loadpatents
name:-0.015451908111572
name:-0.0074241161346436
name:-0.00096797943115234
Zhang; Beichao Patent Filings

Zhang; Beichao

Patent Applications and Registrations

Patent applications and USPTO patent grants for Zhang; Beichao.The latest application filed is for "implantation for shallow trench isolation (sti) formation and for stress for transistor performance enhancement".

Company Profile
0.6.9
  • Zhang; Beichao - Singapore SG
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Methods to eliminate contact plug sidewall slit
Grant 7,670,946 - Siew , et al. March 2, 2
2010-03-02
Implantation for shallow trench isolation (STI) formation and for stress for transistor performance enhancement
App 20090315115 - Zhang; Beichao ;   et al.
2009-12-24
Protruded contact and insertion of inter-layer-dielectric material to match damascene hardmask to improve undercut for low-k interconnects
Grant 7,601,607 - Liu , et al. October 13, 2
2009-10-13
Metal barrier cap fabrication by polymer lift-off
Grant 7,323,408 - Zhang , et al. January 29, 2
2008-01-29
Methods to eliminate contact plug sidewall slit
App 20070264824 - Siew; Yong Kong ;   et al.
2007-11-15
Protruded contact and insertion of inter-layer-dielectric material to match damascene hardmask to improve undercut for low-k interconnects
App 20070264820 - Liu; Wuping ;   et al.
2007-11-15
Metal barrier cap fabrication by polymer lift-off
Grant 7,153,766 - Zhang , et al. December 26, 2
2006-12-26
Via electromigration improvement by changing the via bottom geometric profile
App 20060160354 - Zhang; BeiChao ;   et al.
2006-07-20
Via electromigration improvement by changing the via bottom geometric profile
Grant 7,045,455 - Zhang , et al. May 16, 2
2006-05-16
Metal barrier cap fabrication by polymer lift-off
App 20060088995 - Zhang; Beichao ;   et al.
2006-04-27
Barrier metal cap structure on copper lines and vias
App 20050191851 - Liu, Wuping ;   et al.
2005-09-01
Via electromigration improvement by changing the via bottom geometric profile
App 20050090097 - Zhang, Beichao ;   et al.
2005-04-28
Metal barrier cap fabrication by polymer lift-off
App 20040137709 - Zhang, Beichao ;   et al.
2004-07-15
Barrier metal cap structure on copper lines and vias
App 20040048468 - Liu, Wuping ;   et al.
2004-03-11
Method of cobalt silicidation using an oxide-Titanium interlayer
Grant 6,653,227 - Lai , et al. November 25, 2
2003-11-25

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