Zhong; Mingjie

Patent Applications and Registrations

Patent applications and USPTO patent grants for Zhong; Mingjie.The latest application filed is for "method and device for pushing application message".

Company Profile

5.8.8

Zhong; Mingjie - Hangzhou CN
Zhong; Mingjie - WeiFang CN
Zhong; Mingjie - Shandong CN
Zhong; Mingjie - Shanghai CN
Zhong; Mingjie - Potsdam NY
Zhong; Mingjie - Postdam NY

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method and device for pushing application message Grant 10,958,749 - Yue , et al. March 23, 2	2021-03-23
Method and device for pushing application message Grant 10,812,607 - Yue , et al. October 20, 2	2020-10-20
Method And Device For Pushing Application Message App 20200128092 - YUE; Yun ; et al.	2020-04-23
Method And Device For Pushing Application Message App 20190173968 - YUE; Yun ; et al.	2019-06-06
Speaker module with sealed cavity and a communicating hole Grant 10,299,030 - Zhong , et al.	2019-05-21
Thin speaker module with a front acoustic cavity Grant 10,178,467 - Hou , et al. J	2019-01-08
Clustering coefficient-based adaptive clustering method and system Grant 10,037,495 - Jiang , et al. July 31, 2	2018-07-31
Speaker Module App 20180035198 - ZHONG; Mingjie ; et al.	2018-02-01
Speaker Module App 20170353783 - HOU; Jincai ; et al.	2017-12-07
Clustering Coefficient-based Adaptive Clustering Method and System App 20170278016 - JIANG; CHANGJUN ; et al.	2017-09-28
Post chemical-mechanical-polishing (post-CMP) cleaning composition comprising a specific sulfur-containing compound and a sugar alcohol or a polycarboxylic acid Grant 9,458,415 - Li , et al. October 4, 2	2016-10-04
Aqueous, nitrogen-free cleaning composition and its use for removing residues and contaminants from semiconductor substrates suitable for manufacturing microelectronic devices Grant 9,275,851 - Klipp , et al. March 1, 2	2016-03-01
Post Chemical-mechanical-polishing (post-cmp) Cleaning Composition Comprising A Specific Sulfur-containing Compound And A Sugar Alcohol Or A Polycarboxylic Acid App 20150018261 - Li; Yuzhuo ; et al.	2015-01-15
Aqueous, Nitrogen-free Cleaning Composition And Its Use For Removing Residues And Contaminants From Semiconductor Substrates Suitable For Manufacturing Microelectronic Devices App 20140011359 - Klipp; Andreas ; et al.	2014-01-09

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