U.S. patent number 3,787,312 [Application Number 05/289,066] was granted by the patent office on 1974-01-22 for device for passing substrates through a vapor deposition zone.
This patent grant is currently assigned to Balzers Patent-und Beteiligungs Aktiengesellschaft. Invention is credited to Roman Schertler, Rudolf Wagner.
United States Patent |
3,787,312 |
Wagner , et al. |
January 22, 1974 |
DEVICE FOR PASSING SUBSTRATES THROUGH A VAPOR DEPOSITION ZONE
Abstract
A device for coating substrates in a vacuum plant comprising a
vacuum chamber which is adapted to be subjected to reduced
pressures and which includes at least one pair of laterally spaced
sources for producing a deposition vapor current of the material to
be coated in a deposition zone therebetween. A conveyor is movable
through the chamber and through the deposition zone. A slider
shield carrier extends over the conveyor and is supported thereon
for movement through the deposition zone and provides a covering to
shield the conveyor parts against the deposition of the material
thereon. The substrates are supported preferably on each side of
the slider shield carrier and they are moved with the carrier on
the conveyor to expose them to the vapor deposition current.
Inventors: |
Wagner; Rudolf (Buchs,
CH), Schertler; Roman (Wolfurt, CH) |
Assignee: |
Balzers Patent-und Beteiligungs
Aktiengesellschaft (Balzers, FL)
|
Family
ID: |
4395631 |
Appl.
No.: |
05/289,066 |
Filed: |
September 14, 1972 |
Foreign Application Priority Data
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Sep 21, 1971 [CH] |
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13822/71 |
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Current U.S.
Class: |
204/298.11;
118/720; 204/298.15; 204/298.23; 118/729 |
Current CPC
Class: |
C23C
14/50 (20130101) |
Current International
Class: |
C23C
14/50 (20060101); C23c 015/00 () |
Field of
Search: |
;118/48-49,49.1-49.5
;204/298,192 |
References Cited
[Referenced By]
U.S. Patent Documents
Primary Examiner: Mack; John H.
Assistant Examiner: Valentine; D. R.
Attorney, Agent or Firm: John J. McGlew et al.
Claims
1. A device for coating substrates in a plant in which under
underpressures are employed, comprising a chamber adapted to be
subject to reduced pressures, at least one pair of laterally spaced
sources for producing a deposition vapor current of the material to
be coated in a deposition zone therebetween, a conveyor movable
through said chamber and through said deposition zone, a slider
shield-carrier extending over said conveyor and supported thereon
for movement through said deposition zone and covering and
shielding said conveyor against the deposition of material thereon
and having means thereon for supporting a substrate on at least one
side of said conveyor in a position to expose it to the vapor
current for
2. A device according to claim 1, wherein said laterally spaced
sources for producing a deposition vapor current comprises a plate
of the material arranged on each side of said conveyor, and means
for supplying an electrical potential to the each plate on each
side of said conveyor for generating a vapor deposition zone of the
material of the plate between
3. A device according to claim 1 wherein said conveyor comprises an
endless conveyor member with guide roller means over which said
conveyor member is directed, said slider shield carrier being of
U-shaped configuration and
4. A device according to claim 1 wherein said slider shield
carriers comprises substantially symmetrical U-shaped members
having a central roof portion adapted to engage at its interior on
said conveyor and including a side like portion on each side
extending downwardly on each respective side of said conveyor from
said roof portion said side legs having means for supporting a
substrate thereon in a position facing outwardly from
5. A device according to claim 3 wherein said slider shield
carriers comprise individual cassettes which are loaded with
substrate plates and have internal supporting flanges at their
lower ends of each side engaging
6. A device for conveying substrates through a zone of reduced
pressure for receiving a coating on the substrates comprising a
conveyor frame, a pair of spaced apart rollers carried on said
frame, an endless member guided over said rollers and defining an
upper movable reach between said rollers, drive means for driving
said rollers, a slider shield carrier comprising a longitudinally
elongated member of generally U-shaped configuration having a leg
portion on each side extending downwardly over said conveyor and
protecting said conveyor and a top portion between said leg
portions supported on the upper reach for movement thereon along
with the endless member, and means on each of said leg portions for
supporting
7. A device according to claim 5 wherein said conveyor frame
comprises a U-shaped member having upright leg portions, said
conveyor rollers having shafts journaled in respective upright leg
portions and being disposed
8. A device according to claim 6 including a drive pulley engaged
with said endless member and located below one end of said U-shaped
frame.
Description
BACKGROUND OF THE INVENTION
1. Field of the Invention
This invention relates in general to vacuum treating devices and in
particular to a new and useful device for coating substrates in a
vacuum plant and for conveying the substrates through a vapor
deposition zone.
2. Description of the Prior Art
The present invention has particular application to a conveying
system for substrates to be coated in a vacuum plant, particularly
a vacuum evaporation or cathode sputtering plant. Such devices are
used for example for applying a thin metallic or non-metallic
coating on glass or ceramic plates. Vacuum evaporation and cathode
sputtering plants are known where the substrates to be coated are
introduced by means of a conveyor device which is moved
continuously into the coating chamber and directed out of the
chamber after the coating. Such conveyor devices can be so designed
that the holders for the substrates are moved by a conveyor belt,
chain or cable running on guide rollers. A disadvantage of the know
constructions is that the conveyor parts are subjected to coating
themselves and the moving conveyor requires a great deal of
attention. The conveyor mechanism must be operated at elevated
temperatures for example at 300.degree.C and possibly without
lubricantsin order to avoid impairment of the vacuum in the
chamber. Any deposit of the coating substance on the moving parts
of the conveyor mechanism can result in an increased wear of the
parts and cause undesired application of material which can
accumulate to an extent that it blocks the operation or which can
become attached under frictional abrasion so as to form an impurity
in the substrates to be coated.
SUMMARY OF THE INVENTION
In accordance with the present invention there is provided an
improved device for coating substrates which includes a conveyor
which is adapted to carry a conveyor slider shield which extends
over the conveyor parts and shields them against the possibility
that these parts will be coated and it provides an improved carrier
for positioning a substrate on each side of the conveyor in the
deposition zone. The device of the invention makes it possible to
provide a more economical use of the plant. The conveyor itself
advantageously includes individual conveyor sections including a
support frame carrying two spaced apart guide pulleys around which
an endless conveyor belt is movable and a separate drive shaft for
driving the pulleys. A slider shield carrier of U-shaped
configuration fits over the conveyor and is supported on the upper
reach of the conveyor chain or cable so that it assumes a position
in which the side leg portions encompass each side of the conveyor
and shield it against vapor deposition. The sides of the shield
members provide supports for the substrates so that they may be
exposed directly to the vapor deposition zone.
Accordingly it is an object of the invention to provide an improved
device for coating substrates which includes a chamber which is
adapted to be subjected to reduced pressures and which carries at
least one pair of laterally spaced sources for producing a
deposition vapor current flow of the material to be coated in a
deposition zone therebetween, and including a conveyor movable
through the zone with a slider shield thereon providing a shield
for the conveyor and a support for the substrate to move it through
the zone.
A further object of the invention is to provide a conveyor device
for transporting substrates through a vapor deposition zone which
includes at least one individual endless conveyor section
comprising spaced apart pulleys with an endless member trained to
run therearound in combination with a slider shield carrier
including a top part which is adapted to engage on the upper reach
of the endless conveyor member and side parts which extend
downwardly on each side and provide a sheild for the conveyor parts
and a support for the substrates to move them through the
deposition zone.
A further object of the invention is to provide a device for
coating substrates and to provide a conveyor which are simple in
design, rugged in construction and economical to manufacture.
For an understanding of the principles of the invention, reference
is made to the following description of a typical embodiment
thereof as illustrated in the accompanying drawing.
BRIEF DESCRIPTION OF THE DRAWINGS
In the Drawings:
FIG. 1 is a transverse sectional view of a device for coating
substrates in a vacuum plant constructed in accordance with the
invention;
FIG. 2 is a partial side perspective view, partly broken away, of
the conveyor shown in FIG. 1;
FIG. 3 is a side elevational view of the conveyor; and
FIG. 4 is a top plan view of the conveyor.
GENERAL DESCRIPTION OF THE PREFERRED EMBODIMENT
Referring to the drawings in particular, the invention embodied
therein comprises a coating chamber 1 which is connected to an
evacuation pump 2 through a line 3 for the purpose of subjecting
the interior of the chamber to vacuum pressures.
In accordance with the invention, the chamber 1 is adapted to
contain means for producing a current or flow of molecules of the
substances to be applied on the surface of substrates 6 and 7 which
are to be coated. In the embodiment indicated, two insulated
electrodes 50 and 52 are arranged in laterally spaced relationship
and they carry plates 4 and 4' respectively of the material which
is to be coated onto the substrates 6 and 7. The substrates have a
ground potential and the plates 4 and 4' are connected by voltage
leads 54 and 56 which extend through vacuum seals 58 and 60
respectively into the chamber 1. By this arrangement, the plates 4
and 4' are subjected to a high negative potential relative to the
substrates 6 and 7 so that the cathode material is sputtered in a
known manner by means of an electric discharge in the under
pressure of the coating chamber 1. The sputtering cathodes consist
of the material which the coating is to be produce for example a
tantalum metal if tantalum coats are to be applied on the
substrates 6 and 7 in the course of the production of electrical
condensers. It should be appreciated that the means for producing a
transverse zone of coating material vapor deposition flow and
generally designated 62 may also be an electrically heatable
evaporation source which permits the heating of the coating
material in order to produce a vapor current which is directed
toward the substrates. In the arrangement shown however the zone is
formed between the plates 4 and 4'.
In accordance with a further feature of the invention there is
provided a device generally designated 5 for conveying the
substantially plate shaped substrates 6 and 7 which are to be
coated through a path in which they move through vapor deposition
zone between the plates 4 and 4'. In the arrangement shown, the
substrates 6 and 7 are supported on side leg portions 8 and 9 of a
slider shield carrier generally designated 10 which includes a
central portion or roof part 10a which rests on an endless member
11 of a conveyor mechanism generally designated 66. In the
arrangement shown the side supports 8 and 9 form cassettes which
hold the substrates 6 and 7 in a substantially vertical orientation
so that their outer surfaces face the molecular currents which
issue from the plates 4 and 4' respectively.
The conveyor 66 of the invention includes an endless belt or chain
11 which is guided over rollers 12 and 12' arranged at respective
ends of a U-shaped upstanding frame 13 and which have axles 14
which are journaled in the frame. The U-shaped frame 13 is secured
by means of a supporting base assembly on the bottom of the coating
chamber 1. As indicated in FIG. 2 the endless belt 11 is driven by
a driving pulley 17 which is driven from a clutch 18. The
construction of the conveyor 66 is such that the sides are
unobstructed in order to permit the slide shield carrier 10 to be
positioned thereover as indicated in FIG. 1 and to shield all of
the operating parts from exposure to the vapor deposition flow
between the plates 4 and 4'.
During the operation of the device, the individual slider shield
carriers 10 are first loaded with the substrates 6 and 7 to be
coated and then they are passed successively on to the individual
endless conveyor belt members 11 so that they move in close
succession through the vapor deposition zone to effect coating of
the substrates 6 and 7. As shown in FIG. 2 several individual
conveyor units or assemblies 66 are arranged in end to end
alignment to extend through the chamber 1 in an arrangement in
which the slider shield carriers 10 pass from one conveyor section
to another automatically. This makes it possible to manufacture the
individual conveyor units economically in a uniform size and to
combine or more of them as needed into the length of conveyor track
which is required for the particular plant. Because of their
compact design such units are particularly suitable for passing the
substrates through any gate valves of series connected lock
chambers having graduated vacuum pressure conditions as it is
frequently the case in a continuous coating plant of this nature.
The conveyor units are preferably installed so that the driving
mechanism is not exposed directly to the molecular current. The
simplest way is to select the length of the conveyor devices which
are to be arranged in the coating chamber so that the driving
mechanism lies outside the vapor zone. If necessary, additional
screening plates can be used to protect the driving mechanism
against the possibility that they become coated.
The attachment and the removal of the individual carriers 10 can be
effected in a plant which has pressure locks at a location outside
the vacuum by hand or with known mechanical lifting devices if
desired. In plants which do not employ pressure locks the slider
shield carriers 10 can be loaded with the substrates and arranged
in a supply stack in the interior of the plant by means of suitable
charging devices and they can be removed from the last coating unit
in the line after treatment has taken place. Preferably the
individual carriers 10 should follow each other so closely that no
gaps are formed between carriers which would cause any disruption
of the shielding of the conveyor.
The inventive device permits the non destructive and the attendance
free operation of the vapor deposition plant for periods of several
thousands of hours. It is obvious that this represents a
considerable progress with regard to the known conveyor devices for
vacuum coating plants. Naturally, the invention while particularly
applicable to the treating of objects in a vacuum treatment plant
is not limited to vacuum evaporation and sputtering in plants per
se but can be used in all plants where coating methods must be
carried out at underpressure.
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