Zhang; Yiting

Patent Applications and Registrations

Patent applications and USPTO patent grants for Zhang; Yiting.The latest application filed is for "system and method for accelerating physical simulation models during microelectronic device fabrication".

Company Profile

7.7.10

Zhang; Yiting - Fremont CA
Zhang; Yiting - Milpitas CA
Zhang; Yiting - Zhuji CN
Zhang; Yiting - Zhuji City CN
Zhang; Yiting - Shenzhen CN
Zhang; Yiting - Vancouver CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Control of on-wafer cd uniformity with movable edge ring and gas injection adjustment Grant 11,424,103 - Zhang , et al. August 23, 2	2022-08-23
System And Method For Accelerating Physical Simulation Models During Microelectronic Device Fabrication App 20220075916 - Zhang; Yiting ; et al.	2022-03-10
System and Method to Adjust A Kinetics Model of Surface Reactions During Plasma Processing App 20210055699 - Agarwal; Ankur A. ; et al.	2021-02-25
Pure bamboo fiber mattress and manufacturing method thereof Grant 10,926,998 - Yao , et al. February 23, 2	2021-02-23
Pure Bamboo Fiber Mattress And Manufacturing Method Thereof App 20200172390 - Yao; Wenbing ; et al.	2020-06-04
Control Of On-wafer Cd Uniformity With Movable Edge Ring And Gas Injection Adjustment App 20190362940 - Zhang; Yiting ; et al.	2019-11-28
Method, device and system for presenting information Grant 10,462,511 - Gao , et al. Oc	2019-10-29
Control of on-wafer CD uniformity with movable edge ring and gas injection adjustment Grant 10,410,832 - Zhang , et al. Sept	2019-09-10
Multi-Zone Cooling Of Plasma Heated Window App 20190148118 - ZHANG; Yiting ; et al.	2019-05-16
Near-substrate supplemental plasma density generation with low bias voltage within inductively coupled plasma processing chamber Grant 10,242,845 - Tan , et al.	2019-03-26
Targeted Software Testing App 20180246803 - Zhang; Yiting	2018-08-30
Near-Substrate Supplemental Plasma Density Generation with Low Bias Voltage within Inductively Coupled Plasma Processing Chamber App 20180204708 - Tan; Zhongkui ; et al.	2018-07-19
Atomic layer etching in continuous plasma Grant 9,991,128 - Tan , et al. June 5, 2	2018-06-05
Control Of On-wafer Cd Uniformity With Movable Edge Ring And Gas Injection Adjustment App 20180053629 - Zhang; Yiting ; et al.	2018-02-22
Line edge roughness improvement with sidewall sputtering Grant 9,852,924 - Tan , et al. December 26, 2	2017-12-26
Method, Device And System For Presenting Information App 20170366834 - GAO; Junzhi ; et al.	2017-12-21
Atomic Layer Etching In Continuous Plasma App 20170229311 - Tan; Zhongkui ; et al.	2017-08-10

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