loadpatents
name:-0.031665802001953
name:-0.028473138809204
name:-0.00066518783569336
Ziger; David Patent Filings

Ziger; David

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ziger; David.The latest application filed is for "calibration of optical line shortening measurements".

Company Profile
0.16.14
  • Ziger; David - San Antonio TX US
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Calibration of optical line shortening measurements
Grant 8,717,539 - Ziger May 6, 2
2014-05-06
Calibration of Optical Line Shortening Measurements
App 20110035171 - Ziger; David
2011-02-10
Calibration of optical line shortening measurements
Grant 7,842,439 - Ziger November 30, 2
2010-11-30
Method for determining relative swing curve amplitude
Grant 7,790,480 - Ziger September 7, 2
2010-09-07
Measuring the effect of flare on line width
Grant 7,709,166 - Ziger , et al. May 4, 2
2010-05-04
Measuring The Effect Of Flare On Line Width
App 20090220870 - ZIGER; DAVID ;   et al.
2009-09-03
Calibration of Optical Line Shortening Measurements
App 20090198468 - Ziger; David
2009-08-06
Measuring the effect of flare on line width
Grant 7,556,900 - Ziger , et al. July 7, 2
2009-07-07
Calibration of optical line shortening measurements
Grant 7,541,121 - Ziger June 2, 2
2009-06-02
System and method for characterizing lithography effects on a wafer
Grant 7,537,939 - Ziger , et al. May 26, 2
2009-05-26
Method For Determining Relative Swing Curve Amplitude
App 20090119069 - Ziger; David
2009-05-07
Method for determining optimal resist thickness
Grant 7,492,465 - Ziger February 17, 2
2009-02-17
Method for Determining Optimal Resist Thickness
App 20080206687 - Ziger; David
2008-08-28
System and Method for Characterizing Lithography Effects on a Wafer
App 20070275329 - Ziger; David ;   et al.
2007-11-29
Measuring the effect of flare on line width
App 20060210885 - Ziger; David ;   et al.
2006-09-21
Measurement of optical properties of radiation sensitive materials
Grant 7,099,018 - Ziger August 29, 2
2006-08-29
Measuring flare in semiconductor lithography
Grant 7,096,127 - Ziger , et al. August 22, 2
2006-08-22
Measuring flare in semiconductor lithography
App 20060080046 - Ziger; David ;   et al.
2006-04-13
Calibration of optical line shortening measurements
App 20060078804 - Ziger; David
2006-04-13
Measurement of optical properties of radiation sensitive materials
App 20050151962 - Ziger, David
2005-07-14
Techniques to characterize iso-dense effects for microdevice manufacture
Grant 6,800,403 - Leroux , et al. October 5, 2
2004-10-05
Techniques to characterize iso-dense effects for microdevice manufacture
App 20030232253 - Leroux, Pierre ;   et al.
2003-12-18
Method to measure alignment using latent image grating structures
Grant 6,498,640 - Ziger December 24, 2
2002-12-24
Semiconductor processing methods and structures for determining alignment during semiconductor wafer processing
Grant 6,465,322 - Ziger , et al. October 15, 2
2002-10-15
Semiconductor processing methods and structures for determining alignment during semiconductor wafer processing
App 20020048922 - Ziger, David ;   et al.
2002-04-25
Methods and apparatus for calculating alignment of layers during semiconductor processing
App 20020038161 - Ziger, David
2002-03-28
Semiconductor Processing Methods And Structures For Determining Alignment During Semiconductor Wafer Processing
App 20010051441 - ZIGER, DAVID ;   et al.
2001-12-13
System and method for residue entrapment utilizing a polish and sacrificial fill for semiconductor fabrication
Grant 6,287,972 - Ziger , et al. September 11, 2
2001-09-11
Method for measuring dimensional anomalies in photolithographed integrated circuits using overlay metrology, and masks therefor
Grant 5,902,703 - Leroux , et al. May 11, 1
1999-05-11

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