U.S. patent number 3,575,629 [Application Number 04/784,763] was granted by the patent office on 1971-04-20 for multiple condensing lens array for concentrating energy on a plurality of electron beam sources of a photocathode.
This patent grant is currently assigned to Westinghouse Electric Corporation. Invention is credited to Charles H. Church, Terence W. O'Keeffe.
United States Patent |
3,575,629 |
O'Keeffe , et al. |
April 20, 1971 |
MULTIPLE CONDENSING LENS ARRAY FOR CONCENTRATING ENERGY ON A
PLURALITY OF ELECTRON BEAM SOURCES OF A PHOTOCATHODE
Abstract
The invention is an array of condensing lense for use in image
tube pattern fabricating applications to provide selective and
intensive illuminations of individual electron emitting sources of
a multiple electron beam photocathode source.
Inventors: |
O'Keeffe; Terence W.
(Pittsburgh, PA), Church; Charles H. (Alexandria, VA) |
Assignee: |
Westinghouse Electric
Corporation (Pittsburgh, PA)
|
Family
ID: |
25133458 |
Appl.
No.: |
04/784,763 |
Filed: |
December 18, 1968 |
Current U.S.
Class: |
313/524; 313/531;
359/565; 250/214VT; 250/492.1; 250/492.3; 250/494.1; 313/542 |
Current CPC
Class: |
H01J
29/38 (20130101) |
Current International
Class: |
H01J
29/38 (20060101); H01J 29/10 (20060101); H01j
039/06 (); H01j 039/16 () |
Field of
Search: |
;313/110,94,95
;178/7.85,7.87,7.91 ;96/32,36 ;350/162
;250/49.51,49.55,49.57,49.56,213 |
References Cited
[Referenced By]
U.S. Patent Documents
Other References
F C. Genovesco et al., PHASE PLATE LENS FOR A MULTIPLE IMAGE LENS
SYSTEM, IBM Tech. Disclosure Bulletin, V. 8, No. 12, May, 1966
.
H. R. Rottman et al., ZONE LENS ARRAY FOR FABRICATION OF
MULTIPLE-IMAGE PATTERNS, V. 9, No. 1, Jun. 1966.
|
Primary Examiner: Lake; Roy
Assistant Examiner: O'Reilly; David
Claims
We claim:
1. In an apparatus for generating a plurality of substantially
identical electron beams comprising, a multiple electron beam
photocathode source, said photocathode source comprising a
plurality of substantially identical, individual electron emitting
sources, a source of radiation energy for exciting said electron
emitting sources, and a condensing lens array disposed between said
radiation source, and said multiple electron beam photocathode,
said condensing lens array including a plurality of individual
lenses, each of said lenses being operatively associated with one
of said electron emitting sources to effectively concentrate energy
from said radiation source onto the respective electron emitting
sources.
2. A device as claimed in claim 1, wherein said multiple element
lens array is comprised of a plurality of zone plates.
3. A device as claimed in claim 2, wherein said zone plates are
half wave zone plates.
4. A system for exposing high resolution patterns on an electron
sensitive anode comprising:
a multiple electron beam photocathode source, said photocathode
source comprising a plurality of substantially identical electron
emitting sources,
a radiation source for illuminating said photocathode, said
photocathode illumination producing electron emission from said
electron emitting sources,
electron beam control means for directing said electron beams to
said anode for exposing a plurality of substantially identical
patterns thereon, and
a condensing lens array disposed between said radiation source and
said multiple electron beam photocathode, said condensing lens
array including a plurality of individual lenses, each of said
lenses operatively associated with one of said electron emitting
sources to effectively concentrate illumination from said radiation
source onto the respective electron emitting sources of said
photocathode.
5. A system as claimed in claim 4, wherein said multiple lens array
is comprised of a plurality of zone plates.
6. A system as claimed in claim 5, wherein said zone plates are
half wave zone plates.
7. In an apparatus as claimed in claim 1 wherein each of said
individual electron emitting sources is comprised of an array of
discrete electron emitting sources.
8. In an apparatus as claimed in claim 1 wherein each of said
individual electron emitting sources is comprised of a circuit
pattern in the form of a single electron emitting source.
Description
GOVERNMENT CONTRACT
The invention herein described was made in the course of or under a
contract with the United States Air Force.
BACKGROUND OF THE INVENTION
1. Field of the Invention
This invention relates to a lens system for directing light onto a
photocathode and more particularly to an array of lenses for use in
conjunction with a multiple electron beam emitting source.
2. Description of the Prior Art
The use of a multiple electron beam source in an image tube
application is the subject of a copending application Ser. No.
784,551 of T. W. O' Keeffe filed Dec. 18, 1968, entitled, A
MULTIPLE BEAM ELECTRON SOURCE FOR PATTERN GENERATION, and assigned
to the assignee of this invention. The multiple electron beam
source is utilized to define an array of multiple images by
simultaneously scanning the multiple beams across the surface of a
target coated with an organic etch resist. In certain applications
such as rapid exposure of high resolution patterns, the current
emitted by each of the electron beam sources must be quite
high.
An obvious method of increasing the output of a photoelectron
source is by increasing the illumination of the photocathode. If
the photocathode is inefficient and a well matched source of
illumination if not available, a great deal of nonuseful energy
must be directed onto the photocathode. This excess energy can
result in detrimental performance of the photocathode due to
heating.
For a photocathode containing only a small relative area of
emitting sources as in the case of the multiple electron beam
source, much useful radiation is wasted if the photocathode is
totally illuminated, i.e., most of the useful radiation falls on
areas of the photocathode which do not emit electrons.
SUMMARY
The invention consist of a multiple condensing lens which, when
positioned in front of the photocathode between a light source and
the photocathode, concentrates the radiation from the light source
onto the electron emitting areas of the photocathode.
A zone plate is a system of concentric circles of diameters
increasing as the square root of the natural numbers such that the
areas of the successive circles are equal. The circles are treated
such that the circles are alternatively transparent and opaque. The
zone plate acts somewhat like a convergent lens in the sense that
an intense bright image will be formed at a point on the side of
the photocathode opposite to the light source. The zone plate has a
primary focal length which is a function of the wavelength and the
radius of the smallest circle.
In a normal zone plate alternate zones are opaque so that half of
the incoming light is immediately lost. The opaque material removes
that portion of the wavefront that would produce secondary waves at
the focus point which would destructively interfere with the waves
from the zones adjacent to it. If the alternate zones instead of
removing the light completely cause a 180.degree. phase shift, then
all zones would constructively interfere at the focus point. Such a
zone plate is referred to as a "half wave (or phase reversal) zone
plate" and is more efficient since no incoming light is removed by
the opaque zones, and the illumination at the focus point is
therefore significantly greater.
The invention comprises the novel application of the zone plate in
a multiple condensing lens device positioned in alignment with the
electron sources of a multiple electron beam source to individually
illuminate each electron source.
State of the art resist technique permit the fabrication of an
array of zone plates of the dimension and arrangement required to
match the array of multiple electron beam sources described in the
above identified copending application of T. W. O' Keeffe.
It is an object of this invention to provide selective and intense
illumination of the electron emitting sources of a multiple
electron beam photocathode and thereby provide improved image tube
pattern fabrication efficiency and improved pattern exposure
speed.
DESCRIPTION OF THE DRAWING
FIG. 1 is a cross-sectional view of an embodiment of apparatus in
accordance with the present invention;
FIG. 2 is a partial detailed view of an embodiment of the present
invention .
DESCRIPTION OF THE PREFERRED EMBODIMENT
Referring to FIG. 1 there is shown an image tube 10 having a
cathode plate 12 and a target plate 14 that are essentially planar
and parallel.
On the cathode plate 12 is a photocathode 11 comprising multiple
electron beam sources 13 defined by a mask 21 and a multiple lens
array 30 here shown to be in axial alignment with the array
electron beam sources 13 such that the incident light from a light
source 20 illuminating the multiple lens array 30 results in
concentrated illumination of the individual electron beam sources
13 thereby providing electron response from the electron sources
13. The target plate 14 contains one or more workpieces 15 that
have a layer of organic etch resist material 16 thereon.
The image tube approach to resist exposure has several distinct
advantages over both optical and scanning electron beam method. As
a specific case a one to one magnetically focused image tube of
about 1 centimeter cathode to anode target spacing, operating at
about 10 KV accelerating potential and focus field of about 1 KG
established by a coil (not shown) is capable of resolving images of
less than 1 micron over a working area greater than 2 centimeters
in width.
Deflection coils 18 provide means for simultaneously deflecting the
multiple electron beams to draw a plurality of identical patterns
on the target plate 14.
The concept of image tube resist exposure is described in detail in
the copending patent application Ser. No. 753,373 by T. W. O'
Keeffe and R. M. Handy filed Aug. 19, 1968, "Pattern Definition in
Resist Layers by Application of an Electron Image " and assigned to
the assignee of the present invention.
The fabrication of the multiple electron beam source is described
in detail in the copending application Ser. No. 784,801, by T. W. O
' Keeffe and J. R. Morris filed Dec. 18, 1968, entitled, "Mask
Photocathode and Method of Making Same, " and assigned to the
assignee of the present invention.
The multiple lens array 30 is more clearly illustrated in the
partial view of one surface of the cathode plate 12 illustrated in
FIG. 2
Utilizing state of the art resist techniques the multiple lens
plate 30 consisting of a plurality of individual zone plate lens
elements 32 can be etched on a suitable material such as a thin
layer of metal, i.e. aluminum in the case of a normal zone plate or
can be etched directly on a quartz plate to form a half wave zone
plate. In the etching of the quartz half wave zone plate the
alternate circles are etched to different depths to produce the
desired constructive interference of adjacent zones 34 and 36. The
area of each circle is identical and the diameter of the circles
increase as the square root of the natural number. A complete
discussion of zone plates is presented "Concepts Of Classical
Optics " by J. Strong, published by W. H. Freeman and Company,
1958.
The focal length of a zone plate is dependent on both the radius of
the smallest circle and the wavelength .lambda./N of the light in
the cathode plate 12, where N is the index of refraction. This
relationship is expressed as f=a.sup.2 N/.lambda., where a is the
radius of the smallest circle. If a useful wavelength of 2537A. is
to be focused on the electron sources 13 located on the inner
surface of a 1/8 inch thick quartz cathode plate 12, the index of
refraction of which is 1.50, the diameter of the smallest circle is
approximately 2 mils.
The effective concentration of light energy on the respective
electron emitting sources 13 by the zone plate lenses 32 increases
the intensity of the electron beams generated by the sources 13 in
response to radiant energy from the light source 20. Due to the
efficient utilization of the light source light energy the
intensity of the light source may be less than that required in
less efficient systems. This reduction in light source intensity
minimizes adverse effects of heating which occur in less efficient
systems. Also since the zone plate is wavelength dependent only the
required wavelength would be focused. The remainder of the spectrum
would be ineffectively focused so that intense "hot spots" would
not be produced at the photoemissive surface of cathode plate
12.
The multiple electron beam photocathode as described in the
copending application of T. W. O' Keeffe, Ser. No. 784,551, can be
comprised of an array of elements each including a uniformly
arranged plurality of various size electron emitting sources. These
micron size electron sources of each photocathode element are so
arranged that a single zone plate can be utilized to illuminate any
of the electron sources within an element. The selection of the
source to be illuminated in each photocathode element can be
controlled by radially displacing the zone plate array 30 with
respect to the light source 20 thereby changing the photocathode
areas illuminated. The relative displacement of the light source 20
and the lens array 30 can be accomplished by radially shifting the
array 30 or by radially displacing the light source 20 as indicated
by the arrows. This radial displacement changes the angle between
the light source 20 and each zone plate identically thereby
resulting in illumination of identical electron sources in each of
the uniformly arranged photocathode elements.
In the event the photocathode consists of a complete pattern or
plurality of complete patterns which are to be exposed directly on
a workpiece, a pair of zone plates can be employed to excite
electron emissive alignment marks to generate high intensity
electron beams for impingement on the workpiece surface. The
workpiece will be fabricated to include a pair of electron beam
induced conductivity devices which will respond to the alignment
electron beam to indicate proper registration between the
photoemissive pattern and the workpiece.
Various modification may be made within the scope of the
invention.
* * * * *