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Patent applications and USPTO patent grants for Zhi; Fan.The latest application filed is for "six-degree-of-freedom displacement measurement method for exposure region on silicon wafer stage".
Patent | Date |
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Six-degree-of-freedom displacement measurement method for exposure region on silicon wafer stage Grant 9,995,569 - Zhu , et al. June 12, 2 | 2018-06-12 |
Six-degree-of-freedom Displacement Measurement Method For Exposure Region On Silicon Wafer Stage App 20180080757 - Zhu; Yu ;   et al. | 2018-03-22 |
Coarse motion and fine motion integrated reticle stage driven by planar motor Grant 9,904,183 - Zhu , et al. February 27, 2 | 2018-02-27 |
Magnetically suspended coarse motion and fine motion integrated reticle stage driven by planar motor Grant 9,791,789 - Zhang , et al. October 17, 2 | 2017-10-17 |
Coarse Motion And Fine Motion Integrated Reticle Stage Driven By Planar Motor App 20170115580 - ZHU; Yu ;   et al. | 2017-04-27 |
Magnetically Suspended Coarse Motion And Fine Motion Integrated Reticle Stage Driven By Planar Motor App 20170052461 - ZHANG; Ming ;   et al. | 2017-02-23 |
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