U.S. patent application number 09/776202 was filed with the patent office on 2001-08-02 for digital optical chemistry micromirror imager.
Invention is credited to Garner, Harold R..
Application Number | 20010010843 09/776202 |
Document ID | / |
Family ID | 22208221 |
Filed Date | 2001-08-02 |
United States Patent
Application |
20010010843 |
Kind Code |
A1 |
Garner, Harold R. |
August 2, 2001 |
Digital optical chemistry micromirror imager
Abstract
An apparatus and method for catalyzing a reaction on a substrate
(24) comprising, a light source (12), a micromirror (16) positioned
to redirect light (14) from the light source (12) toward a
substrate (24) wherein the redirected light (14) catalyzes a
chemical reaction proximate a substrate (24), is disclosed. A
computer (18) is connected to, and controls, the positioning of
mirrors within the micromirror (16) to specifically redirect light
to specific portions of a substrate. The substrate (24) can be
placed in a reaction chamber (50), wherein the light (14) that is
redirected by the micromirror (16) catalyzes a chemical reaction
proximate a substrate (24).
Inventors: |
Garner, Harold R.; (Flower
Mound, TX) |
Correspondence
Address: |
Gardere Wynne Sewell LLP
1601 Elm Street, Suite 300
Dallas
TX
75201
US
|
Family ID: |
22208221 |
Appl. No.: |
09/776202 |
Filed: |
February 2, 2001 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
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09776202 |
Feb 2, 2001 |
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09326526 |
Jun 4, 1999 |
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60087948 |
Jun 4, 1998 |
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Current U.S.
Class: |
427/582 |
Current CPC
Class: |
B01J 2219/00529
20130101; G01J 2003/1278 20130101; B01J 19/0046 20130101; B01J
2219/00704 20130101; B01J 2219/00711 20130101; G03F 7/70291
20130101; B01J 2219/00605 20130101; B01J 2219/00659 20130101; B82Y
30/00 20130101; B01J 2219/00439 20130101; G03F 7/2002 20130101;
G03F 7/70375 20130101; B01J 2219/00617 20130101; G03F 7/2053
20130101; B01J 2219/00612 20130101; B01J 2219/00722 20130101; B01J
2219/00576 20130101; B01J 2219/0059 20130101; B01J 2219/00527
20130101; B01J 2219/00689 20130101; B01J 2219/00637 20130101; B01J
2219/00585 20130101; B01J 2219/00596 20130101; C40B 40/06 20130101;
B01J 2219/00608 20130101; B01J 2219/00675 20130101; B01J 2219/00626
20130101; G02B 26/0833 20130101 |
Class at
Publication: |
427/582 |
International
Class: |
C23C 016/48 |
Claims
What is claimed is:
1. An apparatus for catalyzing a reaction on a substrate
comprising: a light source; a micromirror positioned to redirect
light from said light source toward said substrate; a computer
connected to, and controlling, said micromirror; and a reaction
chamber is placed in the path of light redirected by said
micromirror, wherein light that is redirected by said micromirror
catalyzes a chemical reaction proximate said substrate in said
reaction chamber.
2. The apparatus of claim 1 wherein said light source is a UV
light.
3. The apparatus of claim 1 wherein said light source produces
visible light.
4. The apparatus of claim 1 further comprising a lens between said
micromirror and said substrate.
5. The apparatus of claim 4 wherein said lens id further defined as
a lens system, and wherein said lens system can change the
magnification of light reflected by said micromirror.
6. The apparatus of claim 1 wherein said micromirror is further
defined as a micromirror array.
7. The apparatus of claim 1 further comprising a diffusion lens
between said light source and said micromirror.
8. The apparatus of claim 1 wherein said light interacts with a
novolak resin proximate said substrate to produce a photoresist
pattern.
9. The apparatus of claim 1 wherein said light catalyzes the
synthesis of a nucleotide base proximate said substrate.
10. The apparatus of claim 1 wherein said light catalyzes the
synthesis of an amino acid residue proximate said substrate.
11. The apparatus of claim 1 wherein said light catalyzes a
reaction involving a molecule proximate said substrate.
12. The apparatus of claim 1 wherein said light crosslinks a
molecule proximate said substrate.
13. The apparatus of claim 1 further comprising: a reaction chamber
disposed about said substrate; one or more reactant lines connected
to said reaction chamber; one or more reaction chemicals connected
to said reactant lines; and a computer connected to, and
controlling, the supply of said one or more reaction chemicals to
said reaction chamber via said reactant lines.
14. The apparatus of claim 13 wherein said one or more of said
reaction chemicals is involved in a chemical reaction when exposed
to light.
15. An apparatus for catalyzing a reaction on a substrate
comprising: a light source; a micromirror positioned to redirect
light from said light source toward said substrate; a reaction
chamber disposed about said substrate; one or more reactant lines
connected to said reaction chamber; one or more reaction chemicals
connected to said reactant lines; and a computer connected to, and
controlling, said micromirror and the supply of said one or more
reaction chemicals to said reaction chamber via said reactant
lines, wherein a light catalyzable reaction occurs proximate to the
site where light produced by said light source and redirected by
said micromirror strikes said substrate.
16. The apparatus of claim 15 wherein said light source is a UV
light.
17. The apparatus of claim 15 wherein said light source produces
visible light.
18. The apparatus of claim 15 wherein said light source is a xenon
lamp, or a mercury lamp, or a laser or a combination thereof.
19. The apparatus of claim 15 further a lens system comprising: a
diffusion lens between said light source and said micromirror; and
a lens between said micromirror and said substrate.
20. The apparatus of claim 15 wherein said micromirror is further
defined as a micromirror array.
21. The apparatus of claim 15 wherein said light interacts with a
novolak resin proximate said substrate to produce a photoresist
pattern.
22. The apparatus of claim 15 wherein said light catalyzes the
synthesis of a nucleotide base proximate said substrate.
23. The apparatus of claim 15 wherein said light catalyzes the
synthesis of an amino acid residue proximate said substrate.
24. The apparatus of claim 15 wherein said light catalyzes a
reaction involving a molecule proximate said substrate.
25. The apparatus of claim 15 wherein said light crosslinks a
molecule proximate said substrate.
26. The apparatus of claim 15 further comprising a total internal
reflection mirror disposed in a position to redirect light from
said light source into said micromirror and from said micromirror
array toward said substrate.
27. The apparatus of claim 15 wherein said substrate is mounted on
a movable platform that can be controlled via a computer to allow
for multiple repetitive exposures of said substrate to light
reflected by said micromirror.
28. A method of patterning on a substrate comprising the steps of:
generating a light beam; illuminating a micromirror with said light
beam; redirecting said light beam with said micromirror onto a
substrate; and catalyzing a light sensitive reaction proximate to
the surface of said substrate using said redirected light beam in a
predetermined pattern.
29. The method of claim 28 further comprising the step of
controlling, using a computer, said micromirror.
30. The method of claim 28 wherein said step of redirecting said
light beam is accomplished using a micromirror array.
31. The method of claim 28 wherein said illuminating light beam is
further defined as a UV light.
32. The method of claim 28, further comprising the step of:
obtaining a substrate; and depositing a novolak resin on said
substrate prior to redirecting said a light beam to pattern said
photoresist.
33. The method of claim 28, wherein said step of catalyzing a light
sensitive reaction proximate to the surface of said substrate is
further defined as patterning a photoresist disposed proximate said
substrate.
34. The method of claim 28, further comprising the steps of:
positioning said substrate with a reaction chamber; flooding said
substrate with a light catalyzable reaction chemical; and exposing
said light catalyzable reaction chemical to light using said
micromirror to catalyze a chemical reaction at the site where light
strikes said substrate.
35. The method of claim 28 wherein said step of catalyzing a light
sensitive reaction proximate to the surface of said substrate is
further defined as the synthesis of a nucleotide base proximate
said substrate.
36. The method of claim 28 wherein said step of catalyzing a light
sensitive reaction proximate to the surface of said substrate is
further defined as the synthesis of an amino acid residue proximate
said substrate.
37. The method of claim 28 wherein said step of catalyzing a light
sensitive reaction proximate to the surface of said substrate is
further defined as involving a molecule proximate said
substrate.
38. The method of claim 28 wherein said step of catalyzing a light
sensitive reaction proximate to the surface of said substrate is
further defined as crosslinking a molecule proximate said
substrate.
Description
[0001] This application claims priority under 35 U.S.C.
.sctn.119(e)(1) of provisional patent application No. 60/087,948,
filed Jun. 4, 1998.
TECHNICAL FIELD OF THE INVENTION
[0002] The present invention relates in general to the field of
optical chemistry, and more particularly, to an apparatus and
method for conducting a light directed chemical synthesis or
reaction on a substrate using a computer controlled digital light
processing micromirror array.
BACKGROUND OF THE INVENTION
[0003] Without limiting the scope of the invention, its background
is described in connection with the patterning of a
photolithographic emulsion for the fabrication of electronic
devices for use in large scale integration, as an example.
[0004] Heretofore, in this field, photolithographic patterning of
integrated circuits has depended on the formation and images with
visible or ultraviolet light in a photoresist. To achieve large
scale integration of electronic circuit devices, photoresist is
patterned is currently achieved using proximity or projection
printing. Proximity or projection printing of photolithographic
patterns on substrates such as single grain silicon, depend on the
printing of a lithographic mask on, e.g., fused-silica.
[0005] One problem with photolithographic masks is the degradation
of the mask with each exposure to high intensity light or other
rays. For example, a fused-silica mask that is used to pattern a
large, dense semiconductor chip can have a useful life as low as
two hours. Furthermore, the formation of masks requires a separate
process, akin to wafer fabrication, in which the masks are
patterned on a ultraviolet transparent material, usually having a
metallic overcoat into which the pattern is etched. The entire mask
producing process is akin to wafer fabrication in that similar care
must be taken to prevent contamination with particulate matter from
processing reagents and the atmosphere in which the masks are
created and handled. The mask process is also very costly, cost
which is further accentuated by the difficulty in making reliable,
long lasting masks. Also, the turnaround time for mask making makes
rapid changes to designs somewhat prohibitive.
[0006] A number of problems are encountered using masks for a wide
variety of applications. For example, U.S. Pat. No. 5,626,784,
issued to Simons, discloses a method for improving the alignment of
photolithographic masks using a frame having sides that are
individually thermally expandable. The mask is fabricated to be
undersized so that the distance between fiducials on the mask is
less than a desired distance, which may be the distance between
corresponding fiducials on the workpiece. The mask is mounted on
the frame, and at least one side of the frame is heated to expand
the side and stretch the mask to achieve the desired interfiducial
distance. While alignment of a mask is improved using the method
disclosed, masks for each of the steps requiring photoresist are
still required. Also, with each step requiring a mask, the above
method has to be repeated to accomplish the underlying photoresist
patterning.
SUMMARY OF THE INVENTION
[0007] It has been found that present apparatus and methods fail to
meet the demands for a low cost, efficient, customizable method of
small scale patterning for use in the creation of arrays for
read-out systems that are capable of overlapping, concurrent data
acquisition and analysis. Present patterning techniques also
require the creation of masks for each step that involves the
patterning of a photoresist during the formation of integrated
circuits.
[0008] In the area of semiconductor design and manufacturing, a
significant problem of current systems is that during the formation
of semiconductor chips a number of photolithographic masks must be
custom designed and printed for steps that require
photolithographic protection of portions of a substrate. Each steps
that requires photolithographic masks to, e.g., protect portions of
semiconductor layers during etching or blanket deposition of
semiconductor device layers, must be fit with a unique mask.
Furthermore, each mask must be closely aligned to achieve efficient
formation of major semiconductor components. The cost of
implementation of novel designs for semiconductor devices is
greatly increased by the need to design, print and pattern each
mask separately. What is needed to design, test and implement
integrated circuit design changes, therefore, is a rapid,
inexpensive apparatus and method for patterning a photoresist on a
semiconductor substrate that uses existing technology.
[0009] Current biochip technology is based on principles not unlike
the formation of integrated circuit devices on a semiconductor
substrate or template. It is recognized, as disclosed herein, that
current biochip fabrication technology is afflicted by the same
inefficiencies intrinsic to the use of photolithography to pattern
and protect light catalyzed chemical reactions on active and
inactive substrates. The present invention is based on the
recognition that photolithographic masks are incapable of being
designed, printed and used, at a reasonable cost to achieve the
needed diversity for arrays of, e.g., oligonucleotide, polypeptide
arrays or small chemical molecules. During large scale
resequencing, for example, the ability to create a system for
determining nucleotide sequences having a large diversity based on
data previously obtained from an automated sequencer.
[0010] More particularly, the present invention can be an apparatus
for catalyzing a reaction on a substrate comprising a light source
that is directed toward a micromirror positioned to redirect light
from the light source toward a substrate. A computer is connected
to, and controls, the micromirror and a substrate holder, such as a
reaction chamber, that is placed in the path of light redirected by
the micromirror, wherein light that is redirected by the
micromirror catalyzes a chemical reaction proximate the substrate.
By proximate it is meant that the light catalyzed reaction can
occur on or about the surface of the substrate. A light source for
use with the present invention is a lamp or laser, such as a UV
light. In an alternative embodiment the light source can be, e.g.,
a xenon lamp, or a mercury lamp, or a laser or a combination
thereof. The light produced by the light source can also be visible
light. One advantage of catalyzing chemical reactions using UV
light is that it provides photons having the required high energy
for the reaction. UV light is also advantageous due to its
wavelength providing high resolution. Lenses can be positioned
between the light source and the micromirror, which can be a
micromirror array, or between the micromirror and the substrate. An
example of such a lens is a diffusion lens.
[0011] Light from the light source can interact with, e.g., a
novolak resin proximate to the substrate to produce a negative or a
positive pattern in photoresist. The light catalyzed synthesis or
reaction can be, e.g., the addition a nucleotide base to the
substrate or to a base or polynucleotide chain attached to the
substrate. Likewise, the light redirected by the micromirror can
catalyze a chemical reaction, e.g., an amino acid addition reaction
or the addition, removal or crosslinking of organic or inorganic
molecules or compounds, small or large. For example, during the
addition of a nucleic or an amino acid residue, the light can
deprotect protecting groups of, e.g., phosphoamidite containing
compounds. Light can also be responsible for the crosslinking or
mono-, bi-, or multi-functional binding groups or compounds to
attach molecules such as, fluorochromes, antibodies, carbohydrates,
lectins, lipids, and the like, to the substrate surface or to
molecules previously or concurrently attached to the substrate.
[0012] The present invention can also be a method of patterning on
a substrate comprising the steps of, generating a light beam,
illuminating a micromirror with the light beam, redirecting the
light beam with the micromirror onto a substrate and catalyzing a
light sensitive reaction proximate to the surface of the substrate
using the redirected light beam in a predetermined pattern. By
using the method of the present invention as a series of cycles, a
number of layers can be built on the substrate or strings of
molecules can be built having a large diversity. The method of the
present invention can further comprising the step of controlling,
using a computer, the micromirror, which can be a light mirror
array such as, e.g., a Texas Instruments Digital Light Processor.
The illuminating light beam can be a UV, or other light source that
is capable of catalyzing a chemical reaction, such as the formation
of a positive or negative photoresist. The present method can also
be used for the in situ addition or removal of organic or inorganic
molecules or compounds, as will be known to those of skill in the
art of photochemistry.
[0013] The method of the present invention can further comprise the
step of, obtaining a substrate, and depositing a novolak resin on
the substrate prior to redirecting the light beam to the
photoresist. The method may also comprise the steps of positioning
a substrate with a reaction chamber, flooding the surface of the
substrate with a light catalyzable reaction chemical, such as a
nucleotide or amino acid residue, and exposing the chemicals
reagents light. A light catalyzable reaction chemical is activated
and a reaction synthesis or decomposition is caused by light at the
location where the micromirror redirects light on the substrate,
but not where the micromirror does not redirect light. The present
invention can be used, e.g., in "stepper" fashion, wherein the
micromirror is directed at a portion of the substrate, that portion
of the substrate exposed to light from the micromirror, and then
stepped on to a different portion. The new portion of the substrate
exposed can be, e.g., overlapping or adjacent to the first
portion.
BRIEF DESCRIPTION OF THE DRAWINGS
[0014] For a more complete understanding of the features and
advantages of the present invention, reference is now made to the
detailed description of the invention along with the accompanying
figures in which corresponding numerals in the different figures
refer to corresponding parts and in which:
[0015] FIG. 1 is a diagram of the basic physical components of a
micromirror imager;
[0016] FIG. 2 is a diagram of the basic principles underlying a
micromirror;
[0017] FIG. 3 is a diagram that represents a micromirror imager
system;
[0018] FIG. 4 is a diagram of an alternative lens mirror
configuration for focusing the light using the micromirror
array;
[0019] FIG. 5 is a flowchart of the steps involved in the use of a
micromirror array to conduct an in situ light catalyzed
reaction;
[0020] FIG. 6 is a physical mask produced using the present
invention; and
[0021] FIG. 7 is a digital image scanned of a substrate onto which
a fluorochrome bound to a phosphoamidite base, which was attached
using the present invention.
DETAILED DESCRIPTION OF THE INVENTION
[0022] While the making and using of various embodiments of the
present invention are discussed in detail below, it should be
appreciated that the present invention provides many applicable
inventive concepts which can be embodied in a wide variety of
specific contexts. The specific embodiments discussed herein are
merely illustrative of specific ways to make and use the invention
and do not delimit the scope of the invention.
[0023] Digital Optical Chemistry System
[0024] The present invention uses Digital Light Processing
technology (Texas Instruments, U.S.A.) with optical deprotection
photochemistry (e.g., Affymetrix, U.S.A.), to create an apparatus
and method for generating Digital Optical Chemistry (DOC) high
diversity arrays. The present invention overcomes the limitations
of the traditional mask-based photolithographic processes by
eliminating the need for a mask. The present invention is also
based on the recognition that DLP systems can be used to pattern
photoresist for the fabrication of substrates, e.g., semiconductor
substrates. The present invention thus overcomes the problem of
manufacturing and printing photolithograhic masks for conventional
photoresist patterning. The present invention can be made as a
portable platform for the construction of unique high-density
arrays.
[0025] FIG. 1 shows a depiction of a basic micromirror imager 10.
The micromirror imager 10 has a light source 12 which produces
light 14, which can be a light beam. The light 14 can be, e.g., a
Xenon lamp, a mercury lamp, a UV light source or other light
sources for use with light catalyzed chemical reactions. The choice
of light source will depend on the exact photochemistry required or
chosen, as will be known to those of skill in the art of
photochemistry. The light 14 is redirected or deflected by a
micromirror 16, such as a Digital Light Processor (DLP) micromirror
array (Texas Instruments, U.S.A.). Other light deflection systems
may be used with the present invention including an individual
mirror, or other light deflection system. A computer 18 is depicted
controlling the positioning of individual mirrors of the
micromirror 16 based on a pattern 20. The micromirror 16 deflects
the light 14 into a lens 22 that can focus or diffuse the light 14
to illuminate a substrate 24. Lens 22 can be magnifying or
demagnifying, to set the size of the features on the substrate 24.
The apparatus may also contain a shutter (not depicted) positioned
between the light source 12 and the micromirror 16 in order to
increase the accuity of light 14 delivery to the micromirror 16.
The shutter may also help increase the life-time of the micromirror
16 by decreasing the extent of direct and incident light that
strikes the array of mirrors. Substrates 24 that can be used with
the present invention include, e.g., silicon, gallium arsenide,
silicon on insulator (SOI) structures, epitaxial formations,
germanium, germanium silicon, polysilicon, amorphous silicon,
glass, quartz, or gel matrices and/or like substrates,
non-conductive, semi-conductive or conductive.
[0026] FIG. 2 shows a diagram illustrating the basic principles
underlying a micromirror 16. Light 14 strikes a pixel mirror 26,
which rotates around a central axis having a plus or minus ten
degree rotation. The incident angle of deflection of the mirror,
which for an aluminum DLP-type mirror, is 20 degrees. At plus 10
degrees light is reflected by the pixel mirror 26 into lens 22 and
onto the substrate to form a light spot 28 of pattern 20. At any
other angle the light is not deflected into the lens and therefore
appears as a dark spot 30. Gray scale, which can be used with the
present invention in some circumstances, is achieved by fluttering
the pixel mirror 26 to produce the analog equivalent of a gray
scale image on pattern 20.
[0027] FIG. 3 shows a diagram representing a micromirror imager
system 40. The micromirror imager or DOC system of the present
invention comprises generally three parts, a DLP micromirror system
34 that selectively directs light 14 onto a substrate 24 on which
the reactions are conducted, a fluidics system 36 that delivers the
photoactivatable reagents in proper sequence and a computer system
38 with software that controls the DLP micromirror system 34
according to the desired pattern 20. The micromirror imager system
40 can be used to create individual spots, 20 microns or smaller in
size, on a substrate 24 such as glass, with up to 2 million spots
per substrate using the present invention.
[0028] The present invention can also be applied to combinatorial
chemistry problems and the manufacture of custom microelectronics.
An important finding of the present invention was the recognition
that the DLP system could be used to reflect light in the UV range.
Light processing systems, such as the DLP created by Texas
Instruments, was intended to be the next generation of high
resolution, very bright, color true TV sets, computer
monitors/projectors and movie projectors. The DLP is designed to
reflect light in the visible range with a high brightness and
brightness efficiency, goals that are presently unattainable by
conventional liquid crystal display units. More information on the
system is available at "www.ti.com/dlp/", relevant portions of
which are incorporated herein by reference.
[0029] The micromirror imager system 40 is designed as a simple
device on which to do synthesis (oligo or combinatorial chemistry)
using, e.g., optical deprotection. As with the basic system
depicted in FIG. 1, the illumination of a given area of an
substrate 24 is controlled by a Digital Light Processor (DLP)
micromirror 16. The pattern 20 is controllable by controlling the
mirror angle using an image on a VGA monitor that is sent by the
computer 18 through the DLP system. For example, one mirror can be
used for each pixel on the 640.times.480 screen. The mirrors of the
micromirror 16 are each individually controlled, with the ability
to rock its angle on a 2 ms time scale. Grey scales are created by
rapidly moving a mirror to project and then not project on a given
position.
[0030] The substrate 24 is mounted in a custom reaction chamber 50
into which chemicals are pumped. The chemicals, including all the
standard chemicals for oligonucleotide synthesis, for example, can
be kept in syringes and pumped manually to the reaction chamber 50
through a chemical line 48. Alternatively an automated fluidics
system 36, as depicted in FIG. 3 can be used to control the input
and output of reagents into and out of reaction chamber 50. In this
example, the substrate 24 is illuminated from above with light
passing through the substrate 24. If the substrate 24 is not light
opaque the synthesis can take place on either side of the
substrate. As will be apparent to those of skill in the art of
optics, light can be reflected from a substrate 24 that is not
light opaque, wherein the light catalyzable reaction occurs at the
site of reflection or absorption. The reaction chamber 50 can be
moved to make multiple arrays at different positions on the
substrate 24.
[0031] The fluidics system 36 of the present invention can include
a number of reagent bottles containing synthesis chemicals 46. The
synthesis chemicals 46 can be, e.g., placed under pressure under a
non-reactive atmosphere, e.g., Argon or Helium, to provide pressure
for chemical delivery and to reduce premature oxidation of the
synthesis chemicals 46. Valves 44, under the control of a computer
such as computer 18 can be used to control the timing of the
synthesis chemical or chemicals 46 delivered through chemical line
48 to the reaction chamber 50.
[0032] FIG. 4 is a diagram of an alternative lens mirror
configuration for focusing the light using the micromirror 16. A
light source 12 is positioned to illuminate a prism set 62. Light
from the light source is focused onto the prism set, which in this
example is a total internal reflection (TIR) mirror that deflects
the light from the mirror surface into the pattern 20 that has been
delivered to the micromirror 16. Light reflected by the individual
mirrors then traverses the prism set into lenses 22, which can be
diffusion lenses. The patterned light strikes a reaction chamber,
depicted in this figure as a slide holder 60. Two slides 56 are
positioned within the slide holder 60. As can be seen from this
cross-sectional view of the slide holder 60, a light translucent
cover 64 is disposed over the reaction chamber 50. Synthesis
chemicals can be pumped into, and evacuated from the reaction
chamber 50 through chemical inlets/outlets (not depicted)
positioned to be in fluid communication with the interior 66 of the
reaction chamber 50. As viewed from the cross-sectional view it is
apparent to those of skill in the art, in light of the present
disclosure, that reaction chemicals can be delivered to the
interior 66 of the reaction chamber 50 from different positions,
such as the sides, top or bottom of the reaction chamber 50.
[0033] FIG. 5 is a flow chart of the steps involved in the use of a
micromirror array to conduct an in situ light catalyzed reaction.
In step 72 a pattern design in created using a computer. The design
can be, e.g., a photolithographic pattern to be formed on a
photoresist for a semiconductor integrated circuit. Alternatively,
the pattern can reflect the sequence of poly-nucleotides or
peptides that are to be conjugated in that particular step. One
advantage of the present system is that patterns of photoresist may
be deposited and/or developed in sequence at the same time that
chemical reactions are being catalyzed. Alternatively, the
pattern/catalysis reactions may occur in a pre-determined set of
cycles that take advantage of photoresist layering and the light
sensitivity of chemical reactions.
[0034] The pattern is transferred to the micromirror 16 in step 74.
The substrate is then exposed to reaction reagents or chemicals,
e.g., by flooding a reaction chamber 50. In step 78, the
micromirror 16 is used to reflect light in the previously
transferred pattern to the substrate, wherein a light catalyzed
reaction takes place at the site or sites where light strikes the
substrate 24. The reaction can be to conjugate directly onto the
substrate 24 or can cause a reaction to occur on compounds or
layers attached to, or disposed on, the substrate 24. A decision
box 82 is reached, and if the last patterning step has occurred
then the process ends 84. If more patterning and catalytic steps
are required, the process returns to step 74, wherein a previously
design pattern from step 72 is transferred to the micromirror 16 to
continue directing light catalyzed reactions on or about the
substrate 24 surface.
[0035] Following are the specifications and characteristics for one
embodiment of the micromirror imager system 40 of the present
invention:
[0036] Control computer - PC with VGA monitor
[0037] Software - Image created using PowerPoint, custom Software
or CAD software
[0038] Digital Light Processor - TI DLP with 640.times.480
resolution
[0039] Number of pixels - 640.times.480=307,200
[0040] Mirror material - Aluminum
[0041] Mirror reflectivity - 88%, Verified using monochromater/PM
tube in our lab for visible and
[0042] UV wavelengths
[0043] Mirror size - 16 microns.times.16 microns in a 20
micron.times.20 micron space
[0044] Synthesis spot size - 1:1 with mirror size
[0045] Mirror switching speed - 2 ms
[0046] Light source - 100 W mercury burner with peak at 365 nm
[0047] Light brightness - 170,000 cd/cm2=250 W/(cm2*st)
[0048] Luminous Flux - 2,200 lumens
[0049] Reaction chamber - custom from teflon, delrin and
aluminum
[0050] Reagent delivery - syringe injectors into header
[0051] Sample configuration - coated microscope slides
[0052] Microscope slide transparency - 5%@280, 40%@300, 75%@320,
87%@340, 88%@360, 89%@400, measured using spectrophotometer
[0053] Exposure time - 3 minutes per coupling reaction.
[0054] The apparatus and method of the present invention has been
used to: 1) show that the mirror array can project UV light (UV
light cannot be passed through conventional liquid crystal
displays) at sufficient intensity to conduct photochemistry, 2)
demonstrate that images at the focal plane can be created, and 3)
demonstrate the use of the apparatus and method photodeprotection
chemistry to make an patterned substrate.
[0055] FIGS. 6 and 7 are drawings that represents the results from
using the present invention to conduct a spatially controlled
oligonucleotide synthesis using light projected with the
micromirror imager system 40. FIG. 6 shows an array with a screen
mask on a glass slide. The dark areas are 0.2 mm in width with a
10X magnification. The pattern was created by UV directed
oligonucleotide synthesis, and was labeled using CY3 dye (Molecular
Probes, Inc., U.S.A.). FIG. 6 was taken using an epi-flouresence
microscope (Olympus, Inc., U.S.A). FIG. 7 shows CY3 dye conjugated
oligonucleotide bases to fluoresce regions of oligonucleotide
synthesis, taken using a laser scanning fluorescence system
(General Scanning, Inc., U.S.A.). The micromirror was set to fully
illuminate the chamber, and reaction chamber 50 was used to
synthesize oligonucleotides.
[0056] Micromirror System Optics
[0057] The optics for use with the present invention can be
designed to maintain the system focus while substantially
increasing the contrast ratio. A high contrast ratio is critical to
obtain high quality differential synthesis which is a function of
UV intensity and exposure time. The critical component to obtaining
higher contrast ratios is the TIR (Total Internal Reflectance)
prism, depicted in FIG. 4, that escorts the UV light from the
source onto the substrate and then out to the focusing optics.
These optics can be customized for a particular DLP with, e.g., UV
transparent glass (BK5, SF5 or KS). The use of a TIR prism is not
necessary, as the apparatus and method of the present invention has
been used with direct projection via a mirror set having 20 degrees
off-axis of the micromirror 16 to match the cant angle of the
individual mirrors and lenses. The TIR prism and lens 22, e.g.,
Acromat doublets or triplets, can be made from UV transparent fused
silica (many types are available for 365 nm, near UV).
[0058] A high power UV source can be used, e.g., a power source of
up to 1 kW can be used before reaching a damage threshold for the
micromirror 16. Also, an automated liquid handling system can be
constructed, fashioned from that used in the MerMade Oligo
Synthesizer (UTSW Medical Center, U.S.A.) or other commercially
available synthesizers (Beckman Instruments or Applied Biosciences,
Inc., U.S.A.). Reagents can be kept in, e.g., Argon pressurized
bottles and dispensed through teflon coated valves 44 under
computer control. A National Instruments digital I/O board can be
installed in the Macintosh control computer, followed by a solid
state relay system that provides the level of current necessary to
run the valves 44, which can be e.g., microvalves. Under computer
control, the valves 44 can be opened between 100 msec and 1 sec,
depending on the amount of reagent to be dispensed. The control
software for the valves 44 can be Labview or other custom codes
written in e.g., C or other computer languages. Pressurized bottles
and valves 44 can be provided for each reagent.
[0059] The reagents will be delivered to, e.g., the slide holder 60
on which the light is projected. The slide holder 60 can be
fabricated from Teflon, with slides sealed using o-rings. Two
slides can be sandwiched with the reagents pumped between them. The
two slide sandwich arrangement allows for the manufacture of two
slides, concurrently, and minimizes the scattered light for excess
light is projected through sandwich. The entire sandwich can be
clamped together and Luer lock fittings will be used to attach the
liquids.
[0060] The substrate, slide(s) or other surface for use with the
invention may be made of different materials, such as silicon,
glass or quartz. The slides may also have patterns on the surface
that are useful for increasing the attachment of compounds.
Additionally, the slide surface may be formed or modified to
increase the surface area and consequently the amount of material
that is formed, deposited or catalyzed on the slide surface. One
example of a modified surface area slide for use with the invention
is a microchannel slide that has a number of grooves or channels
throughout the slide that increase the surface area of the slide.
Another examples of a surface enhancing feature include: dimples,
holes, scratches and fibrous deposits or mesh.
[0061] It should be noted, that once produced, the DOC slide arrays
when used, can have a modified hybridization protocol. Possible
adjustments will include temperature, time, sample concentration,
buffer and wash conditions. These can be resolved depending on the
background and signal to noise ratio encountered with an initial
DOC slide. Once the DOC has been manufactured, however, the same
slide can be stripped and reused for the next hybridization cycle
with new conditions. Alternatively, the image acquisition can be
recalibrated to take into account increased background signal to
improve the signal to noise ratio through adjustments, manual or
automatic, to the data acquisition software. In fact, sample data
can be taken from the positive and negative controls on the DOC
slide by, e.g., placing the positive and negative controls in the
first line of samples to be scanned, and adjusting the calibration
for the entire DOC chip before any more data acquisition
continues.
[0062] Photoprotection chemistries for improved coupling yield
[0063] The critical step with light-directed synthesis of DNA
arrays on glass supports is the rate of photolytic release of the
5'-protecting group which is related to the reaction quantum
efficiency. For the 2-nitrobenzylic compounds to be used in
proposed research, the 365 nm emission of the Hg lamp is almost
exclusively responsible for photochemistry due to its chromophore
absorbance (.lambda..sub.max=345 nm,
.epsilon.=5.times.10.sup.3M.sup.-1 cm.sup.-1). The photocleavage
half-lives obey an inverse-linear dependence on light intensity and
saturation of the excited state was not found over the range of
5-50 mW/cm.sup.2 at 365 nm. This indicates that, in principle, even
higher intensity light, such as provided by a nitrogen laser, could
be used to shorten exposure times.
[0064] Solvent effects reveal that photocleavage rates proceeded
rapidly under dry conditions, or when the substrate was maintained
under a nonpolar solvent such as toluene or dioxane. To date, most
of the photoremovable protecting groups have been derivatives of
2-nitrobenzylic compounds. Both the structure of the nitrobenzyl
moiety and the atom to which it is attached have some effect on the
efficiency and wavelength required for cleavage. By changing
substituents in the aromatic ring and at the benzylic carbon,
improved efficiency of deprotection can be accomplished. Also,
different types of protecting groups that exhibit much higher
photolysis rates and quantum yields can be used. One of the
possible candidates can be desoxybenzoinyl (desyl) derivatives,
which have much higher photolysis quantum rates and therefore can
be cleaved much faster. In addition, the photo by-product is inert
and photolysis is efficiently performed at 360 nm.
[0065] Fluorochromes or dyes for use with the present invention
will depend on wavelength and coupling structure compatibility. By
means of example, Fluorescein-5-EX, 5-SFX, Rhodamine Green-X,
Bodipy FL-X, Cy2-OSu, Fluor X, 5(6)TAMRA-X, Bodipy TMR-X, Rhodamine
Red-X, Texas Red-X, Bodipy TR-X, Cy3-OSu, Cy3.5-OSu, Cy5-Osu and/or
Cy5.5-OSu, may be used if desired.
[0066] High density arrays of oligonucleotide (or other) probes are
an emerging technology for research and potential clinical
diagnostics. Arrays of up to 65,000 oligos, manufactured using
conventional photolithographic methods are now available
commercially from Affymetrix/Hewlett Packard. These arrays are used
for resequencing and expression studies via hybridization to the
array. These chips currently have feature sizes of 20 microns.
[0067] The present invention can provide a handling system for the
design, deposition and formation of biological samples on slides.
Furthermore, unlike biochips that are expensive to make and have a
reduced yield due to the underlying electronics, the present
invention does not suffer from high initial cost to set up a
manufacturing run. Nor does the present invention require a long
time to make a sequence change on the array. The inability to make
an arbitrary sequence at an arbitrary position within the array,
and low coupling efficiency have contributed to the need to search
for alternatives to existing biochips.
[0068] Slide Sample Chemistry
[0069] One example of slide sample preparation for use with the
micromirror imager 10 disclosed herein is the use of light
catalyzed chemistry. Light catalyzed chemistry can be used to
attach to, e.g., a glass slide, nucleic and amino acids, lipids,
carbohydrates or inorganic or organic molecules that can be used to
detect known and unknown molecules. For example, nucleic acids
segments, such as oligonucleotides can be attached to detect the
presence of complementary or hybridizing nucleic acids. The
strength of the interaction between the nucleic acid on the slide
and the analyte can be varied as is known to those of skill in the
art, e.g., changes in salt concentration, temperature of
hybridization, etc. Interactions with proteins and even cells can
be measured by attaching, e.g., receptors or ligands to the slide
surface to measure binding. As with nucleic acid interactions,
interactions with receptors or ligands can be affected by the
presence or absence or, e.g., cofactors, competitors and the
like.
[0070] As an example, the formation of nucleic acids on the
substrate surface are used as an example. More conventional
chemistries may also be used to attach molecules to the substrate
surface, depending on the nature of the substrate, the molecules
that are being attached and other factors that will be known to
those of skill in the art of chemical attachment and synthesis.
[0071] The chemistry for light-directed oligonucleotide synthesis
using photo labile protected 2'-deoxynucleoside phosphoramites has
been developed at, e.g., Affymetrix, U.S.A. The basics of one type
of photo-labile protection chemistry are explained in U.S. Pat. No.
5,424,186, wherein relevant explanations of basic photochemistry
techniques and compounds are incorporated herein by reference.
[0072] For example, the reaction of commercially available
3,4-(methylenedioxy) acetophenone with nitric acid followed by
ketone reduction, and treatment with phosgene gives chloroformate.
Then 5.degree.-hydroxyl of N-acyl-2'-deoxynucleosides reacts with
chloroformate, and 3'-hydroxyl reacts with 2.degree.cyanoethyl
N,N,N',N'-tetraisopropylphosphorodiamidite to yield photo labile
protected phosphoramidites.
[0073] Standard phosphoramidite chemistry is adapted to include
photo labile protecting groups by replacing the 5'-protecting group
DMT, and incorporating photoactivateable hydroxyl linker into the
synthesis substrate. Hydroxyl groups are selectively deprotected by
irradiation at a wavelength of 365 nm, and oligonucleotides
assembled using standard phosphoramidite chemistry.
[0074] Micromirror Imager for use with Expression Analysis
[0075] To study gene expression in mammalian and amphibian cells,
the present invention can be used conduct studies using the
genetics of yeast, as an example. With the entire sequence
available for yeast, it was possible to search the Expressed
Sequence Tagged subset of GenBank to identify in a quantitative way
the expression levels of each yeast ORF. The available data allowed
for an image to be obtained and compared to, e.g., known genes.
Given genes necessary for the operation of the basic cellular
machinery of yeast have overlap with other cell types, especially
other eukaryotes, it is possible to inspect the data to determine
candidate genes for particular disease conditions or genetic
analysis.
[0076] For example, statistically relevant expression analysis can
be done by sequence similarity searching of all query open reading
frame or gene sequences against expressed sequence tagged cDNA
sequence libraries. These libraries, because of their large size,
have enabled statistically relevant comparative genomics studies of
S. cerevisiae to EST sequences of all species represented, and with
human ESTs by tissue type. All yeast ORFs (6,217) were analyzed by
sequence similarity searching using sppBLASTn against the GenBank
EST database (Issue 104.0, Dec. 15, 1998). This database contains
1,377,132 EST sequence files (493.6 million bp).
[0077] Polymerase Chain Reaction Polymerase Chain Reaction (PCR)
products, cDNAs, oligonucleotides and DNA fragments have been
spotted in excess on glass using the micromirror imager 10 of the
present invention, as high-density hybridization targets.
Fluorescently labeled cDNAs derived from cellular extracts of mRNA
have achieved a dynamic range (detection limit) of 1 in 10,000 to
100,000, allowing for detection of message in low and high
abundance. Many experiments to measure differential expression have
been reported for yeast, Arabidopsis and human DNAs. Presently,
comprehensive and concise data on quantitative analysis of gene
expression are available. Use of known expression data can be used
to predict and measure known expression patterns having
clinical/clinical research application with unknown samples to
obtain real-time expression data.
[0078] The present invention can be used with existing
photochemical protocols, in conjunction with known expression
levels for preselected and known genes, to optimize gene expression
analysis using multiplexing of query samples by using a number of
dyes and substrate produced using the micromirror imager 10. The
micromirror imager 10 can be used to produce a substrate for use in
identifying the expression levels of every gene of as entire
organism such as yeast, at one time. For example, the micromirror
imager 10 can be used for the gene networks study project of the
National Institutes of Health-National Cancer Institute (NIH-NCI)
by providing substrate arrays having the required diversity and
sensitivity. The gene networks study involves the identification of
yeast gene pathways by measuring the expression level of all 6,217
open reading frames (ORFs) in response to a systematic knockout of
each gene (ORF). Using substrates produced using the micromirror
imager 10 disclosed herein, the expression level of every yeast
gene in every yeast gene knockout can be determined by designing
and fabricating a hybridization substrate for analyzing the
expression of multiple yeast gene knockouts per substrate, at a
greatly reduced cost, with greater efficiency and in less time.
[0079] During expression analysis the micromirror imager 10 can be
used to produce a substrate 24, such as a slide that can be used
for specific hybridization of each of the ORFs in a genome. For
example, a hydridization matrix can be disposed on a substrate 24,
such as a glass or quartz slide. Complementary DNA can be produced
from mRNA, tagged and placed on the hybridization matrix. Tagged,
expressed genes are specifically hybridize with the hybridization
matrix and the expressed genes are quantitated by moving the
substrate 24 that has been hybridized past scanning hardware. The
location and level of expression of known genes can be used as
positive and negative controls to calibrate the sensitivity of the
analysis.
[0080] A charge coupled display (CCD) camera connected to a
microscope can be used to capture the fluorescence level on the
hybridization matrix. The digital data captured by the CCD camera
is sent to a computer that matches the position on the
hybridization matrix of the specific gene sequence created using
the micromirror imager 10. The level of fluorescence is compared to
known expression level controls also on the slide, and the level of
expression of each ORF is determined. Data can be displayed in real
time, or can be stored for future analysis.
[0081] Software for analyzing high density grid hybridizations has
been developed for use with the present invention. The software has
been used to analyze over 260 images containing 1536 colonies
spotted on membranes using a spotter system. The software
application was developed using macros for IDL, a widely used
commercial software package. IDL is a complete, integrated software
environment for data analysis, visualization, and application
development, made by Research Systems, Inc. (http://www.rsinc.com).
Capture images are imported as either 8-bit, or 16-bit Tiff files.
Key components of the analysis include spot-finding,
spot-quantification, and spot addressing. The 12-bit camera output
can be padded to 16-bits. The slide image can also be analyzed for
constant intensity level contours satisfying the following
constraints: the contour is closed (around a spot), the enclosed
area is above a minimum area threshold and below a maximum area
threshold, and the spot-integrated intensity is above a minimum
intensity threshold relative to background. The user is presented
with software controls (widget sliders) to define the parameters
min_area, max_area, and min_intensity within the user interface so
that the analysis is automatic and quick. The numerical parameters
that set the gradation of the contours and the coarse-graining to
define the local background intensity are also adjustable. Once
spots are identified and quantified, the centroid of each spot is
associated with a unique grid-cell that defines the spot's address
in the array. This process avoids quantification errors associated
with strong signals bleeding into neighboring cells. While this
invention has been described in reference to illustrative
embodiments, this description is not intended to be construed in a
limiting sense. For example, the term "computer" as used herein is
to include any control apparatus capable of actuating a micromirror
or micromirror array. Various modifications and combinations of the
illustrative embodiments, as well as other embodiments of the
invention, will be apparent to persons skilled in the art upon
reference to the description. It is therefore intended that the
appended claims encompass any such modifications or
embodiments.
* * * * *
References