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Method and apparatus for illumination adjustment
Grant 11,429,029 - Van Der Schaar , et al. August 30, 2 | 2022-08-30 |
Method of determining a position of a feature
Grant 11,392,044 - Huijgen , et al. July 19, 2 | 2022-07-19 |
Measuring a process parameter for a manufacturing process involving lithography
Grant 11,320,745 - Van Der Schaar , et al. May 3, 2 | 2022-05-03 |
Method for determining stack configuration of substrate
Grant 11,281,113 - Li , et al. March 22, 2 | 2022-03-22 |
Determining Pattern Ranking Based On Measurement Feedback From Printed Substrate
App 20220043356 - ZHANG; Youping ; et al. | 2022-02-10 |
Determining Hot Spot Ranking Based On Wafer Measurement
App 20220035256 - ZHANG; Youping ; et al. | 2022-02-03 |
Method For Controlling A Manufacturing Process And Associated Apparatuses
App 20220026810 - BRANTJES; Nicolaas Petrus Marcus ; et al. | 2022-01-27 |
Apparatus And Method For Grouping Image Patterns To Determine Wafer Behavior In A Patterning Process
App 20220028052 - LI; Zhiqin ; et al. | 2022-01-27 |
Method To Predict Yield Of A Device Manufacturing Process
App 20220011728 - ZHANG; Youping ; et al. | 2022-01-13 |
Method Of Manufacturing Devices
App 20210397172 - SLACHTER; Abraham ; et al. | 2021-12-23 |
Method For Determining Root Cause Affecting Yield In A Semiconductor Manufacturing Process
App 20210389677 - LIN; Chenxi ; et al. | 2021-12-16 |
Metrology using a plurality of metrology target measurement recipes
Grant 11,187,995 - Calado , et al. November 30, 2 | 2021-11-30 |
Measurement Apparatus And A Method For Determining A Substrate Grid
App 20210341846 - BIJNEN; Franciscus Godefridus Casper ; et al. | 2021-11-04 |
Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method
Grant 11,092,900 - Van Der Schaar , et al. August 17, 2 | 2021-08-17 |
Method For Determining Stack Configuration Of Substrate
App 20210247701 - LI; Danying ; et al. | 2021-08-12 |
Measurement apparatus and a method for determining a substrate grid
Grant 11,079,684 - Bijnen , et al. August 3, 2 | 2021-08-03 |
Metrology Using A Plurality Of Metrology Target Measurement Recipes
App 20210208512 - CALADO; Victor Emanuel ; et al. | 2021-07-08 |
Method For Determining An Etch Profile Of A Layer Of A Wafer For A Simulation System
App 20210150116 - Fan; Chi-Hsiang ; et al. | 2021-05-20 |
Method And Apparatus For Illumination Adjustment
App 20210055663 - VAN DER SCHAAR; Maurits ; et al. | 2021-02-25 |
Measuring a Process Parameter for a Manufacturing Process Involving Lithography
App 20200401054 - Van Der Schaar; Maurits ; et al. | 2020-12-24 |
Metrology method and apparatus, substrate, lithographic method and associated computer product
Grant 10,802,409 - Fan , et al. October 13, 2 | 2020-10-13 |
Method Of Determining A Position Of A Feature
App 20200150547 - HUIJGEN; Ralph Timotheus ; et al. | 2020-05-14 |
Alternative target design for metrology using modulation techniques
Grant 10,585,357 - Van Der Schaar , et al. | 2020-03-10 |
Method and Apparatus for Measuring a Parameter of a Lithographic Process, Substrate and Patterning Devices for use in the Method
App 20200073254 - VAN DER SCHAAR; Maurits ; et al. | 2020-03-05 |
Method of determining a position of a feature
Grant 10,578,980 - Huijgen , et al. | 2020-03-03 |
Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method
Grant 10,481,503 - Van Der Schaar , et al. Nov | 2019-11-19 |
Method Of Determining A Position Of A Feature
App 20190339211 - HUIJGEN; Ralph Timotheus ; et al. | 2019-11-07 |
Methods and systems for pattern design with tailored response to wavefront aberration
Grant 10,423,075 - Feng , et al. Sept | 2019-09-24 |
Measurement Apparatus And A Method For Determining A Substrate Grid
App 20190235391 - BIJNEN; Franciscus Godefridus Casper ; et al. | 2019-08-01 |
Roller Treatment Process And Treatment Device Suitable For Total-amount Steel Slag Treatment
App 20190203307 - LI; Yongqian ; et al. | 2019-07-04 |
Process based metrology target design
Grant 10,296,681 - Chen , et al. | 2019-05-21 |
Measuring a Process Parameter for a Manufacturing Process Involving Lithography
App 20190018326 - Van Der Schaar; Maurits ; et al. | 2019-01-17 |
Alternative Target Design For Metrology Using Modulation Techniques
App 20180373168 - VAN DER SCHAAR; Maurits ; et al. | 2018-12-27 |
Polarization Tuning In Scatterometry
App 20180364590 - VAN DER SCHAAR; Maurits ; et al. | 2018-12-20 |
Process Based Metrology Target Design
App 20180268093 - CHEN; Guangqing ; et al. | 2018-09-20 |
Measuring a process parameter for a manufacturing process involving lithography
Grant 10,073,357 - Van Der Schaar , et al. September 11, 2 | 2018-09-11 |
Metrology target, method and apparatus, target design method, computer program and lithographic system
Grant 10,061,212 - Van Der Schaar , et al. August 28, 2 | 2018-08-28 |
Metrology Method And Apparatus, Substrate, Lithographic Method And Associated Computer Product
App 20180238737 - FAN; Chi-Hsiang ; et al. | 2018-08-23 |
Process based metrology target design
Grant 10,007,744 - Chen , et al. June 26, 2 | 2018-06-26 |
Metrology Target, Method and Apparatus, Target Design Method, Computer Program and Lithographic System
App 20170293233 - VAN DER SCHAAR; Maurits ; et al. | 2017-10-12 |
Pattern Placement Error Aware Optimization
App 20170082927 - HSU; Duan-Fu Stephen ; et al. | 2017-03-23 |
Method And Apparatus for Measuring a Parameter of a Lithographic Process, Substrate and Patterning Devices for use in the Method
App 20170059999 - VAN DER SCHAAR; Maurits ; et al. | 2017-03-02 |
Measuring a Process Parameter for a Manufacturing Process Involving Lithography
App 20160349627 - VAN DER SCHAAR; Maurits ; et al. | 2016-12-01 |
Process Based Metrology Target Design
App 20160140267 - CHEN; Guangqing ; et al. | 2016-05-19 |
Methods And Systems For Pattern Design With Tailored Response To Wavefront Aberration
App 20150153651 - FENG; Hanying ; et al. | 2015-06-04 |
Methods and systems for pattern design with tailored response to wavefront aberration
Grant 8,918,742 - Feng , et al. December 23, 2 | 2014-12-23 |
System for simplifying layout processing
Grant 8,782,574 - Zhang , et al. July 15, 2 | 2014-07-15 |
Method of pattern selection for source and mask optimization
Grant 8,739,082 - Liu , et al. May 27, 2 | 2014-05-27 |
Methods and Systems for Pattern Design with Tailored Response to Wavefront Aberration
App 20130014065 - Feng; Hanying ; et al. | 2013-01-10 |
Model-based pattern characterization to generate rules for rule-model-based hybrid optical proximity correction
Grant 8,281,264 - Zhang October 2, 2 | 2012-10-02 |
Method of Pattern Selection for Source and Mask Optimization
App 20120216156 - Liu; Hua-Yu ; et al. | 2012-08-23 |
Photolithographic mask correction
App 20110209105 - Zhang; Youping | 2011-08-25 |
Integrated circuit design using modified cells
Grant 7,934,184 - Zhang April 26, 2 | 2011-04-26 |
Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effects
Grant 7,926,004 - Pierrat , et al. April 12, 2 | 2011-04-12 |
Creating and applying variable bias rules in rule-based optical proximity correction for reduced complexity
Grant 7,908,572 - Zhang March 15, 2 | 2011-03-15 |
Model-based pattern characterization to generate rules for rule-model-based hybrid optical proximity correction
App 20100153904 - Zhang; Youping | 2010-06-17 |
Model-based pattern characterization to generate rules for rule-model-based hybrid optical proximity correction
Grant 7,627,837 - Zhang December 1, 2 | 2009-12-01 |
Displacing Edge Segments On A Fabrication Layout Based On Proximity Effects Model Amplitudes For Correcting Proximity Effects
App 20090249266 - Pierrat; Christophe ; et al. | 2009-10-01 |
System for simplifying layout processing
App 20090241087 - Zhang; Youping ; et al. | 2009-09-24 |
Method and apparatus for performing target-image-based optical proximity correction
Grant 7,585,600 - Zhang September 8, 2 | 2009-09-08 |
Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effects
Grant 7,562,319 - Pierrat , et al. July 14, 2 | 2009-07-14 |
System for integrated circuit layout partition and extraction for independent layout processing
Grant 7,533,363 - Zhang , et al. May 12, 2 | 2009-05-12 |
System for designing integrated circuits with enhanced manufacturability
Grant 7,523,429 - Kroyan , et al. April 21, 2 | 2009-04-21 |
System for simplifying layout processing
Grant 7,487,490 - Zhang , et al. February 3, 2 | 2009-02-03 |
Method And Apparatus For Performing Target-image-based Optical Proximity Correction
App 20080201686 - Zhang; Youping | 2008-08-21 |
Method and apparatus for performing target-image-based optical proximity correction
Grant 7,382,912 - Zhang June 3, 2 | 2008-06-03 |
Structure and method of correcting proximity effects in a tri-tone attenuated phase-shifting mask
Grant 7,236,916 - Pierrat , et al. June 26, 2 | 2007-06-26 |
Photolithographic mask correction
App 20070113216 - Zhang; Youping | 2007-05-17 |
Displacing Edge Segments On A Fabrication Layout Based On Proximity Effects Model Amplitudes For Correcting Proximity Effects
App 20070006118 - Pierrat; Christophe ; et al. | 2007-01-04 |
Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effects
Grant 7,131,101 - Pierrat , et al. October 31, 2 | 2006-10-31 |
Method and apparatus for performing target-image-based optical proximity correction
App 20060115753 - Zhang; Youping | 2006-06-01 |
Creating and applying variable bias rules in rule-based optical proximity correction for reduced complexity
App 20060085773 - Zhang; Youping | 2006-04-20 |
Model-based pattern characterization to generate rules for rule-model-based hybrid optical proximity correction
App 20060085772 - Zhang; Youping | 2006-04-20 |
Method and apparatus for performing target-image-based optical proximity correction
Grant 7,005,218 - Zhang February 28, 2 | 2006-02-28 |
Dissection of edges with projection points in a fabrication layout for correcting proximity effects
Grant 7,003,757 - Pierrat , et al. February 21, 2 | 2006-02-21 |
Method and apparatus for controlling rippling during optical proximity correction
Grant 7,003,756 - Zhang February 21, 2 | 2006-02-21 |
Repetition recognition using segments
Grant 7,000,208 - Zhang February 14, 2 | 2006-02-14 |
System for simplifying layout processing
App 20050223350 - Zhang, Youping ; et al. | 2005-10-06 |
System for integrated circuit layout partition and extraction for independent layout processing
App 20050216875 - Zhang, Youping ; et al. | 2005-09-29 |
System for designing integrated circuits with enhanced manufacturability
App 20050188338 - Kroyan, Armen ; et al. | 2005-08-25 |
Dissection of printed edges from a fabrication layout for correcting proximity effects
Grant 6,918,104 - Pierrat , et al. July 12, 2 | 2005-07-12 |
Dissection of edges with projection points in a fabrication layout for correcting proximity effects
App 20040221255 - Pierrat, Christophe ; et al. | 2004-11-04 |
Method and apparatus for performing target-image-based optical proximity correction
App 20040219436 - Zhang, Youping | 2004-11-04 |
Method and apparatus for controlling rippling during optical proximity correction
App 20040181770 - Zhang, Youping | 2004-09-16 |
Dissection of edges with projection points in a fabrication layout for correcting proximity effects
Grant 6,792,590 - Pierrat , et al. September 14, 2 | 2004-09-14 |
Mask product made by selection of evaluation point locations based on proximity effects model amplitudes for correcting proximity effects in a fabricat layout
Grant 6,777,138 - Pierrat , et al. August 17, 2 | 2004-08-17 |
Method and apparatus for controlling rippling during optical proximity correction
Grant 6,763,514 - Zhang July 13, 2 | 2004-07-13 |
Facilitating minimum spacing and/or width control optical proximity correction
Grant 6,753,115 - Zhang , et al. June 22, 2 | 2004-06-22 |
Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effects
App 20040083439 - Pierrat, Christophe ; et al. | 2004-04-29 |
Structure and method of correcting proximity effects in a tri-tone attenuated phase-shifting mask
App 20040048170 - Pierrat, Christophe ; et al. | 2004-03-11 |
Method and apparatus for reducing optical proximity correction output file size
Grant 6,687,895 - Zhang February 3, 2 | 2004-02-03 |
Repetition recognition using segments
App 20040019869 - Zhang, Youping | 2004-01-29 |
Method And Apparatus For Reducing Optical Proximity Correction Output File Size
App 20040006756 - Zhang, Youping | 2004-01-08 |
Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effects
Grant 6,665,856 - Pierrat , et al. December 16, 2 | 2003-12-16 |
Structure and method of correcting proximity effects in a tri-tone attenuated phase-shifting mask
Grant 6,653,026 - Pierrat , et al. November 25, 2 | 2003-11-25 |
Dissection of printed edges from a fabrication layout for correcting proximity effects
Grant 6,625,801 - Pierrat , et al. September 23, 2 | 2003-09-23 |
Facilitating minimum spacing and/or width control during optical proximity correction
App 20030118917 - Zhang, Youping ; et al. | 2003-06-26 |
Method and apparatus for controlling rippling during optical proximity correction
App 20030110465 - Zhang, Youping | 2003-06-12 |
Dissection of printed edges from a fabrication layout for correcting proximity effects
App 20030110460 - Pierrat, Christophe ; et al. | 2003-06-12 |
Method and apparatus for visualizing optical proximity correction process information and output
App 20030061587 - Zhang, Youping ; et al. | 2003-03-27 |
Dissection of corners in a fabrication layout for correcting proximity effects
Grant 6,539,521 - Pierrat , et al. March 25, 2 | 2003-03-25 |
Suppressing oscillations in processes such as gas turbine combustion
Grant 6,522,991 - Banaszuk , et al. February 18, 2 | 2003-02-18 |
Suppressing oscillations in processes such as gas turbine combustion
App 20020162317 - Banaszuk, Andrzej ; et al. | 2002-11-07 |
Selection of evaluation point locations based on proximity effects model amplitudes for correcting proximity effects in a fabrication layout
Grant 6,453,457 - Pierrat , et al. September 17, 2 | 2002-09-17 |
Selection of evaluation point locations based on proximity effects model amplitudes for correcting proximity effects in a fabrication layout
App 20020100004 - Pierrat, Christophe ; et al. | 2002-07-25 |
Structure and method of correcting proximity effects in a tri-tone attenuated phase-shifting mask
App 20020076622 - Pierrat, Christophe ; et al. | 2002-06-20 |
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