U.S. patent number 3,767,447 [Application Number 05/134,653] was granted by the patent office on 1973-10-23 for electron scattering prevention film and method of manufacturing the same.
This patent grant is currently assigned to Victor Company of Japan, Ltd.. Invention is credited to Naoki Akiyama, Hideaki Mizuno.
United States Patent |
3,767,447 |
Mizuno , et al. |
October 23, 1973 |
ELECTRON SCATTERING PREVENTION FILM AND METHOD OF MANUFACTURING THE
SAME
Abstract
An electron scattering prevention film in disclosed comprising
at least the following three layers: an electrode layer deposited
on a phosphor layer; a first electron scattering prevention layer
deposited on the electrode layer composed of a first electron
scattering prevention material having a smaller atomic number than
that of the material constituting the electrode layer; and a second
electron scattering prevention layer deposited on the first
electron scattering prevention layer composed of a second electron
scattering prevention material having a smaller atomic number than
that of the material constituting the electrode layer. A bimetal
action which occurs between the electrode layer and the first
electron scattering prevention layer is cancelled by a bimetal
action which occurs between the first electron scattering
prevention layer and the second electron scattering prevention
layer whereby the electron scattering prevention film is prevented
from being distorted to an extent that the electrode layer peels
off from the phosphor layer under variation of temperature.
Inventors: |
Mizuno; Hideaki (Tokyo,
JA), Akiyama; Naoki (Kanagawa, JA) |
Assignee: |
Victor Company of Japan, Ltd.
(Kanagawa-ken, JA)
|
Family
ID: |
12369916 |
Appl.
No.: |
05/134,653 |
Filed: |
April 16, 1971 |
Foreign Application Priority Data
|
|
|
|
|
Apr 17, 1970 [JA] |
|
|
45/32837 |
|
Current U.S.
Class: |
428/610; 427/10;
428/457; 428/691; 428/698; 313/466; 427/69; 428/690; 428/696;
428/699 |
Current CPC
Class: |
H01J
29/32 (20130101); H01J 29/28 (20130101); Y10T
428/31678 (20150401); Y10T 428/12458 (20150115) |
Current International
Class: |
H01J
29/32 (20060101); H01J 29/18 (20060101); H01J
29/28 (20060101); H01j 001/68 () |
Field of
Search: |
;117/33.5C,216,217,219
;250/71R,80 ;313/92PD,92R,92PH,18A |
References Cited
[Referenced By]
U.S. Patent Documents
Primary Examiner: Leavitt; Alfred L.
Assistant Examiner: Weston; Caleb
Claims
What we claim is:
1. An electron scattering-prevention film deposited on a phosphor
layer for an electron beam device, said film comprising a metallic
electrode layer which is penetrable by primary electron beams and
deposited on a phosphor layer, first electron scattering-prevention
layer deposited on the metallic electrode layer, said first
electron scattering-prevention layer being of a first compound of
elements having a first atomic number less than the atomic number
of the metal of the electrode layer, and a second electron
scattering-prevention layer deposited on said first electron
scattering-prevention layer, said second electron
scattering-prevention layer being of a second compound of elements
having a second atomic number less than the atomic number of the
metal of the electrode layer, the first and second compounds being
different from each other in atomic number said metallic electrode
layer and said first electron scattering-prevention layer having
therebetween a crossed layer which has a continuously varying
composition from said first electron scattering-prevention layer to
said metallic electrode layer ranging from zero to 100 percent of
said metal and from 100 to 0 percent of said first compound,
respective thicknesses of the metallic electrode layer and the
first and second electron scattering-prevention layers being
respectively of such values in connection with respective
coefficients of thermal expansion and Young's moduluses of the
metallic electrode layer and the first and second electron
scattering-prevention layers that a bimetal action which occurs
between said metallic electrode layer and said first electron
scattering-prevention layer is substantially cancelled by a bimetal
action which occurs between the first and second electron
scattering-prevention layers under variation of temperature whereby
the electron scattering-prevention film comprising the metallic
electrode layer and the first and second electron
scattering-prevention layers do not peel off from said phosphor
layer.
2. The electron scattering-prevention film as defined in claim 1
wherein the respective thicknesses of the metallic electrode layer
and the first and second electron scattering-prevention layers
satisfy a relationship expressed by or approximated by the
following equation:
t'b(l + t'b)(.alpha.a - .alpha.b) EaEb + t'bt'c(t'b + t'c)(.alpha.b
- .alpha.c)
EbEc - t'c(l - 2t'b + t'c)(.alpha.c - .alpha.a)EcEa = 0
where t'b = tb/ta', t'c = tc/ta; ta, tb and tc are thicknesses
respectively of the metallic electrode layer, the first electron
scattering-prevention layer; .alpha.a, .alpha.b and .alpha.c are
coefficients of thermal expansion, and Ea, Eb and Ec are Young's
moduluses respectively of the metal of the electrode layer, the
first compound and the second compound.
3. The electron scattering-prevention film as defined in claim 1
further comprising a third electron scattering-prevention layer
deposited on said second electron scattering-prevention layer, said
third electron scattering-prevention layer being of the same
compound as the first compound, and a fourth electron
scattering-prevention layer deposited on said third electron
scattering-prevention layer, said fourth electron
scattering-prevention layer being of the same compound as the
second compound.
4. The electron scattering-prevention film as defined in claim 1
wherein the metal of the electrode layer is aluminum (Al), the
first compound is boron carbide (B.sub.4 C) and the second compound
is lithium fluoride (LiF).
Description
BACKGROUND OF THE INVENTION
This invention relates to an electron scattering and reflecting
prevention film and a method of manufacturing the same, and more
particularly to a film for use in color television picture tubes
designed to minimize the reflection and scattering of electron
beams and to prevent peeling off of a deposited film from a
phosphor layer under variation of temperature.
Generally, in a post-acceleration color television picture tube,
electron beams emitted from electron guns are accelerated in the
accelerating field of a high voltage and strike a phosphor surface
in electron beams of high kinetic energy exciting the phosphors to
produce a luminous output. At the same time, a large number of
secondary electrons, reflecting electrons and scattering electrons
are generated by the impact of the electron beams of high kinetic
energy.
These secondary electrons have no high kinetic energy as do the
reflecting electrons. The secondary electrons, therefore, can be
removed by utilizing the energy difference between the injected
electrons and the secondary electrons. The scattering electrons,
however, are accelerated by the post-accelerating field and strike
the phosphor surface again with high kinetic energy of the same
intensity as that of the incident electrons. As a result, halos
take place around luminous points for the regular incident
electrons. This deteriorates contrast of reproduced images and
causes adverse color contamination.
In order to remove the phenomena, it has been proposed, as
disclosed in U.S. Pat. No. 2,878,411, to provide an electron
scattering prevention layer by sintering a single thin layer of
material of small atomic number such as boron or carbon deposited
on the metal backing of aluminum evaporated on the phosphor layer
so that the amount of electrons scattering from the phosphor
surface is reduced. However, this conventional electron scattering
prevention layer made of a single thin layer is not capable of
sufficiently preventing the scattering of electrons since the
electrons are scattered at the boundary between the electron
scattering prevention layer and the metal backing layer. This layer
is also incapable of sufficiently absorbing the secondary electrons
emitted from the shadow mask and has a further disadvantage that
the single layer is apt to peel off during heating process in the
manufacturing of the color television picture tube which is usually
conducted under temperature of approximately 430.degree.C and
accordingly the manufacture is very difficult.
Furthermore, there is a tendency that the layer superposed upon the
phosphor layer peels off more readily as the thickness of the
superposed layer increases. In the meanwhile, the electron
scattering prevention film must be of such a thickness that
corresponds to the kinetic energy of the striking electrons so that
the scattering of electrons will effectively be prevented. For
example, phosphor screen voltage of the picture tube is in the
order of 20 KV to 20-odd KV in which case the thickness of the
electron scattering prevention film should be more than several
thousand A. However, the thicker the electron scattering prevention
film, the greater is the stress between the material composing the
electron scattering prevention layer and the material composing the
metal backing layer due to difference in the coefficient of thermal
expansion between the two materials. Consequently, the electron
scattering prevention layer is more apt to peel off from the metal
backing layer because of a bimetal action between the two layers.
Owing to such disadvantages, the above described conventional film
has not been put to practical use.
With a view to eliminating such disadvantages, the applicant
proposed a film which is capable of effectively preventing
scattering of electrons and which is much less likely to peel off
than the conventional films and a method of manufacturing the same,
in U.S. Pat. application Ser. No. 1,647 U.S. Pat. No. 3,692,576,
filed Jan. 9, 1970, entitled "Electrons scattering prevention film
and method of manufacturing the same." According to this proposed
method, the electron scattering prevention film is manufactured by
forming a crossed layer of aluminum (Al) and boron carbide (B.sub.4
C) between the metal backing layer of aluminum and the electron
scattering prevention layer of boron carbide. This electron
scattering prevention film is advantageous in that the electron
scattering prevention layer is formed integrally with the metal
backing layer through the crossed layer so that the electron
scattering prevention layer hardly peels off from the metal backing
layer.
However, this proposed electron scattering prevention film is not
still free from the problem that the metal backing layer sometimes
peels off from the phosphor layer during heating process due to a
bimetal action which takes place between the metal backing layer
and the electron scattering prevention layer. Generally, there is
an innumerable number of projections and depressions on the surface
of the phosphor layer and, if aluminum is evaporated directly upon
the surface of the phosphor layer, the phosphor layer side of the
aluminum thin film formed as a metal backing layer cannot be made
as a mirror surface. Hence, in forming the metal backing layer on
the phosphor layer, an intermediate film is first coated on the
phosphor layer to make a flat surface and then aluminum is
evaporated on this flat surface. The intermediate film is removed
later by a baking treatment. Accordingly, adhesion of the metal
backing layer produced in the above described manner to the
phosphor layer is extremely weak. As a result, the metal backing
layer easily peels off from the phosphor layer when the bimetal
action takes place between the metal backing layer and the electron
scattering prevention layer as described above. This causes a
problem that precision is required in various manufacturing
conditions with a resultant increase in the manufacturing cost.
SUMMARY OF THE INVENTION
It is, therefore, a general object of the present invention to
provide a novel and useful electron scattering prevention film and
a method of manufacturing the same eliminating the aforementioned
disadvantages.
Another object of the invention is to provide an electron
scattering prevention film and a method of manufacturing the same
which film is capable of effectively preventing the scattering of
electrons produced by the striking electron beams and in which an
electrode layer does not peel off from a phosphor layer under
variation of temperature.
A further object of the invention is to provide an electron
scattering prevention film and a method of manufacturing the same
in which an electron scattering prevention layer does not peel off
from an electrode layer and the electrode layer does not peel off
from a phosphor layer under variation of temperature.
A still further object of the invention is to provide an electron
scattering prevention film and a method of manufacturing the same
which film is particularly useful in a post-acceleration color
television picture tube.
BRIEF DESCRIPTION OF THE DRAWINGS
Other objects and features of the invention will become apparent
from the description made hereinbelow with reference to the
accompanying drawings, in which:
FIG. 1 is a vertical section of one embodiment of a
post-acceleration color television picture tube having an electron
scattering prevention film according to the invention;
FIG. 2 is an enlarged vertical section of a part of the picture
tube screen having one embodiment of the electron scattering
prevention film according to the invention;
FIG. 3 is a diagram showing a ratio of composition of evaporated
film;
FIG. 4 is a schematic vertical section of one embodiment of an
apparatus for manufacturing the electron scattering prevention film
according to the invention;
FIG. 5 is a perspective view of a heating means for evaporating
materials;
FIG. 6 is an explanatory diagram showing each layer of the
evaporated film as a model;
FIG. 7 is a diagram for illustrating the state of each layer shown
in FIG. 6 under a high temperature;
FIG. 8 is a graph showing the relationship between the relative
thickness of the metal backing layer and the electron scattering
prevention layer and the range in which the peeling off of the
layer can be prevented; and
FIG. 9 is an enlarged vertical section of a part of a picture tube
screen having another embodiment of the electron scattering
prevention film according to the invention.
DETAILED DESCRIPTION OF PREFERRED EMBODIMENTS
First, one embodiment of a post-acceleration color television
picture tube having the electron scattering prevention film
according to the invention will be illustrated with reference to
FIG. 1.
A post-acceleration type color television picture tube 10 generally
comprises a glass bulb 11 and is externally provided with a
deflection yoke 12. Three electron guns provided on a connecting
base 14 are sealed within neck 13 of the funnel. The bulb 11
generally comprises the funnel neck 13, a funnel 16 and a face
plate 17. On the inner surface of the face plate 17 are disposed a
phosphor layer 18 consisting of three color dot phosphors, i.e., of
red, green and blue and an electron scattering prevention film 19
later described and formed integrally with a metal backing in
accordance with the present invention. A shadow mask 20 which has
apertures larger in diameter than each dot of phosphors of the
phosphor layer 18 formed in correspondence to respective dot trios
is provided spaced apart from respective layer 18 and film 19 and
in parallel therewith.
According to one aspect of the present invention, a first electric
power source E.sub.1 is connected to a metal backing layer and a
transparent conducting electrode such as a nesa glass. A second
power source E.sub.2 of 8.8 KV is connected to a shadow mask 20 and
a third power source E.sub.3 of 9.6 KV is connected to an anode 21
provided on the inner walls of the funnel 16. The power voltages
E.sub.1 to E.sub.3 of the above power sources may preferably have
the mutual relationships of E.sub.2 <E.sub.3 <E.sub.1, so
that there may be formed an intense post-acceleration electric
field between the shadow mask 20 and the phosphor layer 18 with
respect to the electron beams 22 emitted from the electron guns 15.
Between the shadow mask 20 and the anode 21 is formed a weak
negative acceleration electric field, which permits a major portion
of the secondary electron 23 emitted from the shadow mask 20 when
the electron beam 22 strikes at the shadow mask 20 to be absorbed
in the anode 21.
Some of the secondary electrons generated from the surroundings of
the apertures of the shadow mask 20 are drawn to the
post-acceleration electric field between the shadow mask 20 and the
phosphor layer 18, and enter the acceleration electric field
through the aperturs, where they are accelerated and strike the
phosphor layer 18 partly causing deterioration of contrast. As the
initial speed of the secondary electrons is about ten-odd volts
when they are emitted from the shadow mask 20, the kinetic energy
thereof is almost equivalent to the energy of the post-acceleration
voltage when the secondary electrons strike at the phosphor layer
18 and said kinetic energy is smaller than that of the electron
beams 22 striking the phosphor layer 18 through the shadow mask 20.
By preferred selection of thicknesses of the metal backing layer
evaporated on the phosphor layer 18 and the scattering prevention
film it is possible to allow the primary electron beams 22 only to
reach the phosphor screen 18 for illumination.
Thickness of the film coated on the phosphor layer 18 which may be
enough to prevent the deterioration of contrast by the secondary
electrons above described is about 5,000 A. in the conversion value
of aluminum, where for instance the voltage of the phosphor layer
is 20 KV and that of the shadow mask is 9 KV, and about 8,000 A.
where the voltage of the phosphor layer is 25 KV and that of the
shadow mask is 11 KV.
The electron beams of high kinetic energy passing through the
shadow mask 20 and striking the phosphor emit a large number of
secondary electrons and scattering electrons during striking the
screen. Due to small initial speed these secondary electrons will
neither excite nor illuminate the phosphor. The scattering
electrons however are the electrons tending to disperse in diverse
directions with nearly the same energy as of the incident electron
beams. Hence, among the scattering electrons, electrons 24 emitted
at angles larger than a critical angle (the angle is defined by the
voltages of the phosphor layer and the shadow mask and the distance
between the phosphor layer and the shadow mask) will draw a curved
line in the post-acceleration electric field again to strike the
phosphor layer almost losing no energy. As they do this, they cause
halos surrounding the luminous point due to striking of normal
electron beams. In consequence, the contrast of the image
deteriorates and the color contamination takes place. As the
scattering electrons 24 have nearly same energy as the primary
electron beams, the contrast and the color contamination can not be
freed from the influence of said scattering electrons only by
coating a thicker layer or film on the phosphor layer. This has
been a major factor which has obstructed the practical use of the
post-accleration color television tubes.
According to the present invention, an electron scattering
prevention film is provided wherein the aforementioned secondary
electrons are sufficiently absorbed, scattering electrons by the
primary electron beams are not produced and an electrode layer such
as a metal backing layer does not peel off from the phosphor layer
under variation of temperature.
FIG. 2 shows a part of the electron scattering prevention film
according to the invention in an enlarged vertical section. A metal
backing layer 30 is formed by evaporating aluminum (Al) on the
phosphor layer 18 by means of an evaporating means later described.
On the metal backing layer 30 is continuously formed a crossed
layer 31 which is composed of boron carbide (B.sub.4 C) used as a
material having a small atomic number for preventing the scattering
of electrons and aluminum in a mixed state. Then, a first electron
scattering prevention layer 32 composed of boron carbide B.sub.4 C
is formed continuously with the crossed layer 31. Further, a second
electron scattering prevention layer 33 composed of lithium
fluoride (LiF) having also a small atomic number is formed on the
first electron scattering prevention layer 31. Thus, an electron
scattering prevention film 19 which is integral with the metal
backing layer 30 is constituted. The material composing the second
electron scattering prevention film 33 (in the present embodiment,
lithium fluoride LiF) is selected from among materials each having
a different coefficient of thermal expansion and a smaller atomic
number relative to the material composing the first electron
scattering prevention layer 32 (in the present embodiment, boron
carbide B.sub.4 C). It is to be understood that, if a reflecting
electron emission ratio is in proportion to the atomic number, the
atomic number required for obtaining a contrast ratio of 20 should
be less than one half of the atomic number of aluminum (13).
Besides, the material must be of characteristics which meet the
various manufacturing conditions for the picture tube. Taking these
conditions into consideration, the inventors have conducted
experiments with materials such as B, C, LiF, LiCO.sub.3 and
B.sub.4 C. As a result, boron carbide B.sub.4 C and lithium
fluoride LiF have been selected as most suitable materials.
The crossed layer 31 has, as shown in FIG. 3, a continuously
varying density gradient of composite materials. Namely, from the
metal backing layer 30 to the electron scattering prevention layer
32, in the diagram the composition ratio of aluminum gradually
varies from 100 percent to 0 percent whereas the composition ratio
of boron carbide varies from 0 percent to 100 percent. By forming
the crossed layer 31 in the foregoing manner, possibility of
undesired production of pin holes in the boron carbide layer 32 is
eliminated. Accordingly, such an accident that the aluminum layer
becomes transparent due to reaction of lithium fluoride LiF and
aluminum Al through these pin holes can be avoided.
Next, the reason why the electron scattering prevention film 19 and
the metal backing layer 30 having the foregoing construction are
prevented from being distorted under variation of temperature to
the extent that they peel off from the phosphor layer 18 will be
explained. For simplicity, the metal backing layer 30, the boron
carbide layer 32 and the lithium fluoride layer 33 are treated in
the form of a model as shown in FIG. 6. It is assumed that the
crossed layer 31 is distributed to the metal backing layer 30 and
the boron carbide layer 32. The thickness of each of the layers 30,
32 and 33 is respectively represented as t.sub.a, t.sub.b and
t.sub.c. The length of these layers is represented as 1.sub.o and
the width as s. It is assumed that the layers are stable in terms
of dynamics, i.e., energy is minimum at a certain temperature
.theta..sub.1 to .theta..sub.2, the layers 30, 32 and 33 are
distorted from the state as shown in FIG. 6 to the state as shown
in FIG. 7 in which the layers are bent with a radius of curvature R
and an angle .phi., a state where energy stored in these layers is
reduced to the minimum.
First the radius of curvature R is obtained and then conditions in
which the radius of curvature R becomes infinite i.e.,
corresponding to the condition that the deposited film composed of
the layers 30, 32 and 33 is not distorted, are obtained. Each
constant to be used in the equation described later is represented
as follows:
Initial temperature in the variation of temperature . . .
.theta..sub.1
Final temperature in the variation of temperature . . .
.theta..sub.2
Magnitude of the variation of temperature . . .
.DELTA..theta.=.theta..sub.2 -.theta..sub.1
Coefficient of thermal expansion of the materials respectively
composing the layers 30, 32 and 33 . . . . .alpha.a,.alpha.
b,.alpha. c respectively The suffixes a, b and c correspond
respectively to the layers 30, 32 and 33. The same is the case with
suffixes used for each following constant.
Thickness of each of the layers 30, 32 and 33 . . . t.sub.a,
t.sub.b, t.sub.c
Young's modulus of composite material of the layers 30, 32 and 33 .
. . E.sub.a, E.sub.b, E.sub.c
Spring constant of each composite material of the layers 30, 32 and
33 . . . K.sub.a, K.sub.b, K.sub.c
Length of the deposited film under the temperature .theta..sub.1 .
. . l.sub.o
Length if each of the layers 30, 32 and 33 existed alone under the
temperature 0.sub.2, i.e., if the layers were not superposed one
upon another . . . l.sub.a, l.sub.b, l.sub.c
Average length of each of the layers 30, 32 and 33 at its center of
thickness under the temperature .theta..sub.2 . . . L.sub.a,
L.sub.b, L.sub.c
Radius of curvature and angle of the bend of the deposited film
under the temperature .theta..sub.2 . . . R and .phi.
First, the average lengths L.sub.a, L.sub.b and L.sub.c of the
respective layers 30, 32 and 33 at their center of thickness under
the temperature .theta..sub.2 are respectively expressed by the
following equations:
L.sub.a =(R+ t.sub.a /2 + t.sub.b + t.sub.c).phi. . . . (1-1)
L.sub.b =(R+ t.sub.b /2 + t.sub.c).phi. . . . (1-2)
L.sub.c =(R+ t.sub.c /2).phi. . . . (1-3)
Again, lengths l.sub.a, l.sub.b and l.sub.c of the respective
layers 30, 32 and 33 under the temperature .theta..sub.2 if each of
the layers existed alone are expressed by the equations;
l.sub.a = l.sub.o (l + .alpha..sub.a .DELTA..theta.) . . .
(2-1)
l.sub.b = l.sub.o (l + .alpha..sub.b .DELTA..theta.) . . .
(2-2)
l.sub.c = l.sub.o (l + .alpha..sub.c .DELTA..theta.) . . .
(2-3)
Further, from the relationship existing between spring constants
and Young's modulus the following equations are obtained;
K.sub.a = t.sub.a /1.sub.o s Ea . . . (3-1)
K.sub.b = t.sub.b /l.sub.o s E.sub.b . . . (3-2)
K.sub.c = t.sub.c /l.sub.o s Ec . . . (3-3)
Next, the change of internal energy in the respective layers 30, 32
and 33 accompanying the change of temperature from .theta..sub.1 to
.theta..sub.2 can be considered as two separate changes, namely a
change due to extension of the deposited film and a change due to
bending thereof. The changes of energy due to extension are
expressed by the equations;
U.sub.a1 = K.sub.a /2 (L.sub.a - l.sub.a).sup.2 . . . (4-1)
U.sub.b1 = K.sub.b /2 (L.sub.b - l.sub.b).sup.2 . . . (4-2)
U.sub.c1 = K.sub.c /2 (L.sub.c - l.sub.c).sup.2 . . . (4-3)
and the changes of energy due to bending are expressed by the
equations;
U.sub.a2 = 1/24K.sub.a .phi..sup.2 t.sub.a.sup.2 . . . (5-1)
U.sub.b2 = 1/24K.sub.b .phi..sup.2 t.sub.b.sup.2 , . . . (5-2)
U.sub.c2 = 1/24K.sub.c .phi..sup.2 t.sub.c.sup.2 . . . (5-3)
The total change U of energy is obtainable by summing the foregoing
equations (4-1), (4-2), (4-3), (5-1), (5-2) and (5-3) and can be
expressed by the equation;
U = U.sub.a1 +U.sub.b1 +U.sub.c1 +U.sub.a2 +U.sub.b2 +U.sub.c2 . .
. (6)
Conditions under which the total change U of internal energy of the
deposited film relative to the change of temperature of the
deposited film is at the minimum can be obtained by the
equations;
.delta.U/.delta. R = 0 . . . (7)
.delta.u/.delta..phi. = 0 . . . (8)
from the equation (7),
.delta.U/.delta.R = .phi. [K.sub.a {(R + t.sub.a /2 + t.sub.b +
t.sub.c).phi. - l.sub.a } + K.sub.b {(R + t.sub.b /2 +
t.sub.c).phi. - l.sub.b } + K.sub.c {(R + t.sub.c /2).phi. -
l.sub.c }] = 0 . . . (9)
From the equation (8),
.delta.U/.delta..phi. = K.sub.a [(R+ t.sub.a /2 +t.sub.b
+t.sub.c){(R+ t.sub.a /2 +t.sub.b +t.sub.c).phi.- l.sub.a } +
.phi./12 t.sub.a 2] + K.sub.b [(R+ t.sub.b /2 + t.sub.c) {(R+
t.sub.b /2 + t.sub.c).phi. - l.sub.b } + .phi./12 t.sub.b 2]+
K.sub.c [ (R+ t.sub.c / 2) {(R+ t.sub.c /2).phi. - l.sub.a } +
.phi./12 t.sub.c 2 ] = 0 . . . (10)
In order that U is held at the minimu, both equations (9) and (10)
must hold at the same time.
From the equation (9),
.phi. = 0 . . . (11)
Or,
K.sub.a {(R+ t.sub.a /2 + t.sub.b + t.sub.c).phi. - l.sub.a } +
K.sub.b {(R + t.sub.b /2 + t.sub.c).phi. - l.sub.b } + K.sub.c {(R
+ t.sub.c /2).phi. - l.sub.c } = 0 . . . (12)
Thus, two solutions (11) and (12) are obtained. If the equation
(11);.phi.= 0 is adopted, the following equation will result from
the equation (10);
-{K.sub.a (R+ t.sub.a /2 + t.sub.b + t.sub.c)l.sub.a + K.sub.b (R+
t.sub.b /2 + t.sub.c)l.sub.b + Kc(R + t.sub.c /2)l.sub.c } = 0 . .
. (10a)
However, since each constant of any actually available material is
positive, it is apparent that the equation (10a) cannot hold by
using an actually available material. Accordingly, the result of
the equation (11); .phi.= 0 cannot be adopted and the result which
can be adopted is only .phi. .noteq. 0.
Then, if .phi. is sought by adopting the equation (12),
##SPC1##
However, if .phi. is sought by using the equation (10),
##SPC2##
If the equation (13) is equal to the equation (14), the radius of
curvature R of the deposited film when the total change U of the
internal energy of the deposited film is minimum can be obtained.
For simplicity of calculation, the following equations will be
used:
P = K.sub.a l.sub.a + K.sub.b l.sub.b + K.sub.c l.sub.c . . .
(15-1)
Q = K.sub.a + K.sub.b + K.sub.c . . . (15-2)
V = K.sub.a + l.sub.a (t.sub.a /2 + t.sub.b + t.sub.c) . . .
(15-3)
W = K.sub.a /12t.sub.a.sup.2 + K.sub.b /12t.sub.b.sup.2 + K.sub.c
/12t.sub.c.sup.2 . . . (15-4)
S = K.sub.a (t.sub.a /2 + t.sub.b + t.sub.c) + K.sub.b (t.sub.b /2
+t.sub.c) + K.sub.c (t.sub.c /2) . . . (15-5)
T = K.sub.a (t.sub.a /2 + t.sub.b + t.sub.c).sup.2 + K.sub.b
(t.sub.b /2 + t.sub.c).sup.2 + K.sub.c (t.sub.c /2) . . .
(15-6)
From the equations (13), (14) and (15),
P/RQ + S = RP + V/R.sup.2 Q + 2RS + T + W . . . (16)
from the equation (16), R is obtained by the equation;
R =VS - PW - PT/PS - VQ . . . (17)
the value of R obtained from the equation (17) is the radius of
curvature of the deposited film when the total change U of the
internal energy of the deposited film is at the minimum.
If a condition under which the radius of curvature R becomes
infinite is sought, the denominator of the equation (17) must be 0.
Accordingly, this condition is given by the equation;
PS - VQ = 0 . . . (18)
the equation (18) can be arranged using the original symbols and
the following equation can be obtained;
t.sub.a t.sub.b (t.sub.a +t.sub.b)(.alpha..sub.a
-.alpha..sub.b)E.sub.a E.sub.b +t.sub.b t.sub.c (t.sub.b
+t.sub.c)(.alpha..sub.b -.alpha..sub.c)E.sub.b E.sub.c - t.sub.a
t.sub.c (.alpha..sub.c -.alpha..sub.a)(t.sub.a +2t.sub.b
+t.sub.c)E.sub.c E.sub.a =0 . . . (19)
In the above equation, the relationship between thicknesses of the
layers is not clear. Hence, t.sub.b and t.sub.c are normalized by
t.sub.a and represented as t.sub.b /t.sub.a =t.sub.b ' and t.sub.c
/t.sub.a =t.sub.c '. Then, the equation can be rewritten as
follows;
t.sub.b '(l+t.sub.b ')(.alpha..sub.a -.alpha..sub.b)E.sub.a E.sub.b
+t.sub.b 't.sub.c '(t.sub.b '+t.sub.c ')(.alpha..sub.b -
.alpha..sub.c)E.sub.b E.sub.c -t.sub.c '(l+2t.sub.b '+t.sub.c
')(.alpha..sub.c -.alpha..sub.a)E.sub.c E.sub.a =0 . . . (20)
From the foregoing consideration, it will be possible to
theoretically prove that in case layers consisting of plurality of
different kinds of materials respectively having different
coefficient of thermal expansion are formed as a film consisting of
more than three layers deposited on a phosphor screen, the
deposited film can be so constructed that it will not be distorted
under variation of temperature by determining thickness of each
layer in conjunction with the coefficient of thermal expansion and
Young's modulus of the material composing each layer.
Physical constants of each material used in the embodiment having
the above described construction are shown in the following
table;
Mater- Young's modulus Coefficient of ial (dyne/cm.sup.2) (E)
thermal expansion (deg.sup.-.sup.1)(.alpha.) Al
0.706.times.10.sup.12 2.3.times.10.sup.-.sup.5 B.sub.4
C4.50.times.10.sup.12 0.45.times.10.sup.-.sup.5 LiF
0.880.times.10.sup.12 3.7.times.10.sup.-.sup.5
if the deposited film consisting of the three layers 30, 32 and 33
composed respectively of Al, B.sub.4 C and LiF is to remain
undistorted under variation of temperature, the thickness of each
layer must satisfy the equation (20). The graph shown in FIG.8
indicates relative thickness of the three layers in a state wherein
the deposited film consisting of the three layers remains
undistorted under variation of temperature, calculating the values
by applying the constants of each material indicated in the above
table to the equation (20) and taking the thickness of the aluminum
layer 30 as a standard which is made one (1).
In FIG.8, t.sub.c ' (=t.sub.c /t.sub.a), i.e., the thickness of the
lithium fluoride layer 33 normalized by the thickness t.sub.a of
the aluminum metal backing layer 30 is indicated on the abscissa
whereas t.sub.b ' (=t.sub.b /t.sub.a),i.e., the thickness of the
boron carbide layer 32 normalized by the thickness t.sub.a of the
aluminum metal backing layer 30 is indicated on the ordinate. A
curve I shown by a full line in FIG.8 indicates a relationship
between the thickness of the lithium fluoride layer 33 and the
thickness of the boron carbide layer 32 respectively normalized by
the thickness of the aluminum layer 30 in the state wherein the
deposited film remains undistorted under variation of temperature.
Accordingly, if the relative thicknesses of the layers 30, 32 and
33 are so selected as to satisfy the relationship indicated by the
curve I shown by full line, stresses existing between each layer
are cancelled with each other and the bimetal action which takes
place between the layer 30 and the layer 32 is cancelled by the
bimetal action which takes place between the layer 32 and the layer
33 whereby no distortion occurs in the deposited film.
A slight bending which may occur in the deposited film will not
cause the deposited film to peel off from the phosphor layer by
adhesion between the deposited film and the phosphor layer if the
degree of bending is small. In FIG.8, the shadowed portion II shown
by oblique lines defined by dotted lines indicates the relative
thickness between the layers 30, 32 and 33 at which there occurs a
bending force in the deposited film which force is of a magnitude
which is insufficient to cause the deposited film to peel of from
the phosphor layer. Accordingly, the relationship between the
thicknesses of the layers 30, 32 and 33 should be chosen within the
shadowed portion II, most preferably on the curve I.
Specific numerical examples of preferable thickness of each layer
will be given hereinbelow.
Examples: 1 2 3 4 Thickness Whole deposited film 5500A. 5000A.
6500A. 3000A. Layer 30 (Aluminum) 1500 1200 1700 1000 Layer 31
(Crossed layer) 500 500 800 600 Layer 32 (Boron carbide) 2500 2500
2500 900 Layer 33 (Lithium 1000 800 1500 500 Fluoride)
In the foregoing embodiment, the deposited film is composed of
three layers (i.e., the layers 30, 32 and 33) including the
aluminum metal backing layer 30 but excluding the crossed layer 31.
If the deposited film is to be made thicker (for example,
approximately 1.mu.), the number of layers may be increased.
Another embodiment of the construction of layers is shown in FIG.9.
In this embodiment, a boron carbide B.sub.4 C layer 40 having a
small coefficient of thermal expansion is superposed on the lithium
fluoride LiF layer 33 constructed in the above described manner.
Further, a lithium fluoride LiF layer 41 having a greater
coefficient of thermal expansion is formed thereon. In this
embodiment also, if the thicknesses of the layers 30 to 33 and 40,
41 are properly selected based on the relationship as described
above, the deposited film can be so constructed as not to produce
bending which will cause the deposited film to peel off from the
phosphor layer.
Next, the method of manufacturing the electron scattering
prevention film shown in FIG.2 and the apparatus for carrying out
the method will be illustrated with reference to FIG.4 and
FIG.5.
Air is introduced into the bell jar 50 through a leak valve 61 and
after the pressure inside the bell jar 50 becomes the same as the
atmospheric pressure the bell jar 50 is raised. A heating device 53
consists, as shown in an enlarged view in FIG.5, of a crucible 55
covered by an electrode 54 and a cathode filament 56 surrounding
the crucible 55. A press formed boron carbide (B.sub.4 C, melting
point 2450.degree.C) 57 which has been sintered in argon gas under
a temperature of 1300.degree.C is placed in the crucible 55. A
piece of solid aluminum (Al, melting point 660.degree.C) 58 (for
example 70mg) is placed on top of the boron carbide 57. On a boat
62 made of tantalum there is placed lithium fluoride (LiF, melting
point 660.degree.C). If the distance between the crucible 55 and
the boat 62 is too great, the thickness of the film will become
uneven whereas if the distance is too small the crucible 55 will be
shaded by the boat 62. Accordingly, the distance should be properly
selected. In the present embodiment, the distance is selected at 8
cm.
Further, the face plate 17 having a phosphor layer is supported by
a support 51 provided in the bell jar 50. The support 51 is spaced
away from the crucible 55 and the boat 62 by about 20 cm to 30
cm.
Then the bell jar 50 is lowered. The leak valves 61 and 64 are
closed. A rotary pump 65 is started in its operation and a valve 66
is opened whereby the bell jar 50 is preliminarily evacuated. The
degree of the preliminary evacuation is checked by a Geissler tube
67 and, when the degree of vacuum has reached approximately
10.sup.-.sup.3 mm Hg, the valve 66 is changed over to a diffusion
pump 68. Then, a main valve 69 is opened and the degree of vacuum
in the bell jar 50 is increased to 2 .times. 10.sup.-.sup.6 mm Hg
by the diffusion pump 68. This degree of vacuum is checked by a
gauge 70.
After the degree of vacuum in the bell jar 50 has reached the
aforementioned value, evaporation commences. The heater 56 is
heated with voltage V.sub.2 of a power source 72 being set at 7V
and with electric current A.sub.2 flowing through an ammeter 75
being set at 80A. Currents of thermions emitted from the heater 56
are bent by an electric field which is formed by the electrode 54
when voltage V.sub.1 of a power source 71 is made 5KV and electric
current A.sub.1 flowing through an ammeter 74 is made 50mA. The
bent currents of thermions concentrate upon the materials 57 and
58, striking and heating them.
A shutter 59 is closed and the materials 57 and 58 are pre-heated
for 2 to 3 minutes. By this pre-heating, gasses contained in the
materials 57 and 58 escape therefrom. Aluminum 58 melts and a part
thereof penetrates into boron carbide 57 to from a crossed part of
the two materials. After pre-heating, the shutter 59 is opened and
the voltage of the power source 71 is gradually increased from 5 KV
to 8 KV during about 5 minutes. Then, aluminum 58 which is of a
lower melting point first evaporates on the phosphor layer of the
face plate 17, forming the aforementioned metal backing layer 30
with a thickness of 1500A.
The aforementioned 8 KV voltage is maintained for a further 5
minutes. The mixed part of the two materials then evaporates to
form the crossed layer 31 in which aluminum and boron carbide are
mixed together with the above described composition ratio gradient.
The crossed layer 31 is continuously formed without having a
definite boundary between the layer 31 and the metal backing layer
30 with a thickness of 500A.
Heating is further continued and all the aluminum evaporates. Then,
the remaining boron carbide 57 evaporates to form the electron
scattering prevention layer 32 continuously on the crossed layer 31
without having a definite boundary between the two layers with a
thickness of 2500A.
When the boron carbide layer 32 has reached the aforementioned
predetermined thickness, electric current flows through the boat 62
to heat it with voltage V.sub.3 of a power source 73 being set at
2V and with electric current A.sub.3 flowing through an ammeter 76
being set at 100 mA. Lithium fluoride 63 on the boat 62 evaporates
by heating on the boron carbide layer 32 with a thickness of 1000A.
A collector electrode 60 is provided to absorb leaking thermions
and charged evaporation material molecules and maintained at earth
potential or a suitably biased potential.
When the lithium fluoride layer 33 has reached the aforementioned
thickness, evaporation is stopped. About 5 minutes later, the main
valve 69 is closed and the leak valve 61 is opened. Atmosphere is
introduced into the bell jar 50 which is then lifted up to enable
the face plate 17 to be taken out. It is to be noted that although
the face place 17 is not specially heated, temperature of the face
plate 17 rises to about 50.degree.C above room temperature due to
factors such as radiant heat. The face plate 17 which has been
taken out of the bell jar 50 is heated in the air at a temperature
of 425.degree.C for about one hour so as to frit-weld it with the
funnel part.
In the foregoing embodiments, the present invention has been
described with reference to a case in which the invention is
applied to a post-acceleration color television picture tube.
However, the invention is not limited to this but it is applicable
to electron beam devices in which scattering of electrons caused by
striking electron beams should be held to the minimum, particularly
general cathode-ray tubes. Moreover, various modifications and
variations of the invention will be apparent to those skilled in
the art without departing from the scope of which is not forth in
the appended claims.
* * * * *