurality of p-n junction diodes.
Metal electrodes 23 are applied onto respective n-type regions
through an insulator film 22 and the electrodes 23 are connected to
a plurality of parallel output conductors 24. Such semiconductor
diodes manifest electronic multiplying function when photoelectrons
are accelerated and caused to collide upon the junctions at a high
speed. Also phototransistors can be used as the electron beam
detecting elements. By the progress of modern integrated circuit
technique it is possible to fabricate these semiconductor detecting
elements to have sufficiently small size and at a high density.
Although the number of the detecting elements constituting the
array is different dependent upon the requirements of the
applications, a practical array for a pattern identifying purpose
is 16 .times. 16 or 32 .times. 32. Further, the array is not
limited to two dimensional type but a sigle dimensional array can
also be used.
The size of the array of the electron beam detecting elements 19 is
not always required to entirely cover the photoeletron image 17 but
may be designed to cover only a portion thereof. In the following
description, the portion of the picture image which is to be
detected by the array of the detecting elements 19 is termed the
"field of view" of the phototelectric converter.
In the photoelectric converter of this construction electrons
emitted from the photoelectric surface 13 and accelerated by
electrode 14 enter the semiconductor substrate 20 to form
electron-hole pairs therein whereby currents flow through output
conductors 24 corresponding to the portions of the semiconductor
substrate which have received the electron beam. In this manner,
the photoelectron image focused on the array of the detecting
elements 19 is converted into electric signals which are
simultaneously derived out in parallel through output conductors
24.
In this photoelectric converter, it is possible to vary the
magnitude of the photoelectron image focused on the focal plane
including the array of the detecting elements 19 by adjusting the
currents flowing through the first and second focusing coils 15 and
16. Since the magnetic field generated by a coil is proportional to
the current flowing therethrough it is possible to enlarge the
photoelectron image formed on the focal plane by increasing the
current flowing through the first deflection coil 15 and by
decreasing the current flowing through the second deflection coil
16. If the currents flowing through the first and second deflection
coils are varied in the opposite manner, the size of the
photoelectron image is reduced. Obscure of the image caused by such
current adjustment can be compensated for by a fine adjustment of
the voltage impressed upon the acceleration electrode 14.
Such a zooming can be readily provided by any well known electronic
circuit.
The position of the photoelectron image 17 on the focal plane can
be adjusted by means of deflecting means 18. Such adjustment of the
position of the electron image 17 can be made with any well known
means capable of adjusting the values of the currents supplied to
the horizontal and vertical deflection coils. It is also possible
to gradually or quickly vary the position of the photoelectron
image 17. More particularly, when a DC current which does not
change with time is applied the photoelectron image is held
standstill. On the other hand, if a current which varies with time,
for example, a saw tooth wave current identical to the output of
the deflection circuit of a television receiver, were applied the
photoelectron image will move in both horizontal and vertical
directions. With such a saw tooth wave current, image signals
produced by scanning the photoelectron image appear on the output
conductors 24. However, in the photoelectric converter since the
array of the electron beam elements occupies a relatively large
area it is possible to scan each one frame with a saw tooth wave
having a lower frequency than that utilized in the conventional
television receiver.
By using such deflecting and zooming devices it is possible to
observe any portion of the object with any magnifying power or the
entire portion of the object. In other words, when the
photoelectric converter is incorporated into the pattern
identifying apparatus, it is possible to firstly observe a wide
portion of the object with a low resolution and then observe a
particular portion of the object with a higher resolution by
zooming up that portion into the entire area of the field of
view.
FIG. 3 depicts the construction of such a pattern identifying
apparatus which is constructed to perform pattern identification of
cells. In the diagnosis of canser or other marignant tumors at
their early stage, the configuration, size and concentration of the
cells are observed. However, it takes a great labour to find out a
particular cell among numerous cells, so that it is desirable to
carry out this operation with a pattern identifying apparatus. To
identify the pattern of the cells, the cells are dyed and are then
photographed with a microscopic camera. In such microscopic
pictures, the nuclei of the cells have larger concentrations than
the surrounding portions. This tendency is remarkable in the
malignant cells.
Referring now to FIG. 3, the parallel outputs from photoelectric
converter 31 are quantized by means of a quantizer circuit 32 to
form binary signals corresponding to the black and white levels.
The output from the quantizer circuit 32 is applied to a detecting
and isolating circuit 33 to isolate the portion of the pattern to
be identified. The output from the detecting and isolating circuit
33 is supplied to an identifying circuit 34. The output from the
photoelectric converter 31 is also supplied to a maximum value
detecting circuit 35 to provide on an output conductor 36 the
maximum signal output out of a plurality of parallel outputs. This
maximum output signal is supplied to difference detecting circuits
37.sub.1 through 37.sub.5 where it is compared with the respective
outputs from the photoelectric converter 31. The difference
detecting circuits 37 operate to compare two analogue inputs for
generating a high level output signal when the inputs have equal
magnitudes, whereas when the two inputs have different magnitudes,
or where the input signal is smaller than the maximum value the
difference detecting circuits generate a low level signal. The high
level signals is transformed into a "1" signal and the low level
signal into a "0" signal by the operation of a group of quantizing
circuits 38.sub.1 through 38.sub.5. Thus, the outputs from the
quantizing circuits 38 determine which one of the output conductors
39 of the photoelectric converter 31 carries the maximum output. In
the illustrated case, since the output from quantizing circuit
38.sub.2 is 1, it can be determined that output conductor 39.sub.2
from the photoelectric converter 31 carries the maximum output.
Actually there are 32 .times. 32 output conductors 39 which are
arranged in a matrix, but for the sake of brevity, only five
conductors are shown in FIG. 3. As above described, these output
conductors 39 are respectively connected to corresponding ones of
32 .times. 32 electron beam detecting elements shown in FIG. 2, the
particular one of the quantizing circuits 38 which provides a 1
output determining that which one of the electron beam detecting
elements in the array or which one of the positions in the field of
view corresponds to the maximum concentration. Responsive to the
outputs from the quantizing circuits 38, a deflection control
circuit 40 produces a deflection current applied to the deflection
device 41 of the photoelectric converter 31. In the illustrated
example, the X and Y deflection currents are determined such that
the detected point of the maximum concentration is brought to
substantially the center of array of the electron beam detecting
elements or the field of view.
FIG. 4 illustrates one example of the construction of the
deflection control circuit. Input signals to the deflection control
circuit are applied to an encoder 401 which is constructed to give
to its output coordinate values corresponding to a position at
which an input signal 1 or the maximum signal presents. Thus, an
abscissa value X of the maximum signal is provided on an output
conductor 402, whereas an coordinate value Y of the maximum signal
is provided on an output conductor 403, respectively, in the form
of digital signals. These rectangular coordinate informations are
applied to a horizontal deflection coil 406 and a vertical
deflection coil 407 of the photoelectric converter respectively
through digital-analogue converters 404 and 405 and amplifiers 406
and 407. When the center of the field of view is aligned with the
origin of the rectangular coordinate, it is possible to always
position the maximum signal at the center of the field of view.
Referring again to FIG. 3, the output from the maximum value
detecting circuit 35 is supplied to a threshold value circuit 42
which produces an output supplied to a zooming command circuit 43
when the output from the maximum value detecting circuit 35 exceeds
a prescribed definite value. The zooming command circuit 43 applies
a zooming command signal to a focus control circuit 44 which is
constructed to apply to the focusing device 45 comprising the first
and second focusing coils shown in FIG. 1 currents of a
predetermined ratio for zooming up the photoelectron image to a
desired size.
At the same time, the output from the zooming command circuit 43 is
applied to the identifying circuit 34 to set it into operation.
When the identifying circuit 34 completes its identifying
operation, a termination signal is generated which is applied to
the focus control circuit 44 to remove the zooming thus returning
the photoelectric converter to the original condition.
With the photoelectric converter, it is possible to identify the
pattern at high accuracies by firstly observing the entire portions
of the object to be identified in the field of view, moving the
point of the maximum concentration to the center of the field of
view, and then enlarging this characteristic point to occupy the
entire field of view by zooming. For this reason, it is possible to
enlarge and identify the particular characteritic point at
sufficiently high resolutions with an array of the electron beam
detecting elements of the number of only 32 .times. 32, that is
having a relatively low resolution.
Although in the embodiment shown in FIG. 3, the concentration of
the picture image is used as the characteristic feature of the
pattern being identified, it is also possible to use another
characteristic feature of the pattern, such as its configuration,
size or colour. In such case, the maximum value detecting circuit
35 is of course substituted by a circuit for detecting a particular
configuration, size or colour of the pattern. Any one of many well
known detecting or identifying circuits can be used for this
purpose.
When detecting the characteristic points by firstly reducing the
photoelectron image for bringing a relatively large portion of the
object into the field of view it is possible to move accurately
determine the characteristic point by searching the same by
adjusting the focusing device to shift the focal point, thus
obscuring the photoelectron image. The adjustment of the focal
point can be made electrically by means of the focusing coil and
the accelerating electrode as shown in FIG. 1. Where it is desired
to roughly detect the characteristic feature of the object
projected in the field of view, if the feature is identified too
indetail, the identification is rather incorrect so that it is
advantageous to search the characteristic point of the object while
it is optically obscured.
While in the foregoing description the size of the image of the
object was firstly reduced and then enlarged it is also possible to
enlarge the image to detect a characteristic point such as a space
between adjacent letters and to apply the detected space to the
detecting and isolating circuit 33 for isolating a particular
letter to be identified. Thereafter, the letter is enlarged to a
size required for identification. For this reason, in this
specification the pattern identifying circuit, the detecting and
isolating circuit and the circuits associated therewith, which are
imparted with the signal of an enlarged or reduced picture image,
are generally termed a pattern processing circuit.
FIG. 5 illustrates the construction of a modified pattern
identifying apparatus which utilizes the photoelectric converter
shown in FIGS. 1 and 2 for normalizing, detecting and isolating the
picture image signal of the object being identified.
In FIG. 5, the photoelectric converter shown in FIG. 1 is
designated by a reference numeral 51. The parallel outputs from the
photoelectric converter 51 are supplied to a quantizing circuit 53
over a plurality of output conductors 52.sub.1. The quantizing
circuit 53 operates to quantize the respective outputs on output
conductors 52, for transforming these outputs into a 1 or 0 signal
in accordance with black and white levels. The outputs from the
qunatizing circuit 53 are applied to a matrix circuit 54 which is
constructed to detect the portion of the field of view at which the
pattern signal resides for the purpose of deriving out the portion
containing the pattern signal from the parallel outputs of the
photoelectric converter 51, the detail of the construction of the
matrix circuit 54 being illustrated in FIG. 6.
5 .times. 5 points 52 which are arranged in a matrix as shown in
FIG. 6 respectively correspond to output conductors 52.sub.2 shown
in FIG. 5 the conductors being shown to extend at right angles
through the sheet of the drawing in FIG. 6.
The outputs on the output conductors 52 belonging to respective
rows of the matrix are supplied to output conductors 56 through
associated OR circuits 55. In the same manner the outputs on the
output conductors 52 belonging to the respective columns of the
matrix are supplied to output conductors 58 through associated OR
circuits 57.
The outputs on the row output conductors 56 of the matrix circuit
54 are coupled to a vertical mask register 59, shown in FIGS. 5 and
6, which comprises five registers in the form of flip-flop
circuits, for instance, which are respectively connected to the row
output conductors 56. The column output conductors 59 of the matrix
circuit 54 are connected to the flip-flop circuits of respective
orders of magnitude of a horizontal mask register having the same
construction as the vertical mask register.
As a result, the horizontal mask register 60 forms a horizontal
projection signal of the image signal 1 presenting in the field of
view, whereas the vertical mask register 59 a vertical projection
signal. These conditions are shown in FIG. 7B, in which the shaded
portions of the vertical and horizontal registers 59 and 60
indicate the projection signal 1 applied to the flip-flop circuits.
FIG. 7A shows the relationship between an array of digits which are
the patterns to be identified and the field of view 19 of the
photoelectric converter 51, while FIG. 5B the array of digits in
the field of view of the photoelectric converter 51. FIGS. 7B
through 7F show outputs from the photoelectric converter 51 as seen
through a portion of the matrix circuit 54.
In this manner, when the projection signals are applied to the
vertical and horizontal mask registers 59 and 60, an identification
termination signal is applied to the deflection control circuit 61
shown in FIG. 5 from an identifying circuit to be described below.
In response to this termination signal, the deflection control
circuit 61 operates to control the deflection device of the
photoelectric converter 51 thereby shifting the digits in the field
of view toward upper and left as shown in FIGS. 7C and 7D.
This operation will be described in detail with the aid of FIG.
8.
The identification termination signal from the identifying circuit
76 is applied to the set input terminals of a flip-flop circuit 611
to produce a signal on the output terminal 1 thereof. This output
is used to enable a gate circuit 612. The output pulse from a clock
signal generator 613 is applied to an X-coordinate counter 614 via
the enabled gate circuit 612. The X-coordinate counter 614 counts
the number of clock pulses to apply its result to a
digital-analogue (D-A) converter 616 through an adder 615. The
output from the D-A converter 616 is applied to the horizontal
deflection coil of the photoelectric converter through a deflection
amplifier 617. Thus, while the gate circuit 612 is enabled, the
content of the X-coordinate counter 614 increases with time to
gradually increase the deflection current. This will shift the
photoelectron image of the photoelectric converter to the left.
When the projected signal in the horizontal mask register 60
reaches the righthand end as shown in FIG. 7D, the lefthand
detector 63 produces an output which is applied to the reset
terminal R of flip-flop circuit 611, shown in FIG. 8. When this
flip-flop circuit 611 resets, gate circuit 612 is disenabled, and a
signal is produced on output terminal 0 of the flip-flop circuit
611. This output signal is used to set a second flip-flop circuit
618. The 1 output of the second flip-flop circuit 618 enables a
second gate circuit 619 to apply the pulse signal generated by
clock pulse generator 613 to a Y-coordinate counter 620, the result
of counting thereof being applied to a D-A converter 623 via an
adder 621. The D-A converter 623 produces an analogue signal
proportional to the content of the Y-coordinate counter 620. The
analogue signal thus produced is applied to the vertical deflection
coil of the photoelectric converter via a deflection amplifier 624.
Consequently, the photoelectron image of the photoelectric
converter is moved to the upper as shown in FIG. 7D. When the
photoelectron image reaches the upper end the upper end detector 62
connected to the vertical mask register 59 generates an output
which is applied to the reset terminal R of the second flip-flop
circuit 618 shown in FIG. 8. When the flip-flop circuit 618 resets,
the gate circuit 619 is desenabled to terminate the shifting
operation. As a result of this shifting operation, the four digits
in the field of view are moved toward the left upper side of the
field so that the digit 2 to be detected and isolated will be
brought to the left upper corner of the field of view as shown in
FIG. 7F.
Then the projection signals produced by the vertical and horizontal
mask registers 59 and 60 are eliminated by connector circuits 64
and 65 except the projection signal of the digit 2 which is to be
detected and isolated. Although there are many types of the
connector circuits available in this invention, one example thereof
is illustrated in FIG. 9. In this figure numeral 60 indicates the
horizontal register and the 1 outputs from flip-flop circuits
60.sub.1 to 60.sub.5 of respective orders are applied to one input
terminals of AND circuits 66.sub.1 to 66.sub.5, respectively. The
output from each AND circuit is applied to the input of the
succeeding AND circuit and to the set terminals of five flip-flop
circuits 67.sub.1 through 67.sub.5 constituting a register 67. A 1
signal from terminal 68 is always applied to the other input
terminal of the leftmost AND circuit 66.sub.1.
In the operation of this connector circuit, when all flip-flop
circuits 60.sub.1 through 60.sub.5 of the register 60 are in the 1
state, all flip-flop circuits 67.sub.1 through 67.sub.5 of the
register 67 are also set to 1 state. When any one of the flip-flop
circuits 60.sub.1 through 60.sub.5, for example 60.sub.3 is in the
0 state two flip-flop circuits 67.sub.1 and 67.sub.2 of the
register 67 are caused to assume 1 state, but the remaining
flip-flop circuits of this register 67 will not be set thus
continuing their 0 state. Where the vertical register 59 is used
instead of the horizontal register 60, the vertical connector
circuit 64 is used.
By the use of these connector circuits, it is possible to take out
from the projection signal shown in FIG. 7D two projection signals
alone which are to be detected and isolated and apply them to the
registers of the connector circuits 64 and 65, respectively.
The outputs from the vertical connector circuit 64 are applied to a
height measuring circuit 69 to measure the height of the digit 2
being isolated. More particularly, the height measuring circuit 69
operates to count the number of 1 signals contained in the outputs
from the vertical connector circuit 64. The height measuring
circuit 69 may be constituted by a decoder, for example. The height
signal produced by the height measuring circuit 69 is applied to
the focusing control circuit 70 and to the deflection control
circuit 61 of the photoelectric converter 51. In response to the
height signal the focusing control circuit 70 operates to determine
the current value necessary to cause the digit 2 being identified
to have the desired size, and the current of the selected value is
applied to the focusing device of the photoelectric converter 50 so
as to enlarge the image. The deflection control circuit 61
functions to control the deflection device such that the digit 2 is
deflected to the left upper corner of the field when the image is
enlarged.
More particularly, the deflection quantities .alpha.X and .alpha.Y
of the photoelectron image under these conditions are determined in
the following manner. As shown in FIG. 7F, the enlarged letter has
a predetermined normalized size. Assume now that the enlarged
letter has a height Y.sub.0 and a width X.sub.0. The height y of
the letter before enlargement is measured by the height measuring
circuit 69 shown in FIG. 5. The width x is not required to be
measured provided that the ratio of the height to the width is
maintained constant. Where digit 2 is enlarged from the size shown
in FIG. 7E to that shown in FIG. 7F, the quantities of the
deflection .DELTA.X and .DELTA.Y required to cause the enlarged
digit 2 to engage the left upper corner of the field of view as
shown in FIG. 7F are expressed as follows.
.DELTA.Y = (Y.sub.0 /y), .DELTA.X = (X.sub.0 /Y.sub.0) .sup..
.DELTA.Y
Thus, the magnifying power is determined by obtaining a ratio
Y.sub.0 /Y between the output y of the height measuring circuit 69
and the height Y.sub.0 after enlargement, thereby determining the
currents supplied to the first and second focusing coils 15 and 16
of the photoelectric converter. The output y from the height
measuring circuit 69 is applied to the operation circuit 625 shown
in FIG. 8 which is constructed to aid .DELTA.X and .DELTA.Y to
produce -.DELTA.X and -.DELTA.Y on the output terminals. These
outputs are applied to adders 615 and 621 respectively, and are
substracted from the contents of X-counter 614 and Y-counter 620.
The outputs of adders 615 and 621 are again converted into analogue
signals by the D-A converters 616 and 623 and the resulting
analogue signals are applied to the deflection coils.
Above described operations of normalizing the size and position of
the pattern to be identified are performed by the optical means.
Upon completion of the normalizing operation of the digit 2 to be
isolated, the isolating operation of this digit 2 is performed by
isolating circuit 71. As shown in FIG. 10, the isolating circuit 71
is constituted by a pluality of AND gate circuits 72 provided for
respective output conductors 52.sub.3 of the photoelectric
converter 51 which have passed through the matrix circuit 54. In
FIG. 10, a plurality of points 52 which are arranged in a matrix
correspond to respective output conductors generally shown by a
numeral 52.sub.3 in FIG. 5, and these points are connected to one
input terminals of three input AND gate circuits 72 The input
terminals of the AND gate circuits 72 belonging to the rows of the
matrix are commonly connected to the output conductors 73 of the
vertical connector circuit 64 as shown in FIG. 7F, whereas the
lower input terminals of the AND gate circuits belonging to the
columns of the matrix are commonly connected to respective output
conductors 74 of the horizontal connector circuit 65 also shown in
FIG. 7F. The outputs 75 of respective AND gate circuits 72 are
connected to the identifying circuit shown in FIG. 5.
If both output conductors 73 and 74 of the vertical and horizontal
connector circuits 64 and 65 of the isolating circuit 71 are
applied with the 1 signal at the same time, AND gate circuits 72
are enabled so that the output from the photoelectric converter can
pass through the AND gate circuits but signals other than this
output can not pass through the AND gate circuits. Accordingly,
only the image signals corresponding to the digit 2 appear on the
output conductors 52.sub.4 of the isorating circuit 71.
The image signals of digit 2 selected and isolated in this manner
are applied to a pattern identifying circuit 76 thereby identifying
the digit 2. Many types of the identifying circuits have already
been proposed and any one of them can be used in this invention.
Briefly stated, the identifying circuit 76 is constructed such that
when it completes the identification on operation of a given digit,
it provides a termination signal to deflection control circuit 61
as above described to prepare for the reading of the next digit or
letter.
Although in this embodiment, a particular pattern to be isolated is
shifted to the left upper corner of the field of view as shown in
FIG. 7F, it is also possible to shift the isolated pattern to the
center of the field of view by taking out the input signals to the
upper end detector and left end detector from suitable positions of
the horizontal and vertical registers and by connecting the
connector circuits on both sides of such positions. Moreover, it
should be understood that the deflection control circuit shown in
FIGS. 3 and 5 may be comprised by a well known circuit utilized in
a flying spot scanner or the like. Similarly, the focusing control
circuit may be constituted by a digital counter, a D-A converter, a
current amplifier or the like.
Thus, it will be clear that the pattern idenfifying apparatus
provided an ability just like that of human eyes.
Since the output from the photoelectric converter consists of two
dimensional signal it is easy to perform spacial processing
necessary to identify patterns, thus improving the ability of the
pattern identifying apparatus.
* * * * *