U.S. patent number 11,002,663 [Application Number 16/232,563] was granted by the patent office on 2021-05-11 for gas injection device.
This patent grant is currently assigned to JIANGSU LEUVEN INSTRUMMENTS CO LTD. The grantee listed for this patent is JIANGSU LEUVEN INSTRUMENTS CO LTD. Invention is credited to Kaidong Xu.
United States Patent |
11,002,663 |
Xu |
May 11, 2021 |
**Please see images for:
( Certificate of Correction ) ** |
Gas injection device
Abstract
A gas injection device, wherein comprising: a gas channel
including an air inlet provided at a upper portion therein and a
gas outlet provided at a lower portion therein; and a light channel
including an incident light channel and a reflected light channel
provided at each side of the gas channel separately, wherein gases
arrives at a surface of a sample to be tested via said gas channel
and flows out from a slit between said light channel, the gas
outlet of gas channel, and the surface of the sample to be tested,
and gases flow in a manner of laminar flow with the Peclet number
of an air flow being larger than 1. The gas injection device can
effectively prevent air from returning back to the measurement
system.
Inventors: |
Xu; Kaidong (Leuven,
BE) |
Applicant: |
Name |
City |
State |
Country |
Type |
JIANGSU LEUVEN INSTRUMENTS CO LTD |
Jiangsu |
N/A |
CN |
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Assignee: |
JIANGSU LEUVEN INSTRUMMENTS CO
LTD (Jiangsu, CN)
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Family
ID: |
60785043 |
Appl.
No.: |
16/232,563 |
Filed: |
December 26, 2018 |
Prior Publication Data
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Document
Identifier |
Publication Date |
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US 20190128795 A1 |
May 2, 2019 |
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Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
Issue Date |
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PCT/CN2017/084102 |
May 12, 2017 |
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Foreign Application Priority Data
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Jul 1, 2016 [CN] |
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201610520818.5 |
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Current U.S.
Class: |
1/1 |
Current CPC
Class: |
G01N
21/01 (20130101); G01N 15/0806 (20130101); G01N
15/088 (20130101); G01N 2015/0846 (20130101); G01N
2021/0106 (20130101) |
Current International
Class: |
G01N
21/01 (20060101); G01N 15/08 (20060101) |
References Cited
[Referenced By]
U.S. Patent Documents
Foreign Patent Documents
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87104313 |
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Jul 1988 |
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CN |
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1797220 |
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Jul 2006 |
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CN |
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101117655 |
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Feb 2008 |
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CN |
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104046565 |
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Sep 2014 |
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CN |
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104250728 |
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Dec 2014 |
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CN |
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105316651 |
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Feb 2016 |
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CN |
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105445201 |
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Mar 2016 |
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CN |
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Other References
International Search Report for PCT Application No.
PCT/CN2017/084102; State Intellectual Property Office of P.R.
China; Beijing, China; dated Aug. 17, 2017. cited by applicant
.
Written Opinion of the International Searching Authority for PCT
Application No. PCT/CN2017/084102; State Intellectual Property
Office of the P.R. China; Beijing, China; dated Aug. 17, 2017.
cited by applicant .
Translation of the International Search Report for PCT Application
No. PCT/CN2017/084102; State Intellectual Property Office of the
P.R. China; Beijing, China; dated Aug. 17, 2017. cited by applicant
.
Bourgeois, A., et al; "Adsorption and Desorption Isotherms at
Ambient Temperature Obtained by Ellipsometric Porosimetry to Probe
Micropores in Ordered Mesoporous Silica Films"; Adsorption
11:195-199; 2005. cited by applicant .
Translation of Written Opinion of the International Searching
Authority for PCT Application No. PCT/CN2017/084102; State
Intellectual Property Office of the P.R. China; Beijing, China;
dated Aug. 17, 2017. cited by applicant .
Chinese Office Action for Chinese Patent Application No.
201610520818.5; dated Nov. 28, 2018. cited by applicant.
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Primary Examiner: Smith; Maurice C
Attorney, Agent or Firm: Thomas E. Lees, LLC
Parent Case Text
CROSS REFERENCE TO RELATED APPLICATIONS
This is a Continuation application of International Application
Serial No. PCT/CN2017/084102, filed on May 12, 2017, which claims
the benefit of Chinese Application No. 201610520818.5, filed on
Jul. 1, 2016, the disclosures of which are hereby incorporated by
reference.
Claims
What is claimed is:
1. A gas injection device, wherein comprising: a gas channel
including an air inlet provided at an upper portion therein and a
gas outlet provided at a lower portion therein; and a light channel
including an incident light channel and a reflected light channel
provided at each side of the gas channel separately, wherein gases
arrives at a surface of a sample to be tested via said gas channel
and flows out from said light channel and a slit between the gas
outlet of said gas channel and a surface of the sample to be
tested, and gases flow in a manner of laminar flow with the Peclet
number of an air flow being larger than 1.
2. The gas injection device according to claim 1 wherein, an inner
diameter of the gas outlet of the gas channel, an inner diameter of
said light channel, and a height from said gas channel to the
surface of said sample to be tested meet the next formula:
Fd/.pi.(d.sup.2/2+Dh).mu.<200, wherein, F is a volume of gas
flow; d is an inner diameter of the light channel; D is an inner
diameter of the gas outlet of the gas channel, h is a height from
the gas outlet of said gas channel to the surface of said sample to
be tested, and .mu. is dynamic viscosity.
3. The gas injection device according to claim 1 wherein, an inner
diameter of said gas outlet is greater than that of said air
inlet.
4. The gas injection device according to claim 1 wherein, an inner
diameter for the gas outlet of said gas channel is 0.1-250 mm.
5. The gas injection device according to claim 1 wherein, an inner
diameter of said light channel is 0.5-20 mm.
6. The gas injection device according to claim 1, wherein, a height
from the gas outlet of said gas channel to the surface of said
sample to be tested is 0.1-10 mm.
7. The gas injection device according to claim 1, wherein, a length
of said gas channel is 0.1-10 cm.
8. The gas injection device according to claim 1, wherein, an inner
diameter for the air inlet of said air channel is 0.1-20 mm.
9. The gas injection device according to claim 1 wherein, a
diameter for the surface where the gas outlet of the gas channel
being formed is 1-300 mm.
Description
BACKGROUND
The present invention relates to the field of sample analysis, more
particularly, to a gas injection device.
Porous films have extensive applications in the field of
microelectronics (low dielectric constant membrane), cell
membranes, catalytic membranes, and sensors. Specifically, as a
kind of low dielectric constant dielectric, porous films is widely
used in ultra-large integrated circuit device. The porosity of
materials can be studied by ellipsometry, and the thickness and
parameters of a porous layer can be studied in a solvent vapor
environment. For the reason that a change in refractive index of
porous material is a function of the relative pressure change of
the solvent vapor, so the volume of the solvent fed into pores can
be determined and an isotherm curve can be drawn. Therefore, the
porosity of a porous material can be measured and its mechanical
and electrical properties can be studied. Methods to evaluate
porous low-k film by means of ellipsometry are disclosed in patent
literature documents 1-4 and non-patent literature documents below.
Patent literature 1: U.S. Pat. No. 6,435,008 B2 Patent literature
2: U.S. Pat. No. 6,662,631 Patent literature 3: US 2006/0254374 A1
Patent literature 4: U.S. Pat. No. 7,568,379 B2
Non-patent literature: Adsorption and Desorption Isotherms at
Ambient Temperature Obtained by Ellipsometric Porosimetry to Probe
Micropores in Ordered Mesoporous Silica Films. Bourgeois A.,
Brunet-Bruneau A., Fisson S., Rivori J. Adsorption 11:195-199,
2005
However, demerits disclosed above lie in the fact that a special
chamber is employed for sample testing, which limits the size of
the sample. Another demerit relates to volume of the chamber, which
takes a long time to fill or change the atmosphere of the chamber.
Furthermore, filling the chamber needs a lot of solvent vapor,
resulting in relatively high cost of measurement.
An alternative system and method is disclosed in the invention
patent application numbered as 201510751567.7 which was submitted
by the present inventor, and this new system is on basis of an
injection airflow forming system with no need for a chamber.
Firstly, adsorbent vapor and carrier gas are mixed together and
each constituent gas is subject to differential pressure control;
secondly, size of the resulting airflow is controllable and close
to the size of a laser beam spot on the surface to be tested. This
results in that the dose of adsorbent required by this system
declines significantly with comparison to the chamber-based system.
In addition, as the sample can be moved in the process of testing,
there is no restriction on sample size.
But, in this sample analysis system, the employed gas injection
device to form injection airflow is critical, especially in the
case of low-speed flow. When the flow rate is too low, air will
possibly diffuse into the gas injection device and further enter
into the mixed gases, causing a change in the partial pressure of
the gas.
BRIEF SUMMARY
The purpose of the present invention is to provide a gas injection
device, wherein comprising: a gas channel, which includes an air
inlet at the upper part gas channel and an gas outlet at the lower
part; and an light channel, which comprises incident light channel
and reflected light channel, which are provided on each side of
said gas channel respectively. Specifically, the gas gets to
surface of the sample to be tested through said gas channel, and
flows out from the light channel and the slit formed between the
surface of the sample to be tested and the gas outlet of the gas
channel. Gas flows in a manner of laminar flow and the Peclet
number of the airflow is greater than 1.
Preferably, the inner diameter of the gas channel, the inner
diameter of the light channel, and the distance from gas channel
gas outlet to the surface of the sample to be tested meet the
following relational expression:
Fd/.pi.(d.sup.2/2+Dh).mu.<200,
wherein, F denotes the gas flow; d denotes the inner diameter of
the light channel; D denotes the inner diameter of the gas outlet
of the gas channel; h denotes the height between the gas channel
gas outlet to the surface of the sample to be tested; .mu. denotes
kinematic viscosity.
Preferably, the inner diameter of the gas outlet is greater than
that of said air inlet.
Preferably, the inner diameter of the gas outlet is 0.1-250 mm.
Preferably, the inner diameter of the light channel is 0.5-20
mm.
Preferably, the height from the gas outlet of the gas channel to
the surface of the sample to be tested is 0.1-10 mm.
Preferably, the length of the gas channel is 0.1-10 cm.
Preferably, the inner diameter of the air inlet of the gas channel
is 0.1-20 mm.
Preferably, the diameter of surface where gas channel gas outlet
will be formed is 1-300 mm.
BRIEF DESCRIPTION OF THE SEVERAL VIEWS OF THE DRAWINGS
FIG. 1 shows schematic structural view of the gas injection
devices.
FIG. 2-FIG. 4 show schematic structural views of the gas injection
device with different shapes.
FIG. 5-FIG. 6 show schematic structural views of the gas injection
device with light channel being of different shapes.
DETAILED DESCRIPTION
In order to make the intention, technical solutions and advantages
of the present invention more explicit, a clear and complete
description of the technical solutions in embodiments of the
present invention will be made on the basis of embodiment drawings
of the present invention. It should be understood that preferred
embodiments described here is used only to explain the present
invention, not to limit the present invention. Described
embodiments are only a portion but not all embodiments of the
present invention. All other embodiments without inventive work
obtained by the people skilled in the art on basis of the
embodiment of present invention will fall in the protection scope
thereof.
FIG. 1 shows a schematic structural view of an embodiment of the
gas injection device. The gas injection device 1 of the present
invention comprises: a gas channel 11, which includes an air inlet
111 and a gas outlet 112, wherein the air inlet 111 is provided at
the upper portion of the gas injection device 1 and the gas outlet
112 is provided at the lower portion of the gas injection device 1.
Preferably, the inner diameter of the gas outlet 112 is larger than
that of the air inlet 111. The gas injection device 1 also contains
a light channel 12, which includes incident light channel 121 and
reflected light channel 122. They are provided on each side of the
gas channel respectively. The gas arrives at the surface of a
sample to be tested 13 via the gas channel 11 and flow out from the
light channel 12 and the slit 14 between a surface of the sample to
be tested 13 and the gas outlet 112 of the gas channel 11.
Specific parameters of the light channel and the gas channel are
set to ensure that solvent vapor can flow in a manner of laminar
flow in the process of testing.
First, we need to define the airflow and calculate the flow rate.
The flow rate can be obtained via V=F/S. Wherein, V is the flow
rate, F is the air flow volume. Assuming that the sum of the
cross-sectional area S1 of the light channel 12 and the side
surface area S2 of the slit 14 which is between the gas outlet 112
of the gas channel 11 and the surface 13 of the sample to be tested
is taken as the airflow cross-sectional area S, i.e.
S=S.sub.1+S.sub.2, wherein, the cross-sectional area 51 of the
light channel 12 is the sum of the cross-sectional area of the
incident light channel 121 and that of the reflected light channel
122. Further assuming that both the cross-sections of the incident
light channel 121 and that of the reflected light channel 122 are
circles, and diameters of them are d, then
S.sub.1=.pi.d.sup.2/2,
assuming that the side superficial area S2 of the slit 14 from gas
outlet 112 of gas channel 11 to surface of the sample to be tested
13 is the superficial area of a cylindrical and that the diameter
of the gas outlet 112 is D, the height of the slit 14 is h, then
S.sub.2=.pi.Dh,
so we can obtain the cross-sectional area of the air flow as
S=.pi.d.sup.2/2+.pi.Dh.
Next, we need to calculate Reynolds number R, which is the basis
for discriminating flow characteristics, R=Vd/.mu.,
wherein, .mu. is dynamic viscosity. If the used gas is air, then
.mu.=2.2.times.10.sup.-5 m.sup.2/s.
In the present invention, the gas flows in a manner of laminar flow
when Reynolds number is less than 200. In that case, the inner
diameter D of the gas outlet 112 of the gas channel 11, the inner
diameter d of the light channel 12, and the height h of the slit 14
i.e. the height from gas outlet 112 of gas channel 11 to a surface
of the sample to be tested 13 meet the relational expression below,
so that the gas can flow in a manner of laminar flow:
Fd/.pi.(d.sup.2/2+Dh).mu.<200,
wherein F is gas flow, d is the inner diameter of the light
channel, D is the inner diameter of the gas outlet of the gas
channel, h is the height from the gas outlet of said gas channel to
the surface of the sample to be tested, .mu. is dynamic
viscosity.
Preferably, the inner diameter of the gas outlet 112 is 0.1-250 mm
and that of the light channel 12 is 0.5-20 mm. Preferably, the
height from the gas outlet 112 of the gas channel 11 to the surface
of the sample to be tested 13 is 0.1-10 mm. The length of the inner
diameter of the air inlet 111 of the gas channel is 0.1-20 mm.
Preferably, the diameter of the cross-sectional area in the gas
injection device where air channel outlet being formed is 1-300
mm.
In a more specific embodiment, the inner diameter d of the light
channel 12 of the gas injection device is 3 mm, the inner diameter
D of gas outlet 112 of gas channel 11 is 5 mm and the height h of a
slit 14 between gas outlet 112 and the surface of sample to be
tested 13 is 0.4 mm. Assuming that the range of change of air flow
is 2-20 L/h, then the airflow cross-sectional area based upon the
formula above can be obtained as S=0.2 cm.sup.2. When the gas flow
is 2 L/h, the flow rate V is 2.8 cm/s, and when the gas flow is 20
L/h, the flow rate V is 28 cm/s. When the gas flow is 2 L/h, R is
6.4, and when the gas flow is 20 L/h, R is 64. It means that the
airflow in the gas injection device with the parameters listed
above flows in a manner of laminar flow.
In addition, it is necessary for the gas channel 11 to be designed
with a sufficient length so as to prevent atmosphere air from
returning back to the measurement area. We may use Peclet number Pe
to estimate the diffusion and convection of the airflow in the gas
injection device of present invention. In the present invention, Pe
may be described as Pe=VL/D.sub.a, wherein, V denotes flow rate, L
denotes length of the gas channel 11, D.sub.a denotes diffusion
coefficient of the air in Argon, which approximates as 0.2
cm.sup.2/s. When Pe is less than 1, diffusion dominates; and when
Pe is larger than 1, the impact of diffusion can be ignored.
Therefore, in this embodiment the gas channel 11 is designed with a
sufficient length so as to prevent atmosphere air from returning
back to the measurement area. Further preferably, the length L of
the gas channel is 0.1-10 cm. Therefore, when the air flow is 2
L/h, Peclet number Pe is 10.5; when the air flow is 20 L/h, Pe is
105. When Pe is greater than 10, the impact of diffusion may be
ignored. It shows that gas injection device disclosed in the
present invention can effectively prevent backflow of air, in
particular when the flow rate is quite low.
It should be noted that structure of the gas injection device shown
in FIG. 1 is only a schematic representation, which shall not be
construed as limiting the present invention. Its outer shape can be
of any other shape such as a cylinder. For a more clear
explanation, FIGS. 2-4 shows schematic structure views of some
embodiments of the gas injection device. It is obvious that the gas
injection device may be in different shapes. As long as the light
channel, the gas channel and the related parameters of the slit 14
satisfy the scope involved in present invention, they all should be
covered by the scope of present invention.
In addition, in the above-described embodiments, the circle shape
is taken as an example to calculate the cross-sectional area of the
light channel. However, the light channel is not limited to the
circular shape. For example, the light channel can be of any shape,
such as an ellipse or a rectangle. Size of the inner diameter of
incident light channel and reflected light channel can also be
different. In addition, the light path may also be non-cylindrical,
i.e., the apertures of light incident and exiting through the light
path may vary in size. The angle to set light channel and gas
channel may be adjusted according to the actual situation. FIGS. 5
and 6 show light channel structure in some embodiments.
The above is only a specific embodiment of the present invention,
but the scope of the present invention is not limited thereto, and
any person skilled in the art can easily think of changes or
substitutions within the technical scope of the present invention,
all of which should be covered by the scope of the present
invention.
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