loadpatents
name:-0.0071108341217041
name:-0.0044369697570801
name:-0.00045394897460938
Zerrade; Azeddine Patent Filings

Zerrade; Azeddine

Patent Applications and Registrations

Patent applications and USPTO patent grants for Zerrade; Azeddine.The latest application filed is for "euv mask blank absorber defect reduction".

Company Profile
0.5.13
  • Zerrade; Azeddine - Singapore SG
  • Zerrade; Azeddine - Boise ID
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
EUV mask blank absorber defect reduction
Grant 11,454,876 - Varghese , et al. September 27, 2
2022-09-27
EUV Mask Blank Absorber Defect Reduction
App 20220187696 - Varghese; Binni ;   et al.
2022-06-16
Extreme ultraviolet mask absorber materials
Grant 11,300,871 - Liu , et al. April 12, 2
2022-04-12
Extreme Ultraviolet Mask Absorber Materials
App 20210341828 - Liu; Shiyu ;   et al.
2021-11-04
Extreme Ultraviolet Mask Blank Defect Reduction
App 20210333703 - Xiao; Wen ;   et al.
2021-10-28
Extreme Ultraviolet Mask Absorber Materials
App 20210302826 - Liu; Shuwei ;   et al.
2021-09-30
Extreme Ultraviolet Mask Absorber Materials
App 20210232039 - Liu; Shuwei ;   et al.
2021-07-29
Extreme Ultraviolet Mask Blank Hard Mask Materials
App 20210232040 - Liu; Shuwei ;   et al.
2021-07-29
Extreme Ultraviolet Mask Absorber Materials
App 20210232042 - Liu; Shuwei ;   et al.
2021-07-29
Extreme Ultraviolet Mask Blank Hard Mask Materials
App 20210232041 - Liu; Shuwei ;   et al.
2021-07-29
Extreme Ultraviolet Mask Blank Defect Reduction Methods
App 20210124253 - Yoong; Herng Yau ;   et al.
2021-04-29
Extreme Ultraviolet Mask Blank Defect Reduction Methods
App 20210124252 - Xiao; Wen ;   et al.
2021-04-29
Methods for forming and cleaning photolithography reticles
Grant 7,767,365 - Carpenter , et al. August 3, 2
2010-08-03
Methods for converting reticle configurations and methods for modifying reticles
Grant 7,592,105 - Chance , et al. September 22, 2
2009-09-22
Methods for forming and cleaning photolithography reticles
App 20080057411 - Carpenter; Craig M. ;   et al.
2008-03-06
Methods for converting reticle configurations
Grant 7,147,974 - Chance , et al. December 12, 2
2006-12-12
Methods for converting reticle configurations
App 20060257757 - Chance; Randall W. ;   et al.
2006-11-16
Methods for converting reticle configurations
App 20050077266 - Chance, Randal W. ;   et al.
2005-04-14

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