Patent | Date |
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Calibration of optical line shortening measurements Grant 8,717,539 - Ziger May 6, 2 | 2014-05-06 |
Calibration of Optical Line Shortening Measurements App 20110035171 - Ziger; David | 2011-02-10 |
Calibration of optical line shortening measurements Grant 7,842,439 - Ziger November 30, 2 | 2010-11-30 |
Method for determining relative swing curve amplitude Grant 7,790,480 - Ziger September 7, 2 | 2010-09-07 |
Measuring the effect of flare on line width Grant 7,709,166 - Ziger , et al. May 4, 2 | 2010-05-04 |
Measuring The Effect Of Flare On Line Width App 20090220870 - ZIGER; DAVID ;   et al. | 2009-09-03 |
Calibration of Optical Line Shortening Measurements App 20090198468 - Ziger; David | 2009-08-06 |
Measuring the effect of flare on line width Grant 7,556,900 - Ziger , et al. July 7, 2 | 2009-07-07 |
Calibration of optical line shortening measurements Grant 7,541,121 - Ziger June 2, 2 | 2009-06-02 |
System and method for characterizing lithography effects on a wafer Grant 7,537,939 - Ziger , et al. May 26, 2 | 2009-05-26 |
Method For Determining Relative Swing Curve Amplitude App 20090119069 - Ziger; David | 2009-05-07 |
Method for determining optimal resist thickness Grant 7,492,465 - Ziger February 17, 2 | 2009-02-17 |
Method for Determining Optimal Resist Thickness App 20080206687 - Ziger; David | 2008-08-28 |
System and Method for Characterizing Lithography Effects on a Wafer App 20070275329 - Ziger; David ;   et al. | 2007-11-29 |
Measuring the effect of flare on line width App 20060210885 - Ziger; David ;   et al. | 2006-09-21 |
Measurement of optical properties of radiation sensitive materials Grant 7,099,018 - Ziger August 29, 2 | 2006-08-29 |
Measuring flare in semiconductor lithography Grant 7,096,127 - Ziger , et al. August 22, 2 | 2006-08-22 |
Measuring flare in semiconductor lithography App 20060080046 - Ziger; David ;   et al. | 2006-04-13 |
Calibration of optical line shortening measurements App 20060078804 - Ziger; David | 2006-04-13 |
Measurement of optical properties of radiation sensitive materials App 20050151962 - Ziger, David | 2005-07-14 |
Techniques to characterize iso-dense effects for microdevice manufacture Grant 6,800,403 - Leroux , et al. October 5, 2 | 2004-10-05 |
Techniques to characterize iso-dense effects for microdevice manufacture App 20030232253 - Leroux, Pierre ;   et al. | 2003-12-18 |
Method to measure alignment using latent image grating structures Grant 6,498,640 - Ziger December 24, 2 | 2002-12-24 |
Semiconductor processing methods and structures for determining alignment during semiconductor wafer processing Grant 6,465,322 - Ziger , et al. October 15, 2 | 2002-10-15 |
Semiconductor processing methods and structures for determining alignment during semiconductor wafer processing App 20020048922 - Ziger, David ;   et al. | 2002-04-25 |
Methods and apparatus for calculating alignment of layers during semiconductor processing App 20020038161 - Ziger, David | 2002-03-28 |
Semiconductor Processing Methods And Structures For Determining Alignment During Semiconductor Wafer Processing App 20010051441 - ZIGER, DAVID ;   et al. | 2001-12-13 |
System and method for residue entrapment utilizing a polish and sacrificial fill for semiconductor fabrication Grant 6,287,972 - Ziger , et al. September 11, 2 | 2001-09-11 |
Method for measuring dimensional anomalies in photolithographed integrated circuits using overlay metrology, and masks therefor Grant 5,902,703 - Leroux , et al. May 11, 1 | 1999-05-11 |