Zheng Lu

USPTO Trademark & Patent Filings

Trademark applications and grants for Zheng Lu. Zheng Lu has 19 trademark applications. The latest application filed is for "RINETA"

Company Profile

Lu Zheng
Lu, Zheng
Zheng Lu
Zheng, Lu
lu zheng
Lu; Zheng - O'Fallon MO
ZHENG; Lu - Changzhou Jiangsu
Lu; Zheng - Shenzhen CN
Lu; Zheng - Bolingbrook IL
Lu; Zheng - Milpitas CA
Zheng; Lu - Shenzhen CN
Zheng; Lu - Palo Alto CA

Entity Type	INDIVIDUAL
Address	Group 6, Siqian village Houzhai street, Yiwu City Zhejiang Province CHINA 322000

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Trademarks Patents

Patent Applications

Patent Application	Date
METHODS AND SYSTEMS OF CAPTURING TRANSIENT THERMAL RESPONSES OF REGIONS OF CRYSTAL PULLERS 20220259763 - 17/651127 Lu; Zheng ; et al.	2022-08-18
PROCESS FOR PREPARING INGOT HAVING REDUCED DISTORTION AT LATE BODY LENGTH 20220220631 - 16/839808 Jain; Tapas ; et al.	2022-07-14
Force Stimulation Loading Device and Working Method Thereof 20220204937 - 17/607041 SHI; Yuanping ; et al.	2022-06-30
Method And Storage Medium For Realizing Interaction Between Business Systems And At Least One Component 20210334114 - 16/315254 Lu; Zheng	2021-10-28
ALKANE DEHYDROGENATION CATALYST AND METHODS OF CONVERTING ALKANES TO ALKENES 20210292258 - 17/197997 Marshall; Christopher L. ; et al.	2021-09-23
Power efficient operation at significant locations 11,343,640 - 16/380,102 Lovlekar , et al. May 24, 2	2022-05-24
Identity authentication method and apparatus 11,310,223 - 16/883,863 Zheng , et al. April 19, 2	2022-04-19
Selecting content for presentation to online system users based on correlations between content accessed by users via third party systems and interactions with online system content 11,157,955 - 14/662,222 Yan , et al. October 26, 2	2021-10-26
Nitrogen doped and vacancy dominated silicon ingot and thermally treated wafer formed therefrom having radially uniformly distributed oxygen precipitation density and size 11,111,602 - 14/812,744 Lu , et al. September 7, 2	2021-09-07
Nitrogen doped and vacancy dominated silicon ingot and thermally treated wafer formed therefrom having radially uniformly distributed oxygen precipitation density and size 10,988,859 - 15/983,455 Lu , et al. April 27, 2	2021-04-27

Patent Grants & Applications

Trademark Applications

Mark Image Registration \| Serial	Trademark Application Date
"RINETA" 90862189	RINETA 2021-08-03
"COOLDOVE" 90739836	COOLDOVE 2021-05-27
"COOLFAIR" 90739844	COOLFAIR 2021-05-27
"COLTKING" 90739825	COLTKING 2021-05-27
"COOLCRAZY" 90739828	COOLCRAZY 2021-05-27
"HIGHTRY" 90733256	HIGHTRY 2021-05-25
"HIGHYOU" 90732799	HIGHYOU 2021-05-25
"HIGHYES" 90733335	HIGHYES 2021-05-25
"HIGHSION" 90733393	HIGHSION 2021-05-25
"SIEANE" 90335015	SIEANE 2020-11-22
"SIEANE" 90326735	SIEANE 2020-11-18
"SIEANE" 90326713	SIEANE 2020-11-18
"SIEANE" 90321068	SIEANE 2020-11-16
"SIEANE" 90320523	SIEANE 2020-11-15
"SIEANE" 90320526	SIEANE 2020-11-15
"EUNSUNG" 88436465	EUNSUNG 2019-05-18
"OTEKSPORT" 5768072 88150659	OTEKSPORT 2018-10-11
"DUZHI" 4849775 86535660	DUZHI 2015-02-16
"DRAGON FORMULA" 2899214 76558603	DRAGON FORMULA 2003-11-10

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.