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Patent applications and USPTO patent grants for Zhu; Helen.The latest application filed is for "contact clean in high-aspect ratio structures".
Patent | Date |
---|---|
Contact clean in high-aspect ratio structures Grant 9,558,928 - Thedjoisworo , et al. January 31, 2 | 2017-01-31 |
Contact Clean In High-aspect Ratio Structures App 20160064212 - Thedjoisworo; Bayu ;   et al. | 2016-03-03 |
Sidewall forming processes Grant 7,772,122 - Cirigliano , et al. August 10, 2 | 2010-08-10 |
Sidewall Forming Processes App 20100068885 - CIRIGLIANO; Peter ;   et al. | 2010-03-18 |
Substituted thiazoles Grant 7,541,475 - Robbins , et al. June 2, 2 | 2009-06-02 |
Method for resist strip in presence of regular low k and/or porous low k dielectric materials Grant 7,288,488 - Zhu , et al. October 30, 2 | 2007-10-30 |
Nitrous oxide stripping process for organosilicate glass Grant 7,202,177 - Zhu , et al. April 10, 2 | 2007-04-10 |
Method for resist strip in presence of regular low k and/or porous low k dielectric materials App 20060258148 - Zhu; Helen ;   et al. | 2006-11-16 |
Selective oxygen-free etching process for barrier materials Grant 7,129,171 - Zhu , et al. October 31, 2 | 2006-10-31 |
Methods and apparatus for the optimization of photo resist etching in a plasma processing system Grant 6,949,469 - Cheng , et al. September 27, 2 | 2005-09-27 |
Etch back process using nitrous oxide Grant 6,916,697 - Zhu , et al. July 12, 2 | 2005-07-12 |
Minimizing the loss of barrier materials during photoresist stripping App 20050101135 - Annapragada, Rao ;   et al. | 2005-05-12 |
Nitrous oxide stripping process for organosilicate glass App 20050079710 - Zhu, Helen ;   et al. | 2005-04-14 |
Selective oxygen-free etching process for barrier materials App 20050079725 - Zhu, Helen ;   et al. | 2005-04-14 |
Etch Back Process Using Nitrous Oxide App 20050079704 - Zhu, Helen ;   et al. | 2005-04-14 |
Substituted thiazoles App 20050075503 - Robbins, Timothy A. ;   et al. | 2005-04-07 |
Substituted thiazoles App 20050027128 - Robbins, Timothy A. ;   et al. | 2005-02-03 |
Method of plasma etching dielectric materials Grant 6,297,163 - Zhu , et al. October 2, 2 | 2001-10-02 |
Plasma etching of semiconductors Grant 5,611,888 - Bosch , et al. March 18, 1 | 1997-03-18 |
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