U.S. patent application number 10/408696 was filed with the patent office on 2006-08-31 for method and apparatus for maskless photolithography.
Invention is credited to David P. Fries.
Application Number | 20060192932 10/408696 |
Document ID | / |
Family ID | 36821742 |
Filed Date | 2006-08-31 |
United States Patent
Application |
20060192932 |
Kind Code |
A1 |
Fries; David P. |
August 31, 2006 |
METHOD AND APPARATUS FOR MASKLESS PHOTOLITHOGRAPHY
Abstract
A method and apparatus to create two dimensional and three
dimensional structures using a maskless photolithography system
that is semi-automated, directly reconfigurable, and does not
require masks, templates or stencils to create each of the planes
or layers on a multi layer two-dimensional or three dimensional
structure. In an embodiment, the pattern generator comprises a
micromirror array wherein the positioning of the mirrors in the
micromirror array and the time duration of exposure can be
modulated to produce gray scale patterns to photoform layers of
continuously variable thickness. The desired pattern can be
designed and stored using conventional computer aided drawing
techniques and can be used to control the positioning of the
individual mirrors in the micromirror array to reflect the
corresponding desired pattern. A fixture for mounting of the
substrate can be incorporated and can allow the substrate to be
moved three dimensions. The fixture can be rotated in one, two, or
three directions.
Inventors: |
Fries; David P.; (St.
Petersburg, FL) |
Correspondence
Address: |
SALIWANCHIK LLOYD & SALIWANCHIK;A PROFESSIONAL ASSOCIATION
PO BOX 142950
GAINESVILLE
FL
32614-2950
US
|
Family ID: |
36821742 |
Appl. No.: |
10/408696 |
Filed: |
April 7, 2003 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
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10179083 |
Jun 25, 2002 |
6544698 |
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10408696 |
Apr 7, 2003 |
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10179565 |
Jun 25, 2002 |
6998219 |
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10408696 |
Apr 7, 2003 |
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60301218 |
Jun 27, 2001 |
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Current U.S.
Class: |
355/67 ;
355/53 |
Current CPC
Class: |
G03F 7/70291
20130101 |
Class at
Publication: |
355/067 ;
355/053 |
International
Class: |
G03B 27/54 20060101
G03B027/54 |
Goverment Interests
[0002] The subject invention was made with government support under
a research project supported by The Office of Naval Research
funding reference number NOO014-98-1-0848. The government has
certain rights in this invention.
Claims
1-90. (canceled)
91. A maskless photolithography system for photoforming
photosensitive materials using gray scale photolithography
comprising: a. a computer system for generating mask patterns and
alignment instructions; b. a gray scale mask pattern controller,
operably connected to said computer system, for receiving said mask
patterns from said computer system and modulating said mask
patterns using time modulation to provide a gray scale mask
pattern; and c. a gray scale patterned light generator, operably
connected to said gray scale pattern controller, for receiving said
gray scale mask patterns and radiating a gray scaled patterned
light beam; wherein the photosensitive material is exposed to said
gray scaled patterned light beam, wherein said gray scaled
patterned light beam is time modulated.
92. The system of claim 91, wherein said gray scaled patterned
light beam incident on the photosensitive material variably
photosculpts the photosensitive material to create patterns of
continuously variable thickness corresponding to said gray scaled
patterned light beam.
93. The system of claim 91, wherein said gray scaled patterned
light beam incident on the photosensitive material variably
photosculpts the photosensitive material to create patterns of
continuously variable composition corresponding to said gray scaled
patterned light beam.
94. The system of claim 91, wherein said gray scale mask pattern
controller is incorporated in said computer system.
95. The system of claim 91, wherein said gray scaled patterned
light generator comprises: a. an array of positionable
micromirrors, wherein said micromirrors reflect light according to
said gray scale mask patterns provided by said gray scale mask
pattern controller by varying the angular position of each of said
micromirrors to reflect light towards or away from the
photosensitive material, wherein the duration of exposure of the
photosensitive material to said gray scaled patterned light beam is
controlled by said gray scale mask pattern controller by varying
the angular position of said micromirrors to modulate the intensity
of said gray scaled patterned light reflected to the photosensitive
material to achieve gray scale photosculpting of the photosensitive
material; and b. an optical system for generating and directing the
light beam to said micromirror array.
96. The system of claim 95, further comprising: an optical system
for collimating the gray scale patterned light beam reflected from
said micromirror array and directing said patterned light beam onto
the photosensitive materials to create patterns on the
photosensitive material corresponding to said gray scale mask
patterns incident on the photosensitive material.
97. The system of claim 153, wherein said gray scaled patterned
light generator comprises: a. a variably transmissive filter array
device having individually addressable pixels, capable of being
addressed to be opaque, to prevent light transmission, and capable
of being addressed to be transparent, to allow light transmission,
wherein said variably transmissive filter array device prevents
light transmission by causing said pixels to be in an opaque state
or a transparent state according to said gray scale mask patterns
provided by said gray scale mask pattern controller, wherein the
intensity of said gray scaled patterned light transmitted to the
photosensitive material is varied by modulating the transmissive
properties of said variably transmissive filter array device to
achieve gray scale photosculpting of the photosensitive material;
b. an optical system for generating and directing the light beam to
said variably transmissive filter array device.
98. The system of claim 97, further comprising: an optical system
for collimating the gray scale patterned light beam transmitted by
said variably transmissive filter array device and directing said
patterned light beam onto the photosensitive materials to create
patterns on the photosensitive material corresponding to said gray
scale mask patterns incident on the photosensitive material.
99. The system of claim 97, wherein the variably transmissive
filter array device comprises Liquid Crystal Display (LCD)
pixels.
100. The system of claim 91, wherein said gray scaled patterned
light generator comprises: a. a plasma display device, having
individually addressable pixels, operably connected to and
controllable by said computer system, wherein said display
generates said patterned light beam corresponding to said gray mask
patterns provided by said computer system to expose the
photosensitive material, wherein the intensity and duration of
exposure of the photosensitive material to said gray scaled
patterned light beam is controlled by said gray scale mask pattern
controller to achieve gray scale photosculpting of the
photosensitive material; b. an optical system for generating and
directing the light beam to said plasma display device.
101. The system of claim 100, further comprising: an optical system
for collimating the gray scale patterned light beam generated by
said plasma display device and directing said patterned light beam
onto the photosensitive materials to create patterns on the
photosensitive material corresponding to said gray scale mask
patterns incident on the photosensitive material.
102. The system of claim 91, further comprising: a manually
controlled alignment fixture for detachably mounting the
photosensitive material, wherein said alignment fixture is movable
in coplanar first and second dimensions, and in a third dimension
direction substantially perpendicular to said first and second
coplanar dimensions and substantially parallel to said patterned
light beam; said fixture providing three dimensional alignment of
the photosensitive material beneath said patterned light beam,
wherein said alignment fixture is moved in three dimensions in
response to mechanical alignments directly provided by a user.
103. The system of claim 91, further comprising: an alignment
fixture for mounting the photosensitive material, wherein said
alignment fixture allows alignment of the photosensitive material
in coplanar first and second dimensions, and in a third dimension
substantially perpendicular to the first and second coplanar
dimensions.
104. The system of claim 102, further comprising: a means for
controlling the rotation of the alignment fixture in at least a
first direction such that controlling the rotation of the alignment
fixture in at least a first direction controls the rotation of the
photosensitive material in the at least first direction.
105. The system of claim 104, wherein the means for controlling the
rotation of the alignment fixture in at least a first direction
controls the rotation of the alignment fixture in a first
direction, controls the rotation of the alignment fixture in a
second direction perpendicular to the first direction, and controls
the rotation of the alignment fixture in a third direction
perpendicular to both the first direction and the second
direction.
106. The system according to claim 103, wherein the means for
controlling the position of the alignment fixture is interconnected
with the computer system such that control of the position of the
alignment fixture is coordinated with control of the gray scale
patterned light generator.
107. The system according to 104, wherein the means for controlling
the rotation of the alignment fixture in at least a first direction
is interconnected with the computer system such that control of the
rotation of the alignment fixture is coordinated with control of
the gray scale patterned light generator.
108. The system of claim 91, further comprising a computer
controlled pattern alignment system, for providing electrical
alignment of said patterns in coplanar first and second dimensions,
wherein said pattern alignment system adjusts the alignment of said
mask patterns in coplanar first and second dimensions in response
to instructions provided by said computer according to said
alignment information, so that said pattern is shifted in at least
one coplanar direction.
109. The system of claim 91, further comprising an optical viewer
to allow optical monitoring of positioning of the photosensitive
material mounted in said alignment fixture by visually verifying
that an image projected on the immersed substrate is properly
aligned.
110. The system of claim 91, further comprising an optical filter,
removably mounted in the light beam to selectively filter light
impinging on the photosensitive material to prevent exposure of the
photosensitive material during an alignment procedure.
111. A method for maskless photolithography for photoforming
photosensitive materials using gray scale photolithography
comprising: a. receiving mask pattern information corresponding to
a desired pattern to be created on the photosensitive material; b.
generating mask patterns based on received said mask pattern
information; c. receiving gray scale information corresponding to a
desired gray scale pattern to be created on the photosensitive
material; d. generating gray scaled mask patterns based on said
mask pattern information and said gray scale information, wherein
generating gray scaled mask patterns comprises applying a time
modulation scheme to the mask patterns; d. providing said gray
scale mask patterns to a patterned light generator; e. generating a
gray scale patterned light beam; f. directing said gray scale
patterned light beam onto the photosensitive material; and g.
exposing the photosensitive material to said gray scale patterned
light beam, wherein said gray scaled patterned light beam is time
modulated.
112. The method according to claim 111, wherein said gray scaled
patterned light beam incident on the photosensitive material
variably photosculpts the photosensitive material to create
patterns of continuously variable thickness corresponding to said
gray scale patterned light beam.
113. The method according to claim 111, wherein said gray scaled
patterned light beam incident on the photosensitive material
variably photosculpts the photosensitive material to create
patterns of continuously variable composition corresponding to said
gray scale patterned light beam.
114. The method of claim 111, wherein generating said gray scale
patterned light beam further comprises: a. receiving said gray
scale mask patterns at an array of positionable micromirrors; b.
generating, collimating, and directing a light beam to said
micromirror array; c. positioning said micromirrors to reflect the
light beam from said micromirror array according to said gray scale
mask patterns; d. varying the angular position of said micromirrors
to modulate the time duration of said gray scaled patterned light
reflected to the photosensitive material; and e. collimating said
patterned light beam reflected from said micromirror array.
115. The method of claim 111, wherein generating said patterned
light beam further comprises: a. receiving said mask patterns at a
variably transmissive filter array device having individually
addressable pixels; b. activating the pixels of said variably
transmissive filter array device to generate a gray scale patterned
light beam corresponding to said gray scale mask patterns; and c.
collimating said patterned light beam generated by said variably
transmissive filter array device.
116. The method of claim 111, further comprising: a. providing
selective filtering of said gray scale patterned light beam
impinging on the photosensitive material to prevent exposure of the
photosensitive material during an alignment procedure; b. allowing
alignment of the photosensitive material under said patterned light
beam by moving said mounted photosensitive material in three
dimensions, wherein the photosensitive material is moved in
coplanar first and second dimensions, and moved in a third
dimension direction substantially perpendicular to said first and
second coplanar dimensions, and substantially parallel to the
patterned light beam; c. allowing optical monitoring of positioning
of the photosensitive material under the gray scale patterned light
beam to visually verify that an image projected on the
photosensitive material is properly aligned; d. receiving alignment
information corresponding to alignment of a desired mask pattern
projected onto the photosensitive material; e. generating alignment
instructions based on received said alignment information; f.
providing alignment instructions, based on said alignment
information, to said patterned light generator to further align
said gray scale mask patterns in the coplanar first and second
dimensions; g. adjusting said micromirror array according to said
alignment instructions by shifting the gray scale mask pattern in
at least one of the coplanar first and second dimensions; h.
disabling filtering of said gray scale patterned light beam; i.
exposing the photosensitive material; and j. repeating steps (a-i)
to create a desired pattern on the photosensitive material.
117. The method according to claim 116, wherein allowing alignment
of the photosensitive material under said patterned light beam
comprises allowing automatically controlled alignment of the
photosensitive material under said patterned light beam.
118. A computer system for maskless photolithography for
photoforming photosensitive materials using gray scale
photolithography comprising: a. a computing device comprising a
display, a central processing unit (CPU), operating system
software, memory for storing data, a user interface, and
input/output capability for reading and writing data; said
computing device operably connected to and operating in conjunction
with a maskless patterned light generator; b. computer program code
for: 1) receiving mask pattern information corresponding to a
desired pattern to be created on an object; 2) generating said mask
patterns based on received mask pattern information; and 3)
providing said mask patterns to a gray scale mask pattern
controller, wherein the gray scale mask pattern controller
modulates said mask patterns using time modulation; whereby said
computing device operates in conjunction with said maskless
photolithography system and executes said computer code to provide
mask patterns to said gray scale mask pattern controller.
119. The computer system of claim 118, wherein said computer system
further comprises: a. a gray scale mask pattern controller to
further process said mask patterns to include gray scale control
information and output gray scale mask patterns; and b. computer
code for: 1) receiving gray scale information corresponding to a
desired gray scale pattern to be created on an object; 2)
generating gray scale mask patterns based on received said gray
scale information, wherein generating gray scale mask patterns
comprises applying a time modulation scheme to said mask patterns;
and 3) providing said gray scale mask patterns to a gray scale
pattern generator.
120. A computer program product recorded on computer readable
medium for a maskless photolithography system comprising: a.
computer readable medium for receiving mask pattern information
corresponding to a desired pattern to be created on the
photosensitive material; b. computer readable medium for generating
mask patterns based on received said mask pattern information; c.
computer readable medium for receiving gray scale information
corresponding to a desired gray scale pattern to be created on the
photosensitive material; d. computer readable medium for generating
gray scaled mask patterns based on said mask pattern information
and said gray scale information; d. computer readable medium for
providing said gray scale mask patterns to a patterned light
generator; e. computer readable medium for generating a gray scale
patterned light beam, wherein the gray scale patterned light beam
is time modulated; f. computer readable medium for directing said
gray scale patterned light beam onto the photosensitive material;
and g. computer readable medium for exposing the photosensitive
material to said gray scale patterned light beam.
121. The computer program product of claim 120, wherein said gray
scaled patterned light beam incident on the photosensitive material
variably photosculpts the photosensitive material to create
patterns of continuously variable thickness corresponding to said
gray scale patterned light beam.
122. The computer program product of claim 120, wherein said gray
scaled patterned light beam incident on the photosensitive material
variably photosculpts the photosensitive material to create
patterns of continuously variable composition corresponding to said
gray scale patterned light beam.
123-142. (canceled)
143. A computer program product recorded on computer readable
medium for a maskless photolithography system comprising: a.
computer readable medium for receiving mask pattern information and
alignment information corresponding to a desired pattern to be
created on the photosensitive material; b. computer readable medium
for generating mask patterns based on received mask pattern
information and alignment information; c. computer readable medium
for providing said mask patterns to a patterned light generator; d.
computer readable medium for generating a patterned light beam; e.
computer readable medium for directing said patterned light beam
onto a first exposure area of the photosensitive material; f.
computer readable medium for exposing the first exposure area of
the photosensitive material to said gray scale patterned light
beam, wherein said gray scale patterned light beam is time
modulated; g. computer readable medium for providing relative
movement of the photosensitive material and the maskless
photolithography system to allow exposure of a second exposure
area; and h. computer readable medium for repeating steps a-g to
sequentially expose the entire surface of the photosensitive
material; wherein said patterned light beam incident on the
photosensitive material photosculpts the photosensitive material to
create contiguous patterns by sequential exposure corresponding to
said patterned light beam.
144. The system of claim 91, wherein the gray scale mask pattern
controller utilizes a pulse width modulation scheme to modulate the
mask pattern.
145. The system of claim 91, further comprising: a means for
controlling the rotation of the alignment fixture in at least a
first direction such that controlling the rotation of the alignment
fixture in at least a first direction controls the rotation of the
photosensitive material in the at least first direction.
146. The system of claim 145, wherein the means for controlling the
rotation of the alignment fixture in at least a first direction
controls the rotation of the alignment fixture in a first
direction, controls the rotation of the alignment fixture in a
second direction perpendicular to the first direction, and controls
the rotation of the alignment fixture in a third direction
perpendicular to both the first direction and the second
direction.
147. The system according to 145, wherein the means for controlling
the rotation of the alignment fixture in at least a first direction
is interconnected with the computer system such that control of the
rotation of the alignment fixture is coordinated with control of
the gray scale patterned light generator.
148. The system of claim 145, wherein the means for controlling the
rotation of the alignment fixture in at least a first direction
controls the rotation of the photosensitive material in the first
direction.
149. The system of claim 148, wherein the means for controlling the
rotation of the alignment fixture in at least a first direction
controls the rotation of the alignment fixture in a second
direction perpendicular the first direction.
150. The system of claim 91, wherein the gray scale mask pattern
controller further modulates the mask patterns using spatial
modulation.
151. The method of claim 111, wherein applying a time modulation
scheme to the mask patterns comprises applying a pulse width
modulation scheme to the mask patterns.
152. The computer system of claim 119, wherein applying a time
modulation scheme to the mask patterns comprises applying a pulse
width modulation scheme to the mask patterns.
153. A maskless photolithography system for photoforming
photosensitive materials using gray scale photolithography
comprising: a. a computer system for generating mask patterns and
alignment instructions; b. a gray scale mask pattern controller,
operably connected to said computer system, for receiving said mask
patterns from said computer system and modulating said mask
patterns using intensity modulation to provide a gray scale mask
pattern; and c. a gray scale patterned light generator, operably
connected to said gray scale pattern controller, for receiving said
gray scale mask patterns and radiating a gray scaled patterned
light beam; wherein the photosensitive material is exposed to said
gray scaled patterned light beam, wherein said gray scaled
patterned light beam is intensity modulated.
154. The system of claim 153, wherein the gray scale mask pattern
controller further modulates the mask patterns using spatial
modulation.
155. The system of claim 153, wherein said gray scaled patterned
light beam incident on the photosensitive material variably
photosculpts the photosensitive material to create patterns of
continuously variable thickness corresponding to said gray scaled
patterned light beam.
156. The system of claim 153, wherein said gray scaled patterned
light beam incident on the photosensitive material variably
photosculpts the photosensitive material to create patterns of
continuously variable composition corresponding to said gray scaled
patterned light beam.
157. The system of claim 153, wherein said gray scale mask pattern
controller is incorporated in said computer system.
158. The system of claim 153, wherein said gray scaled patterned
light generator comprises: a. a plasma display device, having
individually addressable pixels, operably connected to and
controllable by said computer system, wherein said display
generates said patterned light beam corresponding to said gray mask
patterns provided by said computer system to expose the
photosensitive material, wherein the intensity and duration of
exposure of the photosensitive material to said gray scaled
patterned light beam is controlled by said gray scale mask pattern
controller to achieve gray scale photosculpting of the
photosensitive material; b. an optical system for generating and
directing the light beam to said plasma display device.
159. The system of claim 158, further comprising: an optical system
for collimating the gray scale patterned light beam generated by
said plasma display device and directing said patterned light beam
onto the photosensitive materials to create patterns on the
photosensitive material corresponding to said gray scale mask
patterns incident on the photosensitive material.
160. The system of claim 153, further comprising: a manually
controlled alignment fixture for detachably mounting the
photosensitive material, wherein said alignment fixture is movable
in coplanar first and second dimensions, and in a third dimension
direction substantially perpendicular to said first and second
coplanar dimensions and substantially parallel to said patterned
light beam; said fixture providing three dimensional alignment of
the photosensitive material beneath said patterned light beam,
wherein said alignment fixture is moved in three dimensions in
response to mechanical alignments directly provided by a user.
161. The system of claim 160, further comprising: a means for
controlling the rotation of the alignment fixture in at least a
first direction such that controlling the rotation of the alignment
fixture in at least a first direction controls the rotation of the
photosensitive material in the at least first direction.
162. The system of claim 161, wherein the means for controlling the
rotation of the alignment fixture in at least a first direction
controls the rotation of the alignment fixture in a first
direction, controls the rotation of the alignment fixture in a
second direction perpendicular to the first direction, and controls
the rotation of the alignment fixture in a third direction
perpendicular to both the first direction and the second
direction.
163. The system according to 161, wherein the means for controlling
the rotation of the alignment fixture in at least a first direction
is interconnected with the computer system such that control of the
rotation of the alignment fixture is coordinated with control of
the gray scale patterned light generator.
164. The system of claim 153, further comprising: an alignment
fixture for mounting the photosensitive material, wherein said
alignment fixture allows alignment of the photosensitive material
in coplanar first and second dimensions, and in a third dimension
substantially perpendicular to the first and second coplanar
dimensions.
165. The system according to claim 164, wherein the means for
controlling the position of the alignment fixture is interconnected
with the computer system such that control of the position of the
alignment fixture is coordinated with control of the gray scale
patterned light generator.
166. The system of claim 153, further comprising a computer
controlled pattern alignment system, for providing electrical
alignment of said patterns in coplanar first and second dimensions,
wherein said pattern alignment system adjusts the alignment of said
mask patterns in coplanar first and second dimensions in response
to instructions provided by said computer according to said
alignment information, so that said pattern is shifted in at least
one coplanar direction.
167. The system of claim 153, further comprising an optical viewer
to allow optical monitoring of positioning of the photosensitive
material mounted in said alignment fixture by visually verifying
that an image projected on the immersed substrate is properly
aligned.
168. The system of claim 153, further comprising an optical filter,
removably mounted in the light beam to selectively filter light
impinging on the photosensitive material to prevent exposure of the
photosensitive material during an alignment procedure.
169. The system of claim 153, further comprising: a means for
controlling the rotation of the alignment fixture in at least a
first direction such that controlling the rotation of the alignment
fixture in at least a first direction controls the rotation of the
photosensitive material in the at least first direction.
170. The system of claim 169, wherein the means for controlling the
rotation of the alignment fixture in at least a first direction
controls the rotation of the alignment fixture in a first
direction, controls the rotation of the alignment fixture in a
second direction perpendicular to the first direction, and controls
the rotation of the alignment fixture in a third direction
perpendicular to both the first direction and the second
direction.
171. The system according to 169, wherein the means for controlling
the rotation of the alignment fixture in at least a first direction
is interconnected with the computer system such that control of the
rotation of the alignment fixture is coordinated with control of
the gray scale patterned light generator.
172. The system of claim 169, wherein the means for controlling the
rotation of the alignment fixture in at least a first direction
controls the rotation of the photosensitive material in the first
direction.
173. The system of claim 172, wherein the means for controlling the
rotation of the alignment fixture in at least a first direction
controls the rotation of the alignment fixture in a second
direction perpendicular the first direction.
174. A method for maskless photolithography for photoforming
photosensitive materials using gray scale photolithography
comprising: a. receiving mask pattern information corresponding to
a desired pattern to be created on the photosensitive material; b.
generating mask patterns based on received said mask pattern
information; c. receiving gray scale information corresponding to a
desired gray scale pattern to be created on the photosensitive
material; d. generating gray scaled mask patterns based on said
mask pattern information and said gray scale information, wherein
generating gray scaled mask patterns comprises applying an
intensity modulation scheme to the mask patterns; d. providing said
gray scale mask patterns to a patterned light generator; e.
generating a gray scale patterned light beam; f. directing said
gray scale patterned light beam onto the photosensitive material;
and g. exposing the photosensitive material to said gray scale
patterned light beam, wherein said gray scaled patterned light beam
is intensity modulated.
175. The method according to claim 174, wherein said gray scaled
patterned light beam incident on the photosensitive material
variably photosculpts the photosensitive material to create
patterns of continuously variable thickness corresponding to said
gray scale patterned light beam.
176. The method according to claim 174, wherein said gray scaled
patterned light beam incident on the photosensitive material
variably photosculpts the photosensitive material to create
patterns of continuously variable composition corresponding to said
gray scale patterned light beam.
177. The method of claim 174, wherein generating said gray scale
patterned light beam further comprises: a. receiving said gray
scale mask patterns at an array of positionable micromirrors; b.
generating, collimating, and directing a light beam to said
micromirror array; c. positioning said micromirrors to reflect the
light beam from said micromirror array according to said gray scale
mask patterns; d. varying the angular position of said micromirrors
to modulate the intensity of said gray scaled patterned light
reflected to the photosensitive material; and e. collimating said
patterned light beam reflected from said micromirror array.
178. The method of claim 174, wherein generating said patterned
light beam further comprises: a. receiving said mask patterns at a
variably transmissive filter array device having individually
addressable pixels; b. activating the pixels of said variably
transmissive filter array device to generate a gray scale patterned
light beam corresponding to said gray scale mask patterns; and c.
collimating said patterned light beam generated by said variably
transmissive filter array device.
179. The method of claim 174, further comprising: a. providing
selective filtering of said gray scale patterned light beam
impinging on the photosensitive material to prevent exposure of the
photosensitive material during an alignment procedure; b. allowing
alignment of the photosensitive material under said patterned light
beam by moving said mounted photosensitive material in three
dimensions, wherein the photosensitive material is moved in
coplanar first and second dimensions, and moved in a third
dimension direction substantially perpendicular to said first and
second coplanar dimensions, and substantially parallel to the
patterned light beam; c. allowing optical monitoring of positioning
of the photosensitive material under the gray scale patterned light
beam to visually verify that an image projected on the
photosensitive material is properly aligned; d. receiving alignment
information corresponding to alignment of a desired mask pattern
projected onto the photosensitive material; e. generating alignment
instructions based on received said alignment information; f.
providing alignment instructions, based on said alignment
information, to said patterned light generator to further align
said gray scale mask patterns in the coplanar first and second
dimensions; g. adjusting said micromirror array according to said
alignment instructions by shifting the gray scale mask pattern in
at least one of the coplanar first and second dimensions; h.
disabling filtering of said gray scale patterned light beam; i.
exposing the photosensitive material; and j. repeating steps (a-i)
to create a desired pattern on the photosensitive material.
180. The method according to claim 179, wherein allowing alignment
of the photosensitive material under said patterned light beam
comprises allowing automatically controlled alignment of the
photosensitive material under said patterned light beam.
181. A computer system for maskless photolithography for
photoforming photosensitive materials using gray scale
photolithography comprising: a. a computing device comprising a
display, a central processing unit (CPU), operating system
software, memory for storing data, a user interface, and
input/output capability for reading and writing data; said
computing device operably connected to and operating in conjunction
with a maskless patterned light generator; b. computer program code
for: 1) receiving mask pattern information corresponding to a
desired pattern to be created on an object; 2) generating said mask
patterns based on received mask pattern information; and 3)
providing said mask patterns to a gray scale mask pattern
controller, wherein the gray scale mask pattern controller
modulates said mask patterns using intensity modulation; whereby
said computing device operates in conjunction with said maskless
photolithography system and executes said computer code to provide
mask patterns to said gray scale mask pattern controller.
182. The computer system of claim 181, wherein said computer system
further comprises: a. a gray scale mask pattern controller to
further process said mask patterns to include gray scale control
information and output gray scale mask patterns; and b. computer
code for: 1) receiving gray scale information corresponding to a
desired gray scale pattern to be created on an object; 2)
generating gray scale mask patterns based on received said gray
scale information, wherein generating gray scale mask patterns
comprises applying an intensity modulation scheme to said mask
patterns; and 3) providing said gray scale mask patterns to a gray
scale pattern generator.
183. A computer program product recorded on computer readable
medium for a maskless photolithography system comprising: a.
computer readable medium for receiving mask pattern information
corresponding to a desired pattern to be created on the
photosensitive material; b. computer readable medium for generating
mask patterns based on received said mask pattern information; c.
computer readable medium for receiving gray scale information
corresponding to a desired gray scale pattern to be created on the
photosensitive material; d. computer readable medium for generating
gray scaled mask patterns based on said mask pattern information
and said gray scale information; d. computer readable medium for
providing said gray scale mask patterns to a patterned light
generator; e. computer readable medium for generating a gray scale
patterned light beam, wherein the gray scale patterned light beam
is intensity modulated; f. computer readable medium for directing
said gray scale patterned light beam onto the photosensitive
material; and g. computer readable medium for exposing the
photosensitive material to said gray scale patterned light
beam.
184. The computer program product of claim 183, wherein said gray
scaled patterned light beam incident on the photosensitive material
variably photosculpts the photosensitive material to create
patterns of continuously variable thickness corresponding to said
gray scale patterned light beam.
185. The computer program product of claim 183, wherein said gray
scaled patterned light beam incident on the photosensitive material
variably photosculpts the photosensitive material to create
patterns of continuously variable composition corresponding to said
gray scale patterned light beam.
186. A computer program product recorded on computer readable
medium for a maskless photolithography system comprising: a.
computer readable medium for receiving mask pattern information and
alignment information corresponding to a desired pattern to be
created on the photosensitive material; b. computer readable medium
for generating mask patterns based on received mask pattern
information and alignment information; c. computer readable medium
for providing said mask patterns to a patterned light generator; d.
computer readable medium for generating a patterned light beam; e.
computer readable medium for directing said patterned light beam
onto a first exposure area of the photosensitive material; f.
computer readable medium for exposing the first exposure area of
the photosensitive material to said gray scale patterned light
beam, wherein said gray scale patterned light beam is intensity
modulated; g. computer readable medium for providing relative
movement of the photosensitive material and the maskless
photolithography system to allow exposure of a second exposure
area; and h. computer readable medium for repeating steps a-g to
sequentially expose the entire surface of the photosensitive
material; wherein said patterned light beam incident on the
photosensitive material photosculpts the photosensitive material to
create contiguous patterns by sequential exposure corresponding to
said patterned light beam.
Description
CROSS-REFERENCE TO A RELATED APPLICATION
[0001] This application claims the benefit of U.S. patent
application Ser. No. 10/179,083, filed on Jun. 25, 2002, U.S.
patent application Ser. No. 10/179,565, filed on Jun. 25, 2002, and
U.S. Provisional Application Ser. No. 60/301,218, filed Jun. 27,
2001, which are incorporated herein by reference.
BACKGROUND ART
[0003] Photolithography systems are known in the art that direct
light beams onto a photosensitive surface covered by a mask,
etching a desired pattern on the substrate corresponding to the
void areas of the mask. Maskless photolithography systems are also
known in the art as described in Singh-Gasson, Sangeet et al.,
Nature Biotechnology 17, 974-78, 1999. The system described in this
article uses an off-axis light source coupled with a digital
micromirror array to fabricate DNA chips containing probes for
genes or other solid phase combinatorial chemistry to be performed
in high-density microarrays.
[0004] A number of patents also exist which relate to maskless
photolithography systems, including U.S. Pat. Nos. 5,870,176;
6,060,224; 6,177,980; and 6,251,550; all of which are incorporated
herein by reference. While the previously described maskless
photolithography systems address several of the problems associated
with mask based photolithography systems, such as distortion and
uniformity of images, problems still arise. Notably, in
environments requiring rapid prototyping and limited production
quantities, the advantages of maskless systems as a result of
efficiencies derived from quantities of scale are not realized.
Further, prior art references lack the ability to provide rapid
prototyping.
[0005] In particular, alignment of patterns with respect to target
substrates in maskless systems can be problematic. Various
solutions have been proposed to mitigate the effect of alignment
problems, including the digital shifting of the projected mask
pattern to compensate for misalignment of a substrate. However,
this technique requires that the substrate be closely aligned
initially and is better suited for high volume production runs
which incorporate automatic initial alignment systems. In a rapid
prototyping, limited quantity environment, automated means of
initial alignment are not cost effective.
[0006] In addition, conventional maskless alignment systems are
normally limited to coplanar, two-dimensional alignment. However,
there is a need in the art to create three-dimensional patterns on
substrates. Creating three-dimensional patterns requires further
alignment of the substrates in a third dimension perpendicular to
the two coplanar dimensions. In the third dimension, computerized
shifting of the mask pattern cannot compensate for misalignments in
a direction parallel with an incident light beam. As a result, an
ability to align a substrate in a third dimension in a rapid
prototyping, reconfigurable environment is needed.
[0007] Another problem with maskless photolithography systems is
that the mask pattern image projected is formed by pixels, instead
of continuous lines. As a result, gaps may exist between adjacent
pixels, which, when projected on a substrate, may allow the area
between the pixels to be exposed, resulting in a break in the
imaged pattern. For example, if the desired pattern is a circuit,
gaps may be inadvertently exposed and formed in a trace, resulting
in an electrical gap. The exposure gaps caused by the pixel nature
of the micromirror arrays, or pixelation, may cause open circuits
or unwanted capacitive effects where trace width or thickness is
critical.
[0008] Another problem with current art systems is the phenomenon
of "stiction," wherein the individual mirrors in a micromirror area
tend to "stick" in a specific orientation if left in that position
for an extended period. Consequently, a higher voltage needs to be
applied to the mirror drive to point the mirror in another desired
direction. Thus the micromirror array consumes more power than
normal and affects the reliability of the mirror.
[0009] It is known in the art to use gray scale masks in
photolithography to form continuously variable material profiles on
substrates, such as microlens arrays (wherein each lens can have a
different profile), refractive and diffractive micro-optics,
precision tapered structures, sinusoidal transmittance gratings,
arbitrary shaped micro-optics, and other 3D microstructures,
including optical micro-electromechanical devices (MEMS). One type
of gray scale mask is a halftone chrome mask that consists, for
example, of mixtures of 0.5 micron.times.0.5 micron chrome spots
which are totally opaque and 0.5 micron.times.0.5 micron clear
spots which are totally transparent due to the absence of chrome
film coating on the glass photomask substrate. The transmittance of
a gray scale resolution element in a halftone chrome mask is
determined by the ratio of the number of chrome spots to clear
spots. Transmittance decreases as the ratio of chrome spots to
clear spots is increased. For a gray scale chrome mask capable of
16 gray levels, a gray scale resolution element must consist of 16
binary spots. A binary spot of the chrome mask is either a chrome
spot or a clear spot. When all 16 binary spots in a gray scale
resolution element are chrome spots, the gray scale resolution
element is totally opaque. However, the images produced using this
method are halftone images, not true gray scale images.
[0010] Gray scale masks have also been implemented in a
photo-emulsion film or a photographic emulsion glass plate and are
halftone gray scale patterns, since each silver grain in a
developed photographic emulsion is totally opaque. The gray scale
is produced by varying the number density of the silver grains. The
spacing between the grains are transparent. The size of silver
grains is not uniform and may range from, for example, about 0.1
micron to about 1 micron in a high-resolution photoemulsion plate.
Therefore, it is difficult to obtain consistent imaging results
because of the nonuniformity of grain size.
[0011] Yet another type of gray scale is the High Energy Beam
Sensitive (HEBS) glass, manufactured, for example by Canyon
Material, Inc. In the HEBS glass, process glass photomasks having
varying transmissive properties are created in photosensitive glass
according to the energy density of a high energy beam impinging on
the glass surface. The resulting varying transmissibility glass
substrate is used as a gray scale photomask in standard
photolithographic processes to create micro-optical elements such
as refractive micro lens arrays, diffractive optical elements,
prism couples, and three-dimensional microstructures.
[0012] Although the HEBS glass process allows true gray scale
imaging, a photomask must still be used for photolithographic
processing of substrates. While effective, the use of physical
masks in photolithography has numerous drawbacks, including the
cost of fabricating masks, the time required to produce the sets of
masks needed to fabricate semiconductors, the diffraction effects
resulting from light from a light source being diffracted from
opaque portions of the mask, registration errors during mask
alignment for multilevel patterns, color centers formed in the mask
substrate, defects in the mask, the necessity for periodic cleaning
and the deterioration of the mask as a consequence of continuous
cleaning.
[0013] It also known in the art to use maskless gray scale x-ray
lithography. Maskless gray-scale x-ray lithography has been
disclosed (Frank Hartley, Maskless Gray-Scale X-ray Lithography,
NASA Tech Brief # NPO-20445, July, 2000). In this reference, a
photoresist coated substrate to be patterned is exposed to a
parallel beam of hard x-rays. The photoresist is translated across
the beam at a varying rate to effect one-dimensional spatial
variations in the radiation dose received by the photoresist. The
radiation dose delivered to the photoresist on a substrate is made
to vary spatially, within a range in which the solubility of the
exposed photoresist in a developer liquid varies with the dose.
[0014] In conventional gray-scale x-ray lithography, the required
spatial variation in the dose is achieved by use of a mask. The
mask and the photoresist-covered substrate are translated as a unit
across an x-ray beam at a constant rate to obtain the required
integrated dose to the mask. In the disclosed maskless technique,
the photoresist is not masked. The gradients in the radiation dose
needed to obtain gradients in the density of the developed
photoresist are generated by controlled variations in the rate of
translation of the x-ray beam across the photoresist. These
controlled variations define the desired features (variations of
the height of the subsequently developed photoresist) to within
sub-micron dimensions, depending on the exposure time of the
substrate.
[0015] After exposure to x-rays, the photoresist coated substrate
is developed in the customary manner. After development, the
photoresist is dried, giving rise to spatial consolidation of the
photoresist into thickness gradients corresponding to the density
gradients. The dosage gradients are chosen to achieve desired final
thickness gradients, for example, to produce triangular- or saw
tooth-cross-section blazes for diffraction gratings. However, the
x-rays are inherently dangerous and their use is highly regulated,
requiring sophisticated equipment to generate and direct the
radiation. In addition, the disclosed techniques require complex
translational stages to expose and generate patterns on
substrates.
[0016] In addition, it is also known in the art to use lasers to
create patterns on large photoresist coated substrates. In
particular, as disclosed in R. Bawn, et al. , "Micromachining
System Accommodates Large Wafers," Laser Focus World, January 2001,
pp. 189-192, and "Laser Microfabrication Process," Proceedings of
ICALEO 2000, Paper A49, October 2000, laser lithography techniques
can be used to create patterns on large substrates. In the
disclosed systems, laser-micromachining systems for large area
patterning require a laser source, optics for conditioning and
focusing the beam, and a way to precisely control and point the
beam. Patterns are produced on substrates by precisely positioning
and focusing the laser beam over small area and ablating away the
substrate material to form a desired pattern, The laser is then
repositioned and another area of the substrate is ablated. The
process is continued until the desired pattern on a substrate has
been created. In this manner a large substrate can be sequential
processed to create large patterned substrates. However, only small
areas can be written at one time because of the small beamwidth of
the laser, making large area patterning prohibitively time
consuming.
[0017] Accordingly, there is a need in the art for a method and
system for maskless photolithography to provide a more effective
way to fabricate custom devices in a low volume production
environment. This system needs to combine ease of use,
reconfigurability, and the ability to provide coarse manual
alignment and automated fine alignment of mask patterns. In
addition the system needs to address the exposure gaps inherent in
the process due to the pixel nature of the projected mask and
provide means for eliminating stiction. In summary, the system
needs to provide all the advantages of a maskless photolithography
system at a reasonable cost, and include capabilities tailored to
direct writing in a rapid prototyping environment.
[0018] In addition, there is a need in the art for a method and
system for maskless photolithography to provide gray scale
capability and large area patterning of substrates. This system can
combine ease of use, reconfigurability, and the ability to provide
gray scale patterns to create variable thickness on exposed
substrates. In addition the system can allow patterning large areas
in a single exposure. The system can provide many of the advantages
of a maskless photolithography system at a reasonable cost, and
include capabilities tailored to gray scale imaging and large area
pattern generation in a cost effective, easy to implement
system.
SUMMARY OF THE INVENTION
[0019] In view of the foregoing deficiencies of the prior art, it
is an object of the present invention to provide a maskless
photolithography system for creating 2-D and 3-D patterns on
substrates.
[0020] It is another object of the present invention to provide an
easy to use, reconfigurable, rapid prototyping maskless
photolithography system.
[0021] It is still another object of the present invention to
provide a directly coupled optical system for maskless
photolithography that ensures efficient transfer of light energy to
a substrate for performing photolithography.
[0022] It is yet another object of the present invention to provide
a projected image for maskless photolithography that is free from
distortion and uniform throughout the exposure area.
[0023] It is still another object of the present invention to
provide a positioning fixture, selectively movable in three
dimensions to accurately position a substrate for maskless
photolithography.
[0024] It is another object of the present invention to provide a
maskless photolithography for creating micro and macro
three-dimensional structures.
[0025] It is another object of the present invention to provide
gray scale patterning using a maskless photolithography system.
[0026] To achieve these objects, a system and method are provided
to create two dimensional and three dimensional structures using a
maskless photolithography system that is directly reconfigurable
and does not require masks, templates or stencils to create each of
the planes or layers on a multi layer two-dimensional or three
dimensional structure. In an embodiment, the invention uses a
micromirror array comprising up to several million elements to
modulate light onto a substrate that has photoreactive compounds
applied to the exposed surface. The desired pattern is designed and
stored using conventional computer aided drawing techniques and is
used to control the positioning of the individual mirrors in the
micromirror array to reflect the corresponding desired pattern.
Light impinging on the array is reflected to or directed away from
the substrate to create light and dark spots on the substrate
according to the pattern. In addition, an alignment fixture,
movable in three dimensions, for mounting of the substrate is
provided. The alignment fixture allows the affixed substrate to be
moved in three dimensions, providing alignment in two, coplanar
dimensions and a third dimension perpendicular to the two coplanar
dimensions. By providing alignment in the third dimensional
direction, the invention advantageously provides the capability to
produce three-dimensional structures on a substrate. Further, the
positioning information provided to the micromirror array can be
modulated to cause the individual mirrors to change their angular
position during exposure to reduce the effects of pixelation and
stiction and/or produce gray scale patterns. Further, the subject
invention can be used to produce large scale patterning on, for
example, substrates.
[0027] The advantages of the invention are numerous. One
significant advantage is the ability to use the invention as a
reconfigurable, rapid prototyping tool for creating two-dimensional
and three dimensional micro and macroscopic objects. Another
advantage of the invention is that it provides the ability to
reduce prototyping costs and enable devices to be fabricated more
quickly with less risk. Yet another advantage of the invention is
the ability to utilize different designs and operating conditions
on a single device. A further advantage is the ability to use
computer network to transfer designs across networks for immediate
light exposure of a substrate. Still another advantage of the
current invention is a reduction in cost for prototyping activities
realized by the elimination of physical masks and the ability to
create both positive and negative tone images using the same array.
Yet another advantage of the current invention is that pattern
generation can be performed optically without having to use
expensive vacuum system required by conventional mask-based
photolithography. A particular advantage of the current invention
is the ability to create three-dimensional devices using an
alignment stage to selectively expose successive layers in a
substrate. By modulating the movement of the micromirror arrays,
the negative effects of pixelation and stiction of micromirrors is
reduced.
[0028] The subject invention can allow the ability to photoform
continuously variable pattern thickness on substrates by using the
disclosed gray scale lithographic techniques that do not have a
gray scale mask as an element in the gray scale lithographic
system. Another advantage of the invention is the ability to
efficiently create patterns on larger areas than conventionally
possible.
[0029] By providing the ability to individually control the
individual micromirrors of the mirror array, any arbitrary micro or
macroscopic structure can easily and quickly be created in
substrates such as polymers, metals, or ceramics. Patterns such as
glasses, microfluidic networks, thin film devices, hybrid material
devices, micro electromechanical machines (MEMs), photomasks and
combinations of the above mentioned devices can be created using
the reconfigurable, application specific photolithography system
disclosed.
[0030] All patents, patent applications, provisional applications,
and publications referred to or cited herein, or from which a claim
for benefit of priority has been made, are incorporated herein by
reference in their entirety to the extent they are not inconsistent
with the explicit teachings of this specification.
[0031] Other aspects and advantages of the invention will become
apparent from the following detailed description taken in
conjunction with the accompanying drawings, illustrating, by way of
example, the principles of the invention.
BRIEF DESCRIPTION OF THE DRAWINGS
[0032] In order that the manner in which the above recited and
other advantages and objects of the invention are obtained, a more
particular description of the invention briefly described above
will be rendered by reference to specific embodiments thereof,
which are illustrated in the appended drawings. Understanding that
these drawings depict only typical embodiments of the invention and
are not therefore to be considered to be limiting of its scope, the
invention will be described and explained with additional
specificity and detail through the use of the accompanying drawings
in which:
[0033] FIG. 1A illustrates a maskless photolithography system
according to an embodiment of the present invention.
[0034] FIG. 1B illustrates a maskless photolithography system using
a plasma display device according to an embodiment of the present
invention.
[0035] FIG. 2A illustrates a gray scale maskless photolithography
system using a micromirror array according to an embodiment of the
present invention.
[0036] FIG. 2B illustrates a gray scale maskless photolithography
system using a variably transmissive light filter device according
to an embodiment of the present invention.
[0037] FIG. 3 is a flow chart illustrating a gray scale maskless
photolithography method according to an embodiment of the present
invention.
[0038] FIG. 4 is a flow chart illustrating a large area patterning
maskless photolithography method according to an embodiment of the
present invention.
[0039] FIG. 5 is a flow chart illustrating a maskless
photolithography method according to an embodiment of the present
invention.
[0040] FIG. 6 is a graph showing the relation between exposure area
and minimum feature size according to the current invention.
[0041] FIG. 7 is a graph showing an exemplary spectral output of
the current invention.
[0042] It should be understood that in certain situations for
reasons of computational efficiency or ease of maintenance, the
ordering and relationships of the blocks of the illustrated flow
charts could be rearranged or re-associated by one skilled in the
art. While the present invention will be described with reference
to the details of the embodiments of the invention shown in the
drawings, these details are not intended to limit the scope of the
invention.
DETAILED DISCLOSURE OF THE INVENTION
[0043] References will now be made in detail to the embodiments
consistent with the invention, examples of which are illustrated in
the accompanying drawings. First, briefly, the invention is a
system and method to create two dimensional and three dimensional
structures using a maskless photolithography system comprising a
maskless pattern generator that is directly reconfigurable and does
not require masks, templates or stencils to create each of the
planes or layers on a multi layer two-dimensional or three
dimensional structure. In an embodiment, the invention uses a
micromirror array comprising up to several million elements to
modulate light onto a substrate that has photoreactive or
photoresist compounds applied to the exposed surface. The desired
pattern is designed and stored using conventional computer aided
drawing techniques and is used to control the positioning of the
individual mirrors in the micromirror array to reflect the
corresponding desired pattern. Light impinging on the array is
reflected to or directed away from the substrate to create light
and dark spots on the substrate according to the desired pattern.
In addition, an alignment fixture for mounting of the substrate
allows the substrate to be moved in three dimensions, providing
alignment in two, coplanar dimensions and the capability to produce
three dimensional structures by aligning the substrate in a third
dimension perpendicular to the two coplanar dimensions.
[0044] The subject invention can provide a system and method for
photoforming photosensitive materials using maskless, gray scale
photolithography system. In addition, the invention provides a
directly coupled optical system for large area patterning using a
maskless photolithography system.
[0045] In a specific embodiment, the alignment fixture for mounting
of the substrate can incorporate a means for positioning the
aligned fixture and, therefore, the substrate, in one, two, or
three dimensions. In a specific embodiment, the means for
positioning the alignment fixture can be interconnected with the
system for controlling the positioning of the individual mirrors in
the micromirror array, such that the system can also control the
movement of the substrate in one, two, or three dimensions. This
can allow the system to coordinate the control of the position of
micromirrors and control of the position of the substrate to
accomplish the desired mask pattern. In a further specific
embodiment, the alignment fixture can incorporate a means for
allowing rotation of the substrate in one, two, or three
directions. The means for allowing rotation of the substrate can be
interconnected with the system for controlling the positioning of
the individual mirrors in the micromirror array, such that the
system can also control the rotation of the substrate in one, two,
or three directions. This can allow the system to coordinate the
control of the position of the micromirrors and the rotation of the
substrate to accomplish the desired mask pattern. The system can
also be allowed to coordinate the control of the position of the
micromirrors, the movement of the substrate, in one, two, or three
dimensions, and the rotation of the substrate in one, two, or three
directions to accomplish the desired mask pattern. In another
specific embodiment, movement of the micromirror array 14 in one,
two, or three dimensions and/or rotation of micromirror array 14 in
one, two, or three directions can be accomplished. Such movement
and/or rotation of micromirror array 14 can be accomplished by
interconnected computer system 16 with the means to accomplish the
movement and/or rotation. Accordingly, the computer system can
coordinate the movement and/or rotation of the substrate and the
movement and/or rotation of micromirror array 14 to accomplish the
desired mask pattern.
I. Maskless Photolithography System
[0046] Referring now to FIG. 1A, an embodiment of the current
invention includes a light source 10, a removable filter 11, a
first lens system 12, a micromirror array 14, a computer system 16,
a second lens system 18, a substrate 20, mounted on a movable
alignment fixture 22, and an optical viewer 24. A layer of
photoreactive chemicals 21 is disposed on the substrate 20. It
should be understood that the invention is not limited to the use
of a substrate 20 having a layer of photoreactive chemicals 21. Any
photoreactive material, such as a photoreactive substrate, may be
used in conjunction with the invention to photoform objects by
patterned light exposure.
[0047] As shown, light source 10 provides a beam of collimated
light, or light beam 26, which can be selectively filtered by
inserting or removing filter 11 from light beam 26. Light beam 26
is projected upon first lens system 12 and then onto micromirror
array 14, wherein each mirror in the micromirror array corresponds
to a pixel of the mask pattern. Micromirror array 14 is controlled
by computer system 16 over signal line(s) 15 to reflect light
according to a desired mask pattern stored in memory. In addition,
computer system 16 can shift the desired mask pattern in two
dimensions to align the pattern with the substrate 20 mounted on
movable alignment fixture 22. Precise pattern alignments are
optionally made electronically by shifting the mask pattern
information provided to the micromirror array such that the image,
or pattern, reflected to the substrate is translated to correct for
misalignment. For example, if the mask pattern needs to be shifted
to the right one pixel width to be properly aligned on the
substrate, the computer compensates for the misalignment by
shifting the mask pattern one pixel width to the right.
[0048] In an embodiment, micromirror array 14 is controlled to
modulate the positioning of the mirror to prevent stiction and
pixelation. The individual mirrors of micromirror array 14 are
driven to vary their angular orientation with respect to on-axis
illumination during exposure of a substrate. The light beam 26
incident on the micromirror array is reflected as a patterned light
beam 27 by reflecting or orienting the desired pixels toward the
substrate 20, and reflecting or orienting the undesired pixels away
from the substrate 20. After being reflected in a desired pattern
from micromirror array 14, patterned light beam 27 passes through
second lens system 18, and impinges on a layer of photoreactive
chemicals 21 applied to substrate 20, thereby creating a pattern on
substrate 20 by producing a reaction between the layer of
photoreactive chemicals 21 and substrate 20 and/or producing a
photo-reaction in the layer of photoreactive chemicals on the
substrate 20. Alternatively, a photoresist chemical could be
applied to substrate 20 to etch areas of substrate 20 not masked
off by the mask pattern during an exposure.
[0049] The mask pattern described above is a programmable mask
pattern generated with the use of computer aided design and is
resident on computer system 16. Accordingly, the mask pattern to be
transferred to the layer of photoreactive chemicals 21 and
substrate 20 is a selectively programmable mask pattern. Thus, with
a programmable mask pattern, any portion of the pattern on the
substrate 20 can be manipulated and/or changed as desired for
rendering of desired changes as may be needed, furthermore, on a
significantly reduced cycle time.
[0050] Micromirror array 14 described above is a micro mirror
device known in the art. With the micro mirror device, light is
reflected according to a pattern of pixels as controlled according
to a prescribed pixel/bit mask pattern received from computer
system 16. The light reflecting from the micro mirror device thus
contains the desired mask pattern information. A micro mirror
device may include any suitable light valve, for example, such as
that used in projection television systems and which are
commercially available. Light valves are also referred to as
deformable mirror devices or digital mirror devices (DMD). One
example of a DMD is illustrated in U.S. Pat. No. 5,079,544 and
patents referenced therein, in which the light valve consists of an
array of tiny movable mirror-like pixels for deflecting a beam of
light either to a display screen (ON) or away from the display
optics (OFF). The pixels of the light valve device are also capable
of being switched very rapidly. Thus, with the use of the light
valve, the photolithography system of the present disclosure can
implement changes in the mask pattern in a relatively quick manner.
The light valve is used to modulate light in accordance with mask
pattern information provided by the computer system 16. In
addition, the DMD reflects light, thus no appreciable loss in
intensity occurs when the patterned light is projected upon the
desired subject during the lithographic mask exposure.
[0051] In an embodiment, the positioning of the mirrors in the
micromirror array and the time duration of exposure can be
modulated while positioned in a desired mask pattern. By
dynamically changing the position of the mirrors while exposing a
substrate and the time duration of exposure, the effects of
pixelation on the exposed substrate and stiction of the mirrors can
be reduced and/or gray scaled patterns can be produced, wherein the
depth of photoreaction can be variably controlled to photoform
layers of continuously variable thickness and/or composition. The
duty cycle of the modulation command can be selectively modified to
achieve an optimum ratio between on axis, direct exposure, and off
axis, indirect exposure. The depth of photoactivation in the photo
reactive material can be proportional to the time length and
intensity of exposure. As a result, the micromirrors are constantly
moving to prevent stiction, and further allow integration of
interpixel exposure areas around directly radiated pixels to
provide uniform coverage of the mask pattern to eliminate
pixelation. In addition, pixelation can be reduced by defocusing
the lens to "blend" adjacent pixels.
[0052] Typically, the micromirrors are quadrilateral in shape and
mounted in an array such that they can be individually driven to
deflect along a diagonal axis, for a maximum deflection of about 10
degrees away from normal in either direction along the diagonal
axis. Light is typically reflected to a target by driving the
mirror 10 degrees form normal in one direction to expose a target
("on"), and driven 10 degrees from normal in the opposite direction
to reflect light away form the target ("off"). Variations in light
intensity projected on a target can be accomplished by binary pulse
width modulation of the driving signal. The length of duration at a
particular on or off state is governed by the binary code
representing various durations of time for light to be on or
off.
[0053] Advantageously, the present system can allow an image to be
shifted electronically to provide fine alignment of the pattern on
substrate 20. The mask pattern is digitally shifted according to
alignment information in one or more directions for achieving a
desired mask alignment on substrate 20. Adjustments in alignment
are carried out electronically in the mask bit pattern information
provided to the light valve. As a result, fine adjustments in
pattern alignment can thus be easily accomplished.
[0054] Movable alignment fixture 22, in conjunction with optical
viewer 24, provides the capability to initially align substrate 20
under light beam 26 using mechanical alignment mechanisms (not
shown) to align substrate 20 in three dimensions. Optical viewer 24
can incorporate, for example, cameras and/or other vision systems.
The mechanical alignment system may include gears, pulleys, belts,
chains, rods, screws, hydraulics, pneumatics, piezo motion or
combinations thereof as known in the art to support and move an
object in three dimensions. While performing alignment procedures,
filter 11 is inserted in light beam 26 to filter out the
wavelengths of light that react with the layer of photoreactive
chemicals 21 on substrate 20. Optical viewer 24 can provide a means
to monitor the positioning of substrate during manual alignment.
While providing alignment in coplanar first and second dimensions,
alignment fixture 22 advantageously provides alignment in a
direction perpendicular to the coplanar first and second
dimensions, allowing fabrication of three dimensional objects. For
example, to gain more control over sidewall profiles or to produce
complicated structures, multiple layers of substrate 20 can be
sequentially exposed by aligning substrate 20 in the third
dimension to create three-dimensional features. Coupled with
computer controlled alignment of the desired pattern, the invention
provides the capability to quickly manually align substrate 20
under light beam 26 and allows computer system 16 to automatically
finely tune the alignment before exposing layer of photoreactive
chemicals 21 on substrate 20. Moveable alignment fixture 22 can
incorporate a means to allow rotation of the substrate in one, two,
or three directions. In a specific embodiment, the alignment
fixture can be interconnected with computer system 16 so as to
allow computer system 16 to coordinate the control of the position
of the micromirrors and the rotation of the substrate in one, two,
or three directions and/or the movement of the substrate in one,
two, or three dimensions, to accomplish the desired mask
pattern.
[0055] In an alternative embodiment shown in FIG. 1B, a plasma
display device 13 can be substituted for the micromirror array 14,
light source 10 and associated optics of FIG. 1A. Referring now to
FIG. 1B, an embodiment of the current invention includes a plasma
display device 13, a computer system 12, a lens system 16, a
substrate 20, mounted on a movable alignment fixture 22, and an
optical viewer 24. A layer of photoreactive chemicals 21 is
disposed on the substrate 20.
[0056] As shown, plasma display device 13 generates a beam of
light, or patterned light beam 27, wherein each pixel of the plasma
display 13 corresponds to a pixel of the mask pattern. Plasma
display device 13 is controlled by computer system 16 over signal
line(s) 14 to generate light according to a desired mask pattern
stored in memory. In addition, computer system 12 can optionally
shift the desired mask pattern in two dimensions to align the
pattern with the substrate 20 mounted on movable alignment fixture
22. Precise pattern alignments are made electronically by shifting
the mask pattern information provided to the plasma display device
13 such that the image directed to the substrate is translated to
correct for misalignment. For example, if the mask pattern needs to
be shifted to the right one pixel width to be properly aligned on
the substrate, the computer compensates for the misalignment by
shifting the mask pattern one pixel width to the right.
[0057] The patterned light beam radiated from plasma display device
13 can be selectively filtered by inserting or removing filter 18
from patterned light beam 27. Filtering can take place at any point
along the light beam path to prevent exposure during alignment. A
lens system 16 can collimate and condition the light beam as
desired. After passing through lens system 16, patterned light beam
27 impinges on a layer of photoreactive chemicals 21 applied to
substrate 20, thereby creating a pattern on substrate 20 by
producing a photo-reaction in the layer of photoreactive chemicals
21 on the substrate 20. Alternatively, a photoresist chemical could
be applied to substrate 20 to etch areas of substrate 20 not masked
off by the mask pattern during an exposure. In a specific
embodiment, the plasma cell can be variably excited to create
variable luminosity.
[0058] The system provides optics, a light source, and integrated
electronic components used to directly generate patterns for the
exposure of photoresist and other photoimagable materials. A broad
band spectrum, high intensity white light source provides the
exposure energy for the process. This light is then filtered and
optimized for the exposure process, using a variety of integrated
optical components. A direct coupled optical delivery system
ensures efficient transfer of the light energy. Using proven
optical techniques, the projected image is free of distortion and
uniform through out the exposure area. With the optimized optical
stream, the image is imposed in the light path, providing the final
exposure pattern. This pattern is then transferred to the substrate
surface and used to expose the photo-sensitive material required in
the user's fabrication process.
[0059] A personal computer operably connected to a micromirror
array provides mask patterns. The mask patterns are generated in
the computer and then transferred to the micromirror array to
provide the optical pattern for exposure. The pattern is
transferred to a substrate and is observed using an optical
microscope. This microscope is needed for pattern alignment to the
substrate. Alignment is controlled through the use of a course
alignment stage provided by a mechanically movable substrate
mounting alignment fixture, combined with a fine, electronic
alignment stage. This fine alignment stage is computer controlled
and aligns the mask pattern reflected from the micromirror instead
of moving the alignment fixture, thereby offering exceptional
accuracy and repeatability. Once alignment is complete, substrate
exposure occurs. Through the use of a step and repeat method, the
entire substrate surface can be exposed and multiple layers can be
created using an alignment stage movable in a direction parallel to
the light beam.
[0060] In addition, according the invention, three-dimensional
patterns can be created using the three dimension alignment
capabilities disclosed above. For example, patterning using thick
photo resist or multilayer patterning of individual photoresist
layers. These techniques can be used to provide either a photomask
for subsequent etching of substrate materials or if the
photopolymer is compatible with the chemistry used in the device,
the fabricated features can be used as part of the device
itself.
[0061] The system described above can be adapted for use in novel
environments. Specifically, a system and method of maskless
photolithography can be used to create 2-D and 3-D patterns of
continuously variable thickness on objects using gray scale
photolithography. In addition, the system can be used to provide
rapid, large area patterning of photoreactive materials.
II. Gray Scale Maskless Photolithography
[0062] A. System for Gray Scale Maskless Photolithography
[0063] Referring now to FIG. 2A, an embodiment of the current
invention for gray scale photolithography will now be described. In
the embodiment, a maskless photolithography system, as described
above, is combined with gray scale controller to photoform
continuously variable thickness in photoreactive materials.
Patterns generated on the photoreactive material are defined by the
patterned light radiated by the maskless photolithography system,
where areas of continuously variable thickness and/or composition
are created by varying the intensity or time duration of the
patterned light exposure. By using photoreactive materials wherein
the thickness of the final deposit and/or composition is a function
of exposure time or intensity, a variety of 2D and 3D heterogenous
microstructures and designs of multilayer, continuously varying
thickness and/or composition can be created.
[0064] As shown in FIG. 2A, a maskless lithography system for gray
scale patterning includes a light source 10, a removable filter 11,
a first lens system 12, a micromirror array 14, a computer system
16, a gray scale controller 17, a second lens system 18, and a
substrate 20, coated with a layer of photoreactive chemicals 21. In
alternative embodiments, a movable alignment fixture 22 upon which
the substrate 20 is mounted, and an optical viewer 24 are provided
as depicted in FIG. 1A.
[0065] As depicted in FIG. 2A, light source 10 provides a beam of
collimated light, or light beam 26, which can be selectively
filtered by inserting or removing filter 11 from light beam 26.
Light beam 26 is projected upon first lens system 12 and then onto
micromirror array 14, wherein each mirror in the micromirror array
corresponds to a pixel of the mask pattern. Computer system 20
provides, over signal line(s) 15, mask patterns to a gray scale
controller 17, which modulates the received mask patterns to
provide a gray scale mask pattern to the micromirror array 14.
Micromirror then reflects light according to the gray scale mask
pattern. In addition, computer system 16 can optionally shift the
desired mask pattern in two dimensions to align the pattern with
the substrate 20.
[0066] In another embodiment, as shown on FIG. 2B, a variably
transmissive filter array device 9, such as a transmissive LCD
display, is used to provide gray scaling. The variably transmissive
filter array device 9 has individually addressable pixels, capable
of being addressed to be opaque, to prevent light transmission, and
capable of being addressed to be transparent, to allow light
transmission.
[0067] As shown in FIG. 2B, the maskless lithography system for
gray scale patterning includes a light source 10, a removable
filter 11, a first lens system 12, a variably transmissive filter
array device 9, a computer system 16, a gray scale controller 17, a
second lens system 18, and a substrate 20, coated with a layer of
photoreactive chemicals 21. In alternative embodiments, a movable
alignment fixture 22 upon which the substrate 20 is mounted, and an
optical viewer 24 are provided as depicted in FIG. 1A.
[0068] As depicted in FIG. 2B, light source 10 provides a beam of
collimated light, or light beam 26, which can be selectively
filtered by inserting or removing filter 11 from light beam 26.
Light beam 26 is projected upon first lens system 12 and then onto
the variably transmissive filter array device 9, wherein each
individually addressable pixel of the variably transmissive filter
array device 9 can be signaled to be opaque or transparent.
Computer system 16 provides, over signal line(s) 15, mask patterns
to a gray scale controller 17, which modulates the received mask
patterns to provide a gray scale mask pattern to the variably
transmissive filter array device 9. The variably transmissive
filter array device 9 then transmits, by driving the addressed
pixel to a transparent state, or blocks light, by driving the
addressed to an opaque state, according to the gray scale mask
pattern. In addition, computer system 16 can optionally shift the
desired mask pattern in two dimensions to align the pattern with
the substrate 20.
[0069] B. Method for Gray Scale Maskless Photolithography
[0070] As depicted in FIG. 3 a method of using the current
invention to photoform photosensitive materials using gray scale
lithography will now be described. It should be understood that in
certain situations for reasons of computational efficiency or ease
of maintenance, the ordering and relationships of the blocks of the
illustrated flow charts could be rearranged or re-associated by one
skilled in the art. Starting from step 50, a desired mask pattern
is designed and stored on computer system 16 in step 52.
Alternatively, mask patterns can be designed on other computer
systems and imported into computer system 16. Next, in step 54, a
photosensitive material is provided for exposure to the patterned
light beam 27. For example, the substrate 20 is affixed to
alignment fixture 22 and coated with a layer of photoreactive
chemicals 21 for exposure to the patterned light beam 27. After the
photosensitive material is provided for exposure, the filter 11 is
placed in the light beam 26 path according to step 56 to filter the
light and prevent exposure of the photosensitive material until the
system has been aligned.
[0071] Next, the computer system 16 is instructed to provide the
resident mask pattern information to micromirror array 14 via the
gray scale controller 17, as shown in step 58, and the micromirror
array 14 responds by orienting each individual mirror to reflect or
direct light beam 26 away from the photosensitive material
according to the desired pattern. In an alternative embodiment, a
variably transmissive filter array device 9 is used and the
projected light beam 26 is directed through the variably
transmissive filter array device 9 and towards the substrate 20.
The variably transmissive filter array device 9 responds to the
resident mask pattern information by preventing light transmission
by causing the individual pixels of the variably transmissive
filter array device 9 to be in an opaque state or a transparent
state according to said gray scale mask patterns provided by said
gray scale mask pattern controller 17. Consequently, the intensity
of said gray scaled patterned light transmitted to the
photosensitive material is varied by modulating the transmissive
properties of said variably transmissive filter array device to
achieve gray scale photosculpting and/or photo transforming of the
photosensitive material.
[0072] Next, alignment of the photosensitive material is enabled by
exciting the light source 10 to provide a light beam in step 60,
projecting light beam 26 through first lens system 12, and then
onto micromirror array 14. In turn, micromirror array 14 reflects
light beam 26 through second lens system 18 and the photosensitive
material.
[0073] With the desired pattern projected on the photosensitive
material, the material can be manually and/or automatically aligned
in three dimensions according to step 62, for example, by moving
alignment fixture 22 to ensure that the photosensitive material is
properly located in light beam 26. Proper alignment can be verified
by viewing the projected pattern on the photosensitive material
through optical viewer 24. In an optional embodiment, once the
photosensitive material is manually and/or automatically aligned,
alignment information can be provided to computer system 16 and
computer system 16 automatically adjusts the micromirror 14 by
shifting the pattern in two dimensions to attain proper alignment
in step 64. Having aligned the photosensitive material, the
material is exposed in step 68 by removing filter 11 from light
beam 26 in step 68 and allowing the light to cause a photoreaction
in the photosensitive material for a required reaction time
depending on the photoreactive chemicals used. For example, using
standard Novolac.TM. positive photoresist an exposure time of 60
seconds is used.
[0074] To accomplish gray scale patterning, the gray scale
controller 17 modulates the mask pattern information in step 70
provided to the micromirror 14 to achieve a desired gray scale
pattern 70. In an embodiment, the angular position and time
duration of the angular positioning of the mirrors in micromirror
array 14 is varied according to commands from gray scale controller
17 to create areas of varying thickness in the photosensitive
material, and/or composition, according to the time duration and
intensity of direct exposure. For example, when masking a 25 micron
square feature on a photoresist coated substrate, angular position
and time duration of the angular positioning of the mirrors in
micromirror array 14 might be varied by the gray scale controller
17 so that the mask effectively covers an area of 36 microns
square, centered on the desired 25 micron square feature. By
varying the time of exposure around the perimeter of the 25 micron
square feature, the resulting feature has sides that gradually
slope away from the directly exposed 25 micron square down to the
substrate wherein the thickness of the photoresist after
development depends on the local dose of UV irradiation. The
exposure time or intensity is adjusted to take into account the
non-linear photo-response of the particular photo resist and
proximity effects. Similar modulation of the mask pattern can be
utilized to create varying compositional changes with respect to
compositional change materials. In a specific embodiment, exposure
time and/or light intensity can be varied as a function of position
on the substrate to effect compositional changes with respect to
compositional change materials of the substrate.
[0075] In an embodiment, the gray scale controller can use a pulse
width modulation scheme to modulate the mask pattern provided to
the micromirror array 14. By applying pulse width modulation to the
control mask pattern information, the micromirrors of the array 14,
driven reflect light to the photosensitive material according to
the mask pattern, are further directed to occasionally reflect
light away according to the duty cycle of the pulse code
modulation. For example, in a pulse code modulation scheme, the
duty cycle for the angular deflection could be adjusted so that a
desired feature is exposed (by directing the mirrors to reflect
light to the feature on the photosensitive material) for 90% of the
total exposure time and masked (by directing the mirrors to reflect
light away from the feature on the photosensitive material) the
remaining 10% of the total exposure time. With respect to a feature
exposed for 100% of the exposure time, the feature exposed for only
90% of the entire exposure time will be proportionately smaller
because of the decreased exposure time and the resulting curing
response of the photoreactive material.
[0076] In addition to time modulation of the mask pattern, the
pattern can also be spatially modulated to provide continuously
variable pattern exposure. In spatial modulation, the varying
thicknesses and/or composition of photoreactive material can be
sculpted by modulating the positioning of the mirrors in the
micromirror array that are already positioned to form a mask
pattern. In this embodiment, the mirrors are directed to different
areas of the substrate, and the desired area exposed sequentially
in a series of directly radiating exposures. Consequently, gray
scaling is accomplished by applying fewer sequential exposure steps
to the desired area to create thinner thickness of photoreactive
material, and applying a greater number of sequential exposure
steps to the desired area to create thicker thickness and/or
compositional changes of photoreactive material. As a result
continuously variable thicknesses can be created by selectively
controlling the number of sequential exposure steps.
[0077] In yet another embodiment, spatial modulation can be
combined with time modulation to create continuously variable
thickness and/or composition. Both the number of sequential
exposure steps and the modulation of the mirror positioning during
each exposure step provides further control over the gray scaling
process.
[0078] In still another embodiment, a plasma display device 13 is
used as both a light source and pattern generator. In this
embodiment the intensity of each pixel of light is variably excited
and/or modulated to create gray scaled patterns. In addition,
spatial modulation can be employed as described above, and both
intensity modulation and spatial modulation can be combined to
create gray scale patterns on substrates.
[0079] In addition to providing gray scale patterns, by dynamically
modulating the mirrors as described, the mirrors can be dynamically
positioned so as to reduce stiction of the mirrors. Further,
pixelation effects on the substrate are reduced by providing mask
pattern coverage of the interpixel areas not exposed to direct, on
axis illumination.
[0080] If further exposures are desired in step 72, such as
required when creating three-dimensional objects, the above method
is repeated by returning to step 52 until the desired object is
fabricated. A new digital mask pattern is provided, another
photoreactive coat is applied, and the substrate is realigned and
re-exposed. Once the desired object has been created, the process
ends in step 74.
III. Large Area Patterning Maskless Photolithography
[0081] Referring now to FIGS. 1A and 1B, embodiments of the current
invention for creating large area patterns on substrates will be
described. In the large area patterning embodiments, a maskless
photolithography system is provided that enables efficient writing
of patterns to large areas in order to permit maximal image
resolution for a maximal field size. A patterned light generator
projects images onto photo reactive compounds mounted on a movable
alignment fixture 22. In a specific embodiment, the system uses a
micromirror array device as described previously and shown in FIG.
1A, to direct patterned light to a substrate 20. In an alternate
embodiment, the system uses a plasma display device as described
previously and shown in FIG. 1B, to generate and direct patterned
light to a substrate 20. During exposure, the patterned light
generator moves across a large substrate 20, while at the same time
successively changing the projected pattern to a large image
exposure area. Alternatively, the substrate 20 is moved under the
patterned light beam 27 while at the same time the projected
pattern is successively changed to expose a large area. In yet
another embodiment, the computer system 16 can control the movement
of the substrate under the patterned light beam 27 to synchronize
the patterned light projected on the substrate with the desired
substrate area of projection.
[0082] Turning now to FIG. 4, a method of using the current
invention to photoform large area photosensitive materials using
maskless photolithography will now be described. It should be
understood that in certain situations for reasons of computational
efficiency or ease of maintenance, the ordering and relationships
of the blocks of the illustrated flow charts could be rearranged or
re-associated by one skilled in the art. Starting from step 80, a
photosensitive material is provided for exposure to the patterned
light beam 27 in step 82. For example, the substrate 20 is affixed
to alignment fixture 22 and coated with a layer of photoreactive
chemicals 21 for exposure to the patterned light beam 27. Next, a
desired mask pattern is designed and stored on computer system 16
in step 84. Alternatively, mask patterns can be designed on other
computer systems and imported into computer system 16. After the
mask pattern is provided for exposure, the filter 11 is placed in
the light beam 26 path according to step 86 to filter the light and
prevent exposure of the photosensitive material until the system
has been aligned.
[0083] Next, the computer system 16 is instructed to provide the
resident mask pattern information to the pattern generator in step
88, and the pattern generator responds by providing a patterned
light beam 27 to the photosensitive material according to the
desired pattern in step 90. With the desired pattern projected on
the photosensitive material, the material can be manually aligned
in three dimensions according to step 92, for example, by moving
alignment fixture 22 to ensure that the photosensitive material is
properly located in light beam 26. Proper alignment is verified by
viewing the projected pattern on the photosensitive material
through optical viewer 24. In an optional embodiment, once the
photosensitive material is manually aligned, alignment information
can be provided to computer system 16 and computer system 16
automatically adjusts the pattern generator by shifting the pattern
in two dimensions to attain proper alignment in step 94. Having
aligned the photosensitive material, the filter is removed from
light beam 26 in step 96 and the photosensitive material is exposed
in step 98, allowing the light to cause a photoreaction in the
photosensitive material for a required reaction time depending on
the photoreactive chemicals used.
[0084] For large area patterning, steps 84 through 98 are repeated
until the desired large area has been exposed. Specifically, if
another area of the photosensitive material needs to be exposed in
step 100, the system can be realigned to expose that area 104. Such
realignment can be performed manually and/or automatically. For
example, the pattern generator is moved to illuminate a new area on
the photosensitive material or the photosensitive material is moved
under the light beam to expose a new area. In an embodiment, the
relative movement of the pattern generator and the photosensitive
material is synchronized to mutually align the pattern generator
and the photosensitive material with respect to each other to
expose new areas. Movement is provided in two coplanar dimensions
perpendicular to the incident patterned light beam 27.
Alternatively, movement is provided in a linear one-dimensional
direction, such as in a conveyor belt fashion.
[0085] After the alignment to expose a new area of the
photosensitive material 104, the mask pattern is shifted 106 to
provide the appropriate pattern for the new area to be exposed and
the process returns to step 84. The process described in steps 84
through 98 is then repeated. If no other areas need to be exposed,
the process ends on step 102. Following the described procedure,
large area patterns can be created, including generation of large 3
dimensional patterns by sequentially exposing layers on top of
previously created layers.
[0086] The system and method can be used to produce large area
microelectronics, large area micro-electromechanical systems, large
area printed materials, large area sensors, whole wafer patterning,
mixed scale electronics (printed wiring boards and
micro-electromechanical systems), mixed signal electronic
patterning (digital circuitry and analog circuitry, large area
printed inks (graphic and electronic) and systems on a wafer. The
subject invention can also be used to produce large area variable
2D and 3D materials of any composition that may be photo imageable,
or may be non-photo imageable materials defined by photo imageable
material/features.
IV. Method for Maskless Photolithography
[0087] A method of using the current invention to fabricate designs
will now be described. It should be understood that in certain
situations for reasons of computational efficiency or ease of
maintenance, the ordering and relationships of the blocks of the
illustrated flow charts could be rearranged or re-associated by one
skilled in the art. Referring to FIG. 5, starting from step 50, a
desired mask pattern is designed and stored on computer system 16
in step 52. Alternatively, mask pattern designs can be designed on
other computer systems and imported into computer system 16. Next,
in step 54, a substrate 20 is placed on alignment fixture 22 and
coated with a layer of photoreactive chemicals 21 in step 56. Once
the substrate is mounted in alignment fixture 22, the filter 11 is
placed in the light beam 26 path according to step 58 to filter the
light and prevent exposure of the substrate. Next, the computer
system 16 can then be instructed to provide the resident mask
pattern information to micromirror array 14 as shown in step 60,
and the micromirror array 14 responds by orienting each individual
mirror to reflect or direct light beam 26 away from substrate 20
according to the desired pattern. Next, alignment of the substrate
is enabled by exciting the light source 10 to provide a light beam
in step 62, projecting light beam 26 through first lens system 12,
and then onto micromirror array 14. In turn, micromirror array 14
reflects light beam 26 through second lens system 18 and onto layer
of photoreactive chemicals 21 and substrate 20.
[0088] With the desired pattern projected on substrate 20,
alignment fixture 22 can be manually aligned in three dimensions
according to step 64 by moving alignment fixture 22 to ensure that
substrate 20 is properly located in light beam 26. Proper alignment
can be verified by viewing the projected pattern on substrate 20
through optical viewer 24. Once substrate 20 is manually aligned,
alignment information can optionally be provided to computer system
16 and computer system 16 automatically adjusts the micromirror 14
by shifting the pattern in two dimensions to attain proper
alignment in optional step 66. Having aligned substrate 20, the
layer of photoreactive chemicals 21 on substrate 20 is exposed in
step 70 by removing filter 11 from light beam 26 in step 68 and
allowing the light to cause a reaction between layer of
photoreactive chemicals 21 and substrate 20 for a required reaction
time depending on the photoreactive chemicals used. For example,
using standard Novolac.TM. positive photoresist, an exposure time
of 60 seconds is used. In an embodiment, during exposure step 70,
the angular position and time duration of the angular positioning
of the mirrors in micromirror array 14 is varied according to
commands from computer system 16. For example, when masking a 25
micron square feature, angular position and time duration of the
angular positioning of the mirrors in micromirror array 14 might be
varied so that the mask effectively covers an area of 36 microns
square, centered on the desired 25 micron square feature. As a
further example, the duty cycle for the angular deflection could be
adjusted so that the 25 micron square feature is masked 90% of the
total exposure time and the remaining 11 square micron area is
covered 10% of the total exposure time. By dynamically modulating
the mirrors as described, stiction of the mirrors is reduced.
Further, pixelation effects on the substrate are reduced by
providing mask pattern coverage of the interpixel areas not exposed
to direct, on axis illumination.
[0089] In an embodiment in which alignment 22 is interconnected
with computer system 16, the movement and/or rotation of the
substrate can be effected via instructions sent to the alignment
fixture 22 from computer system 16 in accordance with the desired
mask pattern. Accordingly, multiple exposures of the substrate can
be accomplished for each coating of the substrate, for example with
the substrate in different positions and/or rotations, so as to
accomplish the desired mask pattern.
[0090] If further exposures are desired in step 72, such as
required when creating three-dimensional objects, the above method
is repeated by returning to step 52 until the desired object is
fabricated. A new digital mask pattern is provided, another
photoreactive coat is applied, and the substrate is realigned and
re-exposed. Once the desired object has been created, the process
ends in step 74.
V. Exemplary Embodiment
[0091] An example of the current invention using the system and
method described above will now be presented. In an embodiment, the
current invention is designed to be an integrated, reconfigurable,
rapid prototyping maskless photography system. The system provides
optics, a light source, and integrated electronic components used
to directly generate patterns for the exposure of photoresist and
other photoimagable materials. A broad band spectrum, high
intensity white light source provides the exposure energy for the
process. This light is then filtered and optimized for the exposure
process, using a variety of integrated optical components. A direct
coupled optical delivery system ensures efficient transfer of the
light energy. Using proven optical techniques, the projected image
is free of distortion and uniform through out the exposure area.
With the optimized optical stream, the image is imposed in the
light path, providing the final exposure pattern. This pattern is
then transferred to the substrate surface and used to expose the
photosensitive material required in the user's fabrication
process.
[0092] A personal computer operably connected to a micromirror
array to provide mask patterns. The mask patterns are generated in
the computer and then transferred to the micromirror array to
provide the optical pattern for exposure. The pattern is
transferred to a substrate and is observed using an optical
microscope. This microscope is needed for pattern alignment to the
substrate. Alignment is controlled through the use of a course
alignment stage provided by a mechanically movable substrate
mounting alignment fixture, combined with a fine, electronic
alignment stage. This fine alignment stage is computer controlled
and aligns the mask pattern reflected from the micromirror instead
of moving the alignment fixture, thereby offering exceptional
accuracy and repeatability. Once alignment is complete, substrate
exposure occurs. Through the use of a step and repeat method, the
entire substrate surface can be exposed and multiple layers can be
created using an alignment stage movable in a direction parallel to
the light beam.
[0093] In the exemplary embodiment, the light source exhibits a
spectral peak at 436 nm as shown in FIG. 6. As a result the
invention produces light compatible with g-line photoresist
material and other photopolymers that activate in this spectral
region. In addition, typical exposure energy density for a 2.5 cm
by 2.5 cm exposure area is 225 mj/cm.sup.2. However, the energy
density can be adjusted as required. By using DMDs designed to
withstand higher levels and different wavelengths of UV light,
different frequencies can be used, such as UV light having a
spectral peak at 365 nm.
[0094] FIG. 7 shows how the minimum feature size varies depending
on the desired exposure area. The invention is capable of creating
features as small as 5 micrometers (.mu.m) for an exposure area of
6.25 millimeters (mm) by 6.25 mm. As shown on the graph, as the
desired minimum feature size increases, the exposure feature size
increases linearly. For example, for a minimum feature size of 20
.mu.m, the exposure field is increased to 25 mm by 25 mm.
[0095] In addition, according the invention, three-dimensional
patterns can be created using the three dimension alignment
capabilities disclosed above. For example, patterning using thick
photo resist or multiplayer patterning of individual photoresist
layers. These techniques can be use to provide either a photomask
for subsequent etching of substrate materials or if the
photopolymer is compatible with the chemistry used in the device,
the fabricated features can be used as part of the device
itself.
[0096] Based on the foregoing specification, the computer system of
the disclosed invention may be implemented using computer
programming or engineering techniques including computer software,
firmware, hardware or any combination or subset thereof. Any such
resulting program, having computer-readable code means, may be
embodied or provided within one or more computer-readable media,
thereby making a computer program product, i.e., an article of
manufacture, according to the invention. The computer readable
media may be, for instance, a fixed (hard) drive, diskette, optical
disk, magnetic tape, semiconductor memory such as read-only memory
(ROM), etc., or any transmitting/receiving medium such as the
Internet or other communication network or link. The article of
manufacture containing the computer code may be made and/or used by
executing the code directly from one medium, by copying the code
from one medium to another medium, or by transmitting the code over
a network.
[0097] One skilled in the art of computer science will easily be
able to combine the software created as described with appropriate
general purpose or special purpose computer hardware to create a
computer system or computer sub-system embodying the method of the
invention. An apparatus for making, using or selling the invention
may be one or more processing systems including, but not limited
to, a central processing unit (CPU), memory, storage devices,
communication links and devices, servers, I/O devices, or any
sub-components of one or more processing systems, including
software, firmware, hardware or any combination or subset thereof,
which embody the invention. User input may be received from the
keyboard, mouse, pen, voice, touch screen, or any other means by
which a human can input data into a computer, including through
other programs such as application programs.
[0098] It should be understood that the examples and embodiments
described herein are for illustrative purposes only and that
various modifications or changes in light thereof will be suggested
to persons skilled in the art and are to be included within the
spirit and purview of this application.
* * * * *