U.S. patent application number 12/401442 was filed with the patent office on 2010-03-04 for roll-to-roll type apparatus for forming thin film pattern.
This patent application is currently assigned to SAMSUNG ELECTRO-MECHANICS CO., LTD.. Invention is credited to Jeong Min Cho, Young Woo Lee, Dong Joo Shin.
Application Number | 20100053577 12/401442 |
Document ID | / |
Family ID | 41724952 |
Filed Date | 2010-03-04 |
United States Patent
Application |
20100053577 |
Kind Code |
A1 |
Lee; Young Woo ; et
al. |
March 4, 2010 |
ROLL-TO-ROLL TYPE APPARATUS FOR FORMING THIN FILM PATTERN
Abstract
An apparatus for forming a thin film pattern according to an
aspect of the invention may include: an unwinding roll and a
winding roll running a sheet; a rotary drum having an elastic layer
provided on a circumferential surface thereof, and disposed between
the winding roll and the unwinding roll to run the sheet along the
circumferential surface; a source containing unit accommodating a
deposition source and mounted such that the deposition source is
evaporated and the evaporated deposition source moves toward the
sheet located on the rotary drum; a shutter selectively preventing
the movement of the deposition source toward the rotary drum from
the source containing unit; a mask having a pattern defining a
pattern of a thin film to be deposited onto the sheet and making
tight contact with the sheet located on the rotary drum during
thin-film deposition; and a tensioning unit pressurizing the sheet
in a direction of the rotary drum to allow the sheet to run after
the thin-film deposition and separating the sheet from the mask by
a reduction in thickness.
Inventors: |
Lee; Young Woo; (Suwon,
KR) ; Cho; Jeong Min; (Seongnam, KR) ; Shin;
Dong Joo; (Gunpo, KR) |
Correspondence
Address: |
MCDERMOTT WILL & EMERY LLP
600 13TH STREET, N.W.
WASHINGTON
DC
20005-3096
US
|
Assignee: |
SAMSUNG ELECTRO-MECHANICS CO.,
LTD.
|
Family ID: |
41724952 |
Appl. No.: |
12/401442 |
Filed: |
March 10, 2009 |
Current U.S.
Class: |
355/47 ;
355/71 |
Current CPC
Class: |
G03B 27/58 20130101;
H05K 3/143 20130101; H05K 1/0393 20130101; H05K 2203/1545
20130101 |
Class at
Publication: |
355/47 ;
355/71 |
International
Class: |
G03B 27/58 20060101
G03B027/58; G03B 27/72 20060101 G03B027/72 |
Foreign Application Data
Date |
Code |
Application Number |
Aug 29, 2008 |
KR |
10-2008-0085461 |
Claims
1. An apparatus for forming a thin film pattern, the apparatus
comprising: an unwinding roll and a winding roll running a sheet; a
rotary drum having an elastic layer provided on a circumferential
surface thereof, and disposed between the winding roll and the
unwinding roll to run the sheet along the circumferential surface;
a source containing unit accommodating a deposition source and
mounted such that the deposition source is evaporated and the
evaporated deposition source moves toward the sheet located on the
rotary drum; a shutter selectively preventing the movement of the
deposition source toward the rotary drum from the source containing
unit; a mask having a pattern defining a pattern of a thin film to
be deposited onto the sheet and making tight contact with the sheet
located on the rotary drum during thin-film deposition; and a
tensioning unit pressurizing the sheet in a direction of the rotary
drum to allow the sheet to run after the thin-film deposition and
separating the sheet from the mask by a reduction in thickness.
2. The apparatus of claim 1, wherein the tensioning unit comprises
a first tensioning roll located between the unwinding roll and the
rotary drum and a second tensioning roll located between the rotary
drum and the winding roll.
3. The apparatus of claim 1, wherein the mask is mounted onto the
rotary drum to make tight contact with the sheet located on the
rotary drum.
4. The apparatus of claim 1, further comprising a tension sensor
unit measuring tension applied to the sheet.
5. The apparatus of claim 1, wherein the sheet is a dielectric
green sheet, and the deposition source is an electrode material
including Ag or Ni.
6. The apparatus of claim 1, wherein the sheet is a flexible
substrate.
7. The apparatus of claim 1, wherein the thin film is deposited
using one selected from the group consisting of e-beam deposition,
thermal deposition, sputtering, ion-beam deposition, and pulse
laser deposition.
8. An apparatus for forming a thin film pattern, the apparatus
comprising: an unwinding roll and a winding roll; a rotary drum
having an elastic layer provided on a circumferential surface
thereof, and disposed between the unwinding roll and the winding
roll to run the sheet along the circumferential surface; a source
containing unit accommodating a deposition source, and mounted such
that the deposition source is evaporated and the evaporated
deposition source moves toward the sheet located on the rotary
drum; a shutter selectively preventing movement of the deposition
source toward the rotary drum from the source containing unit; a
mask having a pattern defining a pattern of a thin film to be
deposited onto the sheet and disposed between the source containing
unit and the rotary drum; and a mask moving unit providing tight
contact between the mask and the sheet during thin-film deposition
and separating the mask and the sheet from each other to allow the
sheet to run after the thin-film deposition.
Description
CROSS-REFERENCE TO RELATED APPLICATIONS
[0001] This application claims the priority of Korean Patent
Application No. 2008-0085461 filed on Aug. 29, 2008, in the Korean
Intellectual Property Office, the disclosure of which is
incorporated herein by reference.
BACKGROUND OF THE INVENTION
[0002] 1. Field of the Invention
[0003] The present invention relates to roll-to-roll type
apparatuses for forming thin film patterns, and more particularly,
to a roll-to-roll type apparatus for forming a thin film pattern
that forms a desired thin film pattern on a sheet running between
rolls.
[0004] 2. Description of the Related Art
[0005] In general, as digital electronic products have been reduced
in size and increased in functionality, various types of passive
components have correspondingly been reduced in size, thickness,
and weight while functions of the passive components have been
upgraded. Especially, a large number of capacitors are used in
portable small electronic products, such as camera phones, DMB
phones, and navigations. There is growing need to increase the
capacity and functionality of the capacitor while the capacity
needs to be formed of multilayered ultra-thin films.
[0006] However, the existing screen printing method is limited when
achieving high-capacity capacitors within the same chip size. In
order to overcome this limitation, various kinds of methods have
been attempted, and among them, there is a roll-to-roll process.
Significant consideration has been given to this roll-to-roll
because it is more suitable for mass production than an existing
batch type process when implementing a display or a device on a
flexible substrate.
[0007] The roll-to-roll type apparatus for forming a thin film has
advantages of mass production because a process is performed while
a sheet is continuously transferred, but it is difficult to form a
pattern necessary to manufacture a device. There is a method of
forming a layer on a sheet wound in a roll, cutting the sheet, and
arranging the cut sheet. However, since this method may not allow
mass production, it is difficult to use the method when repeating
the formation of a thin film pattern.
[0008] To overcome difficulties, there is a method of forming a
desired pattern on a sheet running between rolls by using a roll
type mask having various patterns as a mask. However, it is
difficult to make tight contact with a deposition object in a
roll-to-roll process using the roll type mask. Therefore, it is
difficult to ensure a precise thin film pattern. When the roll type
mask is used, other devices such as a driving roll and a guide roll
to move the mask are required.
[0009] Further, when any one of the various patterns of the roll
type mask is damaged, the repair of the roll type mask is
difficult.
[0010] Therefore, there is a need for a technique that effectively
forms a thin film pattern in a roll-to-roll process.
SUMMARY OF THE INVENTION
[0011] An aspect of the present invention provides an apparatus for
forming a thin film pattern that can effectively perform a process
of forming a thin film pattern while maintaining mass production
achieved by a roll-to-roll process.
[0012] According to an aspect of the present invention, there is
provided an apparatus for forming a thin film pattern, the
apparatus including: an unwinding roll and a winding roll running a
sheet; a rotary drum having an elastic layer provided on a
circumferential surface thereof, and disposed between the winding
roll and the unwinding roll to run the sheet along the
circumferential surface; a source containing unit accommodating a
deposition source and mounted such that the deposition source is
evaporated and the evaporated deposition source moves toward the
sheet located on the rotary drum; a shutter selectively preventing
the movement of the deposition source toward the rotary drum from
the source containing unit; a mask having a pattern defining a
pattern of a thin film to be deposited onto the sheet and making
tight contact with the sheet located on the rotary drum during
thin-film deposition; and a tensioning unit pressurizing the sheet
in a direction of the rotary drum to allow the sheet to run after
the thin-film deposition and separating the sheet from the mask by
a reduction in thickness.
[0013] The tensioning unit may include a first tensioning roll
located between the unwinding roll and the rotary drum and a second
tensioning roll located between the rotary drum and the winding
roll.
[0014] The mask may be mounted onto the rotary drum to make tight
contact with the sheet located on the rotary drum.
[0015] The apparatus may further include a tension sensor unit
measuring tension applied to the sheet.
[0016] The sheet may be a dielectric green sheet, and the
deposition source may be an electrode material including Ag or
Ni.
[0017] The sheet may be a flexible substrate.
[0018] The thin film may be deposited using one selected from the
group consisting of e-beam deposition, thermal deposition,
sputtering, ion-beam deposition, and pulse laser deposition.
[0019] According to another aspect of the present invention, there
is provided an apparatus for forming a thin film pattern, the
apparatus including: an unwinding roll and a winding roll; a rotary
drum having an elastic layer provided on a circumferential surface
thereof, and disposed between the unwinding roll and the winding
roll to run the sheet along the circumferential surface; a source
containing unit accommodating a deposition source, and mounted such
that the deposition source is evaporated and the evaporated
deposition source moves toward the sheet located on the rotary
drum; a shutter selectively preventing movement of the deposition
source toward the rotary drum from the source containing unit; a
mask having a pattern defining a pattern of a thin film to be
deposited onto the sheet and disposed between the source containing
unit and the rotary drum; and a mask moving unit providing tight
contact between the mask and the sheet during thin-film deposition
and separating the mask and the sheet from each other to allow the
sheet to run after the thin-film deposition.
BRIEF DESCRIPTION OF THE DRAWINGS
[0020] The above and other aspects, features and other advantages
of the present invention will be more clearly understood from the
following detailed description taken in conjunction with the
accompanying drawings, in which:
[0021] FIG. 1 is a schematic view illustrating an apparatus for
forming a thin film pattern according to an exemplary embodiment of
the present invention;
[0022] FIGS. 2A through 2D are schematic views illustrating a
process of forming a thin film pattern according to the embodiment
illustrated in FIG. 1; and
[0023] FIGS. 3A through 3D are schematic views illustrating a
process of forming a thin film pattern in an apparatus for forming
a thin film pattern according to another exemplary embodiment of
the present invention.
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT
[0024] Exemplary embodiments of the present invention will now be
described in detail with reference to the accompanying
drawings.
[0025] FIG. 1 is a schematic view illustrating an apparatus for
forming a thin film pattern according to an exemplary embodiment of
the invention.
[0026] Referring to FIG. 1, a thin film pattern forming apparatus
10 according to this embodiment includes a vacuum chamber 11, an
unwinding roll 12a and a winding roll 12b that are disposed inside
the vacuum chamber 11 to run a sheet 14, and a rotary drum 16 that
is disposed between the unwinding roll 12a and the winding roll
12b.
[0027] The sheet 14 moves along a circumferential surface of the
rotary drum 16. An area of the sheet 14 that is located on the
circumferential surface of the rotary drum 16 is subject to
deposition. The rotary drum 16 may be a cooling rotary drum in
which a coolant flows.
[0028] The rotary drum 16, used in this embodiment, has an elastic
layer 17 formed on the circumferential surface thereof. The elastic
layer 17 may be formed of a material having restoring force. That
is, the material can be reduced by pressurization, and returns to
its original state when the pressure is released. For example, the
elastic layer 17 may be formed of a polymer that is an elastic
body.
[0029] The thin film pattern forming apparatus 10 includes a source
containing unit 20 that accommodates a deposition source M in the
vacuum chamber 11. Though not shown in FIG. 1, the thin film
pattern forming apparatus 10 further includes a unit used to
evaporate the deposition source M to form a thin film on the
surface of the sheet 14, such as an electronic beam. A shielding
layer S may be further included to prevent thin-film deposition of
another sheet area other than a desired area.
[0030] When a deposition area of the sheet 14 is located at the
surface of the rotary drum 16 by the unwinding roll 12a and the
winding roll 12b, a shutter 22 is opened so that the evaporated
deposition source (indicated by arrow) travelling to the rotary
drum 16 from the source containing unit 20 can proceed. When the
sheet 14 is moved after the deposition is completed, the shutter 22
is closed so that the evaporated deposition source does not travel
to the rotary drum 16.
[0031] The thin film pattern forming apparatus 10 includes a mask
18 on the sheet 14 that has a pattern corresponding to a desired
pattern. In this embodiment, when the sheet 14 does not run, the
mask 18 is in tight contact with the sheet 14 located on the rotary
drum 16.
[0032] Like this embodiment, the mask 18 may be disposed onto the
rotary drum 16 by using a known fixing unit 19 such that the mask
18 makes tight contact with the sheet 14 located on the rotary drum
16.
[0033] After the thin-film deposition is completed, the sheet 14 is
run such that another area of the sheet 14 is located as a
deposition area. In order to run the sheet 14, the sheet 14 is
pressurized in a direction of the rotary drum 16 by using a
tensioning unit. This results in a reduction in thickness of the
elastic layer to separate the sheet 14 from the mask 18. As such,
when the sheet 14 is separated from the mask 18, smooth movement of
the sheet 14 can be ensured.
[0034] In this embodiment, the tensioning unit includes a first
tensioning roll 15a located between the unwinding roll 12a and the
rotary drum 16 and a second tensioning roll 15b located between the
rotary drum 16 and the winding roll 12b. Though not shown in FIG.
1, a tension sensor unit (not shown) that measures tension applied
to the sheet 14 may be further included.
[0035] The present invention can be applied to various kinds of
products to improve mass production. For example, the sheet 14 may
be a dielectric green sheet, and the deposition source M may be an
electrode material, such as Ag or Ni, to form an internal
electrode. Alternatively, the sheet 14 may be a flexible substrate,
and an electrode material may be deposited to form a circuit
pattern.
[0036] FIGS. 2A through 2D are schematic views illustrating a
process of forming a thin film pattern according to an exemplary
embodiment of the invention. That is, FIGS. 2A through 2D are
cross-sectional views illustrating the process flow showing a
deposition area of the rotary drum 16 to describe sheet running and
a thin film forming process in the thin film pattern forming
apparatus 10, illustrated in FIG. 1.
[0037] As shown in FIG. 2A, the rotary drum 16 has the elastic
layer 17 formed on the circumferential surface thereof. The sheet
14 is formed at the surface of the elastic layer 17, and the mask
18 having a desired pattern is disposed on the sheet 14. The mask
18 may be almost disposed in tight contact with the sheet 14. The
tight contact between the mask 18 and the sheet 14 allows formation
of more precise patterns. As shown in FIG. 1, the mask 18 may be
fixed to the rotary drum 16.
[0038] Then, as shown in FIG. 2B, a deposition process is performed
on the sheet 14 to form a thin film pattern P. This deposition
process may be performed by opening the shutter 22, shown in FIG.
1. The thin-film deposition may be selected from the group
consisting of e-beam evaporation, thermal evaporation, sputtering,
ion-beam deposition, and pulse laser deposition.
[0039] Then, as shown in FIG. 2C, the sheet 14 is compressed
against the rotary drum 16 by using the tensioning unit. The
compression process causes the elastic layer 17 to be reduced from
a first thickness t1 to a second thickness t1'. As such, the
reduction in thickness of the elastic layer 17 allows the sheet 14
to be separated from the fixed mask 18.
[0040] When the tension is applied to the sheet 14, as shown in
FIG. 2D, the sheet 14 separated from the mask 18 can smoothly run
by driving rolls. After the sheet 14 is moved such that another
deposition area is located on the rotary drum 16, the tension is
released, and the sheet 14 is ready to undergo deposition as shown
in FIG. 2A.
[0041] A thin film pattern can be easily formed at a desired
deposition position by repeating the processes illustrated in FIGS.
2A through 2D.
[0042] FIGS. 3A through 3D are schematic views illustrating a
process of forming a thin film pattern in an apparatus for forming
a thin film pattern according to another exemplary embodiment of
the invention. In this embodiment, a unit that moves a mask is
separately provided, and sheet running and a thin film pattern
forming process are performed using this unit.
[0043] FIGS. 3A through 3D are cross-sectional views illustrating
the process flow showing a deposition area of a rotary drum 26 in
detail to describe sheet running and a thin film pattern forming
process in a thin film pattern forming apparatus 20.
[0044] As shown in FIG. 3A, the rotary drum 26 has an elastic layer
27 formed on a circumferential surface thereof. A sheet 24 is
located on the surface of the elastic layer 27. The elastic layer
27 has a relatively large thickness t2 when it is not pressurized.
In this embodiment, the sheet 24 is moved to a deposition position
by running the sheet 24, and then a mask 28 is located on the sheet
24.
[0045] As shown in FIG. 3B, as the mask 28 having a desired pattern
is disposed on the sheet 24, and then pressurized, the mask 28 and
the sheet 24, where a thin film will be formed, make tight contact
with each other. This tight contact therebetween allows formation
of more precise patterns. Then, a deposition process is performed
on the sheet 24 to form a thin film pattern P. The thin-film
deposition may include e-beam evaporation, thermal evaporation,
sputtering, ion-beam deposition, and pulse laser deposition.
[0046] Then, as shown in FIG. 3C, the sheet 24 is compressed
against the rotary drum 26. A separate moving unit is used to move
the mask 28 so as to be separated from the sheet 24 on which the
thin film pattern P is formed. The elastic layer 27 returns to the
original thickness t2 after the movement of the mask 28.
[0047] When the mask 28 is separated from the sheet 24, as shown in
FIG. 3D, the sheet 24 can smoothly run by driving rolls. After the
sheet 14 is moved to another necessary deposition area, the sheet
24 is ready to undergo deposition as shown in FIG. 3A. A thin film
pattern can be easily formed at a desired deposition position by
repeating the processes illustrated in FIGS. 3A through 3D.
[0048] As set forth above, according to exemplary embodiments of
the invention, since one mask can make tight contact with a
deposition area, a precise thin film pattern can be ensured as
compared to when a roll type mask is used. Further, accompanying
devices related to a mask are simplified, and running of a sheet
can be effectively ensured.
[0049] While the present invention has been shown and described in
connection with the exemplary embodiments, it will be apparent to
those skilled in the art that modifications and variations can be
made without departing from the spirit and scope of the invention
as defined by the appended claims.
* * * * *