loadpatents
Patent applications and USPTO patent grants for Zerrade; Azeddine.The latest application filed is for "euv mask blank absorber defect reduction".
Patent | Date |
---|---|
EUV mask blank absorber defect reduction Grant 11,454,876 - Varghese , et al. September 27, 2 | 2022-09-27 |
EUV Mask Blank Absorber Defect Reduction App 20220187696 - Varghese; Binni ;   et al. | 2022-06-16 |
Extreme ultraviolet mask absorber materials Grant 11,300,871 - Liu , et al. April 12, 2 | 2022-04-12 |
Extreme Ultraviolet Mask Absorber Materials App 20210341828 - Liu; Shiyu ;   et al. | 2021-11-04 |
Extreme Ultraviolet Mask Blank Defect Reduction App 20210333703 - Xiao; Wen ;   et al. | 2021-10-28 |
Extreme Ultraviolet Mask Absorber Materials App 20210302826 - Liu; Shuwei ;   et al. | 2021-09-30 |
Extreme Ultraviolet Mask Absorber Materials App 20210232039 - Liu; Shuwei ;   et al. | 2021-07-29 |
Extreme Ultraviolet Mask Blank Hard Mask Materials App 20210232040 - Liu; Shuwei ;   et al. | 2021-07-29 |
Extreme Ultraviolet Mask Absorber Materials App 20210232042 - Liu; Shuwei ;   et al. | 2021-07-29 |
Extreme Ultraviolet Mask Blank Hard Mask Materials App 20210232041 - Liu; Shuwei ;   et al. | 2021-07-29 |
Extreme Ultraviolet Mask Blank Defect Reduction Methods App 20210124253 - Yoong; Herng Yau ;   et al. | 2021-04-29 |
Extreme Ultraviolet Mask Blank Defect Reduction Methods App 20210124252 - Xiao; Wen ;   et al. | 2021-04-29 |
Methods for forming and cleaning photolithography reticles Grant 7,767,365 - Carpenter , et al. August 3, 2 | 2010-08-03 |
Methods for converting reticle configurations and methods for modifying reticles Grant 7,592,105 - Chance , et al. September 22, 2 | 2009-09-22 |
Methods for forming and cleaning photolithography reticles App 20080057411 - Carpenter; Craig M. ;   et al. | 2008-03-06 |
Methods for converting reticle configurations Grant 7,147,974 - Chance , et al. December 12, 2 | 2006-12-12 |
Methods for converting reticle configurations App 20060257757 - Chance; Randall W. ;   et al. | 2006-11-16 |
Methods for converting reticle configurations App 20050077266 - Chance, Randal W. ;   et al. | 2005-04-14 |
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.