U.S. patent number 3,765,883 [Application Number 05/111,626] was granted by the patent office on 1973-10-16 for organic photoconductors sensitized with free radical liberators and organometallic compounds.
This patent grant is currently assigned to Canon Kabushiki Kaisha. Invention is credited to Ichiro Endo, Teruo Yamanoughi.
United States Patent |
3,765,883 |
Endo , et al. |
October 16, 1973 |
ORGANIC PHOTOCONDUCTORS SENSITIZED WITH FREE RADICAL LIBERATORS AND
ORGANOMETALLIC COMPOUNDS
Abstract
A photosensitive material suitable for electrophotography is
composed mainly of a free radical former capable of producing free
radical by a radiation energy (F) and an organic photoconductive
material (OPH) treated with a radiation energy in the presence of
an organometallic compound (OM). If desired, a dye base compound or
an organic colorization component may be added thereto. The
photosensitive material may be produced by applying a radiation
energy to a formulation containing F, OPH and OM.
Inventors: |
Endo; Ichiro (Tokyo,
JA), Yamanoughi; Teruo (Fujisawa, JA) |
Assignee: |
Canon Kabushiki Kaisha (Tokyo,
JA)
|
Family
ID: |
27278661 |
Appl.
No.: |
05/111,626 |
Filed: |
February 1, 1971 |
Foreign Application Priority Data
|
|
|
|
|
Apr 2, 1970 [JA] |
|
|
45/9836 |
Apr 2, 1970 [JA] |
|
|
45/9838 |
Apr 14, 1970 [JA] |
|
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45/31850 |
|
Current U.S.
Class: |
430/80; 430/81;
430/83 |
Current CPC
Class: |
G03G
5/09 (20130101); G03G 5/0698 (20130101); G03G
5/0662 (20130101) |
Current International
Class: |
G03G
5/04 (20060101); G03G 5/09 (20060101); G03G
5/06 (20060101); G03g 005/06 () |
Field of
Search: |
;96/1,1.5,1.6,35.1,115,115P,90 ;204/159.24 |
References Cited
[Referenced By]
U.S. Patent Documents
Primary Examiner: Martin, Jr.; Roland E.
Claims
We claim:
1. A sensitized electrographic photosensitive member which
comprises a support having coated thereon a layer of
photoconductive photosensitive material, said layer comprising an
organic photoconductive material, a free radical former capable of
producing free radicals for sensitizing said organic
photoconductive material when excited by radiation energy having
ultraviolet radiation and an organometallic compound incapable of
liberating free radicals under the exposure used to sensitize said
layer but capable of catalyzing the sensitizing ability of the
radical former, said support having been exposed to said radiation
energy to sensitize said layer.
2. A photosensitive material according to claim 1 in which the
organometallic compound is at least one member selected from the
group consisting of alkyl metallic compounds, aryl metallic
compounds, and alkylaryl metallic compounds of a metal element of
Group IV B or Group V B of the Periodic Table.
3. A photosensitive material according to claim 2 in which the
metal element of Group IV B is a member selected from the group
consisting of Ge, Sn and Pb.
4. A photosensitive material according to claim 2 in which the
metal element of Group V B is a member selected from the group
consisting of P, As, Sb and Bi.
5. A photosensitive material according to claim 2 in which the aryl
metallic compound is one of triphenyl metallic compound and
tetraphenyl metallic compound.
6. A photosensitive material according to claim 1 in which the
organometallic compound is a cyclopentadienyl metallic compound of
at least one transition metal element selected from the group
consisting of Group III A, IV A, V A, VI A, VII A and VIII A of the
Periodic Table.
7. A photosensitive material according to claim 6 in which the
transition metal element of Group III A of the Periodic Table is a
member selected from the group consisting of Sc, Y, La, Ce, Pr, Nd,
Sm, Gd, Dy, Er and Yb.
8. A photosensitive material according to claim 6 in which the
transition metal element of Group IV A of the Periodic Table is a
member selected from the group consisting of Ti, Zr and Hf.
9. A photosensitive material according to claim 6 in which the
transition metal element of Group V A of the Periodic Table is a
member selected from the group consisting of V, Nd and Ta.
10. A photosensitive material according to claim 6 in which the
transition metal element of Group VI A is a member selected from
the group consisting of Cr, Mo, W and U.
11. A photosensitive material according to claim 6 in which the
transition metal element of Group VII A is a member selected from
the group consisting of Mn, Tc and Re.
12. A photosensitive material according to claim 6 in which the
transition metal element of Group VIII A is a member selected from
the group consisting of Fe, Co, Ni and Ru.
13. A photosensitive material according to claim 1 in which the
content of the organometallic compound is 10.sup.-.sup.3 - 10
percent by weight based on the organic photoconductive
material.
14. A photosensitive material according to claim 1 in which the
content of the free radical former is 1 - 30 percent by weight
based on the organic photoconductive material.
15. A photosensitive material according to claim 1 in which a
sensitizing material is incorporated in a mixture of a free radical
former and an organic photoconductive material reactively treated
by a radiation energy.
16. A photosensitive material according to claim 15 in which the
sensitizing material is Lewis acid.
17. A photosensitive material according to claim 15 in which the
sensitizing material is a sensitizing dye.
18. A photosensitive material according to claim 15 in which the
sensitizing material is a Lewis acid and a sensitizing dye.
19. A photosensitive member according to claim 1 wherein at least
one organometallic compound is selected from the group consisting
of triphenylbismuthine, triphenylphosphine, tetraphenylarsine,
ferrocene and cobaltocene.
20. A photosensitive member according to claim 1 including at least
one organic photosensitive material selected from the group
consisting of vinyl carbazoles, aromatic amine derivatives,
diphenylmethane compounds and triphenylmethane compounds.
21. A photosensitive material according to claim 20 in which the
vinyl carbazole is at least one member selected from the group
consisting of poly-9-vinylcarbazole, bromine substituted
poly-9-vinylcarbazole and iodine substituted
poly-9-vinylcarbazole.
22. A photosensitive material according to claim 20 in which the
vinyl carbazole is a member selected from the group consisting of
9-vinylcarbazole copolymer, bromine substituted 9-vinylcarbazole
copolymer and iodine substituted 9-vinylcarbazole copolymer.
23. A photosensitive member according to claim 1 including at least
one free radical former selected from the group consisting of
polyhalogen containing compound, carbonyl compound, organic sulfur
compound, peroxide, azo compound, and diazo compound.
24. A photosensitive material according to claim 23 in which the
poly-halogen containing compound is a compound of the formula
##SPC10##
where R is selected from the group consisting of hydrogen, alkyl,
chlorine, bromine, iodine, ##SPC11##
where R.sub.1 is selected from the group consisting of substituted
or unsubstituted alkyl, aryl and hetrocyclic residue; X, Y and Z
are, similar or dissimilar, selected from the group consisting of
hydrogen, alkyl, Cl, Br and I and at least one of X, Y and Z is
halogen atom.
25. A photosensitive material according to claim 24 in which the
polyhalogen containing compound is carbon tetrabromide.
26. A photosensitive material according to claim 24 in which the
polyhalogen containing compound is bromoform.
27. A photosensitive material according to claim 24 in which the
polyhalogen containing compound is iodoform.
28. A photosensitive material according to claim 24 in which the
polyhalogen containing compound is a halogenated organic
sulfoxide.
29. A photosensitive material according to claim 24 in which the
polyhalogen containing compound is a halogenated organic sulfone
compound.
30. A photosensitive member according to claim 1 wherein said free
radical former is a polyhalogen containing compound and said
organic photoconductive material is a vinylcarbazole.
31. A photosensitive member according to claim 1 including a
colorization component selected from the group consisting of a dye
base or an organic colorization component capable of forming a
coloring material by reaction with said free radical former upon
radiation excitation.
32. A photosensitive material according to claim 31 in which the
dye base compound is selected from the group consisting of leuco
bases, carbinol bases, styryl dye bases, cyanine dye bases,
merocyanine dye bases and leuco dihydroanthracenes.
33. A photosensitive material according to claim 32 in which the
leuco base is a member selected from the group consisting of leuco
bases of triphenylmethane dye and leuco bases of diphenylmethane
dye.
34. A photosensitive material according to claim 32 in which the
carbinol base is selected from the group consisting of carbinol
bases of triphenylmethane dye and carbinol bases of diphenylmethane
dye.
35. A photosensitive material according to claim 31 in which the
organic colorization component is a member selected from the group
consisting of arylamines, carbazoles, indoles, 1,3,4-oxadiazoles,
1,3,4-triazoles, imidazoles, pyrazolines, aminophenyl substituted
oxazoles, benzidines, 1,3-diphenyltetrahydroimidazoles, phenazines,
acridines, acyl hydrazone derivatives, quinoxalines,
N-di-substituted amino containing arylideneazines, pyridines,
quinolines, ethylene derivatives, and spiropyran compounds.
36. A photosensitive material according to claim 35 in which the
arylamine is a compound of the formula: ##SPC12##
where R is a member selected from the group consisting of hydrogen,
alkyl, aryl and aralkyl (substituted or unsubstituted) and R.sub.1
is a member selected from the group consisting of phenyl,
.alpha.-naphthyl and .beta.-naphthyl and R.sub.2 is a member
selected from the group consisting of alkyl, aryl and aralkyl
(substituted or unsubstituted).
37. A photosensitive material according to claim 35 in which the
carbazole is a compound of the formula: ##SPC13##
where R is a member selected from the group consisting of hydrogen,
alkyl, alkenyl, aralkyl and aryl (substituted or unsubstituted) and
R.sub.1 and R.sub.2 are, similar or dissimilar, selected from the
group consisting of hydrogen, alkyl, alkenyl, aralkyl, alkoxy,
halogen, and dialkylamino.
38. A photosensitive material according to claim 35 in which the
indole is a compound of the formula: ##SPC14##
where R is a member selected from the group consisting of hydrogen,
alkyl aralkyl and aryl (substituted or unsubstituted) and each
R.sub.3 is, similar or dissimilar, selected from the group
consisting of hydrogen, alkyl, alkoxy, halogen and dialkylamino.
Description
BACKGROUND OF THE INVENTION
1. Field of the Invention
This invention relates to a photosensitive material and preparation
of said photosensitive material. More particularly, this invention
relates to photosensitive material mainly containing an organic
photoconductive material and a free radical former capable of
producing a free radical by exciting with a radiation energy
subjected to a radiation energy in the presence of an
organometallic compound and a method of producing said
photosensitive material.
2. Description of the Prior Art
As electrostatic photographic photosensitive materials, there have
been used metallic selenium and selen alloys for indirect
electrostatic photography and metallic oxides such as zinc oxide
for direct electrostatic photography, and they are widely used for
reproduction apparatus. On the contrary, organic photoconductive
materials are far better than selenium and zinc oxide in points of
transparency, flexibility, light weight, film shapability,
selectivity of charging polarity, and surface smoothness, but
organic photoconductive materials have not been practically used
for electrostatic photography. This is due to that the
photosensitivity of organic photoconductive materials is remarkably
lower than that of selenium and zinc oxide and, therefore, a strong
light source is necessary for image-wise exposure after charging.
As organic photoconductive materials, there have been known, for
example, condensed polynuclear aromatic compounds such as
anthracene, pyrene, perylene and the like, heterocyclic compounds
such as triphenyl pyrazoline derivatives, acyl hydrazone
derivatives and high polymers such as poly-N-vinylcarbazole. It has
been recently contemplated to enhance the photosensitivity of the
above mentioned conventional photoconductive materials of low
sensitivity by using organic synthetic means. As the result,
several useful photoconductive materials have been found. For
example, they are brominated poly-N-vinylcarbazole disclosed in
Japanese Patent Publication No. 25230/1967,
poly-3,6-diiodo-9-vinylcarbazole disclosed in Japanese Patent
Publication No. 7592/1968, poly-N-vinyl-3-aminocarbazole disclosed
in Japanese Patent Publication No. 9639/1967, and
polyvinylanthracene disclosed in Japanese Patent Publication No.
2629/1968. However, these photoconductive materials alone are not
of high photosensitivity and therefore, they are used together with
a spectral sensitizing dye for practical use. For example, a
brominated polyvinylcarbazole is combined with a certain triaryl
carbonium salt dye to give a photosensitivity comparable with that
of zinc oxide sensitized by dye. As are clear from the above
mentioned example, the organic photoconductive materials and the
sensitizing dye combined therewith for sensitization are usually
prepared by special and complicated organic syntheses and
purification. Therefore, even if there is obtained high
sensitivity, there remain economical and practical problems.
The prevent inventors have now found that organic photoconductive
materials can be sensitized by a simple sensitizing treatment to
give a high sensitivity comparable with or higher than that of
conventional selenium or zinc oxide (dye-sensitized).
In a printing-out recording material known as free radical system,
there is used a free radical former capable of producing free
radical when excited by radiation energy, but such photosensitive
material or recording material are low in stability. This is due to
the free radical former used. For example, when as the free radical
former, a polyhalogen compound such as carbon tetrabromide is
employed, unreacted carbon tetrabromide is essentially present in a
photosensitive layer of the photosensitive material or recording
material and carbon tetrabromide is so volatile, unstable and
poisonous that such photosensitive material or recording material
can not be practically used.
According to the present invention it is possible to solve such
drawbacks and provide a highly sensitive, economical and chemically
stable photosensitive material for electrostatic photography.
SUMMARY OF THE INVENTION
The photosensitive material according to this invention is composed
mainly of a free radical former capable of producing free radical
by exciting with a radication energy and an organic photoconductive
material irradiated with a radiation energy in the presence of an
organometallic compound.
According to another aspect of this invention, the photosensitive
material may additionally contain a dye base compound and/or an
organic colorization component.
According to a further aspect of this invention, the above
mentioned photosensitive material may be prepared by applying a
radiation energy, if desired, together with heat to the composition
containing the above mentioned ingredients.
According to still another aspect of this invention, a
photosensitive member may be produced by applying a radiation
energy to the above mentioned ingredients present on a support.
An object of this invention is to provide an electrostatic
photosensitive material highly sensitized and method for preparing
the same.
Another object of this invention is to provide a highly sensitive
organic photoconductive photosensitive material for electrostatic
photography comprising a free radical former capable of producing
free radical by a radiation energy and an organic photoconductive
material subjected to a radiation energy in the presence of
organometallic compound, and method for production thereof.
A further object of this invention is to provide an economical and
highly sensitive organic photoconductive photosensitive material
which is free from complicated organic syntheses and purification
step and can be obtained by a simple sensitizing treatment, and
method for production thereof.
Still another object of this invention is to provide a chemically
stable and highly sensitive organic photosensitive material and
method for production thereof.
DETAILED DESCRIPTION
Organic photoconductive materials used in this invention may be
selected from the following wide material sources.
A. as vinylcarbazoles, there may be mentioned, for example,
vinylcarbazole, poly-9-vinylcarbazole, 9-vinylcarbazole copolymer,
3-nitro-9-vinylcarbazole copolymer,
3-N-methylamino-9-vinylcarbazole copolymer, nitrated
poly-9-vinylcarbazole, bromine substituted 9-vinylcarbazole
copolymer such as 3-bromo-9-vinylcarbazole copolymer, brominated
9-vinylcarbazole copolymer and 3,6-dibromo-9-vinylcarbazole
copolymer, poly-N-vinyl-3-aminocarbazole, bromine substituted
poly-9-vinylcarbazole such as poly-3-bromo-9-vinylcarbazole,
poly-3,6-dibromo-9 -vinylcarbazole and brominated-N-vinylcarbazole,
iodine substituted poly-9-vinylcarbazole such as
3-iodo-9-vinylcarbazole copolymer and
poly-3,6-diiodo-9-vinylcarbazole, iodine substituted
9-vinylcarbazole copolymer such as 3-iodo-9-vinylcarbazole
copolymer, poly-3-benzylideneamino-9-vinylcarbazole,
.alpha.,.omega.-bis-(N-carbazole)-alkane derivative,
vinylanthracene-N-vinyclcarbazole copolymer, and 2- (or 3-)
vinyl-9-alkyl carbazole homopolymer or copolymer wherein alkyl is
primary alkyl group such as methyl, ethyl and propyl.
B. as aromatic amino derivatives, there may be mentioned, for
example, aminopolyphenyl, allylideneazine,
N,N'-diallyl-N,N'-dibenzyl phenylenediamine,
N,N,N',N'-tetrabenzyl-p-phenylenediamine,
N,N'-diphenyl-p-phenylenediamine,
N,N'-dinaphthyl-p-phenylenediamine, and
4,4'-bis-dimethylaminobenzophenone.
C. as diphenylmethanes and triphenylmethanes, there may be
mentioned, for example, diphenylmethane dye leuco base and
triphenylmethane dye leuco base.
D. as compounds having heterocyclic ring, there may be mentioned,
for example, oxadiazole, 5-aminothiazole, 4,1,2-triazole,
imidazolone, oxazole, imidazole, pyrazoline, imidazolidine,
polyphenylene thiazole, 1,6-methoxyphenazine, and
pyrazolinopyrazoline derivatives.
E. as compounds having a condensed ring, there may be mentioned,
for example, benzthiazole, benzimidazole, benzoxazole derivatives
such as 2-(4'-diaminophenyl)-benzoxazole,
2-(4'-dimethylaminophenyl)benzoxazole, aminoacridine, quinoxaline,
diphenylene hydrazone compound, pyrrocoline derivatives and
9,10-dihydroanthracene derivatives.
F. as compounds having a double bond, there may be mentioned, for
example, acylhydrazone, ethylene derivatives,
1,1,6,6-tetraphenylhexatriene and
1,1,5-triphenyl-pent-1-ene-4-yn-3-ol.
G. as condensation products, there may be mentioned, for example,
condensation product of aldehyde and aromatic amine, the reaction
product of a secondary aromatic amine with an aromatic halide, and
poly pyromethanoimido poly-p-phenylene-1,3,4-oxadiazole.
H. as vinyl polymers (excluding polyvinylcarbazole), there may be
mentioned, for example, .alpha.-alkylacrylic acid amide polymer,
polyvinylacridine,
poly-[1,5-diphenyl-3-(4-vinylphenyl)-2-pyrazoline],
poly(1,5-diphenyl)-pyrazoline, polyacenaphthylene, nuclear
substituted polyacenaphthylene, polyvinylanthracene, and
poly-2-vinyldibenzthiophene. (I) As organic photoconductive
oligomers, there may be mentioned, for example, compound having the
formula ##SPC1##
wherein l, m and n are each 0 or 1, and l .gtoreq. m .gtoreq. n.
For example, as a five ring compound, there may be mentioned
p-bis(2-phenyl-4-thiazolyl) benzene; as a seven ring compound,
2,4-bis[4-(2-phenyl-4-thiazolyl)-phenyl] thiazole; as a nine ring
compound, 1,4-bis[4-{4-(2-phenyl-4-thiazolyl)-phenyl}
thiazolyl]benzene. Among these organic photoconductive materials,
there are preferably used vinylcarbazole and its derivatives,
aromatic amino derivative, and diphenylmethane and triphenylmethane
derivatives. A free radical former employed in this invention is a
material capable of producing a free radical by excitation with a
radiation energy. A free radical former can be selected from the
following classes of widely ranged substances.
A. as polyhalogen containing compounds, there may be used a
compound of the general formula: ##SPC2##
wherein R represents hydrogen, alkyl, halogen atom selected from
Cl, Br and I, ##SPC3## wherein R.sub.1 represents substituted or
unsubstituted alkyl, aryl or heterocyclic group; X, Y and Z are
similar or dissimilar, and hydrogen, alkyl or halogen atom selected
from Cl, Br and I, at least one of X, Y and Z is halogen atom, for
example, CBr.sub.4, CI.sub.4, CHI.sub.3, C.sub.2 Cl.sub.6,
CBrCl.sub.3, CCl.sub.4, CHBr.sub.3, CHCl.sub.3, C.sub.2 BR.sub.6,
C.sub.2 HBr.sub.5, C.sub.6 H.sub.5 CBr.sub.3, CIBr.sub.3,
CICl.sub.3, CHICl.sub.2, CHIBr.sub.2, CBrCl.sub.3, CHBrCl.sub.2,
2,2,2-trichlorotoluene, 2,2,2-tribromo acetophenone,
1,1,1-tribromo-2-methyl-2-propanole, 1,1,2,2-tetra bromoethane,
2,2,2-tribromoethanole, CH.sub.2 Cl.sub.2, CH.sub.2 Br.sub.2,
CH.sub.2 I.sub.2, ClCH.sub.2 CH.sub.2 Cl, BrCH.sub.2 CH.sub.2 Br,
CH.sub.3 CHCl.sub.2, CH.sub.3 CHBr.sub.2, CHCl.sub.2 CHCl.sub.2,
ClCH=CHCl, CHCl=CCl.sub.2, Br(CH.sub.2).sub.3 Br,
Br(CH.sub.2).sub.4 Br, Br(CH.sub.2).sub.5 Br and Br(CH.sub.2).sub.6
Br; halogenated organic sulfoxide such as
pentabromodimethylsulfoxide and hexabromodimethylsulfoxide,
halogenated organic sulfone compound such as
hexabromodimethylsulfone, trichloromethylphenyl sulfone,
tribromomethylphenylsulfone, trichloromethyl-parachlorophenyl
sulfone, tribromomethyl-paranitrophenyl sulfone,
2-trichloromethyl-benzoxathiazolyl sulfone,
4,6-dimethylpyrimidyl-2-tribromomethyl sulfone, tetrabromodimethyl
sulfone, 2,4-dichlorophenyltrichloromethyl sulfone,
2-methyl-4-chlorophenyl trichloromethyl sulfone,
2,5-dimethyl-4-chlorophenyltrichloromethyl sulfone,
2,4-dichlorophenyl tribromomethyl sulfone, and
bromomethyldibromomethylsulfone.
B. as carbonyl compounds, there may be mentioned, for example,
vicinal polyketaldonyl compounds, .alpha.-carbonyl alcohols,
acryloin ethers, .alpha.-hydrocarbon-substituted acryloins,
polynuclear quinones.
C. as sulfur compounds, there may be mentioned, for example,
alkyldisulfide, aralkyldisulfide, aryldisulfide, aroyldisulfide,
acryldisulfide, cyclic alkyldisulfide, mercaptane, thiole,
metalmercaptide, dithiocarbamates, O-alkylxanthene esters, and
thiuram derivatives.
D. as a peroxide compound, there may be for example, hydroperoxide,
dialkylperoxide, diacrylperoxide and diaroylperoxide.
E. as azo and diazo compounds, there may be mentioned, for example,
azonitrile compound, diazo compound such as p-nitrobenzene
diazonium-p-chlorobenzene sulfonate.
Among these free radical formers, a compound giving an especially
excellent result is a polyhalogen containing compound.
The representative organometallic compounds used in this invention
are alkylmetallic compound, arylmetallic compound,
alkylarylmetallic compound and cyclopentadienyl-metallic compound.
Metals in alkymetallic compound, arylmetallic compound and
alkylarylmetallic compound are metal elements in the Groups IVB and
VB of the Periodic Table. The metals are preferably Ge, Sn, Pb, P,
As, Sb and Bi. The metal in cyclopentadienyl compound is transition
metal elements in the Groups IIIA, IVA, VA, VIA, VIIA and VIIIA.
The transition metal elements as the Group IIIA element are Sc, Y,
La, Ce, Pr, Nd, Sm, Gd, Dy, Er and Yb; as the Group IVA element Ti,
Zr and Hf; as the Group VA element V, Nd and Ta; as the Group VIA
element Cr, Mo, W and U; as the Group VIIA element Mn, Tc and Re;
and as the Group VIIIA element Fe, Co, Ni and Ru.
The examples for these organometallic compound are the
followings.
As the alkylmetallic compound, arylmetallic compound and
alkylarylmetallic compound, there may be mentioned, for example,
triphenylmetallic compound such as triphenyl bismuthine,
triphenylstibine, triphenylarsine and triphenylphosphine,
tetraphenylmetallic compound such as tetraphenyldistibine,
tetraphenyllead, tetraphenyltin, tetraphenylarsine and
tetraphenylgermanium, benzyltriphenyllead, trimethyltriphenylditin,
hexamethylditin and hexaphenylditin. The alkyl group, aryl group or
alkylaryl group is attached to the metal element so as to satisfy
the valency of the metal element to form a metal - carbon bond. As
organometallic compounds having the Group IIIA element, there may
be mentioned, for example, cyclopentadienyl compounds of scandium,
yttrium, lanthanum, cerium, praseodymium, neodymium, samarium,
gadolinium, dysprosium, erbium and ytterbium. As an organometallic
compound having the Group IVA transition elements, there may be
mentioned, for example, bis (cyclopentadienyl) titanium,
dihalogenated bis(cyclopentadienyl) titanium, bis
(cyclopentadienyl) titanium diaryl, and bis (cyclopentadienyl)
zirconium dibromide. As an organometallic compound having the Group
VA transition element, there may be mentioned, for example, bis
(cyclopentadienyl) vanadium dihalide, bis (cyclopentadienyl)
niobium tribromide, bis (cyclopentadienyl) tantalum tribromide, bis
(cyclopentadienyl) vanadium, and cyclopentadienyl vanadium
tetracarbonyl.
As an organometallic compound having the Group VIA transition
element, there may be mentioned, for example, bis
(cyclopentadienyl) chromium, bis (cyclopentadienyl)- .mu.
-pentacarbomonooxide-bimolybdenum, bis (cyclopentadienyl)- .mu.
-hexacarbonmonooxide-bitungsten, tris (cyclopentadienyl) uranium
chloride.
As an organometallic compound having the Group VIIA transition
element, there may be mentioned, for example, bis
(cyclopentadienyl) manganese, and hydrogenated bis
(cyclopentadienyl) rhenium.
As an organometallic compound having the Group VIIIA transition
element, there may be mentioned, for example, bis
(cyclopentadienyl) iron [ferrocene], bis (cyclopentadienyl) iron
dicarbonyl, cyclopentadienyliron dicarbonyl chloride,
cyclopentadienylirondicarbonyl cyanate, bis (cyclopentadienyl)
cobalt bromide, bis (cyclopentadienyl) cobalt [cobaltocene],
cyclopentadienyl cobalt dicarbonyl, bis (cyclopentadienyl) nickel
[nickelocene], cyclopentadienylnickelnitrosyl, bis
(cyclopentadienyl) ruthenium and bis (cyclopentadienyl)
ruthenate.
One or more of the organometallic compounds may be used. Among the
above-mentioned organometallic compounds, there are preferably used
triphenylbismuthine, triphenylphosphine, tetraphenylarsine,
ferrocene and cobaltocene.
The radiation energy source used in this invention is selected
depending upon organometallic compounds, free radical formers,
organic photoconductive materials and/or solvent used. Any kind of
light source may be used as far as it can produce free radical from
a free radical former in the sensitization system. Preferably a
light source emitting a large amount of ultraviolet ray or near
ultraviolet ray such as mercury (low pressure, high pressure or
super high pressure), metal halide lamp and xenon lamp is used. If
desired, a radiation energy such as ultraviolet ray can be applied
together with heat to accelerate the decomposition of free radical
formers by selecting the temperature at which the radiation energy
is applied and the time of irradiation in such a manner that there
are balanced the degree of sensitization and undesirable secondary
effects such as remarkable colorization and gellation. Furthermore,
it is clear that the decomposition of free radical former and the
accompanying chemical reaction can be controlled by adjusting the
time of applying the radiation energy. The effective wave length of
radiation energy is, for example, illustrated below.
Halogen compound-300 - 400 m.mu.
Carbonyl compound-360 - 380 m.mu.
Organic sulfur compound-280 - 400 m.mu.
Peroxide-300 - 400 m.mu.
Azo compound-340 - 400 m.mu.
Among them, effective wave length for some halogen compounds is
shown below.
Cbr.sub.4 -lower than 400 m.mu.
Chbr.sub.3, CH.sub.2 Br.sub.2 -lower than 330 m.mu.
CbrCl.sub.3 -lower than 400 m.mu.
Chi.sub.3 -lower than 400 m.mu.
The sensitization treatment may be effected as follows. An organic
photoconductive material, a free radical former and an
organometallic compound are brought into coexistence to form a
uniform solution by using an appropriate solvent and a radiation
energy is applied to the resulting solution for sensitization
treatment. In this case, if an organometallic compound is not used,
it is very difficult to select an appropriate solvent since the
solvent should have a sufficient solubility to the organic
photoconductive material and the free radical former, and
furthermore such a solvent which reduces the sensitization effect
should be avoided. For example, in case of using
poly-N-vinylcarbazole as organic photoconductive material and
carbon tetrabromide as free radical former, benzene and
monochlorobenzene can enhance the sensitization effect while
tetrahydrofuran and dioxane reduce the sensitization effect.
The present inventors have found that the reduction of
sensitization effect caused by solvent is remarkably weakened by
incorporating a small amount of an organometallic compound in the
reaction system. For example, there may be used methylene chloride,
chloroform, toluene and xylene which are usually not preferable,
and further tetrahydrofuran and dioxane which are extremely
unfavorable can also be sufficiently used. Thus the selection range
of solvent is very broadened.
The use of organometallic compound results in high sensitivity. The
sensitizing effect of the organometallic compounds is illustrated
in the Examples appearing later. When a solution containing a free
radical former and an organic photoconductive material has a color
or the solution contains additionally a dye base compound or an
organic colorization component, the sensitization effect can be
visually observed since the colorization of the solution is
markedly accelerated.
The sensitization treatment may be carried out by various methods
such as, for example, applying a radiation energy to a solution
comprising an organometallic compound and a free radical former
followed by mixing with a solution of an organic photoconductive
solution, or applying a radiation energy to each of a solution
containing a free radical former and an organic photoconductive
material and a solution containing a free radical former and an
organometallic compound followed by mixing these two solutions, or
applying a radiation energy to a solution containing an organic
photoconductive material, a free radical former and an
organometallic compound coated on a base support. Furthermore, a
photosensitive material of higher sensitivity can be obtained by
additionally incorporating a dye base compound or organic
colorization component thereto. Particularly, in case of applying a
radiation energy to a solution containing an organic
photoconductive material, a free radical former, an organometallic
compound and, if desired, a dye base compound and/or an organic
colorization component which is coated on a base support, any
solvent can be selected as far as the solvent can dissolve the
organic photoconductive material. This free selection of solvent is
very valuable.
The change caused by applying a radiation energy to organic
photoconductive material, free radical former and organometallic
compound is considered to occur in the following sequence.
Assuming that the free radical former is a polyhalogen compound of
the formula
R - CX.sub.3
where R is hydrogen, halogen, alkyl or aryl (substituted or
unsubstituted) and each X may be, the same or different, chlorine,
bromine or iodine, when the polyhalogen compound is exposed to a
sufficient amount of radiation energy, the following reaction
proceeds:
R-CX.sub.3 .fwdarw. R-CX.sub.2 + X.sup.. ( 1)
the X thus formed (halogen free radical) extracts hydrogen from a
medium to form secondarily HX (halogen acid) as follows.
X.sup.. H HX (2)
the R-CX.sub.2 (organic free radical) is considered as a chain
carrier causing reactions (1) and (2) above as chain reaction.
When an organometallic compound (M) is present in the reaction
system, the radical formation efficiency by a radiation energy is
increased as shown in the following formula:
R-CX.sub.3 .sup.M R-CX.sub.2 + X.sup.. ( 3)
it is considered that the organometallic compound works as a
reaction accelerator or catalyst.
Therefore, the reactions shown in Formulas (1) and (2) can be
effectively caused and the reaction time is shortened by the action
of the organometallic compound and simultaneously the reaction
conditions such as selectivity of solvent, tolerable amounts of
impurity, and temperature range for reactions of Formulas (1) and
(2) can be broadened. And further the addition of organometallic
compound results in improvement in photosensitivity.
According to the present invention, the above-mentioned
organometallic compound and halogen compound are added to a
solution of organic photoconductive material and the resulting
solution is subjected to a radiation energy sufficient to cause the
reactions in Formulas (1) and (2) to sensitize remarkably the
organic photoconductive material. It has now been found that the
above mentioned sensitizing treatment can improve photosensitivity
of photosensitive materials for electrophotography, but the
mechanism of sensitization is not yet fully understood. The amount
of the free radical former used in this invention is appropriately
selected depending upon each particular photoconductive material
and amount of radiation energy. In general, the amount of the free
radical former is preferably 1 - 30 percent by weight. The amount
of organometallic compound used in this invention is appropriately
selected depending upon each particular photoconductive material,
free radical former, and amount of radiation energy. In general,
the amount of the organometallic compound preferably ranges from
10.sup.-.sup.3 to 10 percent by weight.
When the organic photoconductive material itself has film
shapability, it is not necessary to use a binder resin or
plasticizer, but when it lacks in film shapability, it is desirable
to use a binder resin of 30 - 100 percent by weight based on the
photoconductive material. For the purpose of improving the property
of film, 5 - 100 percent by weight plasticizer may be added.
Representative binder resins are polystyrene resin, polyvinyl
chloride resin, phenolic resin, polyvinyl acetate resin, polyvinyl
acetal resin, epoxy resin, xylene resin, alkyd resin, polycarbonate
resin and acrylonitrile-styrene resin.
Representative plasticizers are dioctylphthalate,
tricresylphosphate, diphenyl chloride, methyl naphthalene,
p-terphenyl and diphenyl.
In order to further enhance photosensitivity of the photosensitive
material for electrography obtained by the invention and adjust the
spectral sensitivity characteristics, it is effective to add a dye
sensitizer or Lwiss acid usually used in electrophotography singly
or in combination. Furthermore, it is also effective for increasing
photosensitivity of the photosensitive material to add a dye base
compound capable of forming a coloring matter by the reaction with
a free radical former caused by a radiation energy. In addition, it
is effective to add an organic colorization component capable of
forming a coloring material by the reaction with a free radical
former caused by a radiation energy. These dye base compound and
organic colorization components can produce a far higher
sensitization effect than that obtained by usual dye
sensitizer.
Representative dye base compounds are shown below.
As leuco base or carbinol base, there may be mentioned, for
example, leuco base of triphenylmethane dye such as leuco malachite
green, leuco crystal violet, leuco methylviolet, leuco opal blue;
carbinol base of triphenylmethane dye such as carbinol
crystalviolet, carbinol methylviolet; leuco base or carbinol base
of diphenylmethane dye having the formula ##SPC4##
where R.sub.1, R.sub.2, R.sub.3 and R.sub.4 represents a member
selected from the group consisting of hydrogen, alkyl, aralkyl and
aryl (substituted or unsubstituted), when X is --H, leuco base,
when X is --OH, carbinol base; such as Michler's hydrol, styryl dye
such as 4-(4-dimethylaminophenyl-1,3-butadienyl)-quinoline,
4-p-dimethylaminostyrylquinoline, 2-p-dimethylaminostyrylquinoline
and 2-p-dimethylaminostyrylquinoline, cyanine dye such as
2-[3-ethyl-2(1H)-quinolylidenepropenyl] quinoline,
2-[2-methyl-3-(3-ethyl-2(3H)-benzothiazolylidene)-propenyl]benzothiazole,
4-[2-(3-ethyl-2(3H)-benzothiazolylideneamino) vinyl]quinoline,
4-(1-ethyl-2(1H)-quinolyldeneamino)quinone,
2-(p-dimethylaminobenzylidene) aminoquinoline, and
4-(p-dimethylaminophenylimino)-cyanomethylquinoline, merocyamine
dye base such as 3-ethyl-5-[(3-ethyl-2(3H)-benzoxazolylidene]
rhodanine, 1-ethyl-3-[(3-ethyl-2(3H)-benzoxazolylidene]-oxyindole,
and
4-[(3-ethyl-2(3H)-benzoxazolylidene)-ethylindene]-3-phenyl-5(4H)-isooxazol
one, leuco dihydroanthracene compound such as
2,7-bis(dimethylamino)-10-p-dimethylaminophenyl-
9,10-dihydro-9,9-dimethylanthracene and 2,7-bis(dimethylamino)
9,10-dihydro-9,9-dimethylanthracene. There may be mentioned the
following compounds as organic colorization components used in this
invention.
As an arylamines there may be mentioned, for example, a compound of
the general formula: ##SPC5##
wherein R represents a member selected from the group consisting of
hydrogen, alkyl, aryl and aralkyl (substituted or unsubstituted),
R.sub.1 represents a member selected from the group consisting of
phenyl, .alpha.-naphthyl and .beta.-naphthyl; R.sub.2 represents a
member selected from the group consisting of alkyl, aryl and
aralkyl (substituted or unsubstituted), such as diphenylamino,
N-methylaniline, N,N-dimethylaniline, N-ethylaniline,
N,N-diethylaniline, phenyl-.alpha.-naphthylamine,
phenyl-.beta.-naphthylamine, triphenylamine and
N-methylidiphenylamine.
B. Carbazoles have the general formula: ##SPC6##
wherein R represents a member selected from the group consisting of
hydrogen, alkyl, alkenyl, aralkyl and aryl (substituted or
unsubstituted), R.sub.1 and R.sub.2 are similar or dissimilar, a
member selected from the group consisting of hydrogen,
alkyl,alkenyl, aralkyl, alkoxy, halogen and dialkylamino.
As such a compound there may be mentioned, for example, carbazole,
N-ethylcarbazole, N-methylcarbazole, N-phenylcarbazole,
N-benzylcarbazole, N-vinylcarbazole, 3,6-dibromo-N-vinylcarbazole,
3-chloro-N-ethylcarbazole, 3-chloro-N-vinylcarbazole,
3-iodo-N-vinylcarbazole and 3-dimethylamino-N-ethylcarbazole.
C. Indoles having the general formula: ##SPC7##
wherein R represents a member selected from the group consisting of
hydrogen, alkyl, aralkyl and aryl (substituted or unsubstituted),
each of R.sub.3 is similar or dissimilar, a member selected from
the group consisting of hydrogen, alkyl, alkoxy, halogen and
dialkylamino.
As such a compound, there may be mentioned, for example, indole,
2-methylindole, 1,2-dimethylindole, 1-phenylindole, 4-chloroindole
and N-vinylindole.
D. As a 1,3,4-oxathiazoles, there may be mentioned, for example,
2,5-bis-[4'-dimethylaminophenyl-1']-1,3,4-oxadiazole,
2,5-bis-[4'-diethylaminophenyl-1']-1,3,4-oxadiazole,
2,5-bis-[4'-n-propylaminophenyl-1']-1,3,4-oxadiazole and
2,5-bis-[4'-cyclohexylaminophenyl-1']-1,3,4-oxadiazole.
E. As 1,3,4-triazoles, there may be mentioned, for example,
1-methyl-2,5-bis-[4'-N,N-diethylaminophenyl-1']-1,3,4-triazole,
2,5-bis-[4'-N,N-diethylaminophenyl-1']-1,3,4-triazole,
2,5-bis-[4'-aminophenyl-1']-1,3,4-triazole and
2,5-bis-[4'-N-ethylaminophenyl-1']-1,3,4-triazole.
F. As imidazoles there may be mentioned, for example,
4-(4'-dimethylaminophenyl)-5-(4"-chlorphenyl)-imidazole,
1-methyl-2-(diethylaminophenyl)-4,5-diphenyl-imidazole,
4-(4'-dimethylaminophenyl)-5-phenyl-imidazole and
2-(4'-dimethylaminophenyl)-4,5-diphenyl-imidazole.
G. As pyrazolines, there may be mentioned, for example,
1,3,5-triphenylpyrazoline, 1,5-diphenyl-3-styryl-pyrazoline,
1,3-diphenyl-5-p-oxyphenyl-pyrazoline, and
1-phenyl-3-p-dimethylaminostyryl-5-p-dimethylaminophenyl-pyrazoline.
H. As aminophenyl substituted oxazoles, there may be mentioned, for
example,
2-(4'-dimethylaminophenyl)-4-(4'-dimethylaminophenyl)-5-(2'-chlor
phenyl)-oxazole,
2-(4'-dimethylaminophenyl)-4-(4'-dimethylaminophenyl)-5-phenyl-oxazole,
and
2-(2'-chlorphenyl)-4-(4'-dimethylaminophenyl)-5-(2'-chlorphenyl)-oxazo
le.
I. As benzidine compounds, there may be mentioned, for example,
ortho-tridine, N,N'-diphenylbenzidine, naphthidine, and
benzidine.
J. As 1,3-diphenyl-tetrahydroimidazoles, there may be mentioned,
for example,
1,3-diphenyl-2-(4'-dimethylaminophenyl)-tetrahydroimidazole,
1,3-diphenyl-2-styryl-tetrahydroimidazole and
1,3-diphenyl-2-styryl-tetrahydroimidazole.
K. As phenazine compounds, there may be mentioned, for example,
1,6-dimethoxyphenazine, and 1,6-dimethylphenazine.
L. As acridine compounds, there may be mentioned, for example,
3,6-bis(diamino)acridine, 3,6-bis(dimethylamino)-acridine and
acridine.
M. As acylhydrazone derivatives, there may be mentioned, for
example, compounds having the formulae ##SPC8##
N. As quinoxaline compounds there may be mentioned, for example,
2,3-bis-(4'-methoxyphenyl)-6-aminoquinoxaline,
2-phenyl-3-(4'-dimethylamino-phenyl)-6-chloro-quinoxaline, and
2-phenyl-3-(4'-dimethylaminophenyl)-6,7-benzoquinoxaline.
O. As arylideneazine compounds containing N-di-substituted-amino
group, there may be mentioned, for example,
bis-4,4-diallyl-aminobenzylideneazine,
bis-4,4-diethylamino-2,2-dimethylbe nzylideneazine,
bis-4,4-dibenzylaminobenzylideneazine, and
bis-4,4-arylmethylaminobenzylideneazine.
P. As pyridine and quinoline compounds, there may be mentioned, for
example, 2-[1,3-dioxohydrindenyl-(2)]quinoline,
2-[4-chlor-1,3-dioxohydrindenyl-(2)]quinoline,
2-[1,3-dioxohydrindenyl-(2)]pyridine, and
4-methyl-2-[1,3-dioxohydrindenyl-(2)]pyridine.
Q. As ethylene derivatives, there may be mentioned, for example,
compounds having the formulae ##SPC9##
R. As spiropyrans, there may be mentioned, for example,
1,3,3-trimethylindolinobenzopyrylspiran,
1,3,3-trimethylindolino-6'-nitrobenzopyrylspiran,
1,3,3-trimethylindolino-6'-nitro-8'-methoxybenzopyrylspiran
and
1,3,3-trimethylindolino-6'-methoxy-8'-nitrobenzopyrylspiran.
According to the present invention, a photosensitive material may
be prepared by applying a radiation energy simultaneously with heat
to a free radical former capable of producing free radical by a
radiation energy and an organic photoconductive material in the
presence of an organometallic compound; or applying a radiation
energy to a solution system containing a free radical former
capable of producing free radical by a radiation energy, an organic
photoconductive material and an organometallic compound; or
applying a radiation energy to a solution system containing a free
radical former capable of producing free radical by a radiation
energy and an organometallic compound and mixing the solution
system thus treated with a solution system containing at least an
organic photoconductive material; or mixing a solution system
containing a free radical former capable of producing free radical
by a radiation energy, an organic photoconductive material and an
organometallic compound irradiated by a radiation energy with a
solution system containing a free radical former and, if desired,
additionally an organometallic compound irradiated by a radiation
energy.
In the above preparation methods, a dye base compound and/or an
organic colorization components may be added to the system.
According to a method of producing a photosensitive member of this
invention, a solution containing an organic photoconductive
material, a free radical former and an organometallic compound
subjected to or to be subjected to a sensitizing treatment by using
a radiation energy may be applied to a transparent or opaque
support by conventional coating methods such as roll coating
method, wire-bar coating method, air-knife method and the like. The
radiation energy may be applied to the solution before or after the
solution is coated on a support. For example, a radiation energy is
applied to the solution coating while the coating is being
continuously formed followed by drying. Furthermore, if desired, a
dye base compound or an organic colorization component may be added
at this stage.
The method of producing a photosensitive member according to this
invention is simple and of high efficiency.
Some examples of this production of photosensitive member are shown
below.
1. A formulation solution mainly containing an organometallic
compound, an organic photoconductive material and a free radical
former is coated on a support and then irradiated by a radiation
energy sufficient to cause a remarkable sensitization in the
resulting coating layer.
2. The formulation solution as in item (1) above is coated on a
support, subjected to a radiation energy sufficient to cause a
remarkable sensitization in the resulting coating layer and dried
while the sensitization in the coating layer is accelerated.
3. The formulation solution as in item (1) above is coated on a
support and simultaneously photo energy and thermal energy are
applied to the coating.
4. The formulation solution as in item (1) above is coated on a
support and simultaneously photo energy and thermal energy are
applied to the coating, and then the resulting coating is dried by
a thermal energy.
The thickness of the resulting photoconductive layer on the support
may be adjusted to a range of from several microns to several tens
microns. For usual purposes, it is less than 10 microns and several
microns.
As the support, there may be used metal sheet such as aluminum,
copper, zinc and silver, paper treated in such a manner that a
solvent does not permeate, aluminum laminate paper, synthetic resin
film in which a surfactant is incorporated, glass on which surface
a metal, metal oxide or metal halide is deposited by the
vapor-deposition, paper and synthetic resin films such as
polyethylene, polypropylene, polyethylene terephthalate,
polystyrene, polyvinyl chloride, ethyl cellulose, cellulose acetate
and polyester. In general, any support having a surface resistivity
lower than that of the photoconductive layer may be used. In other
words, such material having a resistivity of lower than 10.sup.9
.OMEGA., preferably lower than 10.sup.5 .OMEGA. may be used.
All known technique of conventional electrophotographic processes
may be employed. There may be generally used a Carlson process
comprising charging, exposing, developing and fixing steps. For
example, positive charge is accumulated and its potential reaches
150-600 V. by passing the photosensitive member below the corona
discharger charged with +6 KV in the dark several times. Then, from
an appropriate light source such as a tungsten lamp, light is
projected through an adequate positive pattern, then the electric
charge at the exposed region is neutralized. Then, the latent image
thus formed is developed with a negatively charged toner by, for
example, a magnet brush developing method, cascade developing
method or a fur-brush developing method to produce the positive
image. This image may be fixed by heating or passing it through an
appropriate solvent vapor. Liquid developing method may also be
used. In this case, although the liquid developer as necessary
constituents a coloring component and a carrier liquid, it is
possible to add to it a controlling agent and an agent improving
fixing property when desired. Further, the electric charge applied
by corona charging may be a positive charge or a negative
charge.
The following examples are given for illustrating the present
invention, but should not be construed as limitation.
EXAMPLE 1
Poly-9-vinylcarbazole (Luvican M-170, trade name, supplied by
Badische Anilin und Soda Fabrik) 8 g. Carbon tetrabromide 400 mg.
Triphenylbismutin 8 mg. Benzene 200 ml.
To a solution comprising the above ingredients was applied a light
irradiation for 5 minutes by using a photochemical reactor having a
100 watt high pressure mercury lamp produced by Ushio Denki
Kabushiki Kaisha (When the solution excluding triphenylbismutin is
used, the irradiation time for producing the same photosensitivity
was as long as 15 minutes.). The solution thus treated was applied,
in an amount of about 5 g/m.sup.2 as solid matter, to a base paper
(70 g/m.sup.2) subjected to a solvent permeation inhibiting
treatment by coating polyvinyl in an amount of about 2 g/m.sup.2,
and then dried for 5 minutes to form a photosensitive paper. Then
the resulting photosensitive paper was given an uniform negative
charge of about 380 V by corona charging using a charging apparatus
of about 5.5 KV, contacted with an original positive film, exposed
to a 150 watt tungsten lamp at 100 lux.sec, and soaked in a liquid
developer for positive image to produce positive images of high
fidelity to the original image.
When a solution not containing triphenylbismutin was employed, the
required exposure amount was about 250 lux.sec.
When the solution containing the above-mentioned ingredients was
coated on the above-mentioned base paper and irradiated with a high
pressure mercury lamp of 100 watt at a distance of 150 mm for 5
seconds, the resulting photosensitive paper also gave a positive
image of high fidelity to the original image under the reproduction
conditions similar to the above ones while 30 seconds irradiation
was necessary to give the same photosensitivity when the solution
excluding triphenylbismutin was employed.
In the instant Example, the sensitization effect by
triphenylbismutin was able to be measured by the degree of
colorization of the soltuion caused by the light irradiation. That
is, when triphenylbismutin is present, the solution was colorized
to bluish by the light irradiation for 5 minutes while it took 15
minutes to colorize to bluish in the absence of
triphenylbismutin.
When a poly-9-vinylcarbazole obtained by precipitation purification
of the poly-9-vinylcarbazole as mentioned in the above formulation
or obtained by precipitation purification of a
poly-9-vinylcarbazole obtained by polymerizing vinylcarbazole was
employed in place of Luvican M-170 in the instant Example, a 5
minute irradiation can colorize the solution to bluish while blue
colorization was hardly observed and a lowering of photosensitivity
was observed with 5 minute irradiation when the solution excluding
triphenylbismutin.
When 80 mg. of lenco malachite green was added to the
above-mentioned formulation and irradiated for 2 minutes, the
exposure amount producing clear positive images for the resulting
photosensitive paper was 95 lux.sec.
When 200 mg. of N-vinylcarbazole was added to the above-metnioned
formulation and irradiated for 5 minutes, the exposure amount
producing clear positive image for the resulting photosensitive
paper was 90 lux.sec.
For reference, a photosensitive paper obtained by coating a
solution of poly-9-vinylcarbazole above requires an exposure amount
of about 60,000 lux.sec. for producing good positive images. A
commercially available dye-sensitized zinc oxide photosensitive
paper requires about 95 lux.sec. to produce good positive
images.
EXAMPLE 2
Poly-9-vinylcarbazole (Luvican M-170, trade name, supplied by
Badische Anilin und Soda Fabrik, hereinafter called BASF) 4 g.
Acrylonitrile-styrene copolymer (Estylene AS-6INT, trade name,
supplied by Yahata Kagaku) 4 g. Carbon tetrabromide 400 mg.
Triphenylbismutin 16 mg. Methylene chloride 200 ml.
A mixture of the above-metnioned ingredients was used to produce a
photosensitive paper in a way similar to Example 1, the light
irradiation being effected for 5 minutes. The resulting
photosensitive paper was given a uniform negative charge of about
380 V by corona charging by using a charging apparatus of about 5.5
KV, contacted with an original positive film, exposed to a 150 watt
tungsten lamp at 200 lux.sec., and soaked in a positive liquid
developer to produce clear positive images of high fidelity to the
original image.
Following the instant Example except that 400 mg. of
tribromomethylsulfone was used in place of carbon tetrabromide and
50 mg. of leuco crystal violet was employed as a dye base compound,
an exposure amount for obtaining clear positive images was 190
lux.sec. Further, when 80 mg. of N-methyldiphenylamine was added as
an organic colorization component in place of leuco crystal violet
in the above procedure, the exposure amount for producing clear
images was 180 lux.sec.
EXAMPLE 3
Poly-9-vinylcarbazole (Luvican M-170, trade name, supplied by BASF)
8 g. Carbon tetrabromide 400 mg. Bis (cyclopentadienyl) titanium
diphenyl 8 mg. Benzene 200 ml.
The mixture of the above-mentioned ingredients was irradiated in a
manner similar to Example 1. Then, 5 ml. of a solution of 80 mg. of
1, 3, 5-trinitrobenzene in benzene was added thereto as Lewis acid.
Then, following the procedure of Example 1, there was produced a
photosensitive paper. The resulting photosensitive paper was given
a uniform negative charge of about 350 V by corona charging using a
charging device of about 5.5 KV, contacted with an original
positive film, exposed to a 150 watt tungsten lamp at 120 lux.sec.,
and soaked in a positive liquid developer to form clear positive
images of high fidelity to the original positive image.
EXAMPLE 4
Poly-9-vinylcarbazole (PO-098, trade name, supplied by Schuchardt)
2 g. Tribromomethylphenylsulfone 100 mg. Triphenylbismutin 2 mg.
Dioctylphthalate 0.5 g. Chlorobenzene 70 ml.
A solution composed of the above ingredients was coated on a base
paper of 79 g/m.sup.2, which was treated with a hydrophilic polymer
so as to inhibit the permeation of a solvent, in an amount of about
5 g/m.sup.2 by a double roll coating method and, after coating is
finished, the resulting coating was immediately irradiated by a 500
watt xenon lamp at a distance of about 10 cm for 5 seconds to
produce a photosensitive paper. When triphenylbismutin was not
used, the required irradiation time was 15 seconds. The resulting
photosensitive paper was given a uniform negative charge of about
280 V by corona charging by using a charging device of about 5.5
KV, placed under an original positive film, exposed to a 15 watt
tungsten lamp at 150 lux.sec., and soaked in a positive liquid
developer to produce a positive image of high fidelity to the
original image.
In the following Examples 5 - 39 the procedures follow Example 1.
That is, a solution obtained by mixing the listed ingredients is
irradiated with a 100 watt high pressure mercury lamp for 5
minutes, coated on a base paper, and dried to produce a
photosensitive paper. The resulting photosensitive paper is
subjected to corona charging by a charging device of about 5.5 KV,
contacted with an original positive film and exposed to a 150 watt
tungsten lamp.
In each of Examples 5 - 39 there are shown a formulation for the
solution, an exposure amount necessary for obtaining clear positive
images and, for comparison, an exposure amount necessary for
obtaining clear positive images when the organometallic compound is
not employed.
EXAMPLE 5
Poly-3-bromo-9-vinylcarbazole 8 g. Di-tertiarybutyl-P-oxide 400 mg.
2,7-Bis (dimethylamino)-10-P-dimethyl aminophenyl-9, 10-dihydro-9,
9-dimethyl Anthracene 100 mg. triphenylphosphine 8 mg.
Monochlorbenzene 200 ml.
The exposure amount needed 170 lux.sec. When triphenylphosphine was
not contained, the exposure amount was 350 lux.sec.
EXAMPLE 6
Copolymer of 3-iodo-9-vinylcarbazole and 9-vinylcarbazole (in ratio
of 40 : 60) 8 g Bromoform 400 mg. 1, 2-Dimethylindole 100 mg.
Triphenylphosphine 8 mg. Benzene 200 ml.
The exposure amount needed 160 lux.sec. However, when
triphenylphosphine was not contained, the exposure amount was 390
lux.sec.
EXAMPLE 7
Poly-9-vinylcarbazole (PC-098 trade name, supplied by Schuchardt
Co.) 8 g. Carbon tetrabromide 400 mg. Triphenylbismuthine 8 mg.
Benzene 200 ml. Orient pink 20 mg.
The exposure amount needed 90 lux.sec. However, when
triphenylbismuthine was not contained, the exposure amount was 300
lux.sec.
EXAMPLE 8
Poly-3-bromo-9-vinylcarbazole 8 g. Tribromomethylphenylsulfone 400
mg. 2-[1, 3-Dioxo-hydrinedenyl-(2)] quinoline 50 mg. Cobaltocene
0.5 mg. Monochlorbenzene 200 ml. Methyl violet 20 mg.
The exposure amount needed 80 lux.sec. When cobaltcene was not
contained, the exposure amount was 280 lux.sec.
EXAMPLE 9
Graft-copolymer of 9-vinylcarbazole and ethylacrylate 8 g.
Bromoform 400 mg. Leuco methylviolet 80 mg. Cobaltcene 0.5 mg.
Toluene 200 ml. Diphenyl chloride 2 g. 2, 4,
7-Trinitro-9-fluorenone 50 mg.
The exposure amount needed 140 lux.sec. When cobaltcene was not
contained, the exposure amount was 325 lux.sec.
EXAMPLE 10
Poly-3-bromo-9-vinylcarbazole 8 g. Carbon tetrabromide 400 mg.
Triphenylbismuthine 8 mg. Benzene 200 ml. P-ter-phenyl 4 g.
The exposure amount needed 95 lux.sec. When triphenylbismuthine was
not contained, the exposure amount was 280 lux.sec.
EXAMPLE 11
Poly-9-vinylcarbazole (trade name Luvican M-170 supplied by BASF) 8
g. Carbon tetrabromide 400 mg. 4- (P-dimethylaminostyryl) quinoline
80 mg. Tetraphenyllead 8 mg. Benzene 200 ml.
The exposure amount needed 90 lux.sec. When tetraphenyllead was not
contained, the exposure amount was 255 lux.sec.
EXAMPLE 12
Graft-copolymer of 9-vinylcarbazole and ethylacrylate (in the ratio
of 90 : 10) 8 g. Carbon tetrabromide 200 mg. N-vinylcarbazole 800
mg. Bis (cyclopentadienyl) - zirconium dibromide 8 mg. Benzene 200
ml. Diphenyl chloride 2 g. 2, 4, 7-trinitro-9-fluorenone 50 mg.
The exposure amount needed 185 lux.sec. When bis (cyclopentadienyl)
zirconium dibromide was not contained, the exposure amount was 395
lux.sec.
EXAMPLE 13
Copolymer of 3-iodo-9-vinylcarbazole and 9-vinylcarbazole (in the
molar ratio of 40 : 60) 8 g. Iodoform 400 mg. Triphenyl bismuthine
4 mg. Benzene 200 ml.
The exposure amount needed 70 lux.sec. When triphenyl bismuthine
was not contained the exposure amount was 250 lux.sec.
EXAMPLE 14
Bis- 4, 4'-dialkylaminobenzylideneazine 4 g. Copolymer of
acrylonitrile and styrene (trade name Estylene AS-61NT supplied by
Yahata Kagaku) 4 g. Pentabromodimethylsulfoxide 400 mg.
4-[2-(3-ethyl-2(3H)- benzothiazolylideneamino) vinyl] quinoline 80
mg. Ferrocene 0.1 mg. Methylene chloride 200 ml. Acridine yellow 20
mg. Chloranil 70 mg.
The exposure amount needed 380 lux.sec. When ferrocene was not
contained, the exposure amount was 140 lux.sec.
EXAMPLE 15
Nitrated poly-9-vinylcarbazole (having 0.06 molars of nitro radical
per one carbazole unit mainly at 3-position of carbazole ring) 8 g.
Iodoform 100 mg. 2.5-Bis- [4'-dimethylaminophenyl-1' ] -1, 3,
4-oxadiazole 100 mg. Triphenylarsine 8 mg. Benzene 200 ml.
The exposure amount needed 275 lux.sec. When triphenylarsine was
not contained, the exposure amount was 560 lux.sec.
EXAMPLE 16
Poly-3-bromo-9-vinylcarbazole 8 g. Iodoform 400 mg.
Triphenylphosphine 8 mg. Nitrobenzene 200 ml. Methylviolet 20
mg.
The exposure amount needed 155 lux.sec. When triphenylphosphine was
not contained, the exposure amount was 335 lux.sec.
EXAMPLE 17
Poly-9-vinylcarbazole (trade name Luvican M-170 supplied by BASF) 8
g. Carbon tetrabromide 400 mg. 1- Methyl-2,5-bis 4'-N,N'-
diethylaminophenyl-1' -1, 3, 4- Triazole 80 mg. Nickelocene 0.5 mg.
Benzene 200 ml.
The exposure amount needed 105 lux.sec. When nickelocene was not
contained, the exposure amount was 210 lux.sec.
EXAMPLE 18
Bis-4,4-diallylaminobenzylidenazine 4 g. Modified phenol resin
(trade name Beckacite 1100 supplied by Japan Reichhold Chemical
Ind. Co.) 4 g. Iodoform 400 mg. 1-Ethyl-3- [3-ethyl- 2
(3H-benzoxazolylidene] oxyindole 80 mg. Bis (cyclopentadienyl)
niobium tribromide 8 mg. Chlorbenzene 200 ml. Tetrachlorophthalic
anhydride 80 mg.
The exposure amount needed 830 lux.sec. When bis (cyclopentadienyl)
niobium tribromide was not contained, the exposure amount was 1540
lux.sec.
EXAMPLE 19
Poly-9-vinylcarbazole (trade name Luvican M-170 supplied by BASF) 8
g. Iodoform 400 mg. Triphenylbismuthine 4 mg. 2, 4,
7-Trinitro-9-fluorenone 50 mg. Benzene 200 ml. Diphenyl chloride 2
g.
The exposure amount needed 55 lux.sec. When triphenylbismuthine was
not contained, the exposure amount was 170 lux.sec.
EXAMPLE 20
N,N,N',N'-tetrabenzyl-P-phenylendiamine 4 g. Polyvinylbutylal resin
(trade name S-lec ELS supplied by Sekisui Kagaku) 4 g.
Hexabromodimethylsulfoxide 400 mg. 3-Ethyl-5- [3-ethyl-2(3H)-
benzothiazolylidene] rhodanine 60 mg. Bis (cyclopentadienyl)
chromium 4 mg. Toluene 200 ml.
The exposure amount needed 1170 lux.sec. When bis
(cyclopentadienyl) chromium was not contained, the exposure amount
was 1,920 lux.sec.
EXAMPLE 21
Bis-4,4'-dialkylaminobenzylideneazine 4 g. Copolymerization resin
of acrylonitrile and styrene (trade name Estylene AS-61NT supplied
by Yahata Kagaku) 4 g. Di-tertiallybutylperoxide 400 mg.
4-(4'-dimethylaminophenyl)- 5-(4"-chlorphenyl) imidazole 80 mg. Bis
(cyclopentadienyl) tantalum tribromide 16 mg. Methylene chloride
200 ml.
The exposure amount needed 870 lux.sec. When bis (cyclopentadienyl)
tantalum tribromide was not contained, the exposure amount was 1880
lux.sec.
EXAMPLE 22
Nitrated poly-9-vinylcarbazole (having 0.06 mole of nitro radical
per one carbazole unit mainly at 3-position of carbazole ring) 8 g.
Bromoform 400 mg. Triphenylbismuthine 16 mg. Benzene 200 ml.
The exposure amount needed 270 lux.sec. When triphenylbismuthine
was not contained, the exposure amount was 530 lux.sec.
EXAMPLE 23
Leuco crystalviolet 4 g. Epoxy resin (trade name Epikote 1004
supplied by Shell Oil) 4 g. 2-Azo-bis-isobutylonitrile 400 mg. 4-
[4-(P-dimethyl aminophenyl)- 1,3-butadienyl] quinoline 80 mg. Bis
(cyclopentadienyl) vanadium 4 mg. Benzene 200 ml.
The exposure amount needed 2060 lux.sec. When bis
(cyclopentadienyl) vanadium was not contained, the exposure amount
was 3750 lux.sec.
EXAMPLE 24
Bis-4,4-diallylaminobenzylidene- azine 4 g. Modified phenolic resin
(Beckacite 1100, trade name, supplied by Japan Reichhold Chemical
Co.) 4 g. Tribromomethylphenylsulfone 400 mg.
1,3,5-Triphenylpyrazoline 80 mg. Tetraphenyl tin 16 mg.
Chlorobenzene 200 ml.
The exposure amount needed 640 lux.sec. When tetraphenyl tin was
not contained, the exposure amount was 1770 lux.sec.
EXAMPLE 25
Poly-9-vinylcarbazole (Luvican M-170, trade name, supplied by BASF)
8 g. Tribromomethylsulfone 400 mg. Tetraphenyl lead 16 mg. Benzene
200 ml.
The exposure amount needed 440 lux.sec. In the absence of
tetraphenyl lead the exposure amount was 1280 lux.sec.
EXAMPLE 26
Leuco malachite green 4 g. Polystyrene resin (Piccolastic D-100,
trade name, supplied by ESSO) 4 g. Diphenylthiocarbazone 400 mg.
2-(P-Dimethylaminostyryl) quinoline 150 mg. Bis
(cyclopentadienyl)-P-pentacarbon- monooxide-bimolybdenum 4 mg.
Benzene 100 ml. Methylene chloride 100 ml.
The exposure amount needed 2300 lux.sec. In the absence of bis
(cyclopentadienyl)-P-pentacarbon-monooxide-bimolybdenum, the
exposure amount was 4150 lux.sec.
EXAMPLE 27
Leuco malachite green 4 g. Polycarbonate resin (Panlite C, trade
name, supplied by Teijin) 4 g. 2-Azo-bis-isobutyronitrile 400 mg.
2-(4'-Diethylaminophenyl)-4- (4'-dimethylaminophenyl)-5-
(2'-chlorophenyl) oxazole 80 mg. Bis (cyclopentadienyl)-P-
hexacarbonmonoxide- bitangsten 4 mg. Methylene chloride 200 ml.
The exposure amount needed 920 lux.sec. In the absence of bis
(cyclopentadienyl)-P-hexacarbon-monooxide-bitungsten, the exposure
amount was 1650 lux.sec.
EXAMPLE 28
4,4'-Bis-dimethylamino-benzophenone 4 g. Polycarbonate resin
(Iupilon E, trade name, supplied by Mitsubishi Edogawa Kagaku) 4 g.
Carbon tetrabromide 400 mg. Triphenylbismutin 4 mg. Methylene
chloride 200 ml.
The exposure amount needed 100 lux.sec. In the absence of
triphenylbismutin, the exposure amount was 290 lux.sec.
EXAMPLE 29
Leuco crystal violet 4 g. Acrylonitrile-styrene copolymer (Estylene
AS-61NT, trade name, supplied by Yahata Kagaku) 4 g.
2-Azobisisobutyronitrile 400 mg. 3-Ethyl-5- [3-ethyl-2(3H)-
benzoxazolyidene ] rhodanine 200 mg. Nickelocene 4 mg. Methylene
chloride 200 ml.
The exposure amount needed 1590 lux.sec. In the absence of
nickelocene, the exposure amount was 4930 lux.sec.
EXAMPLE 30
Leuco crystal violet 4 g. Epoxy resin (Epikote 1004, trade name,
supplied by Shell Petroleum Co.) 4 g. Hexabromodimethylsulfoxide
400 mg. o - tolydine 100 mg. Hydrogenated bis (cyclopenta- dienyl)
rhenium 2 mg. Benzene 200 ml.
The exposure amount needed 750 lux.sec. In the absence of
hydrogenated bis (cyclopentadienyl) rhenium, the exposure amount
was 1510 lux.sec.
EXAMPLE 31
Bis-4,4'-diallylamino- benzylidene azine 4 g. Acrylonitrile-styrene
copolymer (Estylene AS-61NT, trade name, supplied Yahata Kagaku) 4
g. Iodoform 400 mg. Bis (cyclopentadienyl) iron dicarbonyl 2 mg.
Methylene chloride 200 ml. Acridine yellow 20 mg. Chloranil 70
mg.
The exposure amount needed 520 lux.sec. In the absence of bis
(cyclopentadienyl) iron dicarbonyl, the exposure amount was 950
lux.sec.
EXAMPLE 32
Leuco malachite green 4 g. Polystyrene resin (Piccolastic D-100,
trade name, supplied by ESSO) 4 g. Diphenylthiocarbazone 400 mg.
Vinylcarbazole 400 mg. Brominated bis (cyclopentadienyl) cobalt 4
mg. Benzene 100 ml. Methylene chloride 100 ml.
The exposure amount needed 2400 lux.sec.
In the absence of brominated bis (cyclopentadienyl) cobalt, the
exposure amount was 90400 lux.sec.
EXAMPLE 33
N,N,N',N'-tetrabenzyl-p- phenylenediamine 4 g. Modified phenolic
resin (Beckacite 1100, trade name, supplied by Japan Reichhold
Chemical Co.) 4 g. Bromoform 400 mg. Tetraphenyl tin 4 mg. Benzene
200 ml.
The exposure amount needed 1550 lux.sec. In the absence of
tetraphenyl tin, the exposure amount was 2250 lux.sec.
EXAMPLE 34
Bis-4,4-diallylaminobenzylidene azine 4 g. Modified phenolic resin
(Beckacite 1100, trade name, supplied by Japan Reichhold Chemical
Co.) 4 g. Tribromomethylphenylsulfone 400 mg. Hexaphenylditin 4 mg.
Chlorobenzene 200 ml.
The exposure amount needed 720 lux.sec. In the absence of
hexaphenylditin, the exposure amount was 1120 lux.sec.
EXAMPLE 35
Leuco malachite green 4 g. Polystyrene resin (Piccolastic D-100,
trade name, supplied by ESSO) 4 g. Diphenylthiocarbazone 400 mg.
Hexaphenylditin 2 mg. Benzene 100 ml. Methylene chloride 100
ml.
The exposure amount needed 2300 lux.sec. In the absence of
hexaphenylditin, the exposure amount was 3750 lux.sec.
EXAMPLE 36
Leuco crystal violet 4 g. Acrylonitrile-styrene copolymer (E
stylene AS-61NT, trade name, supplied by Yahata Kagaku) 4 g.
2-Azobisisobutyronitrile 400 mg. Ferrocene 0.5 mg. Mechylene
chloride 200 ml.
The exposure amount needed 600 lux.sec. In the absence of
ferrocene, the exposure amount was 2300 lux.sec.
EXAMPLE 37
Leuco crystal violet 4 g. Acrylonitrile-styrene copolymer (Estylene
AS-61NT, trade name, supplied by Yahata Kagaku) 4 g.
Diphenylthiocarbazone 200 mg. Tetraphenylgermanium 8 mg.
2-Azobisisobutyronitrile 200 mg. Methylene chloride 200 ml. Orient
oil pink OP 20 mg.
The exposure amount needed 780 lux.sec. In the absence of
tetraphenylgermanium, the exposure amount was 1450 lux.sec.
EXAMPLE 38
Poly-9-vinylcarbazole (Luvican M-170, trade name, supplied by BASF)
8 g. Carbon tetrabromide 400 mg. Bis (cyclopentadienyl) cerium 8
mg. Dioxane 200 ml.
The exposure amount needed 100 lux.sec. In the absence of bis
(cyclopentadienyl) cerium, the exposure amount was 315 lux.sec.
EXAMPLE 39
Following Example 38, but using bis (cyclopentadienyl) titanium,
bis (cyclopentadienyl) chromium, bis (cyclopentadienyl) manganese,
or dihalogenated bis (cyclopentadienyl) vanadium in place of bis
(cyclopentadienyl) cerium, the exposure amount needed was about 200
lux.sec. for each of them.
EXAMPLE 40
Iodoform 100 mg. Triphenylphosphine 4 mg. Benzene 25 ml.
A solution composed of the above ingredients was placed in a 50 ml.
quartz Erlenmeyer flask, and irridated by a high pressure mercury
lamp of 100 watt at a distance of 10 cm for about 20 minutes. (When
triphenyl phosphine was not contained, the solution was irradiated
for 30 minutes.)
Then, a solution obtained by the following ingradients:
poly-3-nitro-9-vinylcarbazole 2 g. diphenyl chloride 0.5 g. benzene
25 ml.
was poured into the above-mentioned Erlenmyer flask and mixed with
the contents and allowed to stand for three days in a dark place.
Then, the solution was coated on an Al laminate paper of 50 .mu.
thick to form a coating of about 5 .mu. and dried naturally to form
a photosensitive paper. The resulting photosensitive paper was
given a uniform negative charge of about 350 V by corona charging
by using a charging device of about 5.5 KV, contacted with an
original positive film, to a 150 watt tungsten lamp at 150 lux.sec.
and soaked in a positive liquid developer to form positive images
of high fidelity to the original image.
EXAMPLE 41
Carbon tetrabromide 100 mg. Vinylcarbazole 50 mg. Triphenylbismutin
2 mg. Benzene 25 ml.
A solution composed of the above ingredients was placed in a 50 ml.
quartz Erlenmeyer flask, irradiated with a 500 watt xenon lamp at a
distance of 10 cm for about 5 minutes. When triphenylbismutin was
not used, 30 minute irridiation was necessary.
Then, a solution of 2 g. of poly-9-vinylcarbazole (PO-098, trade
name, supplied by Schuchardt) in 25 ml. of benzene was immediately
poured into the above-mentioned Erlenmeyer flask and the resulting
mixture was allowed to stand in a dark place for 3 days. Then the
resulting mixture was coated on an Al plate (0.8 mm thick) to form
a coating of about 5 .mu. thick, and dried naturally to form a
photosensitive plate. The resulting photosensitive plate was
subjected to an electrophotographic process similar to that of
Example 40 and an exposure amount of 110 lux.sec. was required to
form positive images of high fidelity to the original image.
EXAMPLE 42
Pentabromodimethylsulfoxide 100 mg. Triphenylbismutin 1 mg. Xylene
25 mg.
A solution composed of the above ingredients was placed in a 50 ml.
quartz Erlenmeyer flask, and irradiated by a 500 watt xenon lamp at
a distance of 20 cm for about 10 minutes. When triphenylbismutin
was not used, 30 minute irradiation was necessary.
Then, a solution of leuco malachite green 1 g. and epoxy resin
(Epikote 1004, trade name, supplied by Shell Petrolum Co.) 1 g. in
25 ml. of MEK was immediately added to the Erlenmeyer flask,
allowed to stand in a dark place for 2 days, and then 5 ml. of an
MEK solution containing 5 mg. of Rose Bengal as a sensitizing dye
and 10 mg. of picric acid as Lewis acid was added thereto.
The solution thus obtained was coated on a baryta paper (80 .mu.
thick) which had been treated so as to increase the
electroconductivity to form a coating of about 5 .mu. thick and
dried naturally to produce a photosensitive paper. The
photosensitive paper thus obtained was subjected to an
electrophotographic process similar to Example 40 to produce
positive images of high fidelity to the original image. The
required exposure amount was 350 lux.sec.
EXAMPLE 43
Poly-9-vinylcarbazole 2 g. Carbon tetrabromide 50 mg.
Triphenylbismutin 2 mg. Benzene 25 ml. Iodoform 50 mg. Benzene 25
ml.
A solution of (I) and a solution of (II) were irradiated by a 100
watt high pressure mercury lamp at a distance of about 10 cm for
about 5 minutes. (When triphenyl bismutin was not used, the
irradiation time was 10 minutes.) Then, these two solutions were
immediately mixed, allowed to stand at a dark place for 10 hours,
coated on a polyester film (75 .mu. thick) having an aluminum
deposit to form a coating of about 5 .mu. thick and dried naturally
to produce a photosensitive film. The photosensitive film thus
obtained was subjected to an electrophotographic process similar to
Example 40, and an exposure amount of 120 lux.sec. was required to
produce positive images of high fidelity to the original image.
When a solution of poly-9-vinylcarbazole above was used for
producing a photosensitive film, an exposure amount of about 58,000
lux.sec. was required to give good positive images.
EXAMPLE 44
Poly-3-bromo-9-vinylcarbazole 2 g. Bromoform 50 mg. Chlorobenzene
25 ml. Hexachloroethane 50 mg. Triphenylbismutin 2 mg.
Chlorobenzene 25 ml.
The solutions (I) and (II) were irradiated by a 100 watt high
pressure mercury lamp at a distance of about 10 cm for 10 minutes.
(When triphenylbismutin was not used, the irradiation time required
was 15 minutes.)
Immediately after the irradiation treatment, these two solutions
were mixed and allowed to stand in a dark place for about 10 hours.
To the resulting mixture was added 10 ml. of a solution of 0.5 g.
p-terphenyl in chlorobenzene as plasticizer and coated on an
aluminum laminate paper (50 .mu. thick) to form a coating of about
5 .mu. thick followed by natural drying to produce a photosensitive
paper. The resulting photosensitive paper was given a uniform
negative charge of about 350 V by corona charging by using a
charging device of 5.5 KV, contacted with an original positive
film, exposed to a 150 watt tungsten lamp at 150 lux.sec., and
soaked in a positive liquid developer to produce positive images of
high fidelity to the original image.
EXAMPLE 45
Poly-9-vinylcarbazole (Luvican M-170, trade name, supplied by BASF)
2 g. Hexabromodimethylsulfoxide 50 mg. Triphenylbismutin 1 mg.
Benzene 25 ml. Pentabromodimethylsulfoxide 50 mg.
1,6-Dimethoxyphenazine 20 mg. Triphenylbismutin 1 mg. Benzene 25
ml.
The solutions of (I) and (II) were irradiated by a 500 watt xenon
lamp at a distance of about 20 cm for about 5 minutes (When
triphenylbismutin was not employed, the required irradiation time
was 30 minutes). Immediately after the irradiation treatment, these
two solutions were mixed and allowed to stand in a room under a
fluorescent lamp for about 24 hours. Then, 5 ml. of a solution of 5
mg. Oil pink in benzene as a sensitizing dye was added thereto, and
a photosensitive film was produced in a way similar to Example 44
and subjected to an electrophotographic process similar to Example
44. An exposure amount of 120 lux.sec. was required to produce a
positive image of high fidelity to the original image.
EXAMPLE 46
Poly-9-vinylcarbazole (PO-098, trade name, supplied by Schuchardt)
170 g. Carbon Tetrabromide 10 g. Triphenylbismutin 340 mg. Diphenyl
chloride 30 g. Benzene 5 ml.
A solution composed of the above ingredients was coated on a base
paper of 60 g/m.sup.2 (the surface on which the solution is applied
was treated with a hydrophilic polymer so as to inhibit the
permeation of a solvent) in an amount of about 6 g/m.sup.2 by a
kiss roll coating method and then immediately irradiated by a high
pressure mercury lamp (100 watt) at a distance of about 15 cm for
10 seconds. When triphenylbismutin was not used, the required
irradiation time was 30 seconds. Then, the coating was dried by hot
air at 70.degree.C at a wind velocity of 15 m/sec. to produce a
photosensitive paper. The resulting photosensitive paper was
subjected to an electrophotographic process similar to Example 44
and the required exposure amount for producing a positive image of
high fidelity to the original image was 115 lux.sec.
* * * * *