Zucker; Martin L.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Zucker; Martin L..The latest application filed is for "plasma processing apparatus having a focus ring adjustment assembly".

Company Profile

1.7.11

Zucker; Martin L. - Orinda CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Plasma processing apparatus having a focus ring adjustment assembly Grant 11,348,767 - Zucker , et al. May 31, 2	2022-05-31
Material deposition prevention on a workpiece in a process chamber Grant 11,251,026 - Cue , et al. February 15, 2	2022-02-15
Pedestal assembly for plasma processing apparatus Grant 11,195,704 - Zucker , et al. December 7, 2	2021-12-07
Systems And Methods For Transportation Of Replaceable Parts In a Vacuum Processing Apparatus App 20200365381 - Zucker; Martin L. ; et al.	2020-11-19
End Effectors For Moving Workpieces And Replaceable Parts Within A System For Processing Workpieces Under Vacuum App 20200361094 - Zucker; Martin L. ; et al.	2020-11-19
Plasma Processing Apparatus Having A Focus Ring Adjustment Assembly App 20200365377 - Zucker; Martin L. ; et al.	2020-11-19
Focus Ring Adjustment Assembly Of A System For Processing Workpieces Under Vacuum App 20200365405 - Zucker; Martin L. ; et al.	2020-11-19
Cooled Focus Ring for Plasma Processing Apparatus App 20190088512 - Zucker; Martin L.	2019-03-21
Material Deposition Prevention on a Workpiece in a Process Chamber App 20180286640 - Cue; Jeffrey ; et al.	2018-10-04
Pedestal Assembly for Plasma Processing Apparatus App 20180286639 - Zucker; Martin L. ; et al.	2018-10-04
Electrostatic chuck system and process for radially tuning the temperature profile across the surface of a substrate Grant 8,405,005 - Zucker , et al. March 26, 2	2013-03-26
Workpiece support with fluid zones for temperature control Grant 7,972,444 - Zucker , et al. July 5, 2	2011-07-05
Electrostatic Chuck System And Process For Radially Tuning The Temperature Profile Across The Surface Of A Substrate App 20100193501 - Zucker; Martin L. ; et al.	2010-08-05
Workpiece Support With Fluid Zones For Temperature Control App 20090114158 - Zucker; Martin L. ; et al.	2009-05-07
Systems and methods for remote plasma clean Grant 6,835,278 - Selbrede , et al. December 28, 2	2004-12-28
Effluent pressure control for use in a processing system App 20040247787 - Mackie, Neil M. ; et al.	2004-12-09
Systems and methods for remote plasma clean App 20020020429 - Selbrede, Steven C. ; et al.	2002-02-21

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