U.S. patent number 10,403,819 [Application Number 15/322,416] was granted by the patent office on 2019-09-03 for pixel define layer and manufacturing method thereof and related light emitting display.
This patent grant is currently assigned to BOE Technology Group Co., Ltd.. The grantee listed for this patent is BOE TECHNOLOGY GROUP CO., LTD.. Invention is credited to Hao-Chih Hung, Hsiao-Wen Hung.
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United States Patent |
10,403,819 |
Hung , et al. |
September 3, 2019 |
Pixel define layer and manufacturing method thereof and related
light emitting display
Abstract
A pixel define layer and manufacturing method thereof and the
related light emitting display are disclosed. The pixel define
layer is arranged on a conductive layer of a substrate and
comprises a base film layer. The base film layer has a plurality of
openings each of which corresponds to a light-emitting region of a
sub-pixel unit. A spacing base body is formed between the adjacent
openings. An upper surface of each spacing base body is coated with
a hydrophobic quantum dot material and a side wall of each opening
is coated with a hydrophilic quantum dot material. With the pixel
define layer and manufacturing method thereof and the related light
emitting display according to embodiments of the disclosure, the
ink within the sub-pixel would not ooze to the outside of the
sub-pixel to result in color mixture between the adjacent
sub-pixels, and the light emitting region within the pixel would
not be decreased. By selecting suitable quantum dot materials, the
photochromic efficiency can be improved. The process is simple and
suitable for large size.
Inventors: |
Hung; Hsiao-Wen (Beijing,
CN), Hung; Hao-Chih (Beijing, CN) |
Applicant: |
Name |
City |
State |
Country |
Type |
BOE TECHNOLOGY GROUP CO., LTD. |
Beijing |
N/A |
CN |
|
|
Assignee: |
BOE Technology Group Co., Ltd.
(Beijing, CN)
|
Family
ID: |
53457221 |
Appl.
No.: |
15/322,416 |
Filed: |
February 19, 2016 |
PCT
Filed: |
February 19, 2016 |
PCT No.: |
PCT/CN2016/074133 |
371(c)(1),(2),(4) Date: |
December 27, 2016 |
PCT
Pub. No.: |
WO2016/145965 |
PCT
Pub. Date: |
September 22, 2016 |
Prior Publication Data
|
|
|
|
Document
Identifier |
Publication Date |
|
US 20180138411 A1 |
May 17, 2018 |
|
Foreign Application Priority Data
|
|
|
|
|
Mar 19, 2015 [CN] |
|
|
2015 1 0122737 |
|
Current U.S.
Class: |
1/1 |
Current CPC
Class: |
H01L
51/0096 (20130101); H01L 27/3246 (20130101); H01L
27/3283 (20130101); H01L 51/0012 (20130101); H01L
51/0005 (20130101); H01L 51/502 (20130101) |
Current International
Class: |
H01L
27/32 (20060101); H01L 51/00 (20060101); H01L
51/50 (20060101) |
References Cited
[Referenced By]
U.S. Patent Documents
Foreign Patent Documents
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|
|
102110788 |
|
Jun 2011 |
|
CN |
|
102157707 |
|
Aug 2011 |
|
CN |
|
104020560 |
|
Sep 2014 |
|
CN |
|
104167430 |
|
Nov 2014 |
|
CN |
|
104733505 |
|
Jun 2015 |
|
CN |
|
Other References
Written Opinion of the International Searching Authority from
corresponding PCT Application No. PCT/CN 2016/074133, dated May 30,
2016 (3 pages). cited by applicant .
Office Action from corresponding Chinese Application No.
201510122737.5, dated Mar. 27, 2017 (7 pages). cited by
applicant.
|
Primary Examiner: Slutsker; Julia
Attorney, Agent or Firm: Harness, Dickey & Pierce,
P.L.C.
Claims
What is claimed is:
1. A pixel define layer arranged on a conductive layer of a
substrate, the pixel define layer comprising: a base film layer
defining a plurality of openings and at least one spacing base
body, each of the plurality of openings corresponding to a
light-emitting region of a sub-pixel unit and including a side
wall, and each spacing base body positioned between adjacent ones
of the plurality of openings and including an upper surface;
wherein the upper surface of each spacing base body is coated with
a hydrophobic quantum dot material, and the side wall of each
opening is coated with a hydrophilic quantum dot material.
2. The pixel define layer according to claim 1, wherein a
longitudinal section of the spacing base body defines a trapezoid
or a reversed trapezoid.
3. The pixel define layer according to claim 1, wherein a height of
the spacing base body is in a range of 0.1 .mu.m-100 .mu.m.
4. The pixel define layer according to claim 1, wherein a height of
the spacing base body is in a range of 0.5 .mu.m-5 .mu.m.
5. The pixel define layer according to claim 1, wherein a bottom of
each opening is coated with the hydrophilic quantum dot
material.
6. The pixel define layer according to claim 1, wherein the
substrate comprises a conductive glass substrate.
7. A light emitting display including a display surface and the
pixel define layer according to claim 1.
8. A method for manufacturing a pixel define layer, the method
comprising: forming a base film layer by coating a layer of
photoresist on a conductive layer of a substrate, and forming a
plurality of openings and a plurality of spacing base bodies by
exposing, developing and etching the layer of photoresist, each of
the openings corresponding to a light-emitting region of a
sub-pixel unit and including a side wall and a bottom, and each
spacing base body formed between adjacent ones of the plurality of
openings and including an upper surface; and spraying a hydrophobic
quantum dot material on the upper surfaces of the spacing base
bodies, and spraying a hydrophilic quantum dot material on the side
walls of the openings or the side walls and the bottoms of the
openings.
9. The method according to claim 8, wherein the photoresist
comprises a negative photoresist and a longitudinal section of each
spacing base body defines a reversed trapezoid.
10. The method according to claim 8, wherein the photoresist
comprises a positive photoresist and a longitudinal section of each
spacing base body defines a trapezoid.
11. The method according to claim 8, wherein: the hydrophobic
quantum dot material is transformed into the hydrophilic quantum
dot material by functional group replacement, ultrasonic
emulsification or photo-irradiation; or the hydrophilic quantum dot
material is transformed into the hydrophobic quantum dot material
by functional group replacement.
12. The method according to claim 8, wherein the substrate
comprises conductive glass.
13. A method for manufacturing a pixel define layer, the method
comprising: forming a base film layer by coating a layer of
photoresist on a conductive layer of a substrate, and forming a
plurality of openings and a plurality of spacing base bodies by
exposing, developing and etching the layer of photoresist, each of
the openings corresponding to a light-emitting region of a
sub-pixel unit and including a side wall and a bottom, and each
spacing base body formed between adjacent ones of the plurality of
openings and including an upper surface; and spraying the
hydrophilic quantum dot material on the upper surfaces of the
spacing base bodies and the side walls of the openings, or spraying
the hydrophilic quantum dot material on the upper surfaces of the
spacing base bodies and the side walls and the bottoms of the
openings; and transforming the hydrophilic quantum dot material on
the upper surfaces of the spacing base bodies into hydrophobic
quantum dot material.
14. The method according to claim 13, wherein the photoresist
comprises a negative photoresist and a longitudinal section of the
spacing base body defines a reversed trapezoid.
15. The method according to claim 13, wherein the photoresist
comprises a positive photoresist and a longitudinal section of the
spacing base body defines a trapezoid.
16. The method according to claim 13, wherein: the hydrophobic
quantum dot material is transformed into the hydrophilic quantum
dot material by functional group replacement, ultrasonic
emulsification or photo-irradiation; or the hydrophilic quantum dot
material is transformed into the hydrophobic quantum dot material
by functional group replacement.
17. A method for manufacturing a pixel define layer, the method
comprising: forming a base film layer by coating a layer of
photoresist on a conductive layer of a substrate, and forming a
plurality of openings and a plurality of spacing base bodies by
exposing, developing and etching the layer of photoresist, each of
the openings corresponding to a light-emitting region of a
sub-pixel unit and including a side wall and a bottom, and each
spacing base body formed between adjacent ones of the plurality of
openings and including an upper surface; and spraying the
hydrophobic quantum dot material on the upper surfaces of the
spacing base bodies and the side walls of the openings, or spraying
the hydrophobic quantum dot material on the upper surfaces of the
spacing base bodies and the side walls and the bottoms of the
openings; and transforming the hydrophobic quantum dot material on
the side walls of the openings or the side walls and bottoms of the
openings into hydrophilic quantum dot material.
18. The method according to claim 17, wherein the photoresist
comprises a negative photoresist and a longitudinal section of the
spacing base body defines a reversed trapezoid.
19. The method according to claim 17, wherein the photoresist
comprises a positive photoresist and a longitudinal section of the
spacing base body defines a trapezoid.
20. The method according to claim 17, wherein: the hydrophobic
quantum dot material is transformed into the hydrophilic quantum
dot material by functional group replacement, ultrasonic
emulsification or photo-irradiation; or the hydrophilic quantum dot
material is transformed into the hydrophobic quantum dot material
by functional group replacement.
Description
This application claims the benefit and priority of Chinese Patent
Application No. 201510122737.5 filed on Mar. 19, 2015, the entire
disclosure of which is incorporated by reference herein.
TECHNICAL FIELD
Exemplary embodiments of the present disclosure relate to a pixel
define layer and manufacturing method thereof and related light
emitting display.
BACKGROUND
There are two kinds of film-forming methods for Organic Light
Emitting Diode (OLED): evaporation process and solution-based
process. The evaporation process is relatively mature for small
size OLED, and has been applied to mass production currently. The
solution-based process mainly comprise inkjet printing, nozzle
coating, spin coating and screen printing, etc. The inkjet printing
technique is considered as an important method for large size OLED
to achieve mass production, due to high efficiency of material
utilization and implementation of large size.
In the inkjet printing process, a pixel define layer (Bank) needs
to be manufactured on electrodes of a substrate in advance to
define that the ink flows into a specified sub-pixel region
accurately. An upper surface of the pixel define layer requires a
hydrophobic material with low surface energy to ensure that the ink
would not ooze to the outside of the pixel to result in color
mixture between the pixels. An inclined surface of the pixel define
layer requires a hydrophilic material with high surface energy to
ensure that the liquids can spread on a conductive glass within the
pixel without an aperture. In addition, luminous efficiency of a
light emitting display is also a bottleneck for materials.
As to the existing pixel define layer with trapezoid shape, after
the hydrophobic treatment, the organic layer spreads badly. There
may exist an un-spreading region at the edges of the conductive
glass and the pixel define layer, which may, after evaporation of
cathodes, cause cathode and anode short circuit to leakage. The
pixel define layer with reversed trapezoid shape may allow the ink
to spread well within the pixel. However such the pixel define
layer may reduce discontinuous light emitting region of the
cathode. Therefore it needs to increase film thickness or evaporate
the cathode thickly. A double-layer pixel define layer with
trapezoid shape may avoid the cathode and anode short circuit in a
single-layer pixel define layer, and may be possible to reduce the
light emitting region.
SUMMARY
According to embodiments of the present disclosure, a pixel define
layer and manufacturing method thereof and the related light
emitting display are provided, which can ensure that the ink within
a sub-pixel would not ooze to the outside of the sub-pixel to
result in color mixture between adjacent sub-pixels, and cannot
reduce the light emitting region within the pixel. By selecting
suitable quantum dot materials, the photochromic efficiency can be
improved. In addition, the process is simple and is suitable for
large size.
According to a first aspect of the disclosure, a pixel define layer
is provided. The pixel define layer is arranged on a conductive
layer of a substrate and comprises a base film layer. The base film
layer has a plurality of openings, each of which corresponds to a
light-emitting region of a sub-pixel unit. A spacing base body is
formed between the adjacent openings. An upper surface of each
spacing base body is coated with a hydrophobic quantum dot material
and a side wall of each opening is coated with a hydrophilic
quantum dot material.
According to some embodiments of the disclosure, a longitudinal
section of the spacing base body presents trapezoid or reversed
trapezoid.
According to some embodiments of the disclosure, a height of the
spacing base body is 0.1-100 .mu.m.
According to some embodiments of the disclosure, a height of the
spacing base body is 0.5-5 .mu.m.
According to some embodiments of the disclosure, a bottom of each
opening is coated with a hydrophilic quantum dot material.
According to some embodiments of the disclosure, the substrate is a
conductive glass substrate.
According to a second aspect of the disclosure, a light emitting
display employing the pixel define layer described above is
provided.
According to a third aspect of the disclosure, a method for
manufacturing a pixel define layer is provided. The method
comprises:
S1: coating a layer of photoresist on a conductive layer of a
substrate, forming a plurality of openings by exposing, developing
and etching, each of the openings corresponding to a light-emitting
region of a sub-pixel unit, and a spacing base body being formed
between adjacent openings, thereby forming a base film layer;
S2: spraying a hydrophobic quantum dot material on upper surfaces
of the spacing base bodies, and spraying a hydrophilic quantum dot
material on side walls of the openings or the side walls and
bottoms of the openings; or
spraying the hydrophilic quantum dot material on the upper surfaces
of the spacing base bodies and the side walls of the openings, or
spraying the hydrophilic quantum dot material on the upper surfaces
of the spacing base bodies and the side walls and bottoms of the
openings, and transforming the hydrophilic quantum dot material on
the upper surfaces of the spacing base bodies into the hydrophobic
quantum dot material; or
spraying the hydrophobic quantum dot material on the upper surfaces
of the spacing base bodies and the side walls of the openings, or
spraying the hydrophobic quantum dot material on the upper surfaces
of the spacing base bodies and the side walls and bottoms of the
openings, and transforming the hydrophobic quantum dot material on
the side walls of the openings or the side walls and bottoms of the
openings into the hydrophilic quantum dot material.
According to some embodiments of the disclosure, the photoresist is
a negative photoresist and a longitudinal section of the spacing
base body presents reversed trapezoid in S1.
According to some embodiments of the disclosure, the photoresist is
a positive photoresist and a longitudinal section of the spacing
base body presents trapezoid in S1.
According to some embodiments of the disclosure, in S2, the
hydrophobic quantum dot material is transformed into the
hydrophilic quantum dot material by means of functional group
replacement, ultrasonic emulsification or photo-irradiation.
Alternatively, the hydrophilic quantum dot material is transformed
into the hydrophobic quantum dot material by means of functional
group replacement.
According to some embodiments of the disclosure, the substrate is
made of conductive glass.
BRIEF DESCRIPTION OF DRAWINGS
To explain the embodiments of the disclosure or the technical
solution in the prior art more clearly, the drawings used in the
description of the embodiments or the prior art will be described
briefly. It is obvious that the drawings described below are merely
some embodiments of the disclosure, those of ordinary skill in the
art can achieve other drawings according to these drawings without
creative efforts.
FIG. 1 is a plan view of the pixel define layer according to an
embodiment of the disclosure;
FIG. 2 is a cross-section view of the pixel define layer shown in
FIG. 1 along the A-A direction;
FIG. 3 is a flowchart of the method for manufacturing the pixel
define layer according to an embodiment of the disclosure;
FIG. 4 is a cross-section view illustrating the coating of the
positive photoresist in the manufacturing method according to an
embodiment of the disclosure;
FIG. 5 is a cross-section view of the base film layer formed by the
manufacturing method according to an embodiment of the
disclosure;
FIG. 6 is a cross-section view of the pixel define layer
manufactured by the manufacturing method according to an embodiment
of the disclosure;
FIG. 7 is a cross-section view of the pixel define layer
manufactured by the manufacturing method according to another
embodiment of the disclosure;
FIG. 8 is a cross-section view illustrating the coating of the
negative photoresist in the manufacturing method according to
another embodiment of the disclosure;
FIG. 9 is a cross-section view of the base film layer formed by the
manufacturing method according to another embodiment of the
disclosure; and
FIG. 10 is a cross-section view of the pixel define layer
manufactured by the manufacturing method according to yet another
embodiment of the disclosure.
DETAILED DESCRIPTION
The technical solutions in the embodiments of the disclosure will
be described clearly and completely in connection with the
drawings. Obviously, the embodiments described are only a part of
the embodiments of the disclosure, but not all the embodiments.
Based on the embodiments of the disclosure, all the other
embodiments achieved by those of ordinary skill in the art without
creative efforts belong to the scope of protection of the
disclosure.
It should be noted that terms "up", "down", "top", "bottom"
indicating a direction or position relationship are based on the
direction or position relationship in the drawings. It is only to
simplify the description, but not to indicate or imply that the
devices or elements must have specific direction or are constructed
or operated in a specific direction. They should not be understood
as limitation of the disclosure.
In addition, an expression such as "first", "second" and "third" in
the disclosure is only for the purpose of description, but cannot
be understood as indicating or implying the relative importance.
Expression of "a plurality of" indicates two or more except for
other specific definition.
Generally a pixel unit includes three sub-pixels, i.e. red (R),
green (G) and blue (B), or four sub-pixels, i.e. red (R), green
(G), blue (B) and white (W). FIG. 1 is a plan view of the pixel
define layer according to an embodiment of the disclosure, which
shows the pixel define layer for one pixel. As shown, the pixel
define layer has three openings for containing red (R) ink, green
(G) ink and blue (B) ink respectively to form the pixel unit with
three sub-pixels. FIG. 2 is a cross-section view of the pixel
define layer shown in FIG. 1 along A-A direction. As shown in FIGS.
1 and 2, the pixel define layer is arranged on the conductive layer
of the substrate 1. The pixel define layer comprises a base film
layer 2 which includes a plurality of openings 3. Each of the
openings corresponds to a light-emitting region of a sub-pixel
unit. A spacing base body 4 is formed between the adjacent openings
3. The upper surface of each spacing base body 4 is coated with a
hydrophobic quantum dot material 5, and the sidewall of each
opening 3 is coated with a hydrophilic quantum dot material 6. The
longitudinal section of the spacing base body 4 may present
trapezoid or reversed trapezoid.
According to some embodiments of the disclosure, the bottom of the
opening 3 is also coated with the hydrophilic quantum dot material
6. It should be noted that the bottom of the opening 3 is the
surface of the conductive layer of the substrate 1.
According to some embodiments of the disclosure, the height (H) of
the spacing base body 4 may be 0.1 .mu.m-100 .mu.m, as shown in
FIG. 2. According to some embodiments of the disclosure, the height
(H) of the spacing base body 4 may be 0.5 .mu.m-5 .mu.m. For
example, the height (H) of the spacing base body 4 may be 0.1
.mu.m, 0.5 .mu.m, 5 .mu.m, 10 .mu.m, 20 .mu.m, 50 .mu.m and 100
.mu.m.
Using the pixel define layer according to some embodiments of the
disclosure to manufacture the light emitting display can ensure
that the ink within the sub-pixel would not ooze to the outside of
the sub-pixel to result in color mixture between the adjacent
sub-pixels, and can ensure that the ink spreads on the substrate
within the sub-pixel to avoid apertures. The manufacturing process
is simple and suitable for large size. Also, the emission spectrum
of the quantum dot has the advantages of continuity and high color
rendering. Therefore the quantum dot exciting spectrum is wide and
presents continuous distribution. Sometimes the quantum dot with
different colors can be excited by the same wavelength of light,
such that the desired spectrum can be selected efficiently to
increase the emission efficiency.
It should be noted that the embodiments described above only takes
one pixel as an example. Actually, in some embodiments, the base
film layer is formed on the substrate, and the base film layer has
the openings arranged in arrays. The side walls of the openings are
coated with the hydrophilic quantum dot material, and the spacing
base bodies between the adjacent openings are coated with the
hydrophobic quantum dot material. In order to avoid the pollution
between any pixels and sub-pixels, the whole upper surface of the
base film layer is sprayed with the hydrophobic quantum dot
material, which falls within the scope of the present
disclosure.
With reference to FIG. 3, the method for manufacturing the pixel
define layer according to an embodiment of the disclosure
comprises:
S1: coating a layer of photoresist on the conductive layer of the
substrate, forming a plurality of openings by exposing, developing
and etching, each of the openings corresponding to the
light-emitting region of the sub-pixel unit, and the spacing base
body being formed between adjacent openings, thereby forming a base
film layer;
S2: spraying the hydrophobic quantum dot material on the upper
surfaces of the spacing base bodies, and spraying the hydrophilic
quantum dot material on the side walls of the openings or the side
walls and the bottoms of the openings; or spraying the hydrophilic
quantum dot material on the upper surfaces of the spacing base
bodies and the side walls of the openings or spraying the
hydrophilic quantum dot material on the upper surfaces of the
spacing base bodies and the side walls and the bottoms of the
openings, and transforming the hydrophilic quantum dot material on
the upper surfaces of the spacing base bodies into the hydrophobic
quantum dot material; or spraying the hydrophobic quantum dot
material on the upper surfaces of the spacing base bodies and the
side walls of the openings or spraying the hydrophobic quantum dot
material on the upper surfaces of the spacing base bodies and the
side walls and the bottoms of the openings, and transforming the
hydrophobic quantum dot material on the side walls of the openings
or the side walls and the bottoms of the openings into the
hydrophilic quantum dot material.
Next the method for manufacturing the pixel define layer for the
pixel including three sub-pixels will be described, as an
example.
As shown in FIG. 4, a layer of positive photoresist 11 is coated on
the conductive layer of the substrate 1. According to some
embodiments of the disclosure, the substrate 1 may be made of
conductive glass, but not limit to the conductive glass. The
conductive glass may be formed by forming a layer of transparent
conductive oxide, such as indium tin oxide, aluminum zinc oxide and
indium zinc oxide, etc. on the upper surfaces of the transparent
glass by means of sputtering or ion plating.
As shown in FIG. 5, after exposing and developing the positive
photoresist 11, a plurality of openings 3 may be formed by
photo-etching the positive photoresist using a mask plate. Each of
the openings 3 corresponds to the light-emitting region of the
sub-pixel unit, and the spacing base body 4 is formed between the
adjacent openings 3. Thus the base film layer 2 can be formed.
According to some embodiment of the disclosure, the longitudinal
section of the spacing base body 4 may present trapezoid.
As shown in FIG. 6, the hydrophobic quantum dot material 5 is
sprayed on the upper surfaces of spacing base bodies 4, and the
hydrophilic quantum dot material 6 is sprayed on the side walls and
the bottoms of the openings 3. Alternatively, as shown in FIG. 7,
the hydrophobic quantum dot material 5 is sprayed on the upper
surfaces of the spacing base bodies 4, and the hydrophilic quantum
dot material 6 is sprayed on the side walls of the openings 3.
It should be noted that the positive photoresist can be replaced
with the negative photoresist, and the longitudinal section of the
formed spacing base body can present reversed trapezoid.
Next another method for manufacturing the pixel define layer of the
pixel with three sub-pixels will be described, as an example.
As shown in FIG. 8, a layer of negative photoresist 12 is coated on
the conductive layer of the substrate 1.
As shown in FIG. 9, after exposing and developing the negative
photoresist 12, a plurality of openings 3 may be formed by
photo-etching the negative photoresist 12 using the mask plate.
Each of the openings 3 corresponds to the light-emitting region of
the sub-pixel unit, and the spacing base body 4 is formed between
the adjacent openings 3. Thus the base film layer 2 is formed.
According to some embodiment of the disclosure, the longitudinal
section of the spacing base body 4 may present reversed
trapezoid.
As shown in FIG. 10, the hydrophobic quantum dot material 5 is
sprayed on the upper surfaces of the spacing base bodies 4 and the
side walls and the bottoms of the openings 3. The hydrophobic
quantum dot material 5 on the side walls of the openings 3 or on
the side walls and the bottoms of the openings 3 may be transformed
into the hydrophilic quantum dot material 6 by means of functional
group replacement, ultrasonic emulsification or photo-irradiation.
For example, the hydrophobic quantum dot material may be
transformed into the hydrophilic quantum dot material by means of
mercaptocarboxylic acid substitution. Alternatively, after the
upper surfaces of the spacing base bodies 4 are covered with the
mask plate, the base film layer may be irradiated with the
ultraviolet (e.g. the ultraviolet with the wavelength about 2540
Angstroms). Then the hydrophobic quantum dot material on the side
walls and the bottoms of the openings 3 may be transformed into the
hydrophilic quantum dot material.
It should be noted that the negative photoresist may be replaced
with the positive photoresist, and the longitudinal section of the
formed spacing base body can present trapezoid. It is also possible
to spray no quantum dot material on the bottoms of the
openings.
According to yet another embodiment of the disclosure, the
difference from the above embodiments is that the hydrophilic
quantum dot material may be sprayed on the upper surfaces of the
spacing base bodies and the side walls of the openings, or the
hydrophilic quantum dot material may be sprayed on the upper
surfaces of the spacing base bodies and the side walls and the
bottoms of the openings. The hydrophilic quantum dot material on
the upper surfaces of the spacing base bodies may be transformed
into the hydrophobic quantum dot material by means of functional
group replacement.
It should be noted that, in some embodiments of the disclosure, the
spraying may be nozzle spraying or arc spraying.
The pixel define layer manufactured by the method for manufacturing
the pixel define layer according to some embodiments of the
disclosure comprises the base film layer, and the side walls of the
openings in the base film layer or the side walls and the bottoms
of the openings are coated with the hydrophilic quantum dot
material, and the upper surfaces of the spacing base bodies are
coated with the hydrophobic quantum dot material. Therefore the ink
within the pixel would not ooze to the outside of the pixel to
result in color mixture between adjacent pixels. Compared with
other types of double-layer pixel define layer, the light emitting
region within the pixel would not be decreased. By selecting the
suitable quantum dot material, the photochromic efficiency can be
improved. The manufacturing process is simple and suitable for
large size. The material of the quantum dot can be changed to adapt
the actual condition of device.
The above are only specific embodiments of the present disclosure,
but the disclosure is not limited thereto. A person skilled in the
art can make changes and variations within the scope of the present
disclosure. The changes and variations should fall within the
protection scope of the present disclosure. Therefore, the
protection scope of the present disclosure should be defined by the
appended claims.
* * * * *